JP3216124B2 - Semiconductor thin film device and method of manufacturing the same - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor thin film device and a method of manufacturing the same, and more particularly, to a method for manufacturing a semiconductor thin film device without generating pinholes due to damage to a resist used.
The present invention relates to a semiconductor thin film device capable of forming a lamination having an accurate profile and a method of manufacturing the same.

[0002]

2. Description of the Related Art Generally, in semiconductor devices, the density and speed of elements have been increasing, and multilayer wiring structures have been widely used.
FIG. 10 is a cross-sectional view of a conventional light valve pixel having a multilayer wiring structure. In this multilayer wiring structure, the first layer Ti /
In order to connect Al and the ITO of the third layer, a total of 1.6 μm of a flattening film / nitride film / nitride film is used as an insulating film between layers 1-3.
m at a stretch, and one layer of 500 Å −
Performing etching to leave the Ti of 1000 Å. After the etching opening, an ITO three-layer wiring is formed thereon.

[0003]

In the light valve pixel, the etching amount is large due to the deep etching of the through hole for the three-layer ITO-1 layer Ti / Al connection, and variations in the film thickness and the etching rate are taken into consideration. Then, it is difficult to etch while leaving Ti.
%. Further, since the etching time becomes longer, the resist used as a mask is lost first, and there is a problem that it does not play a role as a mask material, so that it was not possible to easily connect (FIG. 11).

In the structure shown in FIG. 12, if the through hole of the first through third layers is opened at once, the photoresist cannot maintain its shape, and the second through third interlayer insulating film is also etched to form a pin on the second layer wiring. Holes are generated and two-layer wiring and 3
The layer wiring is short-circuited. Further, in the structure of FIG.
The two-layer wiring and the three-layer wiring may be short-circuited by a pinhole in the 2-3 interlayer insulating film. In the structure shown in FIG. 13, since the opening must be opened by the total thickness of the 1-2 interlayer insulating film and the 2-3 interlayer insulating film, the resist shape cannot be maintained as described above, or the etching is performed as shown in FIG. becomes insufficient, can leave the barrier metal layer as shown in FIG. 15 becomes harder made if the opening. The reason why these problems occur is that, as described above, since, for example, the flattening film / nitride film / nitride film (total 1.6 μm) of the insulating film between the 1-3 layers is etched at once, the etching time is long, and This is because the shape cannot be maintained. Furthermore, SiN and T
Even when the selectivity of i is as large as about 20, Ti may disappear in consideration of the variation (FIG. 15).

[0005]

According to the present invention, there is provided a semiconductor thin-film device comprising a single-layer wiring and a part covered on the surface of the single-layer wiring.
A 1-2 interlayer insulating film in which a through hole is formed;
The surface of the two interlayer insulating film, the inner side wall of the through hole and the through hole
-Cover the surface of the single-layer wiring exposed at the bottom of the hole
Wiring having an opening on the side, and an inner side wall of the opening
Barrier metal layer formed on the two-layer wiring of
Also contacts the two-layer wiring at the bottom of the opening and the barrier metal layer.
A semiconductor thin film device comprising a transparent conductor film that touches and covers the opening and the 2-3 interlayer insulating film, and the laminated structure can be manufactured by the method of the present invention described later.

[0006]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail. The feature of the present invention is that the barrier metal layer and
By laminating and connecting the layers in the lateral direction, the amount of etching is reduced, so that the resist is not damaged by long-time etching, whereby problems such as pinhole formation due to resist damage can be solved. Specifically, an underlying wiring having a groove, for example, an Al groove is used. When the barrier metal Ti is left on the side surface of the Al groove exposed by the formation of the through hole and the ITO of the transparent electrode is put on the entire surface, the Al
-Ti-ITO configuration. In the pixel of the light valve for a projector whose specific cross-sectional view is shown in FIG. 1, elements and wirings are arranged around the pixel in order to increase the aperture ratio, and finally, ITO is used as a transparent electrode. ITO is in the third layer and is connected to the first layer wiring to form an electrode.

In the case where Al of the first layer wiring is connected to ITO of the third layer, if Al is directly connected to ITO, the oxygen of the ITO oxidizes the Al surface to become alumina, so that conduction cannot be established. Therefore, insert Ti between them and use ITO
By making it a barrier for oxygen from
Generally well known. However, a very thick insulating film combining the 2-3 interlayer insulating film and the 1-2 interlayer insulating film is formed of 1Al.
It is difficult to form an etching opening while leaving the barrier metal Ti thereon. Further, since the step is large and steep, the ITO of the third layer is also disconnected.

The present invention is a proposal for improving the problem of wiring connection between different layers of the light valve wiring system, and an embodiment of the present invention will be described below. FIG. 2 is a cross-sectional view showing a representative example of the present invention. A method of manufacturing the representative example will be described with reference to FIGS. An opening is formed in the 1-2 interlayer insulating film 2 on the single-layer wiring 1 by anisotropic etching, and a through hole (opening) 3 for the 1-2 interlayer is formed as a concave portion (FIG. 3). A two-layer metal having an isolated pattern is placed thereon so as to cover the opening 3 when the two-layer wiring 4 is formed. At this time, a barrier metal layer 5 made of Ti or Cr is formed on the Al2 layer wiring 4 of the isolated pattern (FIG. 4). The barrier metal layer 5 is also formed on the inner wall of the opening of the layer wiring 4.

Next, a 2-3 interlayer insulating film 6 is formed thereon (FIG. 5). The use amount of the 2-3 interlayer insulating film 6 is inevitably increased because the upper surface is flattened. Next, anisotropic etching (RIE) is performed with the same size as that of the through hole 3 between the first and second layers to open a through hole 7 between the second and third layers (FIG. 6). At this time, Al and Ti of the two-layer wiring are also formed along the step of the 1-2 interlayer through-hole 3, and even if Ti at the bottom is lost due to an overetch of anisotropic etching, the side surface of the step is removed. , Ti remains, and the process margin can be increased. Ti of barrier metal layer 5
Is 300-1000 from the relation of contact resistance.
It is formed as thin as Å . Next, when a third layer of ITO 8 is formed, a structure of Al-Ti-ITO is completed on the side surface of the step, and good conduction can be obtained. (FIG. 7).

According to this embodiment, the number of steps is increased without increasing the number of steps.
It is possible to easily open a thick film of the laminated structure of the two-layered film 2 and the 2-3-layered film 6, and to increase a process margin. Further, since the side surface is used for the connection, troubles such as disconnection can be prevented. Therefore, the problem between the interlayer connections is improved, and the yield is improved. In the example of the projector light valve as a specific example, the connection between the ITO electrode 8 and 1Al1 is improved, so that the pixel operates normally and the situation where the pixel does not operate (point defect) is solved. And an image without defects can be obtained. Usually 1-2
A thick insulating film (1-2 μm) such that the interlayer film 2 and the 2-3 interlayer film 6 are combined with a thin barrier metal 5 such as Ti
Opening while leaving (500-1000 ° ) makes it possible to increase the selectivity with Ti by 20-40 in consideration of the process margin.
More than that. However, it is impossible to etch a wide substrate such as a glass substrate with a high selectivity, and it is up to 15 at most.

According to the present invention, 2Al (two-layer wiring 4) on which Ti (barrier metal layer 5) is deposited is placed on the opening formed by using a through-hole opening step of the 1-2 interlayer film 2, and the opening is formed. The 2-3 interlayer film 6 formed on the upper portion is opened with substantially the same size as the 1-2 interlayer film through hole 2. At this time, the depth of the opening is the same as that of the 1-2 interlayer film through hole opening.
-3 interlayer anisotropic etching is performed vertically in the through hole opening, so that the etching depth becomes shallow and Ti
Is about half the conventional ratio. Further, Ti5 on 2Al4 on the side surface formed by the step of the 1-2 interlayer film through-hole 2 remains on the side surface according to the same principle as the formation of the sidewall in the anisotropic etching. Even if Ti at the bottom is lost by overetching the 2-3 interlayer film through-hole 6, it can be surely left as it has a thickness corresponding to the vertical height. Therefore, even if the transparent electrode ITO8 is formed on the upper side, the Al-Ti
-The structure of ITO is completed, and Al is not oxidized by the oxygen of ITO to cause a connection failure. Since this oxidation affects only the upper part, Al-Ti-
If the structure of ITO is made, conduction can be ensured. Therefore, the process margin can be increased, and the pixel yield can be reliably improved.

Next, another embodiment will be briefly described as an application of the interlayer connection of the present invention. The present invention is effective when connection is difficult due to a thick insulating film even in connection of 1-2 interlayer wiring. If a pattern is designed so as to pass through the first wiring through a portion connected between layers by using a lower layer, a barrier metal or a buffer may be formed on the side surface of the lower layer transferred on the first wiring. There is metal. Then, in the next through hole process, the interlayer insulating film on the upper portion is anisotropically (RIE).
Even if overetching is performed, the barrier metal or the buffer metal remains on the side surface even if overetching is performed, and connection with the second wiring can be easily performed. FIG. 8 is a cross-sectional view showing the connection between the 2-3 layers, and can be applied to any layer. FIG.
Is a plan view showing the positional relationship between the underlying pattern and the interlayer connection through-holes.The pattern of the underlying step may be square or striped, and if the upper through-hole pattern covers this step, Barrier metal remains,
Connection can be made securely. Also, the shape of the step may be stepped, and any structure may be used as long as the barrier metal or the buffer metal remains on the vertical surface.

[0013]

According to the present invention, the single-layer wiring and the surface of the single-layer wiring are provided.
1-2 layers with through holes formed in part of the coating
An insulating film, the surface of the 1-2 interlayer insulating film, and the through hole
The one-layer wiring exposed on the inner side wall and the bottom of the through hole
A two-layer wiring covering the surface and having an opening on the surface side;
Barrier meta formed on the two-layer wiring on the inner side wall of the opening
Layer, at least two-layer wiring on the bottom of the opening, and the
A semiconductor thin film device (Claim 1) comprising a transparent conductor film in contact with a rear metal layer and covering the opening and the 2-3 interlayer insulating film. In this semiconductor thin film device, through-holes are formed in the two-layer wiring, and a three-layer structure of the two-layer wiring, the barrier metal layer, and the transparent conductor film is realized in this portion in the horizontal direction, so that conduction is ensured. In addition, since the side surface is used for the connection, problems such as disconnection can be prevented, so that problems between the interlayer connections are improved, and the yield is improved.

The material of the three-layer structure is optimally selected so that the material of the two-layer wiring is Al, the material of the barrier metal layer is Ti, and the material of the transparent conductor film is ITO. . The use of the process for manufacturing a semiconductor thin film device (claim 3) eliminates the need for a large etching that extends over three layers, so that the shape of the resist is maintained during the etching operation and has an accurate profile. An element can be formed.

[Brief description of the drawings]

FIG. 1 is a pixel sectional view of a light valve for a projector that can be used in the present invention.

FIG. 2 is a cross-sectional view illustrating a typical semiconductor thin film device of the present invention.

FIG. 3 is a sectional view showing a first stage of a process for manufacturing the semiconductor thin film device of FIG. 2;

FIG. 4 is a sectional view showing a second stage in the same manner.

FIG. 5 is a sectional view showing a third stage.

FIG. 6 is a sectional view showing a fourth stage.

FIG. 7 is a sectional view showing a fifth stage.

FIG. 8 is a sectional view showing another example of a typical semiconductor thin film device of the present invention.

FIG. 9 is a plan view showing a relationship between a base pattern and an interlayer connection through hole.

FIG. 10 is a pixel sectional view illustrating a conventional light valve for a projector.

FIG. 11 is a sectional view showing a first defect of a conventional semiconductor thin film device.

FIG. 12 is a sectional view showing a second disadvantage of the conventional semiconductor thin film device.

FIG. 13 is a sectional view showing a third disadvantage of the conventional semiconductor thin film device.

FIG. 14 is a sectional view showing a fourth disadvantage of the conventional semiconductor thin film device.

FIG. 15 is a sectional view showing a fifth disadvantage of the conventional semiconductor thin film device.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 1-layer wiring 2 1-2 interlayer insulating film 3 1-2 interlayer through hole 4 2-layer wiring 5 barrier metal layer 6 2-3 interlayer insulating film 7 2-3 interlayer through hole 8 transparent conductor film

Claims (3)

(57) [Claims] A single-layer wiring and a surface of the single-layer wiring are covered.
A 1-2 interlayer insulating film in which a through hole is partially formed,
The surface of the 1-2 interlayer insulating film and the inner side wall of the through hole;
Covering the surface of the one-layer wiring exposed on the bottom surface of the through hole
A two-layer wiring having an opening on the surface side;
A barrier metal layer formed on the two-layer wiring on the side wall;
At least the two-layer wiring at the bottom of the opening and the barrier metal
A semiconductor thin film device comprising a transparent conductor film in contact with a layer and covering the opening and the 2-3 interlayer insulating film. 2. The semiconductor thin film device according to claim 1, wherein the material of the two-layer wiring is Al, the material of the barrier metal layer is Ti, and the material of the transparent conductor film is ITO. 3. A 1-2 interlayer insulating film is coated on the one-layer wiring, a 1-2 interlayer through hole is formed in the 1-2 interlayer insulating film, and the 1-2 interlayer insulating film surface and the through hole are formed. The surface of the inner wall is covered with a two-layer wiring, then the surface of the two-layer wiring is coated with a barrier metal layer, and the surface of the barrier metal layer is coated with a 2-3 interlayer insulating film. The layer is etched such that at least the lower barrier metal layer formed on the side wall of the opening corresponding to the 1-2 interlayer through hole of the 1-2 interlayer insulating film remains, and the two-layer wiring, the barrier metal layer, and the (3) A method for manufacturing a semiconductor thin film device, comprising forming a transparent conductor film so as to cover an interlayer insulating film.