JP2024500368A5 - - Google Patents

Info

Publication number
JP2024500368A5
JP2024500368A5 JP2023535670A JP2023535670A JP2024500368A5 JP 2024500368 A5 JP2024500368 A5 JP 2024500368A5 JP 2023535670 A JP2023535670 A JP 2023535670A JP 2023535670 A JP2023535670 A JP 2023535670A JP 2024500368 A5 JP2024500368 A5 JP 2024500368A5
Authority
JP
Japan
Prior art keywords
mixture
hydrate
composition
sulfosalicylic
composition according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023535670A
Other languages
English (en)
Japanese (ja)
Other versions
JP2024500368A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2021/085370 external-priority patent/WO2022128844A1/en
Publication of JP2024500368A publication Critical patent/JP2024500368A/ja
Publication of JP2024500368A5 publication Critical patent/JP2024500368A5/ja
Pending legal-status Critical Current

Links

JP2023535670A 2020-12-15 2021-12-13 フォトレジスト除去剤組成物 Pending JP2024500368A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202063125666P 2020-12-15 2020-12-15
US63/125,666 2020-12-15
PCT/EP2021/085370 WO2022128844A1 (en) 2020-12-15 2021-12-13 Photoresist remover compositions

Publications (2)

Publication Number Publication Date
JP2024500368A JP2024500368A (ja) 2024-01-09
JP2024500368A5 true JP2024500368A5 (https=) 2024-10-09

Family

ID=79259327

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023535670A Pending JP2024500368A (ja) 2020-12-15 2021-12-13 フォトレジスト除去剤組成物

Country Status (7)

Country Link
US (1) US20240004303A1 (https=)
EP (1) EP4263776A1 (https=)
JP (1) JP2024500368A (https=)
KR (1) KR20230120663A (https=)
CN (1) CN116568794B (https=)
TW (1) TW202232252A (https=)
WO (1) WO2022128844A1 (https=)

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2652942C3 (de) * 1976-11-22 1979-05-31 Hoechst Ag, 6000 Frankfurt Zweikomponenten-Diazotypiematerial
SU901265A1 (ru) * 1980-04-04 1982-01-30 Предприятие П/Я Р-6561 Раствор дл одновременного травлени и обезжиривани металлов
US5411595A (en) * 1993-07-13 1995-05-02 Mcgean-Rohco, Inc. Post-etch, printed circuit board cleaning process
RU2061101C1 (ru) * 1994-01-10 1996-05-27 Молохина Лариса Аркадьевна Раствор для одновременного травления и обезжиривания металлов
US6284721B1 (en) * 1997-01-21 2001-09-04 Ki Won Lee Cleaning and etching compositions
JP4355083B2 (ja) * 2000-02-29 2009-10-28 関東化学株式会社 フォトレジスト剥離液組成物およびそれを用いた半導体基板処理方法
US6576394B1 (en) 2000-06-16 2003-06-10 Clariant Finance (Bvi) Limited Negative-acting chemically amplified photoresist composition
US6551973B1 (en) 2001-10-09 2003-04-22 General Chemical Corporation Stable metal-safe stripper for removing cured negative-tone novolak and acrylic photoresists and post-etch residue
JP4620680B2 (ja) * 2003-10-29 2011-01-26 マリンクロッド・ベイカー・インコーポレイテッド ハロゲン化金属の腐食阻害剤を含有するアルカリ性のプラズマエッチング／灰化後の残渣の除去剤およびフォトレジスト剥離組成物
KR20070023004A (ko) * 2005-08-23 2007-02-28 곽병훈 픽셀층 및 포토레지스트 제거액
KR100791687B1 (ko) * 2006-02-27 2008-01-03 채종근 결정성 클로피도그렐 설포살리실산 염을 포함하는 제제
US8288330B2 (en) * 2006-05-26 2012-10-16 Air Products And Chemicals, Inc. Composition and method for photoresist removal
SG177915A1 (en) * 2006-12-21 2012-02-28 Advanced Tech Materials Liquid cleaner for the removal of post-etch residues
WO2009032460A1 (en) * 2007-08-02 2009-03-12 Advanced Technology Materials, Inc. Non-fluoride containing composition for the removal of residue from a microelectronic device
WO2010091045A2 (en) * 2009-02-05 2010-08-12 Advanced Technology Materials, Inc. Non-fluoride containing composition for the removal of polymers and other organic material from a surface
FR2976290B1 (fr) * 2011-06-09 2014-08-15 Jerome Daviot Composition de solutions et conditions d'utilisation permettant le retrait et la dissolution complete de resines photo-lithographiques
US10613442B2 (en) 2015-03-12 2020-04-07 Merck Patent Gmbh Compositions and methods that promote charge complexing copper protection during low pKa driven polymer stripping
EP3251737A1 (en) * 2016-05-31 2017-12-06 Evonik Degussa GmbH Membrane-based processes for purification of cashew nut shell liquid
KR102499429B1 (ko) * 2017-02-10 2023-02-13 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. 세정 제형
JP7759807B2 (ja) * 2018-12-21 2025-10-24 インテグリス・インコーポレーテッド コバルト基板のｃｍｐ後洗浄のための組成物及び方法
US11456170B2 (en) * 2019-04-15 2022-09-27 Taiwan Semiconductor Manufacturing Co., Ltd. Cleaning solution and method of cleaning wafer

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