JP2024116282A5 - - Google Patents
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- JP2024116282A5 JP2024116282A5 JP2024093431A JP2024093431A JP2024116282A5 JP 2024116282 A5 JP2024116282 A5 JP 2024116282A5 JP 2024093431 A JP2024093431 A JP 2024093431A JP 2024093431 A JP2024093431 A JP 2024093431A JP 2024116282 A5 JP2024116282 A5 JP 2024116282A5
- Authority
- JP
- Japan
- Prior art keywords
- metal
- precursor
- layer
- contacting
- rare earth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862700063P | 2018-07-18 | 2018-07-18 | |
| US62/700,063 | 2018-07-18 | ||
| US16/204,655 US20200024735A1 (en) | 2018-07-18 | 2018-11-29 | Erosion resistant metal fluoride coatings deposited by atomic layer deposition |
| US16/204,655 | 2018-11-29 | ||
| JP2019131878A JP2020012199A (ja) | 2018-07-18 | 2019-07-17 | 原子層堆積法で堆積させた耐浸食性金属フッ化物コーティング |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019131878A Division JP2020012199A (ja) | 2018-07-18 | 2019-07-17 | 原子層堆積法で堆積させた耐浸食性金属フッ化物コーティング |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024116282A JP2024116282A (ja) | 2024-08-27 |
| JP2024116282A5 true JP2024116282A5 (https=) | 2025-06-26 |
Family
ID=68610997
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019003453U Active JP3224084U (ja) | 2018-07-18 | 2019-09-12 | 原子層堆積法で堆積させた耐浸食性金属フッ化物コーティング |
| JP2024093431A Pending JP2024116282A (ja) | 2018-07-18 | 2024-06-10 | 原子層堆積法で堆積させた耐浸食性金属フッ化物コーティング |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019003453U Active JP3224084U (ja) | 2018-07-18 | 2019-09-12 | 原子層堆積法で堆積させた耐浸食性金属フッ化物コーティング |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240401197A1 (https=) |
| JP (2) | JP3224084U (https=) |
| KR (1) | KR20250020574A (https=) |
| CN (1) | CN117026202A (https=) |
| TW (1) | TWI902284B (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4085157A4 (en) | 2019-12-30 | 2024-01-17 | Entegris, Inc. | METAL BODY WITH MAGNESIUM FLUORIDE AREA FORMED THEREOF |
| TWI767244B (zh) * | 2020-05-29 | 2022-06-11 | 朗曦科技股份有限公司 | 半導體製程腔體之氣體噴頭 |
| US20220351960A1 (en) * | 2021-05-03 | 2022-11-03 | Applied Materials, Inc. | Atomic Layer Deposition Of Metal Fluoride Films |
| JP7154517B1 (ja) | 2022-02-18 | 2022-10-18 | Ａｇｃ株式会社 | イットリウム質保護膜およびその製造方法ならびに部材 |
| US12601050B2 (en) | 2023-07-27 | 2026-04-14 | Entegris, Inc. | Surface modified substrates and related methods |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7491431B2 (en) * | 2004-12-20 | 2009-02-17 | Nanogram Corporation | Dense coating formation by reactive deposition |
| JP2007115973A (ja) * | 2005-10-21 | 2007-05-10 | Shin Etsu Chem Co Ltd | 耐食性部材 |
| US20070237697A1 (en) * | 2006-03-31 | 2007-10-11 | Tokyo Electron Limited | Method of forming mixed rare earth oxide and aluminate films by atomic layer deposition |
| US10242888B2 (en) * | 2007-04-27 | 2019-03-26 | Applied Materials, Inc. | Semiconductor processing apparatus with a ceramic-comprising surface which exhibits fracture toughness and halogen plasma resistance |
| US20120127629A1 (en) * | 2009-04-16 | 2012-05-24 | Advanced Technology Materials, Inc. | DOPED ZrO2 CAPACITOR MATERIALS AND STRUCTURES |
| CA2761748C (en) * | 2009-05-28 | 2016-01-12 | Kovio, Inc. | Semiconductor devices on diffusion barrier coated substrates and methods of making the same |
| EP2337064B1 (en) * | 2009-12-18 | 2014-08-06 | Imec | Dielectric layer for flash memory device and method for manufacturing thereof |
| US11326253B2 (en) * | 2016-04-27 | 2022-05-10 | Applied Materials, Inc. | Atomic layer deposition of protective coatings for semiconductor process chamber components |
| US9850573B1 (en) * | 2016-06-23 | 2017-12-26 | Applied Materials, Inc. | Non-line of sight deposition of erbium based plasma resistant ceramic coating |
| US20180016678A1 (en) * | 2016-07-15 | 2018-01-18 | Applied Materials, Inc. | Multi-layer coating with diffusion barrier layer and erosion resistant layer |
| US20200024735A1 (en) * | 2018-07-18 | 2020-01-23 | Applied Materials, Inc. | Erosion resistant metal fluoride coatings deposited by atomic layer deposition |
-
2019
- 2019-07-17 TW TW113120580A patent/TWI902284B/zh active
- 2019-07-18 CN CN202311076661.8A patent/CN117026202A/zh active Pending
- 2019-09-12 JP JP2019003453U patent/JP3224084U/ja active Active
-
2024
- 2024-06-10 JP JP2024093431A patent/JP2024116282A/ja active Pending
- 2024-08-13 US US18/802,354 patent/US20240401197A1/en active Pending
-
2025
- 2025-01-31 KR KR1020250012521A patent/KR20250020574A/ko active Pending
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