JP3713354B2 - 位置測定装置 - Google Patents

位置測定装置 Download PDF

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Publication number
JP3713354B2
JP3713354B2 JP06866997A JP6866997A JP3713354B2 JP 3713354 B2 JP3713354 B2 JP 3713354B2 JP 06866997 A JP06866997 A JP 06866997A JP 6866997 A JP6866997 A JP 6866997A JP 3713354 B2 JP3713354 B2 JP 3713354B2
Authority
JP
Japan
Prior art keywords
light
measurement
position measurement
signal
illumination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP06866997A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10267613A (ja
JPH10267613A5 (enExample
Inventor
真也 渡邉
等 鈴木
和夫 阿部
晋 斎藤
徹 東條
亮一 平野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Topcon Corp
Original Assignee
Toshiba Corp
Topcon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Topcon Corp filed Critical Toshiba Corp
Priority to JP06866997A priority Critical patent/JP3713354B2/ja
Priority to US09/040,391 priority patent/US6080990A/en
Publication of JPH10267613A publication Critical patent/JPH10267613A/ja
Publication of JPH10267613A5 publication Critical patent/JPH10267613A5/ja
Application granted granted Critical
Publication of JP3713354B2 publication Critical patent/JP3713354B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Transform (AREA)
  • Electron Beam Exposure (AREA)
JP06866997A 1997-03-21 1997-03-21 位置測定装置 Expired - Fee Related JP3713354B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP06866997A JP3713354B2 (ja) 1997-03-21 1997-03-21 位置測定装置
US09/040,391 US6080990A (en) 1997-03-21 1998-03-18 Position measuring apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06866997A JP3713354B2 (ja) 1997-03-21 1997-03-21 位置測定装置

Publications (3)

Publication Number Publication Date
JPH10267613A JPH10267613A (ja) 1998-10-09
JPH10267613A5 JPH10267613A5 (enExample) 2005-01-20
JP3713354B2 true JP3713354B2 (ja) 2005-11-09

Family

ID=13380363

Family Applications (1)

Application Number Title Priority Date Filing Date
JP06866997A Expired - Fee Related JP3713354B2 (ja) 1997-03-21 1997-03-21 位置測定装置

Country Status (2)

Country Link
US (1) US6080990A (enExample)
JP (1) JP3713354B2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7116401B2 (en) * 1999-03-08 2006-10-03 Asml Netherlands B.V. Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method
CA2319898C (en) 2000-09-18 2006-05-16 Institut National D'optique Position encoding optical device and method
US7791727B2 (en) 2004-08-16 2010-09-07 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
JP5227023B2 (ja) * 2004-09-21 2013-07-03 ディジタル シグナル コーポレイション 生理学的機能を遠隔的にモニターするシステムおよび方法
TWI278682B (en) * 2004-11-23 2007-04-11 Ind Tech Res Inst Fiber optic interferometric position sensor and measuring method thereof
CA2597712C (en) 2005-02-14 2013-08-13 Digital Signal Corporation Laser radar system and system and method for providing chirped electromagnetic radiation
US7528953B2 (en) * 2005-03-01 2009-05-05 Kla-Tencor Technologies Corp. Target acquisition and overlay metrology based on two diffracted orders imaging
CN101437440B (zh) 2005-12-14 2011-09-07 数字信号公司 跟踪眼球运动的系统和方法
US8081670B2 (en) * 2006-02-14 2011-12-20 Digital Signal Corporation System and method for providing chirped electromagnetic radiation
CA2753197C (en) 2009-02-20 2018-09-11 Digital Signal Corporation System and method for generating three dimensional images using lidar and video measurements
CN103398666B (zh) * 2013-05-27 2015-12-23 电子科技大学 一种用于双层周期性微结构的层间错位测试方法
CN104749901B (zh) * 2013-12-31 2017-08-29 上海微电子装备有限公司 一种调焦调平装置
CN111352304B (zh) * 2018-12-24 2021-11-19 上海微电子装备（集团）股份有限公司 调焦调平装置、光刻设备及调焦调平方法
CN112097651B (zh) * 2020-09-11 2022-07-22 中国科学院长春光学精密机械与物理研究所 外差二维光栅位移测量系统及测量方法
WO2025242413A1 (en) * 2024-05-20 2025-11-27 Asml Netherlands B.V. Systems, methods, and software for phase-based alignment sensors

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5530550A (en) * 1994-12-21 1996-06-25 Tencor Instruments Optical wafer positioning system
JPH0966702A (ja) * 1995-08-31 1997-03-11 Mitsubishi Motors Corp ダブルタイヤ用ホイールディスク締結構造
JP3364382B2 (ja) * 1996-07-12 2003-01-08 株式会社東芝 試料面位置測定装置及び測定方法

Also Published As

Publication number Publication date
JPH10267613A (ja) 1998-10-09
US6080990A (en) 2000-06-27

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