JP3683166B2 - 基板の熱処理方法及びそれに用いる連続式熱処理炉 - Google Patents

基板の熱処理方法及びそれに用いる連続式熱処理炉 Download PDF

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Publication number
JP3683166B2
JP3683166B2 JP2000238538A JP2000238538A JP3683166B2 JP 3683166 B2 JP3683166 B2 JP 3683166B2 JP 2000238538 A JP2000238538 A JP 2000238538A JP 2000238538 A JP2000238538 A JP 2000238538A JP 3683166 B2 JP3683166 B2 JP 3683166B2
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JP
Japan
Prior art keywords
temperature
heat
heating
heat treatment
treated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000238538A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002048475A (ja
Inventor
聡 谷口
一二夫 野入
道郎 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
Priority to JP2000238538A priority Critical patent/JP3683166B2/ja
Priority to TW090113100A priority patent/TW469338B/zh
Priority to KR10-2001-0046687A priority patent/KR100440667B1/ko
Publication of JP2002048475A publication Critical patent/JP2002048475A/ja
Application granted granted Critical
Publication of JP3683166B2 publication Critical patent/JP3683166B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/36—Arrangements of heating devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B5/10—Muffles
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/06—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated
    • F27B9/062—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated electrically heated
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/3077—Arrangements for treating electronic components, e.g. semiconductors
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/40—Arrangements of controlling or monitoring devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Tunnel Furnaces (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
JP2000238538A 2000-08-07 2000-08-07 基板の熱処理方法及びそれに用いる連続式熱処理炉 Expired - Fee Related JP3683166B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2000238538A JP3683166B2 (ja) 2000-08-07 2000-08-07 基板の熱処理方法及びそれに用いる連続式熱処理炉
TW090113100A TW469338B (en) 2000-08-07 2001-05-30 Substrate heating method and the continuous heat treatment furnace thereof
KR10-2001-0046687A KR100440667B1 (ko) 2000-08-07 2001-08-02 기판의 열처리 방법 및 그에 사용하는 연속식 열처리로

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000238538A JP3683166B2 (ja) 2000-08-07 2000-08-07 基板の熱処理方法及びそれに用いる連続式熱処理炉

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2004213913A Division JP2004354043A (ja) 2004-07-22 2004-07-22 基板の熱処理方法及びそれに用いる連続式熱処理炉

Publications (2)

Publication Number Publication Date
JP2002048475A JP2002048475A (ja) 2002-02-15
JP3683166B2 true JP3683166B2 (ja) 2005-08-17

Family

ID=18730225

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000238538A Expired - Fee Related JP3683166B2 (ja) 2000-08-07 2000-08-07 基板の熱処理方法及びそれに用いる連続式熱処理炉

Country Status (3)

Country Link
JP (1) JP3683166B2 (ko)
KR (1) KR100440667B1 (ko)
TW (1) TW469338B (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4523479B2 (ja) * 2005-03-01 2010-08-11 日本碍子株式会社 連続式熱処理炉及び熱処理方法
JP4978001B2 (ja) * 2005-01-17 2012-07-18 オムロン株式会社 温度制御方法、温度制御装置および熱処理装置
JP4999422B2 (ja) * 2005-10-26 2012-08-15 美濃窯業株式会社 連続式の熱処理方法及び連続式の熱処理炉
JP4874754B2 (ja) * 2006-09-29 2012-02-15 信越半導体株式会社 被加熱物の熱処理方法
JP5216246B2 (ja) * 2007-06-04 2013-06-19 光洋サーモシステム株式会社 連続焼成炉
TWI601926B (zh) * 2014-10-24 2017-10-11 Dong-Ming Li Increase the number of independent temperature control within the pre-baking oven structure
TWI557389B (zh) * 2014-10-24 2016-11-11 Dong-Ming Li Improvement of Heating Device of Light Resistance Pre - oven
CN105800920B (zh) * 2014-12-31 2018-10-23 中国科学院广州能源研究所 一种片状基片热色涂层的热处理装置
CN107256924B (zh) * 2017-06-09 2019-10-11 京东方科技集团股份有限公司 阻变器件及其制作方法、显示基板的制作方法、显示装置
TWI730525B (zh) * 2019-12-04 2021-06-11 財團法人金屬工業研究發展中心 氣電混合爐
TWI729886B (zh) * 2020-07-21 2021-06-01 群翊工業股份有限公司 連續式真空加熱設備

Also Published As

Publication number Publication date
TW469338B (en) 2001-12-21
JP2002048475A (ja) 2002-02-15
KR100440667B1 (ko) 2004-07-19
KR20020012497A (ko) 2002-02-16

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