JP3332555B2 - Semiconductor device and manufacturing method thereof - Google Patents

Semiconductor device and manufacturing method thereof

Info

Publication number
JP3332555B2
JP3332555B2 JP5075794A JP5075794A JP3332555B2 JP 3332555 B2 JP3332555 B2 JP 3332555B2 JP 5075794 A JP5075794 A JP 5075794A JP 5075794 A JP5075794 A JP 5075794A JP 3332555 B2 JP3332555 B2 JP 3332555B2
Authority
JP
Japan
Prior art keywords
semiconductor chip
substrate
main surface
gold
connection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP5075794A
Other languages
Japanese (ja)
Other versions
JPH07226455A (en
Inventor
博 岩崎
秀夫 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP5075794A priority Critical patent/JP3332555B2/en
Priority to EP94306204A priority patent/EP0644587B1/en
Priority to DE69431023T priority patent/DE69431023T2/en
Priority to KR1019940021753A priority patent/KR0172203B1/en
Publication of JPH07226455A publication Critical patent/JPH07226455A/en
Priority to US08/749,028 priority patent/US5866950A/en
Application granted granted Critical
Publication of JP3332555B2 publication Critical patent/JP3332555B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector

Landscapes

  • Wire Bonding (AREA)

Abstract

PURPOSE:To provide a manufacturing method capable of manufacturing the semiconductor package and assuring thin and compact form at low cost with high reliability and high yield. CONSTITUTION:The semiconductor package is provided with a substrate 7 having wiring circuit including a connecting part, a semiconductor chip 8 packaged in facedown mode on one main surface of the substrate 7, a resin layer 11 filling up the gap between the lower surface of the semiconductor chip 8 and the upper surface of the substrate 7 as well as a planar outer connecting terminal 9 electrically connecting to the semiconductor chip 8 so as to be led out and exposed in the other main surface side of the substrate 7. On the other hand, the manufacturing method is composed of the four steps as follows, i.e., the first step of aligning and arranging step of the connecting part 7a of the substrate 7 corresponding to the electrode terminal part 8a of the semiconductor chip 8 with one main surface of the substrate 7 having a wiring circuit including the connecting part, the second step of fixing and connecting the connected parts of the connecting part 7a of the corresponded and aligned substrate 7 surface and that of electrode terminal part 8a of the semiconductor chip 8 to be assembled, the third step of filling the gap between the assembled substrate 7 surface and the lower surface of the semiconductor chip 8 and the fourth step of setting the filled up resin 11.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、半導体パッケージおよ
びその製造方法に係り、たとえばカード型の外部記憶媒
体などに適する薄形ないしコンパクトな半導体パッケー
ジおよびその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor package and a method of manufacturing the same, and more particularly, to a thin or compact semiconductor package suitable for a card-type external storage medium and a method of manufacturing the same.

【0002】[0002]

【従来の技術】各種データなどの記録・保存が可能な記
憶装置として、たとえば各種のメモリカードが知られて
いる。そして、この種のカード類の構成においては、カ
ードの大きさや厚さなどに制約があるため、たとえばメ
モリ機能などに寄与する半導体チップ(IC素子など)
の薄形実装が要求され、またパッケージ化する場合も可
及的な薄形,コンパクト化が望まれる。
2. Description of the Related Art For example, various memory cards are known as storage devices capable of recording and storing various data. In the configuration of this kind of cards, since the size and thickness of the card are restricted, for example, a semiconductor chip (such as an IC element) contributing to a memory function or the like
It is required to mount as thin as possible, and it is desired to make the package as thin and compact as possible.

【0003】このような薄形実装の要求、たとえば厚み
方向に対して 1mm以下のスペースに実装する必要性に対
しては、TAB(Tape Automated Bonding)法、フリッ
プチップ実装、COB(Chip on Board)法が知られてい
る。また、薄形パッケージの一例としては、たとえば図
7に要部構成を断面的に示すごとく、所要の半導体チッ
プ1などを一主面に搭載・実装する回路基板2と、スル
ホール3を介して前記回路基板2の他主面側に導出され
た外部接続用端子4と、前記半導体チップ1などの実装
領域面を封止・被覆するモールド樹脂層5とを具備した
構成を採ったモジュールが知られている。なお、図7に
おいて、6はボンディングワイヤである。
In order to meet such requirements for thin mounting, for example, mounting in a space of 1 mm or less in the thickness direction, TAB (Tape Automated Bonding), flip chip mounting, COB (Chip on Board) The law is known. As an example of a thin package, as shown in a sectional view of a main part in FIG. 7, for example, a circuit board 2 for mounting and mounting a required semiconductor chip 1 and the like on one main surface and the through hole 3 A module having a configuration including an external connection terminal 4 led to the other main surface side of the circuit board 2 and a mold resin layer 5 for sealing and covering a mounting area surface such as the semiconductor chip 1 is known. ing. In FIG. 7, reference numeral 6 denotes a bonding wire.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、前記T
AB法の場合は、キャリアーテープの製造コストが比較
的高いことに加え、実装プロセスにおいてパッケージサ
イズに合わせて専用の金型や、ボンディングツールを必
要とするため、アッセンブリコストが相対的に高くな
り、実用的な手段としては経済的に問題がある。
However, the above-mentioned T
In the case of the AB method, in addition to the relatively high manufacturing cost of the carrier tape, a special mold and a bonding tool are required according to the package size in the mounting process, so that the assembly cost is relatively high. Practical means are economically problematic.

【0005】一方、フリップチップ実装およびCOB法
の場合は、KGN(Known Good Die)をいかに確保するか
が問題である。チップ状態でのバーンインの開発が必要
であるが難しく、通常は使用する半導体チップ1につい
て予めバーンインを行い得ないので、信頼性上の問題が
ある。つまり、この種の半導体チップ(ICチップ)1
は、半導体チップ自体として近い将来発現するであろ欠
陥を検知するところの、いわゆるバーンインを行うこと
ができないため、実装・モジュール化後の実用初期段階
でトラブルを起こす可能性を秘めていることになり、信
頼性の点で問題があるといえる。この信頼性の問題に対
しては、実装した半導体チップ1などの着脱・交換手
段、すなわちリペアもしくはリワークによって対応する
ことも可能であるが、結果的にアッセンブリコストのさ
らなる増大を招来することになるとともに、技術的に困
難なことが多い。特に、電極端子数が増大した半導体チ
ップ1をCOB法で実装する場合は、アッセンブリに多
くの時間を要するので、コストアップを増長することに
なる。
On the other hand, in the case of the flip chip mounting and the COB method, there is a problem how to secure KGN (Known Good Die). It is necessary, but difficult, to develop a burn-in in a chip state. Normally, it is not possible to perform a burn-in in advance on a semiconductor chip 1 to be used. That is, this kind of semiconductor chip (IC chip) 1
Cannot detect burn-in defects that will appear in the near future as semiconductor chips themselves, so it is not possible to perform burn-in, so there is a possibility that trouble will occur at the early practical stage after mounting and modularization. It can be said that there is a problem in terms of reliability. This reliability problem can be dealt with by means of attaching / detaching / exchanging the mounted semiconductor chip 1 or the like, that is, repair or rework, but as a result, the assembly cost is further increased. At the same time, it is often technically difficult. In particular, when the semiconductor chip 1 having the increased number of electrode terminals is mounted by the COB method, a large amount of time is required for assembly, which increases the cost.

【0006】さらに、コンパクト化の点についてみる
と、TAB法およびCOB法の場合は、フリップチップ
実装の場合に較べて、広い実装面積を要するのでコンパ
クト化が阻害される。また、前記片面側モールドによる
パッケージ化モジュールの場合は、一般的な(通常の)
トランスファーモールド工程において、ボンディングワ
イヤ6の流れ発生や接続部の離脱発生なども起こり易
く、信頼性および歩留まりの点で問題がある。加えて、
ボンディングワイヤ6の高さも、現状では 0.1mm以下に
制御することが困難で、薄型パッケージを形成する上で
障害になっている。また、ボンディングワイヤ6を外部
接続用端子と結線する際、半導体チップ1外に余分なス
ペースも必要とし、コンパクト化を阻害している。
Further, in terms of compactness, the TAB method and the COB method require a larger mounting area than the flip-chip mounting method, which hinders compactness. In the case of a packaged module using the single-sided mold, a general (normal)
In the transfer molding process, a flow of the bonding wire 6 and a detachment of the connection portion are apt to occur, which causes problems in reliability and yield. in addition,
At present, it is difficult to control the height of the bonding wire 6 to 0.1 mm or less, which is an obstacle to forming a thin package. Further, when connecting the bonding wires 6 to the terminals for external connection, an extra space is required outside the semiconductor chip 1, which hinders downsizing.

【0007】本発明は上記事情に対処してなされたもの
で、薄形・コンパクトで、低コストかつ高信頼性を保証
し得る半導体パッケージ、および前記半導体パッケージ
を低コスト・高歩留まりに製造し得る製造方法の提供を
目的とする。
The present invention has been made in view of the above circumstances, and is a thin and compact semiconductor package which can guarantee low cost and high reliability, and can manufacture the semiconductor package at low cost and high yield. The purpose is to provide a manufacturing method.

【0008】[0008]

【課題を解決するための手段】本発明に係る半導体パッ
ケージは、接続部を含む配線回路を備えた基板と、前記
基板の一主面にフェースダウン型に実装された半導体チ
ップと、前記半導体チップ下面および基板上面間を充填
する樹脂層と、前記半導体チップに接続部を介して電気
的に接続し、かつ基板の他主面側に導出・露出させた平
面型の外部接続用端子とを具備して成り、さらに要すれ
ば半導体チップの電極端子部および基板の接続部を固相
拡散接合させたことを特徴とすし、また本発明に係る第
1の半導体パッケージの製造方法は、一主面に接続部
(接続パッド)を含む配線回路を備え、他主面に平面型
の外部接続用端子を導出・露出させた基板の前記一主面
に、半導体チップの電極端子部を前記接部に対応させ、
半導体チップを位置合わせ・配置する工程と、前記対応
・位置合わせした基板面および半導体チップの被接続部
同士を固定接続してモジュール本体を組み立てる工程
と、前記組み立てたモジュール本体の基板の上面および
半導体チップの下面が成す間隙に封止樹脂を充填する工
程と、前記充填した樹脂を硬化させる工程とを具備して
成ることを特徴とする。
A semiconductor package according to the present invention includes a substrate provided with a wiring circuit including a connection portion, a semiconductor chip mounted face-down on one main surface of the substrate, and the semiconductor chip. A resin layer filling between the lower surface and the upper surface of the substrate, and a planar external connection terminal electrically connected to the semiconductor chip via a connection portion and led out and exposed to the other main surface of the substrate. If necessary, the electrode terminal portion of the semiconductor chip and the connection portion of the substrate are solid-phase diffusion-bonded, and the first method of manufacturing a semiconductor package according to the present invention is characterized in that one principal surface is provided. A wiring circuit including a connection portion (connection pad), and an electrode terminal portion of a semiconductor chip on the one main surface of the substrate on which a planar external connection terminal is led out and exposed on the other main surface. Corresponding,
A step of aligning and arranging the semiconductor chip, a step of fixing and connecting the corresponding and aligned substrate surfaces and the connected portions of the semiconductor chip to assemble a module body, and an upper surface and a semiconductor of the assembled module body. The method is characterized by comprising a step of filling the gap formed by the lower surface of the chip with a sealing resin, and a step of curing the filled resin.

【0009】本発明に係る第2の半導体パッケージの製
造方法は、一主面に接続部(接続パッド)を含む配線回
路を備え、他主面に平面型の外部接続用端子を導出・露
出させた基板の前記一主面に、半導体チップの電極端子
部を前記接続部に対応させ、半導体チップを位置合わせ
・配置する工程と、前記対応・位置合わせして配置した
基板および半導体チップの被接続部同士を固相拡散・接
合させて本体を組み立てる工程と、前記被接続部同士を
固相拡散・接合させた基板の上面および半導体チップの
下面が成す間隙に封止樹脂を充填する工程と、前記充填
樹脂を硬化させる工程とを具備して成ることを特徴とす
る。さらに、本発明に係る第3の半導体パッケージの製
造方法は、一主面に金から成る接続部(接続パッド)を
含む配線回路を備え、他主面に平面型の外部接続用端子
を導出・露出させた基板の前記一主面に、半導体チップ
の電極端子部に設けた金のバンプを前記接続部に対応さ
せ、半導体チップを位置合わせ・配置する工程と、前記
対応・位置合わせして配置した基板および半導体チップ
に荷重を加え被接続部同士を密着させる工程と、前記被
接続部同士を密着させた基板の上面および半導体チップ
の下面が成す間隙に封止樹脂を充填する工程と、前記樹
脂を充填した状態で荷重を加えて被接続部の位置ずれを
防ぎながら、前記充填樹脂を硬化させる工程とを具備し
て成ることを特徴とする。
According to a second method of manufacturing a semiconductor package according to the present invention, a wiring circuit including a connection portion (connection pad) is provided on one main surface, and a planar external connection terminal is led out and exposed on the other main surface. Aligning and arranging the semiconductor chip on the one main surface of the substrate with the electrode terminal portion of the semiconductor chip corresponding to the connection portion, and connecting the substrate and the semiconductor chip with the corresponding and aligned alignment. A step of assembling a main body by solid-phase diffusion and bonding of the parts, and a step of filling a sealing resin in a gap formed by the upper surface of the substrate and the lower surface of the semiconductor chip where the connected parts are solid-phase diffused and bonded, Curing the filling resin. Furthermore, a third method of manufacturing a semiconductor package according to the present invention includes a wiring circuit including a connection portion (connection pad) made of gold on one main surface, and leading out a flat external connection terminal on the other main surface. A step of aligning and arranging a semiconductor chip on the one main surface of the exposed substrate by associating a gold bump provided on an electrode terminal of a semiconductor chip with the connection section; A step of applying a load to the substrate and the semiconductor chip to bring the connected parts into close contact with each other, and filling a gap formed by the upper surface of the substrate and the lower surface of the semiconductor chip with the connected parts to each other with sealing resin, Curing the filled resin while applying a load while the resin is filled to prevent displacement of the connected portion.

【0010】本発明は、樹脂系基板もしくはセラミック
系基板の一主面(片面)に、はんどうたいチップ(IC
チップなど)を実装した構成で、かつ前記実装部品上面
側のモールド封止樹脂層を省略して、薄形・コンパクト
化および低コスト化を図り実現したもので、さらに基板
の他主面側(非実装面側)に外部接続用端子を導出した
構成とし、半導体パッケージを簡略に形成し得るように
したことを骨子とする。つまり、上面側のモールド封止
樹脂層を省略し、その分、半導体パッケージの薄型化を
図ったものである。さらに換言すると、シリコン(S
i)半導体チップの表面が、緻密で堅牢を保つことを利
用して、上面側のモールド封止樹脂層を無くし得ること
に着目してなされたものである。
According to the present invention, a chip (IC) is mounted on one main surface (one surface) of a resin-based substrate or a ceramic-based substrate.
Chip, etc.), and by omitting the mold sealing resin layer on the upper surface of the mounted component to achieve a thinner, more compact and lower cost. The outline is that the external connection terminals are led out to the (non-mounting surface side) and the semiconductor package can be easily formed. That is, the mold sealing resin layer on the upper surface side is omitted, and the thickness of the semiconductor package is reduced accordingly. In other words, silicon (S
i) The purpose of the present invention is to pay attention to the fact that the surface of the semiconductor chip is kept dense and robust, so that the mold sealing resin layer on the upper surface side can be eliminated.

【0011】なお、前記半導体パッケージの製造工程に
おいて、基板面および半導体チップの対応・位置合わせ
した接続端子(被接続部)同士を固定接続して組み立て
る際、基板面の接続端子(接続部)上に、たとえば導電
性ペーストで形成しておき、対応する半導体チップの接
続端子を圧入・接続する構成など比較的簡便な手段を採
ってもよい。また、前記の被接続部同士の固定接続は、
基板面の接続部および半導体チップの電極端子部との間
で、いわゆる固相拡散を起こさせて接合する方式を採る
ことも可能である。つまり、基板の接続部および対応す
る半導体チップの電極端子部を、所要の固相拡散可能な
温度に加熱し、被接続部を形成する金属同士、たとえば
金製の接続パッド(接続部)および金製のバンプ(電極
端子部)とを固相拡散させて、電気的,機械的な接合す
る手段を採り得る。そして、この固相拡散・接合の方式
は、基板および半導体チップの位置合わせ・配置に先立
って、基板の接続パッド(接続部),半導体チップのバ
ンプ(電極端子部),もしくは両者を予め所要の固相拡
散可能な温度に加熱する方式が採られる。
In the process of manufacturing the semiconductor package, when connecting and assembling connection terminals (connected portions) of the substrate surface and the semiconductor chip corresponding to each other and aligned, when assembling the terminals, the connection terminals (connection portions) on the substrate surface are assembled. Alternatively, for example, a relatively simple means such as a structure in which a connection terminal of a corresponding semiconductor chip is press-fitted and connected may be employed, for example, by using a conductive paste. Further, the fixed connection between the connected parts is as follows.
It is also possible to adopt a method of causing a so-called solid phase diffusion to join between the connection part on the substrate surface and the electrode terminal part of the semiconductor chip. In other words, the connection portion of the substrate and the electrode terminal portion of the corresponding semiconductor chip are heated to a required temperature at which solid phase diffusion is possible, and the metals forming the connection portion, such as a connection pad (connection portion) made of gold and gold, are formed. And electric and mechanical joining means by solid-phase diffusion with a metal bump (electrode terminal portion). In this solid-phase diffusion / bonding method, prior to the positioning and arrangement of the substrate and the semiconductor chip, connection pads (connection parts) of the substrate, bumps (electrode terminal parts) of the semiconductor chip, or both of them are required in advance. A method of heating to a temperature at which solid phase diffusion is possible is employed.

【0012】[0012]

【作用】本発明に係る半導体パッケージは、搭載・実装
した半導体チップ自体によって、緻密な封装などが成さ
れており、この緻密な封装に伴い保護・安定化などが図
られるばかりでなく、薄形化およびコンパクト化も容易
に達成される。つまり、特性的に安定し、信頼性が高い
ので、たとえばカード類の実装に適する薄形でコンパク
トな半導体パッケージとしての機能を呈する。
In the semiconductor package according to the present invention, the semiconductor chip itself mounted and mounted is densely sealed and the like, and not only is the protection and stabilization achieved with this dense sealing, but also a thin package. And compactness can be easily achieved. In other words, since the semiconductor device is stable in characteristics and has high reliability, it has a function as a thin and compact semiconductor package suitable for mounting cards, for example.

【0013】また、本発明に係る半導体パッケージの製
造方法によれば、組み立てた基板面と半導体チップ下面
との間(間隙)に、充填(封止)用樹脂が適度の流動性
などを呈する条件、あるいは液状の樹脂(たとえばエポ
キシ樹脂)を用い、これをたとえば毛細管現象によって
流し込み硬化させることによって、先行して組み立てら
れた半導体チップの破損、たとえば端子接続部の剥離な
どを起こすことなく、歩留まりよく信頼性の高い半導体
パッケージを得ることが可能となる。特に、基板に対す
る半導体チップの実装に、被接続部同士の固相拡散を適
用した場合は、電気的な接続の信頼性をより向上させる
ことが可能となる。
Further, according to the method of manufacturing a semiconductor package of the present invention, the filling (sealing) resin exhibits a suitable fluidity or the like between the assembled substrate surface and the lower surface of the semiconductor chip (gap). Alternatively, by using a liquid resin (for example, epoxy resin) and pouring it by, for example, capillary action, and hardening it, the semiconductor chip assembled in advance, such as breakage of the terminal connection portion, does not occur, and the yield is improved. A highly reliable semiconductor package can be obtained. In particular, when solid-phase diffusion between connected parts is applied to the mounting of the semiconductor chip on the substrate, the reliability of electrical connection can be further improved.

【0014】[0014]

【実施例】以下図1 (a), (b)、図2、図3、図4
(a), (b)、図5、および図6 (a),(b)を参照して本発
明の実施例を説明する。
FIG. 1A, FIG. 1B, FIG. 2, FIG. 3 and FIG.
An embodiment of the present invention will be described with reference to (a), (b), FIG. 5, and FIGS. 6 (a), (b).

【0015】実施例1 図1 (a)は、本発明に係る半導体パッケージの要部構成
例の上面側を斜視的に、また図1 (b)は本発明に係る半
導体パッケージの要部構成例の下面側を斜視的にそれぞ
れ示したものである。ここで、7は一主面に半導体チッ
プを搭載・実装する領域(接続部を含む配線回路など)
を備えた回路基板、8は前記回路基板7の一主面に搭載
・実装された所要の半導体チップ(ICチップなど)、
9は前記回路基板7のスルホール(図示省略)を介し
て、回路基板7の他主面側に導出された平面型の外部接
続用端子である。そして、前記回路基板7面と搭載・実
装された半導体チップ8下面との間隙部には、樹脂層が
充填・形成されて接合一体化など補強されている。
Embodiment 1 FIG. 1 (a) is a perspective view of an upper surface side of an example of a main part configuration of a semiconductor package according to the present invention, and FIG. 1 (b) is an example of a main part configuration of a semiconductor package according to the present invention. Are perspectively shown on the lower surface side of FIG. Here, 7 is a region for mounting and mounting a semiconductor chip on one principal surface (a wiring circuit including a connection portion, etc.).
A required semiconductor chip (such as an IC chip) mounted and mounted on one main surface of the circuit board 7;
Reference numeral 9 denotes a planar external connection terminal led out to the other main surface side of the circuit board 7 through a through hole (not shown) of the circuit board 7. A gap between the surface of the circuit board 7 and the lower surface of the mounted and mounted semiconductor chip 8 is filled and formed with a resin layer and reinforced by joining and integrating.

【0016】次に、上記構成の半導体パッケージの製造
例を説明する。
Next, an example of manufacturing a semiconductor package having the above configuration will be described.

【0017】図2はモジュール組み立ての態様を模式的
に示す断面図であり、先ず、片面に(一主面に)フリッ
プチップ実装用の接続部(接続パッド)を含む配線回路
を有し、かつ前記接続部を含む配線回路からスルホール
10を介して裏面(他主面)に平面型の外部接続用端子9
を導出した構成の樹脂系の回路基板7を用意する。この
樹脂系回路基板7は、たとえば長さ17mm,幅 7mm,厚さ
0.2mmで、長さ15mm,幅 5mm,厚さ0.25〜0.30mmの半導
体チップ(ICチップ)8を搭載・実装するものであ
る。
FIG. 2 is a cross-sectional view schematically showing a mode of assembling the module. First, a wiring circuit including a connection part (connection pad) for flip-chip mounting on one surface (one main surface) is provided. From the wiring circuit including the connection part to the through hole
A flat external connection terminal 9 is provided on the back (other main surface) through
A resin-based circuit board 7 having a configuration derived from the above is prepared. This resin-based circuit board 7 has, for example, a length of 17 mm, a width of 7 mm, and a thickness of 17 mm.
A semiconductor chip (IC chip) 8 of 0.2 mm, length 15 mm, width 5 mm, and thickness 0.25 to 0.30 mm is mounted and mounted.

【0018】次いで、前記樹脂系の回路基板7を、たと
えば真空吸着機構付きのスクリーン印刷機のステージ上
に固定し、前記半導体チップ8の電極パッドに対応する
基板7上の接続用端子上の接続パッド7aを形成する。す
なわち、搭載・実装する半導体チップ8の電極パッド
(たとえば, 100× 100μm)に対応する開口(たとえ
ば, 150× 150μm)を有するメタルマスクを用いて、樹
脂系回路基板7の一主面に銀ペースト(たとえば銀の粒
径 1μm ,粘度1000ps)をスクリーン印刷し、接続端子
部面上に直径 150μm ,高さ約80μm の接続用パッド7a
を形成する。一方、半導体チップ8の電極パッド面上に
電気メッキにより接続用の金バンプ、あるいはボールボ
ンディング法により金のボールバンプ(たとえば,高さ
30μm , 100× 100μm)8aを形成した半導体チップ8を
用意する。
Next, the resin-based circuit board 7 is fixed on, for example, a stage of a screen printing machine equipped with a vacuum suction mechanism, and connection on connection terminals on the board 7 corresponding to the electrode pads of the semiconductor chip 8 is performed. The pad 7a is formed. That is, using a metal mask having an opening (for example, 150 × 150 μm) corresponding to an electrode pad (for example, 100 × 100 μm) of the semiconductor chip 8 to be mounted / mounted, a silver paste is applied to one main surface of the resin-based circuit board 7. (For example, silver particle size 1μm, viscosity 1000ps) is screen printed, and connection pad 7a of 150μm in diameter and about 80μm in height is formed on the connection terminal surface.
To form On the other hand, a gold bump for connection is formed on the electrode pad surface of the semiconductor chip 8 by electroplating or a gold ball bump (for example, height
A semiconductor chip 8 having 30 μm, 100 × 100 μm) 8a is prepared.

【0019】前記樹脂系基板7の一主面で、前記半導体
チップ8を互いに対応する接続用パッド7aおよび接続用
の金バンプ8aを位置合わせ・配置し、前記樹脂系基板7
および半導体チップ8の対応・位置合わせした被接続部
7a,8a同士を加圧することにより、接続パッド7aに接続
バンプ8aの少なくとも先端部を埋め込む形に圧入して固
定接続し、モジュールを組み立てる。この状態で、前記
接続パッド7aを成す銀ペーストを熱硬化させることによ
って、いわゆるフリップチップボンディングが完了し、
樹脂系基板7への固定・保持ともに、電気的な接続が達
成される。なお、この工程において、樹脂系基板7にソ
リを発生する恐れがある場合は、前記接続パッド7aが形
成されていない領域面に、適量(たとえば 0.1mm3
下)の熱硬化性樹脂(熱硬化型接着剤)を塗着しておく
ことが望ましい。ただしこの場合は、前記フリップチッ
プボンディングの加圧時に、加熱も行い予め硬化させて
おく必要がある。
On one main surface of the resin-based substrate 7, the connection pads 7a and the connection gold bumps 8a corresponding to the semiconductor chips 8 are aligned and arranged.
And corresponding connected parts of semiconductor chip 8
The modules 7a and 8a are press-fitted to each other so that at least the tip of the connection bump 8a is buried in the connection pad 7a and fixedly connected, thereby assembling a module. In this state, the so-called flip-chip bonding is completed by thermosetting the silver paste forming the connection pad 7a,
Both the fixing and the holding to the resin-based substrate 7 achieve the electrical connection. In this step, if there is a possibility that warpage may occur in the resin-based substrate 7, an appropriate amount (for example, 0.1 mm 3 or less) of a thermosetting resin (thermosetting resin) is applied to the surface of the region where the connection pads 7a are not formed. It is desirable to apply a mold adhesive). In this case, however, it is necessary to heat the flip chip bonding and to cure the flip chip bonding in advance.

【0020】その後、封止樹脂による処理を行う。すな
わち、前記半導体チップ8下面と樹脂系基板7上面との
間隙部に、その間隙部の一端側から、いわゆる毛細管現
象を利用して封止樹脂を流し込み・充填する。この選択
的な樹脂処理においては、前記間隙部に対する十分な樹
脂の充填とともに、半導体チップ8の側面部に一部が回
り込む形にすることが好ましい。このようにして、所要
の樹脂処理を行った後、前記充填させた樹脂を熱などで
硬化(固化)させることにより、図3に断面的に示すご
とき構成を採った半導体パッケージが得られる。ここ
で、半導体パッケージの半導体チップ8は、前記充填し
た樹脂層11によって、樹脂系基板7面に対する固定化な
どが、さらに良好になされるばかりでなく、半導体チッ
プ8の樹脂系基板7面に対する絶縁保護なども図られ
る。一方、半導体チップ8は、その上面が露出している
が、半導体チップ8の露出面は素材であるシリコンが緻
密で堅牢なため、表面保護され、かかる点による信頼性
などは問題にならないことも確認された。
Thereafter, a treatment with a sealing resin is performed. That is, the sealing resin is poured and filled into the gap between the lower surface of the semiconductor chip 8 and the upper surface of the resin substrate 7 from one end of the gap by using a so-called capillary phenomenon. In this selective resin treatment, it is preferable that the gap be filled with a sufficient amount of resin, and at the same time, a part of the space bend around the side surface of the semiconductor chip 8. After the required resin treatment is performed in this way, the filled resin is cured (solidified) by heat or the like, whereby a semiconductor package having a configuration as shown in a cross section in FIG. 3 is obtained. Here, the semiconductor chip 8 of the semiconductor package is not only better fixed to the surface of the resin-based substrate 7 by the filled resin layer 11, but also insulated from the surface of the resin-based substrate 7 of the semiconductor chip 8. Protection is also achieved. On the other hand, the upper surface of the semiconductor chip 8 is exposed. However, the exposed surface of the semiconductor chip 8 is protected because the material silicon is dense and robust, and the reliability is not a problem. confirmed.

【0021】実施例2 実施例1の場合の半導体チップ8において、いわゆる選
択的なメッキもしくは蒸着(ソルダーマスクを用いて)
により、半田(たとえば63Sn−37Pb)を電極パッド
面( 100× 100μm )に高さ 100μm の接続バンプ8aを
形成したものを用い、また樹脂系基板7としては、前記
主面の接続パッド7aを半田ペーストのスクリーン印刷で
設けた物を用いて、フリッブチップボンダーにより、前
記樹脂系基板7の一主面に、半導体チップ8を位置決め
・仮固定した後、リフロー炉内を通過させて、前記半田
溶融温度(183℃)以上に加熱して固定した。
Embodiment 2 In the semiconductor chip 8 in Embodiment 1, so-called selective plating or vapor deposition (using a solder mask)
Thus, a solder (for example, 63Sn-37Pb) having a connection bump 8a having a height of 100 .mu.m formed on an electrode pad surface (100.times.100 .mu.m) is used. As the resin-based substrate 7, the connection pad 7a on the main surface is soldered. After the semiconductor chip 8 is positioned and temporarily fixed to one main surface of the resin-based substrate 7 by a flip chip bonder by using a paste provided by screen printing of the paste, the semiconductor chip 8 is passed through a reflow furnace and the solder It was heated and fixed above the melting temperature (183 ° C).

【0022】次いで、前記実施例1の場合と同様の条件
で樹脂を選択的に充填処理して、半導体パッケージを得
た。この半導体パッケージは、実施例1の場合と同じ
く、薄形・コンパクトで特性的な信頼性も高く、かつ歩
留まりも良好であった。
Next, a resin was selectively filled under the same conditions as in Example 1 to obtain a semiconductor package. As in the case of the first embodiment, this semiconductor package was thin and compact, had high characteristic reliability, and had a good yield.

【0023】実施例3 図4 (a), (b)は本実施例の実施態様を模式的に示した
もので、先ず一主面に、金から成る接続部(接続パッ
ド)7aを含むフリップチップ実装用の配線回路を備え、
他主面に平板型の外部接続端子が導出・配置されたアル
ミナ系基板(もしくは窒化アルミ系基板や樹脂系基板)
7、および電極端子(電極パッド)面に電気めっき法
(もしくはボールボンディング法)で金バンプ8b(高さ
30μm ,大きさ 100× 100μm )を設けた半導体チップ
8を用意した。
Embodiment 3 FIGS. 4 (a) and 4 (b) schematically show an embodiment of the present embodiment. First, a flip including a connection portion (connection pad) 7a made of gold on one main surface. Equipped with a wiring circuit for chip mounting,
Alumina-based substrate (or aluminum nitride-based substrate or resin-based substrate) with flat external connection terminals led out and arranged on the other main surface
7 and gold bumps 8b (height) on the electrode terminals (electrode pads) by electroplating (or ball bonding)
A semiconductor chip 8 having a size of 30 μm and a size of 100 × 100 μm) was prepared.

【0024】次いで、前記基板7および半導体チップ8
を、図4 (a)に模式的に示すごとく、フリップチップボ
ンダーのステージ12面上に位置決め・配置・接合した。
この位置決め・配置・接合は、先ず、基板7のソリを防
ぎ平坦に置くため、基板7をステージ12面上に真空吸着
させ、さらに、少なくとも基板7の金製の接続パッド7a
が、たとえば 350℃〜 450℃の範囲の所定の温度になる
ように加熱した。その後、真空吸着にてフリップチップ
ボンダーのピックアップヘッド13に固定した半導体チッ
プ8の少なくとも電極パッド8a面に形成した金バンプ8b
が、たとえば 350℃〜 450℃の範囲の所定の温度になる
ように加熱した。その状態にしてから、基板7の金製の
接続パッド7aに、半導体チップ8の電極パッド8a面に形
成した金バンプ8bを位置合わせして・配置した後、前記
接続パッド7aおよび金バンプ8bの被接続部同士を固相拡
散接続させるため、半導体チップ8の上から一つのバン
プ(高さ30μm ,大きさ 100× 100μm )当り、たとえ
ば 10g〜100gの範囲の所定の荷重(加圧)を加えた。
Next, the substrate 7 and the semiconductor chip 8
Was positioned, arranged, and bonded on the surface of the stage 12 of the flip chip bonder, as schematically shown in FIG.
In this positioning, arrangement, and bonding, first, the substrate 7 is vacuum-adsorbed on the surface of the stage 12 in order to prevent warpage of the substrate 7 and place the substrate 7 flat.
Was heated to a predetermined temperature in the range of, for example, 350 ° C to 450 ° C. Then, the gold bump 8b formed on at least the electrode pad 8a surface of the semiconductor chip 8 fixed to the pickup head 13 of the flip chip bonder by vacuum suction
Was heated to a predetermined temperature in the range of, for example, 350 ° C to 450 ° C. In this state, the gold bump 8b formed on the surface of the electrode pad 8a of the semiconductor chip 8 is positioned and arranged on the gold connection pad 7a of the substrate 7, and then the connection pad 7a and the gold bump 8b are formed. A predetermined load (pressurization) in the range of, for example, 10 g to 100 g is applied to one bump (height: 30 μm, size: 100 × 100 μm) from above the semiconductor chip 8 in order to perform solid phase diffusion connection between the connected portions. Was.

【0025】ここでいう固相拡散接続とは、同種あるい
は異種の金属同士の境界面に塑性変形を与えることで、
接合部での酸化被膜の破壊と表面の活性化を促し、新生
面同士が接触することで両金属が拡散して接合すること
を意味する。
The solid phase diffusion connection referred to here is to give plastic deformation to the interface between the same or different metals,
It promotes destruction of the oxide film at the joint and activation of the surface, and means that both metals are diffused and joined when the new surfaces come into contact with each other.

【0026】その意味で、本実施例では、金製の接続パ
ッド7aおよび金バンプ8bの固相拡散接続であるが、固相
拡散接続が可能な金属同士であれば、例示に限定される
ものでなく、発明の趣旨を逸脱しない範囲でいろいろの
金属同士の接続を採り得る。たとえば、錫製の接続部
(接続パッド)と金製の電極端子部(金製バンプ)、ア
ルミニウム製の接続部(接続パッド)と金製の電極端子
部(金バンプ)などの組合わせがある。
In this sense, in the present embodiment, the solid-state diffusion connection of the gold connection pads 7a and the gold bumps 8b is used. Instead, various metal-to-metal connections may be employed without departing from the spirit of the invention. For example, there are combinations of a connection part (connection pad) made of tin and an electrode terminal part (gold bump) made of gold, and a connection part (connection pad) made of aluminum and an electrode terminal part (gold bump) made of gold. .

【0027】また、前記実施例では、フリップ・チッ
プ。ボンダーのステージ12面上に載せた基板7の金製の
接続パッド7aも、ピックアップヘッド13に取付けた半導
体チップ8に形成した金バンプ8bもともに所定温度に加
熱したが、固相拡散接続が可能ならば、どちらか片方の
み所定温度に加熱することによっても可能である。さら
には、たとえば、超音波振動を利用することで、温度を
かけなくても固相拡散接続が可能ならば、加熱する必要
性もない。
In the above embodiment, a flip chip is used. Both the gold connection pads 7a of the substrate 7 placed on the surface of the bonder stage 12 and the gold bumps 8b formed on the semiconductor chip 8 mounted on the pickup head 13 are heated to a predetermined temperature, but solid-phase diffusion connection is possible. Then, it is also possible to heat only one of them to a predetermined temperature. Further, for example, if solid-phase diffusion connection is possible without using temperature by using ultrasonic vibration, there is no need for heating.

【0028】次に、前記ステージ12面から取り出して、
基板7と半導体チップ8との間に、前記実施例1の場合
と同様の条件で封止樹脂を充填処理した。前記樹脂の充
填処理においては、温度を適宜上げると毛細管現象が促
進されて、より容易に樹脂の充填処理を行い得る。こう
して、所要の樹脂充填処理を行った後、図4 (b)に模式
的に示すように、前記充填樹脂111 を硬化させることに
より、前記固相拡散接続部(接続パッド7aおよび金バン
プ8b)の固定を強固にした半導体パッケージを製造し
た。
Next, the stage is taken out from the surface of the stage 12, and
A sealing resin was filled between the substrate 7 and the semiconductor chip 8 under the same conditions as in the first embodiment. In the resin filling process, when the temperature is appropriately increased, the capillary phenomenon is promoted, and the resin filling process can be performed more easily. After the required resin filling process is performed in this way, as shown schematically in FIG. 4B, the filling resin 111 is cured to form the solid-phase diffusion connection portions (the connection pads 7a and the gold bumps 8b). A semiconductor package with a firm fixation was manufactured.

【0029】実施例4 図5 (a), (b), (c)は本実施例の実施態様を模式的に
示したもので、先ず一主面に金から成る接続部(接続パ
ッド)7a含むフリップチップ実装用の配線回路を備え、
他主面に平板型の外部接続端子が導出・配置された樹脂
系基板(もしくはアルミナ系基板や窒化アルミ系基板)
7、および電極パッド面に電気めっき法(もしくはボー
ルボンディング法)で電極端子部(金バンプ)8b(高さ
30μm,大きさ 100× 100μm )を設けた半導体チップ
8を用意した。この樹脂系基板7および半導体チップ8
を図5 (a)に模式的に示すごとく、フリップチップボン
ダーのステージ12面上に位置決め・配置した。この位置
決め・配置は、先ず、樹脂系基板7のソリを防ぎ平坦に
置くため、樹脂系基板7を真空吸着させてから、樹脂系
基板7の金製の接続パッド7aに、半導体チップ8の電極
パッド8a面に形成したで金バンプ8bを位置合わせして・
配置したした後、接続パッド7aおよび金バンプ8bの被接
続部を密着させるため、半導体チップ8の上から荷重
(加圧)を加えた。
Embodiment 4 FIGS. 5 (a), 5 (b) and 5 (c) schematically show an embodiment of this embodiment. First, a connection portion (connection pad) 7a made of gold is formed on one main surface. Includes a wiring circuit for flip chip mounting, including
Resin-based board (or alumina-based board or aluminum nitride-based board) with flat external connection terminals led out and arranged on the other main surface
7 and the electrode terminals (gold bumps) 8b (height) on the electrode pad surface by electroplating (or ball bonding)
A semiconductor chip 8 having a size of 30 μm and a size of 100 × 100 μm) was prepared. The resin substrate 7 and the semiconductor chip 8
Was positioned and arranged on the surface of the stage 12 of the flip chip bonder as schematically shown in FIG. In order to prevent the warpage of the resin-based substrate 7 and place the resin-based substrate 7 flat, the positioning and the arrangement are performed by vacuum-absorbing the resin-based substrate 7 and then applying the electrodes of the semiconductor chip 8 to the gold connection pads 7a of the resin-based substrate 7. Align the gold bump 8b formed on the pad 8a surface.
After the placement, a load (pressure) was applied from above the semiconductor chip 8 in order to bring the connection portions of the connection pads 7a and the gold bumps 8b into close contact.

【0030】次に、前記加圧を維持しながら、前記樹脂
系基板7と半導体チップ8との間に、前記実施例1の場
合と同様の条件で、封止樹脂を充填処理した。前記樹脂
の充填処理においては、温度を適宜上げると毛細管現象
が促進されて、より容易に樹脂の充填処理を行い得る。
こうして、所要の樹脂充填処理を行った後、図5 (b)に
模式的に示すように、たとえば半導体チップ8側に所要
の荷重を維持しながら加熱処理した。この加熱処理によ
り、前記充填樹脂11を硬化させて、前記被接続部(接続
パッド7aおよび金バンプ8b)の位置ずれを回避する一方
密着を確保しつつ、樹脂系基板7面に半導体チップ8が
固定・保持された半導体パッケージを製造した。図5
(c)はこの半導体パッケージの構造を断面的に示したも
のである。
Next, a sealing resin was filled between the resin substrate 7 and the semiconductor chip 8 under the same conditions as in the first embodiment while maintaining the pressure. In the resin filling process, when the temperature is appropriately increased, the capillary phenomenon is promoted, and the resin filling process can be performed more easily.
After the required resin filling process was performed in this way, as shown schematically in FIG. 5B, a heat treatment was performed while maintaining a required load on the semiconductor chip 8 side, for example. By this heat treatment, the filling resin 11 is hardened to avoid the positional displacement of the connected parts (the connection pads 7a and the gold bumps 8b), while the semiconductor chip 8 is attached to the surface of the resin-based substrate 7 while ensuring the close contact. A fixed and held semiconductor package was manufactured. FIG.
(c) shows a cross section of the structure of the semiconductor package.

【0031】この製造方法の場合は、固相拡散・接続
(接合)に伴う高温の加熱を必要としないため、基板7
および半導体チップ8を接続する際、接合部に熱膨脹に
伴う応力歪みが内在しないことになる。このことは、半
導体パッケージとして、後に施される高低温の熱サイク
ルなどの信頼性試験において、有利な信頼性保証が得ら
れる。
In the case of this manufacturing method, since high-temperature heating accompanying solid-phase diffusion and connection (joining) is not required, the substrate 7
When the semiconductor chip 8 is connected, no stress distortion due to thermal expansion is present in the joint. This provides an advantageous reliability guarantee in a reliability test of a semiconductor package, such as a high-low temperature thermal cycle, which is performed later.

【0032】図6は、前記製造手段によって製造(製
作)した半導体パッケージの構造例を、平面型外部接続
用端子9側から透視的に示す平面図であり、この構造例
では大きさ 7× 7mmの基板7に、大きさ 5× 5mmの半導
体チップ8を組合わせた場合で、基板7は充填樹脂11の
回り込みを考慮して各辺とも 1mmの余裕をもたせてあ
る。また、基板7の他主面に導出・配置された平面型の
外部接続用端子9は、たとえばLGA(Land Grid Arra
y) やBGA(Ball Grid Array) であり、ピンピッチ1m
m,グリッド直径 0.5mmの千鳥格子状にピンが配置さ
れ、さらにピン位置を示すため基板7の一つの角をカッ
トしてある。そして、この構成を採った場合は、被接続
部に半田が用いられていないので、半導体パッケージを
基板などへ搭載・実装時に行われる半田リフローに対し
て、何の障害もなくなる。
FIG. 6 is a plan view showing an example of the structure of a semiconductor package manufactured (manufactured) by the manufacturing means as seen from the side of the planar type external connection terminal 9 side. In this example, the size is 7 × 7 mm. When the semiconductor chip 8 having a size of 5 × 5 mm is combined with the substrate 7, the substrate 7 has a margin of 1 mm on each side in consideration of the wraparound of the filling resin 11. The planar external connection terminals 9 led out and arranged on the other main surface of the substrate 7 are, for example, LGA (Land Grid Arra).
y) or BGA (Ball Grid Array) with a pin pitch of 1m
The pins are arranged in a houndstooth check pattern having a grid diameter of 0.5 mm and a grid diameter of 0.5 mm, and one corner of the substrate 7 is cut to indicate the pin positions. In the case where this configuration is adopted, no solder is used for the connected portion, so that there is no obstacle to the solder reflow performed when the semiconductor package is mounted and mounted on a substrate or the like.

【0033】なお、上記では回路基板として、樹脂系回
路基板を用いた構成例を説明したが、本発明はこの例示
に限定されるものでなく、発明の趣旨を逸脱しない範囲
でいろいろの変形を採り得る。たとえばアルミナ系回路
基板や窒化アルミ系回路基板など用いてもよく、また、
その大きさなども搭載・実装する半導体チップの大きさ
などによって選択される。また、半導体パッケージの識
別マークなどは、半導体チップの露出面に印刷してもよ
い。
Although a configuration example using a resin-based circuit board as the circuit board has been described above, the present invention is not limited to this example, and various modifications may be made without departing from the spirit of the invention. Can be taken. For example, an alumina circuit board or an aluminum nitride circuit board may be used.
The size and the like are also selected according to the size of the semiconductor chip to be mounted and mounted. Further, the identification mark of the semiconductor package may be printed on the exposed surface of the semiconductor chip.

【0034】また、この構成によれば、基板7の厚さ
0.2〜0.25mm,半導体チップの厚さ0.25 0.3mm,基板7
面と半導体チップとの間隙0.03mmとすると、全体として
の厚さ0.5〜 0.6mmの半導体パッケージが実現できる。
According to this configuration, the thickness of the substrate 7 is
0.2 to 0.25mm, semiconductor chip thickness 0.25 0.3mm, substrate 7
If the gap between the surface and the semiconductor chip is 0.03 mm, a semiconductor package having a thickness of 0.5 to 0.6 mm as a whole can be realized.

【0035】[0035]

【発明の効果】上記説明から分かるように、本発明に係
る半導体パッケージは、いわゆるモールド樹脂層を省略
・排除したため、少なくともその分の薄形化・コンパク
ト化されながら、特性ないし機能面の信頼性も高いの
で、たとえばカード用の機能部品として好適するものと
いえる。特に、前記薄形化が可能なことは、一方では樹
脂系基板の厚さや,搭載・実装するICチップなどの厚
さの選択・設定範囲を拡大し得ることになり、用途に対
応した特性ないし機能の調整を可能とするので、用途の
拡大にも寄与するといえる。さらに、半導体チップと基
板側との電気的な接続もワイヤボンディングでなされな
いため、実装効率の向上など図り得るし、加えて、回路
的にもインダクタンスを低減できるので、信号の高速化
なども図り得る。
As can be seen from the above description, the semiconductor package according to the present invention is characterized by omitting or eliminating the so-called mold resin layer, so that the semiconductor package is at least thinner and more compact, and at the same time, has higher reliability in characteristics and functions. Therefore, it can be said that it is suitable as a functional component for a card, for example. In particular, the fact that the above-mentioned thinning is possible means that, on the other hand, the selection and setting range of the thickness of the resin-based substrate and the thickness of the IC chip to be mounted and mounted can be expanded. Since the function can be adjusted, it can be said that it also contributes to the expansion of applications. Furthermore, since the electrical connection between the semiconductor chip and the substrate side is not made by wire bonding, it is possible to improve the mounting efficiency, etc. In addition, since the inductance can be reduced also in the circuit, the signal speed can be increased. obtain.

【0036】さらに、従来の半導体チップをワイヤボン
デング接続する場合は、電極パッドの位置が制約を受け
るが、本発明の半導体パッケージの接続構成の場合は、
半導体チップの電極パッドの設定位置を任意に選ぶこと
も可能である。そして、このことは半導体チップの設計
概念を大きく変革させることになる。
Furthermore, when the conventional semiconductor chip is connected by wire bonding, the position of the electrode pad is restricted, but in the case of the connection configuration of the semiconductor package of the present invention,
It is also possible to arbitrarily select the setting positions of the electrode pads of the semiconductor chip. This will greatly change the design concept of the semiconductor chip.

【0037】また、本発明に係る半導体パッケージの製
造方法によれば、上記したようにすぐれた機能を備えた
半導体パッケージを歩留まりよく、かつ量産的に製造し
得るので、低コスト化などの点と相俟って実用上多くの
利点をもたらすものといえる。 なお、基板へ直接複数
のチップを実装するCOB法およびフリップチップ実装
は、前記指摘したように、バーンインの実施が不可能な
ため、それぞれのチップの信頼性の保証が困難であっ
た。これに対して、本発明に係る半導体パッケージは樹
脂封止後、バーンインを実施し得るので、基板などへ実
装する場合、のいわゆる不良品のリペア技術を用いるこ
となく、信頼性の高い実装回路装置の構成が可能とな
る。つまり、本発明に係る半導体パッケージを搭載・実
装することにより高い信頼性の保証が可能となり、結果
的に歩留まり向上および製造コストの低減など図り得
る。
Further, according to the method of manufacturing a semiconductor package according to the present invention, a semiconductor package having excellent functions as described above can be manufactured with high yield and mass production. It can be said that they bring many advantages in practical use. In the COB method and the flip-chip mounting method in which a plurality of chips are directly mounted on a substrate, as described above, since it is impossible to perform burn-in, it is difficult to guarantee the reliability of each chip. On the other hand, the semiconductor package according to the present invention can be burn-in after resin sealing, so that when mounted on a substrate or the like, a highly reliable mounting circuit device can be used without using a so-called defective product repair technique. Is possible. That is, by mounting and mounting the semiconductor package according to the present invention, high reliability can be guaranteed, and as a result, yield can be improved and manufacturing cost can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る半導体パッケージの要部構成例を
示すもので、 (a)は上面側の斜視図、 (b)は下面側の斜
視図。
1A and 1B show an example of a configuration of a main part of a semiconductor package according to the present invention, wherein FIG. 1A is a perspective view of an upper surface side, and FIG.

【図2】本発明に係る半導体パッケージの製造工程にお
ける半導体モジュールの要部構成例を示す断面図。
FIG. 2 is a sectional view showing an example of a configuration of a main part of a semiconductor module in a semiconductor package manufacturing process according to the present invention.

【図3】本発明に係る半導体パッケージの要部構成例を
示す断面図。
FIG. 3 is a sectional view showing an example of a configuration of a main part of a semiconductor package according to the present invention.

【図4】本発明に係る半導体パッケージの他の製造工程
における半導体モジュールの要部構成例を示すもので、
(a)は基板一主面に半導体チップを位置決め配置し加圧
した状態の断面図、 (b)は加圧した状態で樹脂を充填
し、硬化させることにより製造された半導体パッケージ
の断面図。
FIG. 4 shows an example of a main configuration of a semiconductor module in another manufacturing process of the semiconductor package according to the present invention;
(a) is a cross-sectional view in which a semiconductor chip is positioned and arranged on one main surface of a substrate and pressed, and (b) is a cross-sectional view of a semiconductor package manufactured by filling and curing a resin in a pressed state.

【図5】本発明に係る半導体パッケージの他の製造工程
における半導体モジュールの要部構成例を示すもので、
(a)は基板一主面に半導体チップを位置決め配置し加圧
した状態の断面図、 (b)は加圧した状態で樹脂を充填し
た状態の断面図、 (c)は製造された半導体パッケージの
断面図。
FIG. 5 shows an example of a configuration of a main part of a semiconductor module in another manufacturing process of the semiconductor package according to the present invention.
(a) is a cross-sectional view of a state where a semiconductor chip is positioned and arranged on one main surface of a substrate and is pressed, (b) is a cross-sectional view of a state where a resin is filled under a pressed state, and (c) is a manufactured semiconductor package. FIG.

【図6】本発明に係る半導体パッケージの構成例を透視
的に示す平面図。
FIG. 6 is a plan view perspectively showing a configuration example of a semiconductor package according to the present invention.

【図7】従来の半導体パッケージの要部構成を示す断面
図。
FIG. 7 is a cross-sectional view showing a main part configuration of a conventional semiconductor package.

【符号の説明】[Explanation of symbols]

1,8…ICチップ 2,7…樹脂系回路基板
3,10…スルホール 4,9…平面型の外部接続用端子 5…モールド樹脂
層 6…ボンディングワイヤ 7a…接続部(接続パ
ッド) 8a…電極端子 8b…接続パンブ 11…封止樹脂層
1,8 ... IC chip 2,7 ... Resin circuit board
3, 10 ... through hole 4, 9 ... flat external connection terminal 5 ... mold resin layer 6 ... bonding wire 7a ... connection part (connection pad) 8a ... electrode terminal 8b ... connection pump 11 ... sealing resin layer

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 23/12 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) H01L 23/12

Claims (7)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 一主面に接続部を含む配線回路を備えた
基板と、前記基板の一主面の接続部に電極端子部を対応
させてフェースダウン型に実装された半導体チップと、
前記半導体チップの下面および基板の一主面間を充填す
る封止樹脂層と、前記半導体チップに電気的に接続し、
かつ前記基板の他主面側に導出・露出させた外部接続用
端子とを具備して成り、 前記基板の接続部および対応する半導体チップの電極端
子部が固相拡散接続していることを特徴とする半導体装
置。
A substrate provided with a wiring circuit including a connection portion on one main surface; a semiconductor chip mounted face-down type with an electrode terminal portion corresponding to the connection portion on one main surface of the substrate;
A sealing resin layer filling the lower surface of the semiconductor chip and one main surface of the substrate, and electrically connected to the semiconductor chip;
And an external connection terminal led out and exposed on the other main surface side of the substrate, wherein a connection portion of the substrate and an electrode terminal portion of the corresponding semiconductor chip are connected by solid phase diffusion connection. Semiconductor device.
【請求項2】 電極端子部が金からなるバンプを有する
ことを特徴とする請求項1記載の半導体装置。
2. The semiconductor device according to claim 1, wherein said electrode terminal portion has a bump made of gold.
【請求項3】 前記外部接続用端子が、平面型であるこ
とを特徴とする請求項1または2記載の半導体装置。
3. The semiconductor device according to claim 1, wherein said external connection terminal is of a planar type.
【請求項4】 一主面に接続部を含む配線回路を備え、
他主面に外部接続用端子を導出・露出させた基板の前記
一主面に、半導体チップの電極端子部を前記接続部に対
応させ、半導体チップを位置合わせ・配置する工程と、 前記対応・位置合わせした基板面および半導体チップの
被接続部同士を固相拡散により接続して組み立てる工程
と、前記組み立てたモジュール本体の基板の上面および
半導体チップの下面が成す間隙に封止樹脂を充填する工
程と、 前記充填した樹脂を硬化させる工程とを具備して成るこ
とを特徴とする半導体装置の製造方法。
4. A wiring circuit including a connection portion on one main surface,
An electrode terminal portion of a semiconductor chip corresponding to the connection portion on the one main surface of the substrate on which the external connection terminals are led out and exposed to the other main surface, and positioning and arranging the semiconductor chip; Connecting the connected substrate surface and the connected portions of the semiconductor chip by solid-phase diffusion to assemble, and filling the gap formed by the upper surface of the substrate of the assembled module body and the lower surface of the semiconductor chip with a sealing resin And a step of curing the filled resin.
【請求項5】 一主面に接続部を含む配線回路を備え、
他主面に外部接続用端子を導出・露出させた基板の前記
一主面の接続部および搭載・実装する半導体チップの電
極端子部に設けたバンプの少なくともいずれか一方を所
定の温度に加熱する工程と、 前記基板の一主面の接続部に、半導体チップの電極端子
部に設けたバンプを対応させ、半導体チップを位置合わ
せ・配置する工程と、 前記対応・位置合わせして配置した基板および半導体チ
ップに荷重を加え被接続部同士を固相拡散接合させる工
程と、 前記被接続部同士を拡散・接合させた基板の上面および
半導体チップの下面が成す間隙に封止樹脂を充填する工
程と、前記充填した樹脂を硬化させる工程とを具備して
成ることを特徴とする半導体装置の製造方法。
5. A wiring circuit including a connection portion on one main surface,
Heating, to a predetermined temperature, at least one of a connection portion on the one main surface of the substrate on which the external connection terminals are led out and exposed on the other main surface and a bump provided on an electrode terminal portion of the semiconductor chip to be mounted and mounted. And a step of aligning and arranging the semiconductor chip with the bumps provided on the electrode terminals of the semiconductor chip corresponding to the connection portion on one main surface of the substrate; and A step of applying a load to the semiconductor chip to perform solid-phase diffusion bonding of the connected parts; and a step of filling a gap formed by an upper surface of the substrate and a lower surface of the semiconductor chip in which the connected parts are diffused and bonded with sealing resin. Curing the filled resin. A method for manufacturing a semiconductor device, comprising:
【請求項6】 一主面に金からなる接続部を含む配線回
路を備え、他主面に外部接続用端子を導出・露出させた
基板の前記一主面の金からなる接続部および半導体チッ
プの電極端子部に設けた金のバンプの少なくともいずれ
か一方を所定の温度に加熱する工程と、 前記基板の一主面の金からなる接続部に、半導体チップ
の電極端子部に設けた金のバンプを対応させ、半導体チ
ップを位置合わせ・配置する工程と、 前記対応・位置合わせして配置した基板および半導体チ
ップに荷重を加え金と金の被接続部同士を固相拡散接合
させる工程と、前記被接続部同士を拡散・接合させた基
板の上面および半導体チップの下面が成す間隙に封止樹
脂を充填する工程と、前記充填した樹脂を硬化させる工
程とを具備して成ることを特徴とする半導体装置の製造
方法。
6. A connecting portion made of gold on one main surface of a substrate provided with a wiring circuit including a connecting portion made of gold on one main surface, and having external connection terminals led out and exposed on another main surface, and a semiconductor chip. Heating at least one of the gold bumps provided on the electrode terminal portion of the substrate to a predetermined temperature; and connecting the gold bump provided on the electrode terminal portion of the semiconductor chip to the connection portion made of gold on one main surface of the substrate. Corresponding bumps, a step of aligning and arranging the semiconductor chip, and a step of applying a load to the substrate and the semiconductor chip arranged and correspondingly aligning and aligning the solid portions of the gold and gold connected parts, A step of filling a gap formed by an upper surface of a substrate and a lower surface of a semiconductor chip in which the connected parts are diffused and joined together with a sealing resin, and a step of curing the filled resin. Of semiconductor devices Production method.
【請求項7】 前記外部接続用端子が、平面型であるこ
とを特徴とする請求項4乃至のいずれか1項記載の半
導体装置の製造方法。
7. The terminal said external connection, a method of manufacturing a semiconductor device according to any one of claims 4 to 6, characterized in that a flat.
JP5075794A 1993-09-01 1994-03-22 Semiconductor device and manufacturing method thereof Expired - Fee Related JP3332555B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP5075794A JP3332555B2 (en) 1993-12-17 1994-03-22 Semiconductor device and manufacturing method thereof
EP94306204A EP0644587B1 (en) 1993-09-01 1994-08-23 Semiconductor package and fabrication method
DE69431023T DE69431023T2 (en) 1993-09-01 1994-08-23 Semiconductor structure and manufacturing method
KR1019940021753A KR0172203B1 (en) 1993-09-01 1994-08-31 Semiconductor package and its manufacturing method
US08/749,028 US5866950A (en) 1993-09-01 1996-11-14 Semiconductor package and fabrication method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP31863393 1993-12-17
JP5-318633 1993-12-17
JP5075794A JP3332555B2 (en) 1993-12-17 1994-03-22 Semiconductor device and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH07226455A JPH07226455A (en) 1995-08-22
JP3332555B2 true JP3332555B2 (en) 2002-10-07

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Country Link
JP (1) JP3332555B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5677246A (en) * 1994-11-29 1997-10-14 Kabushiki Kaisha Toshiba Method of manufacturing semiconductor devices
JP3437687B2 (en) * 1994-12-22 2003-08-18 株式会社東芝 Semiconductor element mounting structure and liquid crystal display device
DE19638175C2 (en) 1996-09-18 2000-05-25 Siemens Ag Integrated circuit (chip) with a housing and external configuration option
TW569424B (en) 2000-03-17 2004-01-01 Matsushita Electric Ind Co Ltd Module with embedded electric elements and the manufacturing method thereof
JP2006216720A (en) 2005-02-02 2006-08-17 Sharp Corp Semiconductor device and its manufacturing method
CN109314122B (en) * 2016-06-20 2023-06-16 索尼公司 Semiconductor chip package

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