JP2524176Y2 - ガスセンサ - Google Patents
ガスセンサInfo
- Publication number
- JP2524176Y2 JP2524176Y2 JP1990402726U JP40272690U JP2524176Y2 JP 2524176 Y2 JP2524176 Y2 JP 2524176Y2 JP 1990402726 U JP1990402726 U JP 1990402726U JP 40272690 U JP40272690 U JP 40272690U JP 2524176 Y2 JP2524176 Y2 JP 2524176Y2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- sensitive film
- heater
- diaphragm
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- 239000010703 silicon Substances 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 7
- 238000005530 etching Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 2
- 239000010419 fine particle Substances 0.000 claims 1
- 239000007789 gas Substances 0.000 description 37
- 239000010408 film Substances 0.000 description 24
- 239000011882 ultra-fine particle Substances 0.000 description 7
- 230000004044 response Effects 0.000 description 5
- 230000006870 function Effects 0.000 description 4
- 238000005259 measurement Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990402726U JP2524176Y2 (ja) | 1990-12-28 | 1990-12-28 | ガスセンサ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990402726U JP2524176Y2 (ja) | 1990-12-28 | 1990-12-28 | ガスセンサ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0494561U JPH0494561U (enrdf_load_stackoverflow) | 1992-08-17 |
| JP2524176Y2 true JP2524176Y2 (ja) | 1997-01-29 |
Family
ID=31880594
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990402726U Expired - Lifetime JP2524176Y2 (ja) | 1990-12-28 | 1990-12-28 | ガスセンサ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2524176Y2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4419620B2 (ja) * | 2004-03-17 | 2010-02-24 | Ｔｄｋ株式会社 | ガスセンサ |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58102144A (ja) * | 1981-12-14 | 1983-06-17 | Matsushita Electric Ind Co Ltd | ガスセンサ |
| JPH02285244A (ja) * | 1989-04-27 | 1990-11-22 | Ricoh Co Ltd | ガス検出装置 |
-
1990
- 1990-12-28 JP JP1990402726U patent/JP2524176Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0494561U (enrdf_load_stackoverflow) | 1992-08-17 |
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