JP3658852B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP3658852B2
JP3658852B2 JP08130096A JP8130096A JP3658852B2 JP 3658852 B2 JP3658852 B2 JP 3658852B2 JP 08130096 A JP08130096 A JP 08130096A JP 8130096 A JP8130096 A JP 8130096A JP 3658852 B2 JP3658852 B2 JP 3658852B2
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JP
Japan
Prior art keywords
impurity
exposure apparatus
outside air
chamber
impurity concentration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP08130096A
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English (en)
Japanese (ja)
Other versions
JPH09275055A (ja
JPH09275055A5 (enExample
Inventor
正幸 村山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP08130096A priority Critical patent/JP3658852B2/ja
Priority to KR1019970012127A priority patent/KR100542414B1/ko
Publication of JPH09275055A publication Critical patent/JPH09275055A/ja
Priority to US09/266,873 priority patent/US6535270B1/en
Priority to US10/237,133 priority patent/US20030035087A1/en
Publication of JPH09275055A5 publication Critical patent/JPH09275055A5/ja
Priority to US11/071,106 priority patent/US20050185156A1/en
Application granted granted Critical
Publication of JP3658852B2 publication Critical patent/JP3658852B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP08130096A 1996-03-27 1996-04-03 露光装置 Expired - Fee Related JP3658852B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP08130096A JP3658852B2 (ja) 1996-04-03 1996-04-03 露光装置
KR1019970012127A KR100542414B1 (ko) 1996-03-27 1997-03-27 노광장치및공조장치
US09/266,873 US6535270B1 (en) 1996-03-27 1999-03-12 Exposure apparatus and air-conditioning apparatus for use with exposure apparatus
US10/237,133 US20030035087A1 (en) 1996-03-27 2002-09-09 Exposure apparatus and air-conditioning apparatus for use with exposure apparatus
US11/071,106 US20050185156A1 (en) 1996-03-27 2005-03-04 Exposure apparatus and air-conditioning apparatus for use with exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP08130096A JP3658852B2 (ja) 1996-04-03 1996-04-03 露光装置

Publications (3)

Publication Number Publication Date
JPH09275055A JPH09275055A (ja) 1997-10-21
JPH09275055A5 JPH09275055A5 (enExample) 2004-07-29
JP3658852B2 true JP3658852B2 (ja) 2005-06-08

Family

ID=13742551

Family Applications (1)

Application Number Title Priority Date Filing Date
JP08130096A Expired - Fee Related JP3658852B2 (ja) 1996-03-27 1996-04-03 露光装置

Country Status (1)

Country Link
JP (1) JP3658852B2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6313953B1 (en) * 1999-01-15 2001-11-06 Donaldson Company, Inc. Gas chemical filtering for optimal light transmittance; and methods
WO2001011665A1 (en) * 1999-08-05 2001-02-15 Nikon Corporation Optical device for illumination, exposure device, container of optical part, method of assembling exposure device, method of evaluating material, and method and device for evaluating filter
DE10061248B4 (de) * 2000-12-09 2004-02-26 Carl Zeiss Verfahren und Vorrichtung zur In-situ-Dekontamination eines EUV-Lithographiegerätes
JP2008224485A (ja) * 2007-03-14 2008-09-25 Espec Corp シロキサン耐久試験機
JP5219878B2 (ja) * 2009-02-20 2013-06-26 キヤノン株式会社 露光装置及び外気導入ユニット、それを用いたデバイスの製造方法
WO2012131944A1 (ja) * 2011-03-30 2012-10-04 富士通株式会社 大気環境測定装置、大気環境測定方法及び大気環境測定システム
JP6356059B2 (ja) * 2014-12-26 2018-07-11 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体
JP7599775B2 (ja) * 2020-09-08 2024-12-16 株式会社ディスコ 高圧エアーを利用する装置

Also Published As

Publication number Publication date
JPH09275055A (ja) 1997-10-21

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