|
JP2620252B2
(ja)
*
|
1987-09-17 |
1997-06-11 |
住友電気工業株式会社 |
窒素含有硬質炭素膜の製造方法
|
|
JP2679808B2
(ja)
*
|
1988-05-27 |
1997-11-19 |
キヤノン株式会社 |
ダイヤモンド状炭素膜の製造方法
|
|
JP3281354B2
(ja)
|
1988-10-11 |
2002-05-13 |
株式会社半導体エネルギー研究所 |
ダイヤモンド状炭素膜の作製方法
|
|
US6884733B1
(en)
*
|
2002-08-08 |
2005-04-26 |
Advanced Micro Devices, Inc. |
Use of amorphous carbon hard mask for gate patterning to eliminate requirement of poly re-oxidation
|
|
US6939794B2
(en)
*
|
2003-06-17 |
2005-09-06 |
Micron Technology, Inc. |
Boron-doped amorphous carbon film for use as a hard etch mask during the formation of a semiconductor device
|
|
KR100704470B1
(ko)
*
|
2004-07-29 |
2007-04-10 |
주식회사 하이닉스반도체 |
비결정성 탄소막을 희생 하드마스크로 이용하는반도체소자 제조 방법
|
|
US7541069B2
(en)
*
|
2005-03-07 |
2009-06-02 |
Sub-One Technology, Inc. |
Method and system for coating internal surfaces using reverse-flow cycling
|
|
US20090029067A1
(en)
*
|
2007-06-28 |
2009-01-29 |
Sciamanna Steven F |
Method for producing amorphous carbon coatings on external surfaces using diamondoid precursors
|
|
JP2009206394A
(ja)
*
|
2008-02-29 |
2009-09-10 |
Nippon Zeon Co Ltd |
炭素系ハードマスクの形成方法
|
|
JP5739325B2
(ja)
*
|
2008-04-23 |
2015-06-24 |
ブルーワー サイエンス アイ エヌシー． |
マイクロリソグラフィー用の感光性ハードマスク
|
|
US20110244142A1
(en)
*
|
2010-03-30 |
2011-10-06 |
Applied Materials, Inc. |
Nitrogen doped amorphous carbon hardmask
|
|
TW201216331A
(en)
*
|
2010-10-05 |
2012-04-16 |
Applied Materials Inc |
Ultra high selectivity doped amorphous carbon strippable hardmask development and integration
|
|
US20120258261A1
(en)
*
|
2011-04-11 |
2012-10-11 |
Novellus Systems, Inc. |
Increasing etch selectivity of carbon films with lower absorption co-efficient and stress
|
|
US20140335700A1
(en)
*
|
2013-05-10 |
2014-11-13 |
Infineon Technologies Ag |
Carbon Layers for High Temperature Processes
|
|
US9320387B2
(en)
*
|
2013-09-30 |
2016-04-26 |
Lam Research Corporation |
Sulfur doped carbon hard masks
|
|
US9589799B2
(en)
*
|
2013-09-30 |
2017-03-07 |
Lam Research Corporation |
High selectivity and low stress carbon hardmask by pulsed low frequency RF power
|
|
KR102311036B1
(ko)
*
|
2014-01-08 |
2021-10-07 |
어플라이드 머티어리얼스, 인코포레이티드 |
비정질 탄소 막들 내로의 이온 주입에 의한 고 에칭 선택성 하드마스크 재료의 개발
|
|
KR102287813B1
(ko)
|
2014-05-30 |
2021-08-10 |
삼성전자주식회사 |
하드마스크 조성물 및 이를 이용한 패턴의 형성방법
|
|
TWI656575B
(zh)
|
2014-09-03 |
2019-04-11 |
美商應用材料股份有限公司 |
用於三維nand硬遮罩應用的奈米結晶鑽石碳膜
|
|
US9520295B2
(en)
*
|
2015-02-03 |
2016-12-13 |
Lam Research Corporation |
Metal doping of amorphous carbon and silicon films used as hardmasks in substrate processing systems
|
|
KR102384226B1
(ko)
*
|
2015-03-24 |
2022-04-07 |
삼성전자주식회사 |
하드마스크 조성물 및 이를 이용한 패턴 형성방법
|
|
US9865459B2
(en)
*
|
2015-04-22 |
2018-01-09 |
Applied Materials, Inc. |
Plasma treatment to improve adhesion between hardmask film and silicon oxide film
|
|
KR101837370B1
(ko)
*
|
2016-02-04 |
2018-03-12 |
주식회사 테스 |
플라즈마를 이용한 비정질 탄소막의 증착 방법
|
|
US10249495B2
(en)
*
|
2016-06-28 |
2019-04-02 |
Applied Materials, Inc. |
Diamond like carbon layer formed by an electron beam plasma process
|
|
CN206580883U
(zh)
*
|
2017-01-13 |
2017-10-24 |
凯里学院 |
一种类金刚石镀膜制备设备
|
|
JP7229929B2
(ja)
*
|
2017-02-01 |
2023-02-28 |
アプライド マテリアルズ インコーポレイテッド |
ハードマスク応用向けのホウ素がドープされた炭化タングステン
|
|
US20180274100A1
(en)
*
|
2017-03-24 |
2018-09-27 |
Applied Materials, Inc. |
Alternating between deposition and treatment of diamond-like carbon
|
|
JP7235683B2
(ja)
*
|
2017-06-08 |
2023-03-08 |
アプライド マテリアルズ インコーポレイテッド |
ハードマスク及びその他のパターニング応用のための高密度低温炭素膜
|
|
US11062897B2
(en)
*
|
2017-06-09 |
2021-07-13 |
Lam Research Corporation |
Metal doped carbon based hard mask removal in semiconductor fabrication
|
|
CN108441825B
(zh)
*
|
2018-02-26 |
2020-12-29 |
温州职业技术学院 |
掺杂金属类金刚石涂层制备方法及其制品
|
|
US11842897B2
(en)
|
2018-10-26 |
2023-12-12 |
Applied Materials, Inc. |
High density carbon films for patterning applications
|
|
US11049728B2
(en)
*
|
2018-10-31 |
2021-06-29 |
Entegris, Inc. |
Boron-doped amorphous carbon hard mask and related methods
|
|
US11270890B2
(en)
*
|
2018-12-14 |
2022-03-08 |
Lam Research Corporation |
Etching carbon layer using doped carbon as a hard mask
|