JP3780104B2 - 塗布装置及び塗布方法 - Google Patents

塗布装置及び塗布方法 Download PDF

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Publication number
JP3780104B2
JP3780104B2 JP21870798A JP21870798A JP3780104B2 JP 3780104 B2 JP3780104 B2 JP 3780104B2 JP 21870798 A JP21870798 A JP 21870798A JP 21870798 A JP21870798 A JP 21870798A JP 3780104 B2 JP3780104 B2 JP 3780104B2
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Japan
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substrate
opening
container
coating
holding member
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Expired - Fee Related
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JP21870798A
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Japanese (ja)
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JP2000033319A5 (enExample
JP2000033319A (ja
Inventor
伝 大森
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
JP21870798A 1998-07-17 1998-07-17 塗布装置及び塗布方法 Expired - Fee Related JP3780104B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21870798A JP3780104B2 (ja) 1998-07-17 1998-07-17 塗布装置及び塗布方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21870798A JP3780104B2 (ja) 1998-07-17 1998-07-17 塗布装置及び塗布方法

Publications (3)

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JP2000033319A JP2000033319A (ja) 2000-02-02
JP2000033319A5 JP2000033319A5 (enExample) 2004-11-18
JP3780104B2 true JP3780104B2 (ja) 2006-05-31

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JP21870798A Expired - Fee Related JP3780104B2 (ja) 1998-07-17 1998-07-17 塗布装置及び塗布方法

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5257915B2 (ja) * 2006-09-29 2013-08-07 国立大学法人東北大学 膜塗布装置および膜塗布方法

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JP2000033319A (ja) 2000-02-02

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