JP2024039768A - ステージ装置、パターン形成装置、及び物品の製造方法 - Google Patents

ステージ装置、パターン形成装置、及び物品の製造方法 Download PDF

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Publication number
JP2024039768A
JP2024039768A JP2022144371A JP2022144371A JP2024039768A JP 2024039768 A JP2024039768 A JP 2024039768A JP 2022144371 A JP2022144371 A JP 2022144371A JP 2022144371 A JP2022144371 A JP 2022144371A JP 2024039768 A JP2024039768 A JP 2024039768A
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JP
Japan
Prior art keywords
stage
reaction force
thrust
positions
stage device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022144371A
Other languages
English (en)
Japanese (ja)
Other versions
JP2024039768A5 (enExample
Inventor
祐一 小沢
Yuichi Ozawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2022144371A priority Critical patent/JP2024039768A/ja
Priority to KR1020230095843A priority patent/KR20240036452A/ko
Priority to US18/364,850 priority patent/US20240085806A1/en
Priority to TW112130591A priority patent/TW202411791A/zh
Priority to EP23192564.5A priority patent/EP4336260A3/en
Priority to CN202311147094.0A priority patent/CN117690852A/zh
Publication of JP2024039768A publication Critical patent/JP2024039768A/ja
Publication of JP2024039768A5 publication Critical patent/JP2024039768A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7618—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70653—Metrology techniques
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2022144371A 2022-09-12 2022-09-12 ステージ装置、パターン形成装置、及び物品の製造方法 Pending JP2024039768A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2022144371A JP2024039768A (ja) 2022-09-12 2022-09-12 ステージ装置、パターン形成装置、及び物品の製造方法
KR1020230095843A KR20240036452A (ko) 2022-09-12 2023-07-24 스테이지 장치, 패턴 형성장치, 및 물품의 제조방법
US18/364,850 US20240085806A1 (en) 2022-09-12 2023-08-03 Stage apparatus, pattern forming apparatus, and method for manufacturing article
TW112130591A TW202411791A (zh) 2022-09-12 2023-08-15 載台裝置、圖案形成裝置及物品製造方法
EP23192564.5A EP4336260A3 (en) 2022-09-12 2023-08-22 Stage apparatus, pattern forming apparatus, and method for manufacturing article
CN202311147094.0A CN117690852A (zh) 2022-09-12 2023-09-06 载台装置、图案形成装置及物品制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022144371A JP2024039768A (ja) 2022-09-12 2022-09-12 ステージ装置、パターン形成装置、及び物品の製造方法

Publications (2)

Publication Number Publication Date
JP2024039768A true JP2024039768A (ja) 2024-03-25
JP2024039768A5 JP2024039768A5 (enExample) 2025-07-17

Family

ID=87762867

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022144371A Pending JP2024039768A (ja) 2022-09-12 2022-09-12 ステージ装置、パターン形成装置、及び物品の製造方法

Country Status (6)

Country Link
US (1) US20240085806A1 (enExample)
EP (1) EP4336260A3 (enExample)
JP (1) JP2024039768A (enExample)
KR (1) KR20240036452A (enExample)
CN (1) CN117690852A (enExample)
TW (1) TW202411791A (enExample)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11168064A (ja) 1997-09-22 1999-06-22 Nikon Corp ステージ駆動方法、ステージ装置、及び露光装置
JP2002221249A (ja) * 2000-11-27 2002-08-09 Canon Inc 能動制振装置、その制御方法および能動制振装置を備えた露光装置
US6844694B2 (en) * 2001-08-10 2005-01-18 Nikon Corporation Stage assembly and exposure apparatus including the same
JPWO2004105105A1 (ja) * 2003-05-21 2006-07-20 株式会社ニコン ステージ装置及び露光装置、並びにデバイス製造方法
JP2006032788A (ja) * 2004-07-20 2006-02-02 Canon Inc 露光装置及び半導体デバイスの製造方法
JP4485550B2 (ja) * 2007-07-30 2010-06-23 住友重機械工業株式会社 反力処理装置
JP4377424B2 (ja) * 2007-07-31 2009-12-02 住友重機械工業株式会社 反力処理装置
WO2009110202A1 (ja) * 2008-03-07 2009-09-11 株式会社ニコン 移動体装置及び露光装置

Also Published As

Publication number Publication date
US20240085806A1 (en) 2024-03-14
EP4336260A3 (en) 2024-03-20
TW202411791A (zh) 2024-03-16
EP4336260A2 (en) 2024-03-13
CN117690852A (zh) 2024-03-12
KR20240036452A (ko) 2024-03-20

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