JP2792508B2 - 超微細パタン形成方法及び超微細エッチング方法 - Google Patents

超微細パタン形成方法及び超微細エッチング方法

Info

Publication number
JP2792508B2
JP2792508B2 JP8157287A JP15728796A JP2792508B2 JP 2792508 B2 JP2792508 B2 JP 2792508B2 JP 8157287 A JP8157287 A JP 8157287A JP 15728796 A JP15728796 A JP 15728796A JP 2792508 B2 JP2792508 B2 JP 2792508B2
Authority
JP
Japan
Prior art keywords
resist
pattern
ultrafine
region
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP8157287A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09236919A (ja
Inventor
良武 大西
淳一 藤田
アルドイーニ アルトゥーロ
カスナーティ アレッサンドロ
ポキーニ アンドレア
ウンガロ ロッコ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Publication of JPH09236919A publication Critical patent/JPH09236919A/ja
Application granted granted Critical
Publication of JP2792508B2 publication Critical patent/JP2792508B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0277—Electrolithographic processes
    • H10P76/2045—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/167—X-ray
    • Y10S430/168—X-ray exposure process

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Paints Or Removers (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP8157287A 1996-02-28 1996-06-18 超微細パタン形成方法及び超微細エッチング方法 Expired - Fee Related JP2792508B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT96MI000382A IT1282709B1 (it) 1996-02-28 1996-02-28 Procedimento di formazione di configurazione ultrafine e procedimento di incisione ultrafine utilizzando derivato di
IT96A000382 1996-02-28

Publications (2)

Publication Number Publication Date
JPH09236919A JPH09236919A (ja) 1997-09-09
JP2792508B2 true JP2792508B2 (ja) 1998-09-03

Family

ID=11373436

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8157287A Expired - Fee Related JP2792508B2 (ja) 1996-02-28 1996-06-18 超微細パタン形成方法及び超微細エッチング方法

Country Status (3)

Country Link
US (1) US5702620A (Direct)
JP (1) JP2792508B2 (Direct)
IT (1) IT1282709B1 (Direct)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7514197B2 (en) 2002-09-09 2009-04-07 Nec Corporation Resist and method of forming resist pattern

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3486341B2 (ja) * 1997-09-18 2004-01-13 株式会社東芝 感光性組成物およびそれを用いたパターン形成法
DE102004012179A1 (de) 2004-03-10 2005-09-29 Universität Kassel Verfahren zur elektrostatischen Strukturierung einer Substratoberfläche und Rastersonden-Lithographieverfahren damit
TWI494697B (zh) 2004-12-24 2015-08-01 Mitsubishi Gas Chemical Co 光阻用化合物
JP4830138B2 (ja) * 2005-08-22 2011-12-07 和歌山県 多孔質薄膜の製造方法
KR100757341B1 (ko) * 2005-12-23 2007-09-11 삼성전자주식회사 실록산 화합물, 이를 포함하는 분자 포토레지스트 조성물및 패턴 형성 방법
TWI432408B (zh) 2007-01-09 2014-04-01 Jsr Corp 化合物及敏輻射線性組成物
US8377627B2 (en) 2007-08-13 2013-02-19 Jsr Corporation Compound and radiation-sensitive composition
DE102012224537A1 (de) 2012-12-31 2014-07-03 Technische Universität Ilmenau Lithographieverfahren und Lithographievorrichtung für Bauteile und Schaltungen mit Strukturabmessungen im Mikro- und Nanobereich

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0723340B2 (ja) * 1990-09-19 1995-03-15 日本電気株式会社 カリックスアレーン誘導体およびそのフィルムおよびそのパターン形成方法
JPH0653819B2 (ja) * 1990-05-10 1994-07-20 日本電気株式会社 カリックスアレーンおよび／またはカリックスアレーン誘導体のフィルムおよびその製造法
US5143784A (en) * 1990-05-10 1992-09-01 Nec Corporation Soluble calixarene derivative and films thereof
JP2893923B2 (ja) * 1990-10-18 1999-05-24 日本電気株式会社 組成物およびそのフイルムおよびそのパターン形成方法
JP2705345B2 (ja) * 1991-03-22 1998-01-28 日本電気株式会社 配線形成方法
JP2692428B2 (ja) * 1991-06-21 1997-12-17 日本電気株式会社 半導体素子の製造方法
JP2712916B2 (ja) * 1991-08-29 1998-02-16 日本電気株式会社 配線形成方法
JP3021236B2 (ja) * 1993-06-17 2000-03-15 シャープ株式会社 磁気記録再生装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7514197B2 (en) 2002-09-09 2009-04-07 Nec Corporation Resist and method of forming resist pattern

Also Published As

Publication number Publication date
ITMI960382A1 (it) 1997-08-28
IT1282709B1 (it) 1998-03-31
ITMI960382A0 (Direct) 1996-02-28
JPH09236919A (ja) 1997-09-09
US5702620A (en) 1997-12-30

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