JP2528031Y2 - 半導体集積回路 - Google Patents
半導体集積回路Info
- Publication number
- JP2528031Y2 JP2528031Y2 JP1990113875U JP11387590U JP2528031Y2 JP 2528031 Y2 JP2528031 Y2 JP 2528031Y2 JP 1990113875 U JP1990113875 U JP 1990113875U JP 11387590 U JP11387590 U JP 11387590U JP 2528031 Y2 JP2528031 Y2 JP 2528031Y2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- region
- insulating film
- contact hole
- emitter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 title claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 13
- 239000000956 alloy Substances 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 6
- 229910018125 Al-Si Inorganic materials 0.000 description 4
- 229910018520 Al—Si Inorganic materials 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Landscapes
- Bipolar Transistors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990113875U JP2528031Y2 (ja) | 1990-10-29 | 1990-10-29 | 半導体集積回路 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990113875U JP2528031Y2 (ja) | 1990-10-29 | 1990-10-29 | 半導体集積回路 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0470736U JPH0470736U (enrdf_load_stackoverflow) | 1992-06-23 |
| JP2528031Y2 true JP2528031Y2 (ja) | 1997-03-05 |
Family
ID=31861499
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990113875U Expired - Lifetime JP2528031Y2 (ja) | 1990-10-29 | 1990-10-29 | 半導体集積回路 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2528031Y2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5341435B2 (ja) * | 2008-08-26 | 2013-11-13 | セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー | 半導体装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5248366U (enrdf_load_stackoverflow) * | 1975-10-01 | 1977-04-06 | ||
| JPH0724305B2 (ja) * | 1987-04-15 | 1995-03-15 | ロ−ム株式会社 | 半導体装置 |
| JPH02159040A (ja) * | 1988-12-12 | 1990-06-19 | Nec Corp | 半導体装置 |
-
1990
- 1990-10-29 JP JP1990113875U patent/JP2528031Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0470736U (enrdf_load_stackoverflow) | 1992-06-23 |
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