JP2024538550A5 - - Google Patents
Info
- Publication number
- JP2024538550A5 JP2024538550A5 JP2024518383A JP2024518383A JP2024538550A5 JP 2024538550 A5 JP2024538550 A5 JP 2024538550A5 JP 2024518383 A JP2024518383 A JP 2024518383A JP 2024518383 A JP2024518383 A JP 2024518383A JP 2024538550 A5 JP2024538550 A5 JP 2024538550A5
- Authority
- JP
- Japan
- Prior art keywords
- mass
- composition
- composition according
- approximately
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163247347P | 2021-09-23 | 2021-09-23 | |
| US63/247,347 | 2021-09-23 | ||
| PCT/US2022/076685 WO2023049688A1 (en) | 2021-09-23 | 2022-09-20 | Post-dry etching photoresist and metal containing residue removal formulation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024538550A JP2024538550A (ja) | 2024-10-23 |
| JP2024538550A5 true JP2024538550A5 (enExample) | 2025-09-30 |
Family
ID=83996417
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024518383A Withdrawn JP2024538550A (ja) | 2021-09-23 | 2022-09-20 | ポストドライエッチングフォトレジストおよび金属含有残渣の除去配合物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20240392194A1 (enExample) |
| EP (1) | EP4388069A1 (enExample) |
| JP (1) | JP2024538550A (enExample) |
| KR (1) | KR20240076803A (enExample) |
| CN (1) | CN118159635A (enExample) |
| TW (1) | TW202313946A (enExample) |
| WO (1) | WO2023049688A1 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240117280A1 (en) * | 2022-09-16 | 2024-04-11 | Tokyo Ohka Kogyo Co., Ltd. | Metal residue removing liquid, metal residue removing method, and metal wiring manufacturing method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6828289B2 (en) * | 1999-01-27 | 2004-12-07 | Air Products And Chemicals, Inc. | Low surface tension, low viscosity, aqueous, acidic compositions containing fluoride and organic, polar solvents for removal of photoresist and organic and inorganic etch residues at room temperature |
| US20030022800A1 (en) * | 2001-06-14 | 2003-01-30 | Peters Darryl W. | Aqueous buffered fluoride-containing etch residue removers and cleaners |
| US6677286B1 (en) * | 2002-07-10 | 2004-01-13 | Air Products And Chemicals, Inc. | Compositions for removing etching residue and use thereof |
| US7166419B2 (en) * | 2002-09-26 | 2007-01-23 | Air Products And Chemicals, Inc. | Compositions substrate for removing etching residue and use thereof |
-
2022
- 2022-09-20 CN CN202280071574.0A patent/CN118159635A/zh active Pending
- 2022-09-20 WO PCT/US2022/076685 patent/WO2023049688A1/en not_active Ceased
- 2022-09-20 JP JP2024518383A patent/JP2024538550A/ja not_active Withdrawn
- 2022-09-20 KR KR1020247013076A patent/KR20240076803A/ko not_active Abandoned
- 2022-09-20 EP EP22797205.6A patent/EP4388069A1/en active Pending
- 2022-09-20 US US18/693,041 patent/US20240392194A1/en active Pending
- 2022-09-21 TW TW111135672A patent/TW202313946A/zh unknown
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