JP3120837B2 - 電気的接続用の樹脂フィルムおよび樹脂フィルムを用いた電気的接続方法 - Google Patents

電気的接続用の樹脂フィルムおよび樹脂フィルムを用いた電気的接続方法

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Publication number
JP3120837B2
JP3120837B2 JP6859198A JP6859198A JP3120837B2 JP 3120837 B2 JP3120837 B2 JP 3120837B2 JP 6859198 A JP6859198 A JP 6859198A JP 6859198 A JP6859198 A JP 6859198A JP 3120837 B2 JP3120837 B2 JP 3120837B2
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Japan
Prior art keywords
resin
resin film
electrical connection
insulating
particles
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Expired - Fee Related
Application number
JP6859198A
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English (en)
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JPH11265910A (ja
Inventor
佳嗣 船田
利枝佳 大内
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NEC Corp
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NEC Corp
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Priority to JP6859198A priority Critical patent/JP3120837B2/ja
Publication of JPH11265910A publication Critical patent/JPH11265910A/ja
Application granted granted Critical
Publication of JP3120837B2 publication Critical patent/JP3120837B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】
【0001】
【発明の属する技術分野】本発明は、電気的接続用の樹
脂フィルムおよびこれを用いた電気的接続方法に関す
る。
【0002】
【従来の技術】近年、電気・電子機器の小型化、薄型化
に伴い、半導体チップ等の微小部品と回路基板等の微細
回路とが接続される構成が増加している。しかも、微細
回路の配線ピッチはますます小さくなってきている。
【0003】従来、このような部品と回路との接続は、
相互の接続端子同士をワイヤボンディングする方法が主
流であったが、接続端子同士を対向させ直接接続する方
が、製造工程の簡単さやコスト等の点でより有利である
ことから、最近ではフリップチップ接続が盛んに行われ
ている。接続端子同士の電気的接続は、はんだにより接
続したり、導電性ペーストにより接続したり、各接続端
子を金により形成して金同士を圧着する方法などによっ
て実施されている。
【0004】接続端子同士が直接接続される部分は、外
部環境からの保護と接続信頼性の向上のために、樹脂に
より封止される場合が多い。具体的には、接続を行った
後で、隣接する接続端子間隙間から、対向する接続端子
間へ向けて液状の安価な樹脂(一般的には低粘度のエポ
キシ樹脂等の熱硬化性樹脂等)を流入し、その後硬化さ
せる方法がとられる。しかしながら、小型化、薄型化が
進むにつれて部品と回路との間隙や隣接する接続端子間
の間隙がより小さくなり、液状樹脂の流入(いわゆるア
ンダーフィル)が難しくなってきている。
【0005】そこで、アンダーフィルを行わない方法と
して、一方の部品(例えば回路基板)の、他方の部品
(例えば半導体チップ)が搭載される領域に、液状樹脂
を予め塗布しておき、接続端子同士を位置合わせして熱
圧着し、電気的接続と機械的接合とをともに行う方法が
提案されている(特開平2−7180号公報に開示)。
この方法では、熱硬化型樹脂の硬化時の収縮力によっ
て、両部品の接続端子同士が直接接触して電気的接続さ
れる。
【0006】
【発明が解決しようとする課題】電気・電子機器を高温
環境下で使用する場合や、パワーモジュール等の高温発
熱の半導体素子の近傍に位置する場合などには、部品を
接合するための樹脂は加熱されて膨張し、使用終了後に
は冷却されて樹脂は収縮する。この膨張と収縮の繰り返
しにより、樹脂の劣化が生じる。
【0007】従来の接続方法では、接続端子周辺の樹脂
の硬化収縮力のみで両部品が相対的に保持され、両接続
端子間の導通が確保されている。ところが、前記したよ
うに膨張収縮の繰り返しにより樹脂が劣化するにつれ
て、次第に樹脂の収縮力が緩和される。そして、冷却時
の樹脂の硬化収縮の方が加熱時の樹脂の膨張よりも小さ
くなると、電気的接続不良が発生する。
【0008】この電気的接続不良を防ぐためには、樹脂
の熱膨張係数を低下させ熱膨張を抑制することが必要で
ある。そこで、通常は樹脂中に熱膨張係数の小さい無機
物であるシリカ粒子等の絶縁性粒子が混合されている。
これにより樹脂の熱膨張係数を低下させることができ
る。ところが、接続端子の表面が平滑であると、対向す
る接続端子間に樹脂が介在し、電気的接続不良を起こし
やすい。特に、樹脂中に混合されているシリカ粒子等の
絶縁性粒子が接続端子間に挟まれて、接続端子同士の直
接接触がはばまれて電気的接続が不確実になりやすい。
部品の接続端子に先端が尖った形状の金属突起(バン
プ)を設けた構成(特開平9−97816号公報等に開
示)としても、図6に示すように、金属突起11とそれ
と対向する接続端子12との間に、樹脂フィルム13中
の絶縁性粒子14が多数挟み込まれて電気的接続が不安
定になるおそれがある。
【0009】以上説明した通り、フリップチップ接続に
おいて熱硬化性の液状(ペースト状)樹脂を用いて固定
する場合、樹脂の硬化時間が数分から数時間と長くかか
り生産性が低いという問題がある。また、一方の部品
の、他方の部品を搭載する領域に液状樹脂を塗布してお
き、各接続端子同士を位置合わせした後熱圧着して電気
的および機械的に接合する場合、熱圧着時に樹脂中に混
合されている絶縁物粒子が対向する接続端子間に挟みこ
まれて接続不良となるおそれがある。
【0010】そこで本発明の目的は、短時間での接続が
可能で接続信頼性が高い電気的接続用の樹脂フィルムお
よびこの樹脂フィルムを用いた電気的接続方法を提供す
ることにある。
【0011】
【課題を解決するための手段】本発明の電気的接続用の
樹脂フィルムは、絶縁性の樹脂と、前記樹脂中に含有さ
れている絶縁性粒子と、前記樹脂中に含有されており前
記絶縁性粒子よりも粒径の小さな導電性粒子とからな
る。
【0012】前記導電性粒子が、コア絶縁体の表面に金
属層が形成されたものであってもよい。
【0013】前記絶縁性粒子と、前記導電性粒子の前記
コア絶縁体とが、同一の無機物粒子であってもよい。そ
の場合、前記絶縁性粒子と、前記導電性粒子の前記コア
絶縁体とが、球状シリカであることが好ましい。
【0014】前記導電性粒子の前記コア絶縁体と前記金
属層との間に、絶縁樹脂層が介在していてもよい。
【0015】前記樹脂が、熱硬化性樹脂、熱可塑性樹
脂、熱硬化性樹脂と熱可塑性樹脂の混合物のうちのいず
れかであってもよい。
【0016】前記絶縁性粒子が、前記樹脂よりも熱膨張
係数が小さいことが好ましい。
【0017】また本発明の樹脂フィルムを用いた電気的
接続方法は、一方の部品に設けられた接続端子上に、絶
縁性の樹脂中に絶縁性粒子と該絶縁性粒子よりも小径の
導電性粒子が含有されている樹脂フィルムを仮圧着させ
る工程と、前記一方の部品の前記接続端子と、他方の部
品に設けられた接続端子とが、前記樹脂フィルムを介し
て対向するように位置合わせする工程と、前記絶縁性の
樹脂を溶融させた後で硬化させることにより前記両部品
を機械的に接合するとともに、対向する前記接続端子同
士を導通させる工程を含む。
【0018】さらに、前記他方の部品の前記接続端子上
に先端の尖った形状の金属突起を形成する工程を含む。
【0019】そして、前記一方の部品が回路基板であ
り、前記他方の部品が半導体チップであってもよい。
【0020】本発明によれば、液状樹脂ではなく樹脂フ
ィルムを用いるため、より短時間での電気的接続および
機械的接合が可能となる。さらに、導電性粒子が絶縁性
粒子より粒径が小さい構成とすると、樹脂フィルムを介
在させて対向する接続端子同士を熱圧着する際、両接続
端子間から粒径の大きい絶縁性粒子は排除され、粒径の
小さい導電性粒子が優先的に残留するため、接続信頼性
が向上する。
【0021】また、絶縁性粒子の熱膨張係数が樹脂より
も小さいと、樹脂の膨張・収縮に伴う経時的な接続不良
を起こしにくくなるとともに、機械的強度や耐熱性およ
び耐湿性も向上する。
【0022】
【発明の実施の形態】次に、本発明の実施形態について
図面を参照して詳細に説明する。
【0023】図1に、本発明の樹脂フィルム1の概略断
面図を示している。これは、ベースとなる絶縁性の樹脂
2中に、絶縁性粒子3と導電性粒子4とが実質的に均一
に分散され、フィルム状に形成されている。
【0024】絶縁性の樹脂2は、熱硬化性樹脂、熱可塑
性樹脂、両者の混合物などからなるもので、その材質は
特に限定されない。なお、熱硬化性樹脂としては、ビス
フェノールA型、ジシクロペンタジエン型、クレゾール
ノボラック型、ビフェニル型、ナフタレン型等のエポキ
シ樹脂や、レゾール型、ノボラック型のフェノール樹脂
や、(R2SiO)nという構造式(Rはメチル基また
はフェニル基)で表されるシリコーン樹脂等が用いられ
る。熱可塑性樹脂としては、アクリル樹脂、ポリエステ
ル樹脂、ABS樹脂、ポリカーボネート樹脂、フェノキ
シ樹脂等が用いられる。
【0025】絶縁性粒子3は、シリカ、アルミナ、窒化
硼素、窒化珪素等からなる。特に好ましくは、低コス
ト、低比重、高流動性である球状のシリカ粒子が用いら
れる。絶縁性粒子3の混合量は、20〜70重量%程度
が好ましい。
【0026】導電性粒子4は、ニッケル、はんだ、銅、
銀等の金属粒子や、図2に示すように絶縁性樹脂からな
るコア絶縁体4aの表面にニッケル、金等の金属層4b
を形成した粒子等が用いられる。導電粒子の混合量は、
1〜10容量%程度が好ましい。導電性粒子4は、絶縁
性粒子3よりも粒径が小さく形成されている。
【0027】次に、この樹脂フィルム1を用いた電気的
の接続方法について、図3,図4を用いて説明する。本
実施形態では、一方の電気部品が回路基板5であり、他
方の電気部品が半導体チップ6である。ここで、回路基
板5は、ガラスエポキシ樹脂基板や、アルミナ等のセラ
ミック基板や、ガラス基板等基板の表面に、図示しない
配線パターンが形成されたものであり、配線パターンの
一部に複数の接続端子7が設けられている。また、半導
体チップ6の表面にも、回路基板5の接続端子7に対応
してアルミニウムパッドなどの接続端子8が複数個設け
られている。
【0028】本実施形態では、まず、接続端子8上に、
先端の尖った形状の金属突起(バンプ)8aを形成する
(ステップ101)。この金属突起8aの形成方法の一
例としては、例えば、ワイヤボンディングで使用する
金、アルミニウム等のボンディングワイヤを半導体チッ
プ6の接続端子8にボンディングした後、ワイヤを過剰
な力で引きちぎり、ワイヤの一部のみ接続端子8上に残
留させることにより形成する方法が用いられ得る。
【0029】回路基板6の表面の、半導体チップ5が搭
載される領域に、前記した構成の本発明の樹脂フィルム
1を仮圧着する(ステップ102)。樹脂フィルム1の
形状は、半導体チップ5より一回り大きな形状とし、厚
みは半導体チップ5と回路基板6の各接続端子7,8お
よび金属突起8aの高さの和と概ね同等レベルであれば
よい。樹脂フィルム1は、前記の通り樹脂2中に絶縁性
粒子3と導電性粒子4を含有したフィルムである。
【0030】そして、半導体チップ5と回路基板6のそ
れぞれの接続端子7,8が互いに対向するように位置合
わせする(ステップ103)。位置合わせした状態で回
路基板6上に半導体チップ5を置き、熱圧着する(ステ
ップ104)。加熱および常温への冷却により樹脂1が
一旦溶融した後に硬化収縮して、半導体チップ5と回路
基板6とが機械的に接合される。この際、半導体チップ
5の接続端子8上の尖った金属突起(バンプ)8aは、
加圧されて先端がつぶれて広がる。金属突起8aがつぶ
れて広がる際に、回路基板6の接続端子7との間隙に位
置する樹脂2は外側へ押し出される。この時、まず粒径
の大きな絶縁性粒子3が押し出され、それに加えて粒径
の小さな導電性粒子4が押し出される。粒径の小さな導
電性粒子4は、金属突起8aと接続端子7との間隙に多
少残留するが、導電性を有しているため、接続端子7,
8間の電気的接続に影響を与えない。なお、液状樹脂を
用いる場合に比べて、熱圧着による接続に要する時間が
短くなる。
【0031】理想的には、半導体チップ5と回路基板6
との熱圧着時に、金属突起8aと接続端子7との間隙に
は全く何も介在しないようにすることが望ましいが、完
全に介在を抑制させることは困難である。その際、金属
突起8aと接続端子7との間隙に絶縁性粒子3が介在し
てしまうと、接続端子7,8間の電気的接続が不確実に
なってしまう。しかし、この間隙に導電性粒子4が介在
するのであれば、電気的接続は問題なく確保される。本
実施形態の導電性粒子4は絶縁性粒子3に比べて小粒径
であり、小粒径粒子ほど接続端子7,8間に残留しやす
い傾向があるため、本実施形態では接続端子7,8間に
優先的に導電性粒子4が残存し、電気的接続が確保され
る。導電粒子の粒径は0.1〜3μm、絶縁粒子の粒径
は5〜10μm程度、ともに粒径分布は狭いことが好ま
しく、特に導電性粒子4は単一粒径とすることが最適で
ある。
【0032】また本実施形態では、樹脂2中に熱膨張係
数の小さい絶縁性粒子3が混合されているため、樹脂フ
ィルム1全体の熱膨張が小さく抑えられ、温度変動に伴
う経時的な樹脂の劣化による接続の不安定が防がれる。
特に、絶縁性粒子3の配合量(占有体積)が大である
程、熱膨張係数の低下に寄与する。さらに、図2に示す
ように、導電性粒子4も、絶縁性粒子3と同様に熱膨張
係数の小さい材質(例えば球状シリカ)からなるコア絶
縁体4aを含むものであると、樹脂フィルム1の熱膨張
係数の低下、ひいては経時的な接続不安定の防止に効果
的である。ただし、導電性粒子4が大きすぎたり、多す
ぎたりすると、樹脂フィルム1内で電気的短絡を起こす
おそれがあるので、大粒径の絶縁性粒子3と小粒径の導
電性粒子4とが混合された構成が最も望ましい。
【0033】図5には、本発明の第2の実施形態の導電
性粒子9の断面図が示されている。この導電性粒子9
は、図2に示す第1の実施形態と同じコア絶縁体4aと
金属層4bとの間に、絶縁樹脂層9aが設けられてお
り、コア絶縁体4aと金属層4bとの密着力が向上して
いる。
【0034】
【実施例】以下、本発明の樹脂フィルム1を用いて半導
体チップ5とプリント基板6とを、100μmのピッチ
で接続した実施例について、具体的な結果を示す表を参
照して説明する。
【0035】各表には、樹脂フィルムの主な構成、熱圧
着による接続条件、接続直後の電気抵抗値、高温高湿保
管試験(温度85℃、湿度85%で800時間放置)の
結果である接続信頼性(表中では信頼性1と表示)、温
度サイクル試験(温度−40℃で30分間放置と、温度
125℃で30分間放置のサイクルを500サイクル繰
り返す)の結果である接続信頼性(表中では信頼性2と
表示)をまとめて示してある。合わせて比較例も示し
た。(実施例1)
【0036】
【表1】 (実施例2)
【0037】
【表2】 (実施例3)
【0038】
【表3】 (実施例4)
【0039】
【表4】 (実施例5)
【0040】
【表5】 (実施例6)
【0041】
【表6】 以上6つの実施例において、樹脂2中に熱膨張係数が小
さく大径の絶縁性粒子4と小径の導電性粒子5を混合さ
せた構成とすることにより、電気的接続の信頼性が優れ
ていることが明らかである。
【0042】ここで、本発明と異なる構成の樹脂フィル
ムを用い実施例1〜6と同様の実験を行った結果を、比
較例として示す。 (比較例1)
【0043】
【表7】 比較例1は、導電性粒子が混合されていない樹脂フィル
ムにより接続したものであるが、温度変動が繰り返され
ると電気的接続の信頼性が失われることがわかる。 (比較例2)
【0044】
【表8】 比較例2は、絶縁性粒子が混合されていない樹脂フィル
ムにより接続したものであるが、高温高湿下に置かれた
時と温度変動が繰り返された時には、電気的接続の信頼
性が失われることがわかる。 (比較例3)
【0045】
【表9】 比較例3は、小径の絶縁性粒子と大径の導電性粒子とが
混合された樹脂フィルムにより接続したものであるが、
熱圧着による接続を行った直後から電気的接続不良(シ
ョート)であることがわかる。 (比較例4)
【0046】
【表10】 比較例4は、同径の絶縁性粒子と導電性粒子とが混合さ
れた樹脂フィルムにより接続したものであるが、温度変
動が繰り返されると電気的接続の信頼性が失われること
がわかる。
【0047】
【発明の効果】本発明によると、樹脂フィルム中の導電
性粒子が絶縁性粒子より粒径が小さいため、電気的接続
を行うべき接続端子間に導電性粒子が残留しても、粒径
の大きい絶縁性粒子は排除され、電気的接続が確保され
る。
【0048】また、樹脂中に熱膨張係数の小さい絶縁性
粒子が混合されているため、樹脂フィルム全体の熱膨張
係数が低下し、経時的な機械的接続強度の低下が防げる
とともに、耐熱性および耐湿性が向上する。導電性粒子
が内部に絶縁性粒子と同様なコア絶縁体を含む構成であ
ると、より効果的である。また、絶縁性粒子とコア絶縁
体とが同一の無機物粒子であると、製造が簡単にでき
る。
【図面の簡単な説明】
【図1】本発明の第1の実施形態の樹脂フィルムの概略
断面図である。
【図2】本発明の第1の実施形態の導電性粒子の拡大断
面図である。
【図3】本発明の第1の実施形態の電気的接続方法を示
す概略断面図であり、(a)は熱圧着前、(b)は熱圧
着後を示す図である。
【図4】本発明の第1の実施形態の電気的接続方法のフ
ローチャートである。
【図5】本発明の第2の実施形態の導電性粒子の拡大断
面図である。
【図6】従来の電気的接続方法を示す概略断面図であ
り、(a)は熱圧着前、(b)は熱圧着後を示す図であ
る。
【符号の説明】
1 樹脂フィルム 2 絶縁性の樹脂 3 絶縁性粒子 4 導電性粒子 4a コア絶縁体 4b 金属層 5 半導体チップ 6 回路基板 7 接続端子 8 接続端子 8a 金属突起(バンプ) 9 導電性粒子 9a 絶縁樹脂層 11 金属突起(バンプ) 12 接続端子 13 樹脂フィルム 14 絶縁性粒子
フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 21/60 H01B 5/16 Fターム・システム(Japanese Patent Office) DIALOG(WPI/L)

Claims (16)

    (57)【特許請求の範囲】
  1. 【請求項1】 絶縁性の樹脂と、前記樹脂中に含有され
    ている絶縁性粒子と、前記樹脂中に含有されており前記
    絶縁性粒子よりも粒径の小さな導電性粒子とからなる電
    気的接続用の樹脂フィルム。
  2. 【請求項2】 前記導電性粒子が、コア絶縁体の表面に
    金属層が形成されたものである請求項1に記載の電気的
    接続用の樹脂フィルム。
  3. 【請求項3】 前記絶縁性粒子と、前記導電性粒子の前
    記コア絶縁体とが、同一の無機物粒子である請求項2に
    記載の電気的接続用の樹脂フィルム。
  4. 【請求項4】 前記絶縁性粒子と、前記導電性粒子の前
    記コア絶縁体とが、球状シリカである請求項3に記載の
    電気的接続用の樹脂フィルム。
  5. 【請求項5】 前記導電性粒子の前記コア絶縁体と前記
    金属層との間に、絶縁樹脂層が介在する請求項2〜4の
    いずれか1項に記載の電気的接続用の樹脂フィルム。
  6. 【請求項6】 前記樹脂が、熱硬化性樹脂、熱可塑性樹
    脂、熱硬化性樹脂と熱可塑性樹脂の混合物のうちのいず
    れかである請求項1〜5のいずれか1項に記載の電気的
    接続用の樹脂フィルム。
  7. 【請求項7】 前記絶縁性粒子が、前記樹脂よりも熱膨
    張係数が小さい請求項1〜6のいずれか1項に記載の電
    気的接続用の樹脂フィルム。
  8. 【請求項8】 一方の部品に設けられた接続端子上に、
    絶縁性の樹脂中に絶縁性粒子と該絶縁性粒子よりも小径
    の導電性粒子が含有されている樹脂フィルムを仮圧着さ
    せる工程と、 前記一方の部品の前記接続端子と、他方の部品に設けら
    れた接続端子とが、前記樹脂フィルムを介して対向する
    ように位置合わせする工程と、 前記絶縁性の樹脂を溶融させた後で硬化させることによ
    り前記両部品を機械的に接合するとともに、対向する前
    記接続端子同士を導通させる工程を含む樹脂フィルムを
    用いた電気的接続方法。
  9. 【請求項9】 前記他方の部品の前記接続端子に先端の
    尖った形状の金属突起を形成する工程を含む請求項8に
    記載の樹脂フィルムを用いた電気的接続方法。
  10. 【請求項10】 前記導電性粒子がコア絶縁体の表面に
    金属層が形成されたものである請求項8または9に記載
    の樹脂フィルムを用いた電気的接続方法。
  11. 【請求項11】 前記絶縁性粒子と、前記導電性粒子の
    前記コア絶縁体とが、同一の無機物粒子である請求項1
    0に記載の樹脂フィルムを用いた電気的接続方法。
  12. 【請求項12】 前記絶縁性粒子と、前記導電性粒子の
    前記コア絶縁体とが、球状シリカである請求項11に記
    載の樹脂フィルムを用いた電気的接続方法。
  13. 【請求項13】 前記導電性粒子の前記コア絶縁体と前
    記金属層との間に、絶縁樹脂層が介在する請求項10〜
    12のいずれか1項に記載の樹脂フィルムを用いた電気
    的接続方法。
  14. 【請求項14】 前記樹脂が、熱硬化性樹脂、熱可塑性
    樹脂、熱硬化性樹脂と熱可塑性樹脂の混合物のうちのい
    ずれかである請求項8〜13のいずれか1項に記載の樹
    脂フィルムを用いた電気的接続方法。
  15. 【請求項15】 前記一方の部品が回路基板であり、前
    記他方の部品が半導体チップである請求項8〜14のい
    ずれか1項に記載の樹脂フィルムを用いた電気的接続方
    法。
  16. 【請求項16】 前記絶縁性粒子が、前記樹脂よりも熱
    膨張係数が小さい請求項8〜15のいずれか1項に記載
    の樹脂フィルムを用いた電気的接続方法。
JP6859198A 1998-03-18 1998-03-18 電気的接続用の樹脂フィルムおよび樹脂フィルムを用いた電気的接続方法 Expired - Fee Related JP3120837B2 (ja)

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EP2495732A3 (en) 2000-08-04 2014-04-16 Sekisui Chemical Co., Ltd. Conductive fine particles, method for plating fine particles, and substrate structure
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