JP2023532883A5 - - Google Patents

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Publication number
JP2023532883A5
JP2023532883A5 JP2022580390A JP2022580390A JP2023532883A5 JP 2023532883 A5 JP2023532883 A5 JP 2023532883A5 JP 2022580390 A JP2022580390 A JP 2022580390A JP 2022580390 A JP2022580390 A JP 2022580390A JP 2023532883 A5 JP2023532883 A5 JP 2023532883A5
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JP
Japan
Prior art keywords
nitrogen
approximately
mpa
atomic
doped diamond
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JP2022580390A
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English (en)
Japanese (ja)
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JP7710474B2 (ja
JP2023532883A (ja
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Priority claimed from US16/915,110 external-priority patent/US20210407801A1/en
Priority claimed from US17/035,192 external-priority patent/US11664214B2/en
Priority claimed from US17/035,265 external-priority patent/US11664226B2/en
Application filed filed Critical
Priority claimed from PCT/US2021/036188 external-priority patent/WO2022005703A1/en
Publication of JP2023532883A publication Critical patent/JP2023532883A/ja
Publication of JP2023532883A5 publication Critical patent/JP2023532883A5/ja
Application granted granted Critical
Publication of JP7710474B2 publication Critical patent/JP7710474B2/ja
Active legal-status Critical Current
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JP2022580390A 2020-06-29 2021-06-07 ハードマスク及びその他のパターニング応用のための高密度窒素ドープ炭素膜を製造するための方法 Active JP7710474B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US16/915,110 2020-06-29
US16/915,110 US20210407801A1 (en) 2020-06-29 2020-06-29 Methods for producing high-density doped-carbon films for hardmask and other patterning applications
US17/035,192 2020-09-28
US17/035,192 US11664214B2 (en) 2020-06-29 2020-09-28 Methods for producing high-density, nitrogen-doped carbon films for hardmasks and other patterning applications
US17/035,265 2020-09-28
US17/035,265 US11664226B2 (en) 2020-06-29 2020-09-28 Methods for producing high-density carbon films for hardmasks and other patterning applications
PCT/US2021/036188 WO2022005703A1 (en) 2020-06-29 2021-06-07 Methods for producing high-density, nitrogen-doped carbon films for hardmasks and other patterning applications

Publications (3)

Publication Number Publication Date
JP2023532883A JP2023532883A (ja) 2023-08-01
JP2023532883A5 true JP2023532883A5 (https=) 2025-04-15
JP7710474B2 JP7710474B2 (ja) 2025-07-18

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ID=79317112

Family Applications (3)

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JP2022581496A Active JP7678830B2 (ja) 2020-06-29 2021-06-07 ハードマスク及びその他のパターニング応用のための高密度炭素膜を製造するための方法
JP2022580390A Active JP7710474B2 (ja) 2020-06-29 2021-06-07 ハードマスク及びその他のパターニング応用のための高密度窒素ドープ炭素膜を製造するための方法
JP2023500017A Active JP7704828B2 (ja) 2020-06-29 2021-06-07 ハードマスク及びその他のパターニング応用のための高密度ドープ炭素膜を製造するための方法

Family Applications Before (1)

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JP2022581496A Active JP7678830B2 (ja) 2020-06-29 2021-06-07 ハードマスク及びその他のパターニング応用のための高密度炭素膜を製造するための方法

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JP2023500017A Active JP7704828B2 (ja) 2020-06-29 2021-06-07 ハードマスク及びその他のパターニング応用のための高密度ドープ炭素膜を製造するための方法

Country Status (4)

Country Link
JP (3) JP7678830B2 (https=)
KR (3) KR20230029911A (https=)
CN (3) CN115885366A (https=)
WO (3) WO2022005700A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025019750A (ja) * 2023-07-28 2025-02-07 東京エレクトロン株式会社 基板処理方法
CN119859789B (zh) * 2025-01-17 2025-11-18 东莞市普拉提纳米科技有限公司 一种切割铝合金用刀具的非晶碳膜涂层及制备工艺

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TWI670831B (zh) 2014-09-03 2019-09-01 美商應用材料股份有限公司 用於三維nand硬遮罩應用的奈米結晶鑽石碳膜
US9520295B2 (en) * 2015-02-03 2016-12-13 Lam Research Corporation Metal doping of amorphous carbon and silicon films used as hardmasks in substrate processing systems
KR102384226B1 (ko) * 2015-03-24 2022-04-07 삼성전자주식회사 하드마스크 조성물 및 이를 이용한 패턴 형성방법
US9865459B2 (en) * 2015-04-22 2018-01-09 Applied Materials, Inc. Plasma treatment to improve adhesion between hardmask film and silicon oxide film
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