JP2756223B2 - Substrate through electrode - Google Patents

Substrate through electrode

Info

Publication number
JP2756223B2
JP2756223B2 JP5190823A JP19082393A JP2756223B2 JP 2756223 B2 JP2756223 B2 JP 2756223B2 JP 5190823 A JP5190823 A JP 5190823A JP 19082393 A JP19082393 A JP 19082393A JP 2756223 B2 JP2756223 B2 JP 2756223B2
Authority
JP
Japan
Prior art keywords
substrate
hole
conductor
binder
conductor layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP5190823A
Other languages
Japanese (ja)
Other versions
JPH0722723A (en
Inventor
禎 田口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nidec Sankyo Corp
Original Assignee
Nidec Sankyo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nidec Sankyo Corp filed Critical Nidec Sankyo Corp
Priority to JP5190823A priority Critical patent/JP2756223B2/en
Publication of JPH0722723A publication Critical patent/JPH0722723A/en
Application granted granted Critical
Publication of JP2756223B2 publication Critical patent/JP2756223B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/4038Through-connections; Vertical interconnect access [VIA] connections
    • H05K3/4053Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques
    • H05K3/4061Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques for via connections in inorganic insulating substrates

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、例えば磁気抵抗素子等
の磁気センサの基板、その他各種電子機器に適用可能な
基板の貫通電極の構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of a through electrode on a substrate of a magnetic sensor such as a magnetoresistive element and a substrate applicable to various electronic devices.

【0002】[0002]

【従来の技術】例えば、磁気式エンコーダ等の磁気セン
サとして用いる磁気抵抗素子では、磁気検知部を外部回
路に接続するための電極を、基板の表面側すなわち磁性
膜形成側に形成すると、磁気抵抗素子を磁気記録体に対
向配置するに際し、上記電極部の盛り上がりを避けて配
置する必要があることから、磁性膜と磁気記録体との間
隔が大きくなりすぎたり、上記電極部分を磁気記録体と
の対向面からずらして配置する必要があるなどの不具合
がある。そこで、基板に表裏に貫通する貫通孔を形成
し、この貫通孔内に表裏面間を導通接続する電極を設け
て両面基板とし、基板の裏面側において上記電極を外部
回路に接続するようにした基板の貫通電極が提案されて
いる。
2. Description of the Related Art For example, in a magnetoresistive element used as a magnetic sensor such as a magnetic encoder, if an electrode for connecting a magnetic detecting portion to an external circuit is formed on the front surface side of a substrate, that is, on a side on which a magnetic film is formed, the magnetoresistive element is formed. When disposing the element in opposition to the magnetic recording body, it is necessary to arrange the element so as to avoid the swelling of the electrode part, so that the distance between the magnetic film and the magnetic recording body becomes too large, or the electrode part is formed with the magnetic recording body. However, there is a problem that it is necessary to dispose it from the facing surface. Therefore, a through-hole is formed in the substrate so as to penetrate the front and back surfaces, and an electrode for conducting connection between the front and back surfaces is provided in the through-hole to form a double-sided substrate. Substrate through electrodes have been proposed.

【0003】上記のような両面基板として、高耐熱性、
高強度、高熱伝導の点で、セラミック等の無機材を基板
とし、これに貫通孔を設けて、Ag,Cu等の導体を貫
通孔の内部に形成したものが知られている。上記セラミ
ックは焼成前のグリーンシートの状態でパンチ等により
貫通孔を形成する。一方、基板として感光性ガラスを用
いたものもある。感光性ガラスは、貫通孔を形成したい
ところにだけに紫外線を照射し、熱処理を施し、エッチ
ング処理をすることによって容易に貫通孔付きの基板が
得られるという利点がある。また、さらに熱処理等を施
すと結晶化ガラス質になり、耐熱性及び強度が向上する
という特性がある。このような感光性ガラス基板の貫通
孔に導体を形成することによって両面基板として使用す
ることができる。
As a double-sided board as described above, high heat resistance,
From the viewpoint of high strength and high thermal conductivity, there is known a substrate in which an inorganic material such as ceramic is used as a substrate, a through hole is provided in the substrate, and a conductor such as Ag or Cu is formed inside the through hole. The ceramic forms a through hole by a punch or the like in a state of a green sheet before firing. On the other hand, there is one using photosensitive glass as a substrate. The photosensitive glass has an advantage that a substrate having a through hole can be easily obtained by irradiating ultraviolet rays only to a portion where a through hole is to be formed, performing a heat treatment, and performing an etching process. Further, when heat treatment or the like is further performed, the material becomes crystallized vitreous, and has a property of improving heat resistance and strength. By forming a conductor in such a through-hole of the photosensitive glass substrate, it can be used as a double-sided substrate.

【0004】しかし、上記のような両面基板において、
上記貫通孔に電極を形成した状態で孔が残っていると、
素子の組立工程中において空気吸引チャックを用いて基
板を搬送しようとするときに上記孔を通じて空気が抜
け、吸引チャックを使用することができないとか、素子
に耐湿性をもたせるために形成した保護膜を基板の表面
ばかりでなく上記孔の内部にまで形成する必要があって
工程が煩雑になるとか、基板の表面にレジストを形成す
る場合、液体が貫通孔を通じて裏面側に至り裏面が汚れ
る、というような不具合がある。
However, in such a double-sided board,
If the hole remains with the electrode formed in the through hole,
When the substrate is transported using the air suction chuck during the device assembling process, air escapes through the hole and the suction chuck cannot be used, or a protective film formed to impart moisture resistance to the device is used. It is necessary to form not only the surface of the substrate but also the inside of the hole, which makes the process complicated, or when forming a resist on the surface of the substrate, the liquid reaches the back side through the through hole and the back surface is stained. There is a problem.

【0005】そこで、基板に形成した貫通孔に導電材を
充填して貫通孔を塞ぎ、上記のような孔が残っているこ
とによる不具合をなくすことができる技術も知られてい
る。本出願人の出願にかかる特開平4−118979号
公報記載の発明はその例である。また、まだ公知ではな
いが、本出願人の出願にかかる実願平4−12417号
の明細書及び図面に記載されているように、基板に表裏
方向に貫通して形成した貫通孔の内面に導電性皮膜を形
成し、さらに貫通孔内に絶縁体を充填してなる基板の貫
通電極も提案されている。
Therefore, there is also known a technique capable of filling a through-hole formed in a substrate with a conductive material to close the through-hole, thereby eliminating the problem caused by the remaining hole. The invention described in Japanese Patent Application Laid-Open No. Hei 4-118979 filed by the present applicant is an example thereof. Although not yet known, as described in the specification and drawings of Japanese Patent Application No. 4-12417 filed by the present applicant, the inner surface of a through-hole formed through the substrate in the front-to-back direction is formed. There has also been proposed a through electrode for a substrate in which a conductive film is formed and an insulator is filled in the through hole.

【0006】基板をセラミックで作る場合、バインダー
を含んだグリーンシート状態で貫通孔を形成し、この貫
通孔に導体ペーストを埋め込んで同時に焼けば、セラミ
ック化と導体の焼成が同時にでき、かつ、グリーンシー
トの収縮率が20%近くあるため、上記貫通孔が導体ペ
ーストの収縮率に追従して隙間ができにくく、導体が貫
通孔内に確実に保持される。
When the substrate is made of ceramic, a through-hole is formed in a green sheet state containing a binder, and a conductor paste is embedded in the through-hole and baked at the same time. Since the shrinkage ratio of the sheet is close to 20%, it is difficult for the through-hole to follow the shrinkage ratio of the conductive paste to form a gap, and the conductor is reliably held in the through-hole.

【0007】[0007]

【発明が解決しようとする課題】ところが、前に述べた
ような感光性ガラス基板のように、既に基板として形成
されていて大きな収縮挙動を示さない基板の貫通孔に導
体を充填することはかなり難しい。何故なら、基板の貫
通孔と導体との密着性を高めるためには導体がある程度
以上のバインダーを含んでいる必要があるが、バインダ
ーを含んでいると収縮率が大きく、貫通孔の周面と導体
との間に隙間が生じるからであり、逆に、貫通孔の周面
と導体との間に隙間が生じないように導体にバインダー
を添加しないか又は添加してもその割合が極少なくする
と、貫通孔の周面と導体との密着性が低下し、導体が貫
通孔から脱落する恐れがあるからである。
However, it is quite difficult to fill a through-hole in a substrate which has already been formed as a substrate and does not exhibit a large shrinkage behavior, such as a photosensitive glass substrate as described above, with a conductor. difficult. Because, in order to enhance the adhesion between the through hole of the substrate and the conductor, the conductor needs to contain a certain amount of binder, but if the binder is included, the shrinkage is large, and the peripheral surface of the through hole and This is because a gap is generated between the conductor and the other way around, when the binder is not added to the conductor so that no gap is generated between the peripheral surface of the through hole and the conductor, or the ratio is extremely small even if added. This is because adhesion between the peripheral surface of the through hole and the conductor is reduced, and the conductor may fall out of the through hole.

【0008】本発明は、このような問題点を解消するた
めになされたもので、基板に表裏方向に貫通する貫通孔
を形成し、この貫通孔内に上記表裏面間を導通接続する
貫通電極を設けてなる基板において、上記貫通孔と電極
との間に隙間ができず、かつ、貫通孔と電極との密着性
が良好で、電極が貫通孔から脱落する恐れのない貫通電
極を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention has been made to solve such a problem. A through hole is formed in a substrate so as to penetrate the substrate in a front-to-back direction. In the substrate provided with the above, there is provided a through electrode in which a gap is not formed between the through hole and the electrode, the adhesion between the through hole and the electrode is good, and the electrode is not likely to fall out of the through hole. The purpose is to:

【0009】[0009]

【課題を解決するための手段】上記目的を達成するため
に本発明は、基板に表裏方向に貫通する貫通孔を形成
し、この貫通孔内に表裏面間を導通接続する貫通電極を
設けてなる基板であって、貫通孔の周面に無機バインダ
ーを添加した導体層を設け、この導体層の内部に無機バ
インダーを含まない導体層を充填したことを特徴とす
る。基板は、感光性ガラスとしてもよい。
SUMMARY OF THE INVENTION In order to achieve the above object, the present invention provides a method for forming a through hole in a substrate in a front-to-back direction.
In this through hole, a through electrode for conducting connection between the front and back surfaces is provided.
A substrate provided with an inorganic binder on the peripheral surface of the through hole.
A conductive layer to which the inorganic layer is added.
Characterized by being filled with a conductor layer that does not contain inders
You. The substrate may be a photosensitive glass.

【0010】[0010]

【作用】無機バインダー(以下「バインダー」という)
を添加した導体層は、基板の貫通孔周面及びバインダー
を含まない導体層と良好に密着する。バインダーを含ま
ない導体層は収縮が少なく、基板の貫通孔周面あるいは
バインダーを添加した導体層との間に隙間ができること
はない。
[Action] Inorganic binder (hereinafter referred to as "binder")
Is well adhered to the peripheral surface of the through hole of the substrate and the conductor layer containing no binder. The conductor layer containing no binder has a small shrinkage, and there is no gap between the peripheral surface of the through hole of the substrate and the conductor layer to which the binder is added.

【0011】[0011]

【実施例】以下、図面を参照しながら本発明にかかる基
板の貫通電極の実施例について説明する。図1、図2に
おいて、基板1は例えば感光性ガラス基板からなり、マ
スク板を被せて紫外線を照射し、熱処理を施し、エッチ
ング処理をすることによって基板1を表裏方向に貫通す
る貫通孔2が形成されている。この貫通孔2内には基板
1の表裏面間を導通接続する貫通電極が形成されてい
る。この貫通電極は、バインダーを添加した導体層3と
バインダーを含まない導体層4からなる。バインダーを
添加した導体層3は貫通孔2の周面に設けられ、この導
体層3の内部にバインダーを含まない導体層4が充填形
成されている。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view showing a through electrode of a substrate according to the present invention. 1 and 2, a substrate 1 is made of, for example, a photosensitive glass substrate. A through hole 2 penetrating the substrate 1 in a front-to-back direction is formed by covering a mask plate, irradiating ultraviolet rays, performing heat treatment, and performing etching. Is formed. In the through-hole 2, a through-electrode for electrically connecting the front and back surfaces of the substrate 1 is formed. This through electrode includes a conductor layer 3 to which a binder is added and a conductor layer 4 not containing a binder. The conductor layer 3 to which the binder is added is provided on the peripheral surface of the through hole 2, and the conductor layer 4 containing no binder is filled and formed inside the conductor layer 3.

【0012】上記各導体層3,4の形成方法としては、
一定の大きさの貫通孔2を導体ペーストで埋め、これを
焼き上げる方法がある。この方法によれば容易に導体層
を形成することができる。しかし、通常の導体ペースト
では溶剤量が多く、乾燥時に収縮して貫通孔周壁との間
に既に隙間を生じ、これを焼くとバインダー材により導
体粉末が凝縮すると共に導体粉末が焼結するためさらに
収縮し、貫通孔周面と導体層との間の隙間がさらに拡大
する不具合がある。
The method for forming the above conductor layers 3 and 4 is as follows.
There is a method of filling a through hole 2 having a predetermined size with a conductive paste and baking the conductive paste. According to this method, the conductor layer can be easily formed. However, the amount of the solvent in the ordinary conductor paste is large, and it shrinks during drying to produce a gap between the conductor paste and the peripheral wall of the through-hole. There is a problem in that the gap between the conductor layer and the conductor layer shrinks and the gap between the peripheral surface of the through hole and the conductor layer further increases.

【0013】そこで、まず基板1の貫通孔2の周面にバ
インダーを添加した導体で導体層3を形成し、必要に応
じてこれを焼成し、そのあと上記導体層3の内部にバイ
ンダーを含まない導体を充填し、必要に応じて焼成して
導体層4を形成する。導体層3を形成するための導体ペ
ーストはバインダーを添加した一般的な導体ペーストで
よい。
Therefore, first, a conductor layer 3 is formed of a conductor to which a binder is added on the peripheral surface of the through hole 2 of the substrate 1 and, if necessary, is baked. Then, the binder is contained inside the conductor layer 3. The conductor which does not fill is filled and baked as necessary to form the conductor layer 4. The conductive paste for forming the conductive layer 3 may be a general conductive paste to which a binder is added.

【0014】一方、導体層4を形成する導体ペーストは
固形分を90%以上とし、乾燥時の収縮をできるだけ抑
え、また、かさ密度が小さくならないように、導体粉末
の平均粒径は例えば50μm以上というようにあまり小
さくしない。さらに、ガラスや酸化物などの通常添加す
るバインダーは表面張力で収縮を助長するので添加しな
い。導体層4を形成する導体ペーストの導体は、導体層
3を形成する導体ペーストの導体と同じ材質系のものと
するのが望ましい。
On the other hand, the conductor paste for forming the conductor layer 4 has a solid content of 90% or more, suppresses shrinkage during drying as much as possible, and has an average particle size of 50 μm or more so that the bulk density is not reduced. Don't be too small. Further, binders usually added such as glass and oxides are not added because they promote shrinkage due to surface tension. It is desirable that the conductor of the conductor paste forming the conductor layer 4 be of the same material type as the conductor of the conductor paste forming the conductor layer 3.

【0015】以上説明した実施例によれば、貫通孔の周
面に形成された導体層3はバインダーを添加した導体か
らなるため、収縮率は大きいが、基板1との密着性は良
好である。一方、導体層3の内部に充填形成された導体
層4はバインダーを含まない導体からなるため、基板1
との密着性は劣るが、ほとんど収縮しない。従って、導
体層3の収縮を導体層4が抑制し、基板1の貫通孔2と
の間に隙間が生じることがなく、かつ、貫通孔2の側面
との密着性の良好な貫通電極を得ることができる。加え
て、各導体層3,4を形成する導体ペーストの導体を同
じ材質系にしておけば、導体層3,4相互の密着性も良
好になる利点がある。
According to the embodiment described above, since the conductor layer 3 formed on the peripheral surface of the through hole is made of a conductor to which a binder is added, the shrinkage is large, but the adhesion to the substrate 1 is good. . On the other hand, since the conductor layer 4 filled inside the conductor layer 3 is made of a conductor containing no binder, the substrate 1
Adhesion with the polymer is poor, but hardly shrinks. Therefore, the conductor layer 4 suppresses the contraction of the conductor layer 3, and a through electrode having no adhesion to the through hole 2 of the substrate 1 and having good adhesion to the side surface of the through hole 2 is obtained. be able to. In addition, if the conductors of the conductor paste forming the conductor layers 3 and 4 are made of the same material, there is an advantage that the adhesion between the conductor layers 3 and 4 is improved.

【0016】上記実施例にかかる基板の貫通電極の形成
方法は各種考えられるが、一例としてスクリーン印刷法
を用いることができる。まず、図3に示すように、基板
1の上にスクリーン印刷用マスク板5を載せる。このと
きマスク板5の所定のメッシュ部分が貫通孔2と一致す
るように位置決めする。次に基板1の裏面側から空気を
吸引しながら、マスク板5上でスキージー6を移動さ
せ、マスク板5上のバインダーを添加した導電ペースト
7をスキージー6で掻き取る。このときマスク板5のメ
ッシュ部分を通じて導電ペースト7が基板1の裏面側に
吸引され、貫通孔2の周面に導電ペースト7が付着して
導体層3が形成される。
Although various methods for forming the through electrodes on the substrate according to the above-described embodiments are conceivable, a screen printing method can be used as an example. First, a screen printing mask plate 5 is placed on the substrate 1 as shown in FIG. At this time, positioning is performed so that a predetermined mesh portion of the mask plate 5 matches the through hole 2. Next, the squeegee 6 is moved on the mask plate 5 while sucking air from the back side of the substrate 1, and the conductive paste 7 on the mask plate 5 to which the binder is added is scraped off by the squeegee 6. At this time, the conductive paste 7 is sucked to the back surface side of the substrate 1 through the mesh portion of the mask plate 5, and the conductive paste 7 adheres to the peripheral surface of the through-hole 2 to form the conductive layer 3.

【0017】このようにして形成された導体層3の内部
にバインダーを含まない導電ペーストを詰め込んで導体
層4を形成する場合も空気吸引力を利用することができ
る。すなわち、図4に示すように、基板1の片面側に貫
通孔2を塞ぐようにして濾紙8を配置し、この濾紙8を
通じて空気を吸引しながら、バインダーを含まない導電
ペーストを上記導体層3の形成方法と同様にスキージー
で掻き取る。こうすることによって導体層3の内部に導
体層4が形成されるが、さらに導体層4の密度を上げる
ために上から押さえ込めばよい。
When the conductive layer 3 is formed by filling the conductive layer 3 thus formed with a conductive paste containing no binder, the air suction force can be used. That is, as shown in FIG. 4, a filter paper 8 is arranged on one side of the substrate 1 so as to cover the through hole 2, and the conductive paste containing no binder is applied to the conductive layer 3 while sucking air through the filter paper 8. And scrape it off with a squeegee. By doing so, the conductor layer 4 is formed inside the conductor layer 3. However, the conductor layer 4 may be held down from above to further increase the density of the conductor layer 4.

【0018】次に、本発明の別の実施例について説明す
る。図5に示す実施例は、基板1の貫通孔2内に、基板
1の厚さ方向中間部にバインダーを含まない導体層11
を充填形成し、この導体層11を挾んで基板1の表裏側
にバインダーを添加した導体層10,12を充填形成し
たものである。この実施例も、導体層10,12の収縮
を導体層11が補完し、基板1の貫通孔2との間に隙間
が生じることがなく、かつ、貫通孔2の側面との密着性
の良好な貫通電極を得ることができる。加えて、各導体
層10,11,12を形成する導体ペーストの導体を同
じ材質系にしておけば、導体層10,11,12相互の
密着性も良好になる利点がある。
Next, another embodiment of the present invention will be described. The embodiment shown in FIG. 5 is different from the embodiment shown in FIG.
And the conductor layers 10 and 12 to which a binder is added are filled and formed on the front and back sides of the substrate 1 with the conductor layer 11 interposed therebetween. Also in this embodiment, the contraction of the conductor layers 10 and 12 is compensated for by the conductor layer 11 so that no gap is formed between the conductor layer 10 and the through hole 2 of the substrate 1 and the adhesion to the side surface of the through hole 2 is good. It is possible to obtain a simple through electrode. In addition, if the conductors of the conductor paste forming the conductor layers 10, 11, 12 are made of the same material, there is an advantage that the adhesion between the conductor layers 10, 11, 12 is also improved.

【0019】図5に示す貫通電極の形成方法の例として
次の方法がある。まず、バインダーを添加した導電ペー
ストを前述のスクリーン印刷法などにより基板1の片面
側に印刷形成して貫通孔2の一端側を塞ぐ。次に、貫通
孔2の開口側からバインダーを含まない導電ペーストを
押し込んで充填する。次に、貫通孔2の残りの部分にバ
インダーを添加した導電ペーストを前述のスクリーン印
刷法などにより印刷形成して貫通孔2を完全に塞ぐ。
The following method is an example of the method for forming the through electrode shown in FIG. First, a conductive paste to which a binder has been added is printed and formed on one side of the substrate 1 by the above-described screen printing method or the like, and one end of the through hole 2 is closed. Next, a conductive paste containing no binder is pressed in from the opening side of the through hole 2 and filled. Next, a conductive paste obtained by adding a binder to the remaining portion of the through-hole 2 is printed and formed by the above-described screen printing method or the like, and the through-hole 2 is completely closed.

【0020】あるいは、図5に示す貫通電極の形成方法
の別の例として図6に示すような方法もある。これはま
ず、基板1の貫通孔2の内径と同じ径の突部14を有す
る治具13を、基板1の片面側から上記突部14を貫通
孔2に嵌めた状態でセットし、貫通孔2の開口端側から
バインダーを含まない導電ペーストを充填して導体層1
1を形成する。このとき貫通孔2の開口端側に導体層1
1が形成されない部分15を残しておく。次に治具13
を取り除き、基板1の表裏からスクリーン印刷その他の
手法で導体層11の両面にバインダーを添加した導電ペ
ーストを埋め込み、導体層10,12を形成する。
Alternatively, as another example of the method of forming the through electrodes shown in FIG. 5, there is a method shown in FIG. First, a jig 13 having a protrusion 14 having the same diameter as the inner diameter of the through hole 2 of the substrate 1 is set in a state where the protrusion 14 is fitted into the through hole 2 from one side of the substrate 1. 2 is filled with a conductive paste containing no binder from the open end side of the conductive layer 1
Form one. At this time, the conductor layer 1 is placed on the opening end side of the through hole 2.
The portion 15 where 1 is not formed is left. Next, jig 13
Is removed, and a conductive paste containing a binder is added to both surfaces of the conductive layer 11 by screen printing or other methods from the front and back of the substrate 1 to form the conductive layers 10 and 12.

【0021】なお、以上説明した実施例のようにバイン
ダーを添加した導体層とバインダーを含まない導体層を
基板1の厚さ方向に重ねて形成する場合、バインダーを
含まない導体層の片面側にのみバインダーを添加した導
体層を形成してもよい。図7はこのような実施例を示す
もので、バインダーを添加した導体層10とバインダー
を含まない導体層11だけを重ねて形成したものであ
る。導体層11の表面及び導体層10の表面は基板1の
表面及び裏面と同一面上にある。図7において基板1の
下側を表面とすれば、基板1の表面側には導体層11の
表面に至る例えば磁性膜17などが形成され、この磁性
膜を含む基板1の表面全体が保護膜18で保護されてい
る。基板1の裏面側の導体層11の表面には外部の回路
に接続するためのリードフレーム等が半田付けその他適
宜の手段で接続される。なお、導体層11の表面は必ず
しも平坦面である必要はなく、図7に鎖線で示すような
凹面16になっていても差し支えない。
When the conductor layer containing the binder and the conductor layer containing no binder are formed in the thickness direction of the substrate 1 as in the above-described embodiment, the conductor layer containing no binder is formed on one side of the conductor layer containing no binder. A conductor layer to which only a binder is added may be formed. FIG. 7 shows such an embodiment, in which only the conductor layer 10 to which the binder is added and the conductor layer 11 which does not contain the binder are formed to overlap. The surface of the conductor layer 11 and the surface of the conductor layer 10 are on the same plane as the front and back surfaces of the substrate 1. In FIG. 7, if the lower side of the substrate 1 is the surface, for example, a magnetic film 17 or the like reaching the surface of the conductor layer 11 is formed on the surface side of the substrate 1, and the entire surface of the substrate 1 including this magnetic film is formed as a protective film. 18 protected. A lead frame or the like for connection to an external circuit is connected to the surface of the conductor layer 11 on the back side of the substrate 1 by soldering or other appropriate means. Note that the surface of the conductor layer 11 does not necessarily need to be a flat surface, and may be a concave surface 16 as shown by a chain line in FIG.

【0022】本発明に用いる基板の材質は特定のものに
限定されるものではないが、感光性ガラス基板は前述の
ように貫通孔の形成加工が容易であり、面粗度が良好で
あり、形成した貫通孔の収縮挙動もなく、しかも導体と
の密着強度も充分にあることから、感光性ガラス基板の
使用が推奨される。もっとも他の材質を用いても差し支
えない。例えばアルミナ基板などは、焼結温度が110
0℃もあるため、一般的なAg、Cuなどの導体を用い
て同時に焼成することはできないが、アルミナ基板を焼
結したあとで導体を焼成する場合は、AgあるいはCu
導体などの低融点で電気伝導度の高い導体を使用するこ
とができる。
Although the material of the substrate used in the present invention is not limited to a specific material, the photosensitive glass substrate is easy to form a through hole and has good surface roughness as described above. The use of a photosensitive glass substrate is recommended because there is no shrinkage behavior of the formed through-hole and the adhesive strength with the conductor is sufficient. However, other materials may be used. For example, an alumina substrate has a sintering temperature of 110.
Since it is 0 ° C., it cannot be fired simultaneously using a common conductor such as Ag or Cu. However, when firing the conductor after sintering the alumina substrate, Ag or Cu
A conductor having a low melting point and high electric conductivity, such as a conductor, can be used.

【0023】本発明にかかる基板の貫通電極は、磁気抵
抗素子などの磁気センサに限らず、各種電子機器の基板
に適用することができる。
The through electrode of the substrate according to the present invention is not limited to a magnetic sensor such as a magnetoresistive element, but can be applied to substrates of various electronic devices.

【0024】[0024]

【発明の効果】本発明によれば、基板に表裏方向に貫通
する貫通孔を形成し、この貫通孔内に上記表裏面間を導
通接続する貫通電極を設けてなる基板であって、上記貫
通孔の周面に無機バインダーを添加した導体層を設け、
この導体層の内部に無機バインダーを含まない導体層を
充填したため、バインダーを添加した導体層の収縮をバ
インダーを含まない導体層が抑制し、基板の貫通孔と導
体層との間に隙間が生じることがなく、かつ、貫通孔の
側面との密着性の良好な貫通電極を得ることができる。
According to the present invention, the substrate penetrates in the front and back directions.
A through hole is formed, and the space between the front and back surfaces is
A through electrode provided with through electrodes,
Provide a conductor layer to which an inorganic binder is added on the peripheral surface of the through hole,
A conductor layer containing no inorganic binder is placed inside this conductor layer.
Due to the filling, the conductive layer containing no binder suppresses the shrinkage of the conductive layer to which the binder is added, so that no gap is formed between the conductive layer and the through-hole of the substrate, and the adhesion to the side surface of the through-hole. Can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明にかかる基板の貫通電極の一実施例を示
す断面図である。
FIG. 1 is a sectional view showing one embodiment of a through electrode of a substrate according to the present invention.

【図2】同上平面図である。FIG. 2 is a plan view of the same.

【図3】上記実施例にかかる貫通電極の製造工程の例を
示す断面図である。
FIG. 3 is a cross-sectional view illustrating an example of a manufacturing process of the through electrode according to the embodiment.

【図4】同じく別の製造工程の例を示す断面図である。FIG. 4 is a cross-sectional view showing another example of the manufacturing process.

【図5】本発明にかかる基板の貫通電極の別の実施例を
示す断面図である。
FIG. 5 is a sectional view showing another embodiment of the through electrode of the substrate according to the present invention.

【図6】同上実施例にかかる貫通電極の製造工程の例を
示す断面図である。
FIG. 6 is a sectional view showing an example of the manufacturing process of the through electrode according to the embodiment.

【図7】本発明にかかる基板の貫通電極のさらに別の実
施例を示す断面図である。
FIG. 7 is a sectional view showing still another embodiment of the through electrode of the substrate according to the present invention.

【符号の説明】[Explanation of symbols]

1 基板 2 貫通孔 3 バインダーを添加した導体層 4 バインダーを含まない導体層 10 バインダーを添加した導体層 11 バインダーを含まない導体層 12 バインダーを添加した導体層 DESCRIPTION OF SYMBOLS 1 Substrate 2 Through-hole 3 Conductor layer with binder 4 Conductor layer without binder 10 Conductor layer with binder 11 Conductor layer without binder 12 Conductor layer with binder

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) H05K 1/11 H05K 3/40──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 6 , DB name) H05K 1/11 H05K 3/40

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 基板に表裏方向に貫通する貫通孔を形成
し、この貫通孔内に上記表裏面間を導通接続する貫通電
極を設けてなる基板であって、上記貫通孔の周面に無機
バインダーを添加した導体層を設け、この導体層の内部
に無機バインダーを含まない導体層を充填したことを特
徴とする基板の貫通電極。
1. A substrate comprising: a through-hole penetrating in a front-to-back direction in a substrate; and a through-electrode for electrically connecting the front and back surfaces in the through-hole.
A conductor layer to which a binder is added is provided.
A through-hole electrode of a substrate, characterized by being filled with a conductor layer containing no inorganic binder .
【請求項2】 基板は、感光性ガラスであることを特徴2. The method according to claim 1, wherein the substrate is a photosensitive glass.
とする請求項1記載基板の貫通電極。The through electrode of the substrate according to claim 1.
JP5190823A 1993-07-02 1993-07-02 Substrate through electrode Expired - Fee Related JP2756223B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5190823A JP2756223B2 (en) 1993-07-02 1993-07-02 Substrate through electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5190823A JP2756223B2 (en) 1993-07-02 1993-07-02 Substrate through electrode

Publications (2)

Publication Number Publication Date
JPH0722723A JPH0722723A (en) 1995-01-24
JP2756223B2 true JP2756223B2 (en) 1998-05-25

Family

ID=16264359

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5190823A Expired - Fee Related JP2756223B2 (en) 1993-07-02 1993-07-02 Substrate through electrode

Country Status (1)

Country Link
JP (1) JP2756223B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1436605B1 (en) * 2001-09-07 2009-10-21 Medtronic MiniMed, Inc. Method of fabricating a substrate
US7323142B2 (en) 2001-09-07 2008-01-29 Medtronic Minimed, Inc. Sensor substrate and method of fabricating same
WO2009005462A1 (en) * 2007-07-05 2009-01-08 ÅAC Microtec AB Low resistance through-wafer via
JP4592738B2 (en) * 2007-11-05 2010-12-08 株式会社東芝 Circuit board manufacturing method and circuit board inspection method
KR101468680B1 (en) * 2013-05-09 2014-12-04 (주)옵토레인 Method for manufacturing through via of interposer and semiconductor package comprising interposer
JP6376649B2 (en) * 2014-06-25 2018-08-22 アルバック成膜株式会社 Method for manufacturing through electrode substrate

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5512777A (en) * 1978-07-14 1980-01-29 Fujitsu Ltd Method of manufacturing ceramic substrate
JP2571952B2 (en) * 1988-06-23 1997-01-16 イビデン株式会社 Method for manufacturing ceramic wiring board having through hole
JPH03212991A (en) * 1990-01-17 1991-09-18 Fujitsu Ltd Method for filling fine metallic powder into via hole
JPH0464254A (en) * 1990-07-04 1992-02-28 Ngk Insulators Ltd Ceramic wiring board and manufacture thereof
JPH04188689A (en) * 1990-11-19 1992-07-07 Toshiba Corp Printed wiring board

Also Published As

Publication number Publication date
JPH0722723A (en) 1995-01-24

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