JP3637680B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP3637680B2
JP3637680B2 JP10621796A JP10621796A JP3637680B2 JP 3637680 B2 JP3637680 B2 JP 3637680B2 JP 10621796 A JP10621796 A JP 10621796A JP 10621796 A JP10621796 A JP 10621796A JP 3637680 B2 JP3637680 B2 JP 3637680B2
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JP
Japan
Prior art keywords
wafer
exposure
circuit pattern
coordinate value
sample circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP10621796A
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English (en)
Japanese (ja)
Other versions
JPH09275066A (ja
JPH09275066A5 (enExample
Inventor
宗毅 杉本
康明 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP10621796A priority Critical patent/JP3637680B2/ja
Publication of JPH09275066A publication Critical patent/JPH09275066A/ja
Publication of JPH09275066A5 publication Critical patent/JPH09275066A5/ja
Application granted granted Critical
Publication of JP3637680B2 publication Critical patent/JP3637680B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10621796A 1996-04-02 1996-04-02 露光装置 Expired - Fee Related JP3637680B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10621796A JP3637680B2 (ja) 1996-04-02 1996-04-02 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10621796A JP3637680B2 (ja) 1996-04-02 1996-04-02 露光装置

Publications (3)

Publication Number Publication Date
JPH09275066A JPH09275066A (ja) 1997-10-21
JPH09275066A5 JPH09275066A5 (enExample) 2004-07-15
JP3637680B2 true JP3637680B2 (ja) 2005-04-13

Family

ID=14427991

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10621796A Expired - Fee Related JP3637680B2 (ja) 1996-04-02 1996-04-02 露光装置

Country Status (1)

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JP (1) JP3637680B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1182508B1 (de) * 2000-08-14 2012-12-12 Vistec Electron Beam GmbH Verfahren zum Belichten eines aus mehreren Ebenen bestehenden Layouts auf einem Wafer
JP4340638B2 (ja) * 2004-03-02 2009-10-07 エーエスエムエル ネザーランズ ビー．ブイ． 基板の表側または裏側に結像するためのリソグラフィ装置、基板識別方法、デバイス製造方法、基板、およびコンピュータプログラム
US7808613B2 (en) 2006-08-03 2010-10-05 Asml Netherlands B.V. Individual wafer history storage for overlay corrections
JP7359899B1 (ja) * 2022-04-27 2023-10-11 華邦電子股▲ふん▼有限公司 半導体製造装置及びその半導体製造方法

Also Published As

Publication number Publication date
JPH09275066A (ja) 1997-10-21

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