JP2024529865A5 - - Google Patents
Info
- Publication number
- JP2024529865A5 JP2024529865A5 JP2024500644A JP2024500644A JP2024529865A5 JP 2024529865 A5 JP2024529865 A5 JP 2024529865A5 JP 2024500644 A JP2024500644 A JP 2024500644A JP 2024500644 A JP2024500644 A JP 2024500644A JP 2024529865 A5 JP2024529865 A5 JP 2024529865A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- deposited
- substrate
- silicon
- annealing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102021120624 | 2021-08-09 | ||
| DE102021120624.3 | 2021-08-09 | ||
| PCT/EP2022/072294 WO2023017009A1 (de) | 2021-08-09 | 2022-08-09 | Verfahren zur erhöhung der haftfestigkeit von aktivschichten in lithium-batterien |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024529865A JP2024529865A (ja) | 2024-08-14 |
| JP2024529865A5 true JP2024529865A5 (enExample) | 2025-08-18 |
Family
ID=83193255
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024500644A Pending JP2024529865A (ja) | 2021-08-09 | 2022-08-09 | リチウム電池の活性層の接着強度を高めるための方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20240347697A1 (enExample) |
| EP (1) | EP4385079A1 (enExample) |
| JP (1) | JP2024529865A (enExample) |
| KR (1) | KR20240046743A (enExample) |
| CN (1) | CN117795698A (enExample) |
| WO (1) | WO2023017009A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN118355517A (zh) * | 2021-11-03 | 2024-07-16 | 诺克西有限公司 | 由至少二元混合相生产富铜硅泡沫的方法 |
| US20240369752A1 (en) * | 2023-05-01 | 2024-11-07 | Lawrence Livermore National Security, Llc | Systems and methods for engraving of nano void-dash metasurface into substrate to generate birefringence in the surface layer |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014145105A (ja) * | 2013-01-29 | 2014-08-14 | Hitachi Ltd | ナノピラー及びその形成方法並びに当該ナノピラーを用いた接合材料、電池、炭酸ガス回収・貯留装置及び電力変換機器用モジュール |
| DE102016001949B4 (de) * | 2016-02-15 | 2020-10-15 | Helmholtz-Zentrum Dresden-Rossendorf E. V. | Verfahren zur Herstellung von auf Silizium basierenden Anoden für Sekundärbatterien |
| US20210057755A1 (en) * | 2019-08-21 | 2021-02-25 | Graphenix Development, Inc. | Anodes for lithium-based energy storage devices |
-
2022
- 2022-08-09 WO PCT/EP2022/072294 patent/WO2023017009A1/de not_active Ceased
- 2022-08-09 CN CN202280054926.1A patent/CN117795698A/zh active Pending
- 2022-08-09 JP JP2024500644A patent/JP2024529865A/ja active Pending
- 2022-08-09 US US18/682,000 patent/US20240347697A1/en active Pending
- 2022-08-09 KR KR1020247007597A patent/KR20240046743A/ko active Pending
- 2022-08-09 EP EP22765028.0A patent/EP4385079A1/de active Pending
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