JP3768029B2 - パターン欠陥修正装置 - Google Patents

パターン欠陥修正装置 Download PDF

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Publication number
JP3768029B2
JP3768029B2 JP15550799A JP15550799A JP3768029B2 JP 3768029 B2 JP3768029 B2 JP 3768029B2 JP 15550799 A JP15550799 A JP 15550799A JP 15550799 A JP15550799 A JP 15550799A JP 3768029 B2 JP3768029 B2 JP 3768029B2
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JP
Japan
Prior art keywords
pattern
optical system
defect
image
differential interference
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP15550799A
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English (en)
Japanese (ja)
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JP2000146537A5 (enExample
JP2000146537A (ja
Inventor
博明 大庭
亨 ▲高▼橋
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NTN Corp
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NTN Corp
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Priority to JP15550799A priority Critical patent/JP3768029B2/ja
Publication of JP2000146537A publication Critical patent/JP2000146537A/ja
Publication of JP2000146537A5 publication Critical patent/JP2000146537A5/ja
Application granted granted Critical
Publication of JP3768029B2 publication Critical patent/JP3768029B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Laser Beam Processing (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP15550799A 1998-08-31 1999-06-02 パターン欠陥修正装置 Expired - Lifetime JP3768029B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15550799A JP3768029B2 (ja) 1998-08-31 1999-06-02 パターン欠陥修正装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP10-245432 1998-08-31
JP24543298 1998-08-31
JP15550799A JP3768029B2 (ja) 1998-08-31 1999-06-02 パターン欠陥修正装置

Publications (3)

Publication Number Publication Date
JP2000146537A JP2000146537A (ja) 2000-05-26
JP2000146537A5 JP2000146537A5 (enExample) 2005-02-24
JP3768029B2 true JP3768029B2 (ja) 2006-04-19

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ID=26483492

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15550799A Expired - Lifetime JP3768029B2 (ja) 1998-08-31 1999-06-02 パターン欠陥修正装置

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JP (1) JP3768029B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104914075A (zh) * 2015-05-22 2015-09-16 湖北省地质实验测试中心 一种基于ccd传感器的元素检测系统及其检测方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100429637B1 (ko) * 2001-12-17 2004-05-03 엘지전자 주식회사 다중 광로 광원장치 및 그 동작방법
US7633033B2 (en) * 2004-01-09 2009-12-15 General Lasertronics Corporation Color sensing for laser decoating
JP4809756B2 (ja) * 2006-11-30 2011-11-09 日本放送協会 ホログラムデータ領域特定装置及びホログラムデータ領域特定プログラム
TW200936287A (en) 2007-11-26 2009-09-01 Nat Inst Of Advanced Ind Scien Mold removing method
JP4716148B1 (ja) * 2010-03-30 2011-07-06 レーザーテック株式会社 検査装置並びに欠陥分類方法及び欠陥検出方法
KR101176475B1 (ko) 2011-06-23 2012-08-28 주식회사 코윈디에스티 유기전계발광소자용 리페어장치의 광학계
US9726891B2 (en) * 2015-09-03 2017-08-08 Microsoft Technology Licensing, Llc Left and right eye optical paths with shared optical element for head-mounted display device
CN109781735A (zh) * 2018-12-26 2019-05-21 中电科信息产业有限公司 一种爆珠在线检测装置及检测方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02170279A (ja) * 1988-12-23 1990-07-02 Hitachi Ltd 被検査対象パターンの欠陥検出方法及びその装置
JP2918938B2 (ja) * 1989-11-15 1999-07-12 オリンパス光学工業株式会社 顕微鏡用ターレットコンデンサー
JPH04340740A (ja) * 1991-05-17 1992-11-27 Fujitsu Ltd 重欠点異物自動検査装置及び検査方法
JP3056823B2 (ja) * 1991-05-30 2000-06-26 エヌティエヌ株式会社 欠陥検査装置
JP3047646B2 (ja) * 1991-10-31 2000-05-29 株式会社日立製作所 欠陥検出方法及びその装置
JPH1073542A (ja) * 1996-04-17 1998-03-17 Nikon Corp 検出装置及び検出方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104914075A (zh) * 2015-05-22 2015-09-16 湖北省地质实验测试中心 一种基于ccd传感器的元素检测系统及其检测方法

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Publication number Publication date
JP2000146537A (ja) 2000-05-26

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