JP2024528521A5 - - Google Patents

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Publication number
JP2024528521A5
JP2024528521A5 JP2023580532A JP2023580532A JP2024528521A5 JP 2024528521 A5 JP2024528521 A5 JP 2024528521A5 JP 2023580532 A JP2023580532 A JP 2023580532A JP 2023580532 A JP2023580532 A JP 2023580532A JP 2024528521 A5 JP2024528521 A5 JP 2024528521A5
Authority
JP
Japan
Prior art keywords
organosin
group
compound
tin
deuterated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023580532A
Other languages
English (en)
Japanese (ja)
Other versions
JP2024528521A (ja
Filing date
Publication date
Priority claimed from US17/682,586 external-priority patent/US20220411446A1/en
Application filed filed Critical
Publication of JP2024528521A publication Critical patent/JP2024528521A/ja
Publication of JP2024528521A5 publication Critical patent/JP2024528521A5/ja
Pending legal-status Critical Current

Links

JP2023580532A 2021-06-28 2022-06-08 重水素化されたオルガノスズ化合物、合成方法、及び放射線によるパターン形成 Pending JP2024528521A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US202163215720P 2021-06-28 2021-06-28
US63/215,720 2021-06-28
US17/682,586 US20220411446A1 (en) 2021-06-28 2022-02-28 Deuterated organotin compounds, methods of synthesis and radiation patterning
US17/682,586 2022-02-28
PCT/US2022/032614 WO2023278109A1 (en) 2021-06-28 2022-06-08 Deuterated organotin compounds, methods of synthesis and radiation patterning

Publications (2)

Publication Number Publication Date
JP2024528521A JP2024528521A (ja) 2024-07-30
JP2024528521A5 true JP2024528521A5 (https=) 2025-06-17

Family

ID=84542171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023580532A Pending JP2024528521A (ja) 2021-06-28 2022-06-08 重水素化されたオルガノスズ化合物、合成方法、及び放射線によるパターン形成

Country Status (6)

Country Link
US (1) US20220411446A1 (https=)
EP (1) EP4363429A4 (https=)
JP (1) JP2024528521A (https=)
KR (1) KR20240026289A (https=)
TW (1) TW202300498A (https=)
WO (1) WO2023278109A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI821891B (zh) * 2021-01-28 2023-11-11 美商恩特葛瑞斯股份有限公司 製備有機錫化合物的方法
US11697660B2 (en) * 2021-01-29 2023-07-11 Entegris, Inc. Process for preparing organotin compounds
CN117402030B (zh) * 2023-12-14 2024-02-13 烟台九目化学股份有限公司 一种全氘代有机光电中间体材料的制备方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63151941A (ja) * 1986-12-16 1988-06-24 Matsushita Electric Ind Co Ltd レジスト材料
TW581746B (en) * 1999-11-12 2004-04-01 Nippon Sheet Glass Co Ltd Photosensitive composition, optical waveguide element and production process therefor
US6579630B2 (en) * 2000-12-07 2003-06-17 Canon Kabushiki Kaisha Deuterated semiconducting organic compounds used for opto-electronic devices
JP4377635B2 (ja) * 2003-09-02 2009-12-02 ダイセル化学工業株式会社 有機スズ化合物及びその製造方法
JP5795636B2 (ja) * 2010-08-11 2015-10-14 ヴォルタイクス エルエルシー． スタンナン及び重水素化スタンナンの合成
KR102952227B1 (ko) * 2014-10-23 2026-04-13 인프리아 코포레이션 유기 금속 용액 기반의 고해상도 패터닝 조성물 및 상응하는 방법
KR102508142B1 (ko) * 2015-10-13 2023-03-08 인프리아 코포레이션 유기주석 옥사이드 하이드록사이드 패터닝 조성물, 전구체 및 패터닝
CA2975104A1 (en) * 2017-08-02 2019-02-02 Seastar Chemicals Inc. Organometallic compounds and methods for the deposition of high purity tin oxide
CA3219374A1 (en) * 2018-04-11 2019-10-17 Inpria Corporation Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
US10787466B2 (en) * 2018-04-11 2020-09-29 Inpria Corporation Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
US11092890B2 (en) * 2018-07-31 2021-08-17 Samsung Sdi Co., Ltd. Semiconductor resist composition, and method of forming patterns using the composition
CN110780536B (zh) * 2018-07-31 2023-05-16 三星Sdi株式会社 半导体抗蚀剂组合物及使用组合物形成图案的方法及系统
US11498934B2 (en) * 2019-01-30 2022-11-15 Inpria Corporation Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with particulate contamination and corresponding methods

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