JP3752338B2 - マクロ検査装置及びプロセスモニタリング方法 - Google Patents
マクロ検査装置及びプロセスモニタリング方法 Download PDFInfo
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- JP3752338B2 JP3752338B2 JP01869397A JP1869397A JP3752338B2 JP 3752338 B2 JP3752338 B2 JP 3752338B2 JP 01869397 A JP01869397 A JP 01869397A JP 1869397 A JP1869397 A JP 1869397A JP 3752338 B2 JP3752338 B2 JP 3752338B2
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- 238000007689 inspection Methods 0.000 title claims description 71
- 238000000034 method Methods 0.000 title claims description 59
- 238000012544 monitoring process Methods 0.000 title claims description 18
- 239000000758 substrate Substances 0.000 claims description 75
- 230000007547 defect Effects 0.000 claims description 64
- 238000012545 processing Methods 0.000 claims description 37
- 238000004519 manufacturing process Methods 0.000 claims description 34
- 230000005856 abnormality Effects 0.000 claims description 31
- 238000003384 imaging method Methods 0.000 claims description 14
- 238000004458 analytical method Methods 0.000 claims description 11
- 238000005286 illumination Methods 0.000 claims description 6
- 238000001514 detection method Methods 0.000 claims description 5
- 238000012360 testing method Methods 0.000 claims description 5
- 238000003705 background correction Methods 0.000 claims description 4
- 244000284152 Carapichea ipecacuanha Species 0.000 claims description 3
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- 229940029408 ipecac Drugs 0.000 claims description 3
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Images
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Image Processing (AREA)
- Image Analysis (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP01869397A JP3752338B2 (ja) | 1997-01-31 | 1997-01-31 | マクロ検査装置及びプロセスモニタリング方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP01869397A JP3752338B2 (ja) | 1997-01-31 | 1997-01-31 | マクロ検査装置及びプロセスモニタリング方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10221040A JPH10221040A (ja) | 1998-08-21 |
| JPH10221040A5 JPH10221040A5 (enExample) | 2004-12-24 |
| JP3752338B2 true JP3752338B2 (ja) | 2006-03-08 |
Family
ID=11978713
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP01869397A Expired - Fee Related JP3752338B2 (ja) | 1997-01-31 | 1997-01-31 | マクロ検査装置及びプロセスモニタリング方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3752338B2 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4744665B2 (ja) * | 2000-03-15 | 2011-08-10 | オリンパス株式会社 | 基板検査装置及び基板検査システム |
| JP4733820B2 (ja) * | 2000-09-05 | 2011-07-27 | Sumco Techxiv株式会社 | 不良ウエハの判定装置及び判定方法 |
| JP4733252B2 (ja) * | 2000-09-05 | 2011-07-27 | Sumco Techxiv株式会社 | ウエハの表面検査装置及び検査方法 |
| TW513772B (en) * | 2000-09-05 | 2002-12-11 | Komatsu Denshi Kinzoku Kk | Apparatus for inspecting wafer surface, method for inspecting wafer surface, apparatus for judging defective wafer, method for judging defective wafer and information treatment apparatus of wafer surface |
| JP4659961B2 (ja) * | 2000-09-29 | 2011-03-30 | Sumco Techxiv株式会社 | ウエハ表面情報処理装置 |
| JP4623809B2 (ja) * | 2000-09-29 | 2011-02-02 | Sumco Techxiv株式会社 | ウエハ表面検査装置及びウエハ表面検査方法 |
| JP2003100599A (ja) * | 2001-09-25 | 2003-04-04 | Nikon Corp | 露光装置の調整方法及び露光システム |
| GB2422202A (en) * | 2005-01-10 | 2006-07-19 | Univ East Anglia | A device for determining dust accumulation |
| JP2012184988A (ja) * | 2011-03-04 | 2012-09-27 | Toray Eng Co Ltd | 膜厚むらの検査装置および検査方法 |
| KR20120129020A (ko) * | 2011-05-18 | 2012-11-28 | 동우 화인켐 주식회사 | 필름 결함 모니터링 장치 및 방법 |
| JP2013008903A (ja) * | 2011-06-27 | 2013-01-10 | Kyocera Corp | 太陽電池素子の検査装置および検査方法 |
| JP5862422B2 (ja) * | 2012-03-30 | 2016-02-16 | 大日本印刷株式会社 | 画像処理装置、画像処理プログラム及び画像処理方法 |
| JP5764592B2 (ja) * | 2013-02-22 | 2015-08-19 | 東京エレクトロン株式会社 | 基板処理装置、基板処理装置の監視装置及び基板処理装置の監視方法 |
| JP7021886B2 (ja) * | 2017-09-19 | 2022-02-17 | 株式会社Screenホールディングス | 基板検査装置、基板処理装置、基板検査方法および基板処理方法 |
-
1997
- 1997-01-31 JP JP01869397A patent/JP3752338B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH10221040A (ja) | 1998-08-21 |
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