JP2023512815A5 - - Google Patents

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Publication number
JP2023512815A5
JP2023512815A5 JP2022547977A JP2022547977A JP2023512815A5 JP 2023512815 A5 JP2023512815 A5 JP 2023512815A5 JP 2022547977 A JP2022547977 A JP 2022547977A JP 2022547977 A JP2022547977 A JP 2022547977A JP 2023512815 A5 JP2023512815 A5 JP 2023512815A5
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JP
Japan
Prior art keywords
electrode
segment
edges
path
edge
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JP2022547977A
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English (en)
Japanese (ja)
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JP7747642B2 (ja
JP2023512815A (ja
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Priority claimed from PCT/EP2021/052760 external-priority patent/WO2021156415A1/en
Publication of JP2023512815A publication Critical patent/JP2023512815A/ja
Publication of JP2023512815A5 publication Critical patent/JP2023512815A5/ja
Application granted granted Critical
Publication of JP7747642B2 publication Critical patent/JP7747642B2/ja
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JP2022547977A 2020-02-07 2021-02-05 被加工物を電解処理するための電極ならびに装置、装置のセルを形成するためのアセンブリ、方法、およびコンピュータプログラム Active JP7747642B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP20156050 2020-02-07
EP20156050.5 2020-02-07
PCT/EP2021/052760 WO2021156415A1 (en) 2020-02-07 2021-02-05 Electrode and apparatus for electrolytically treating a workpiece, assembly for forming a cell of the apparatus and method and computer program

Publications (3)

Publication Number Publication Date
JP2023512815A JP2023512815A (ja) 2023-03-29
JP2023512815A5 true JP2023512815A5 (enExample) 2024-01-19
JP7747642B2 JP7747642B2 (ja) 2025-10-01

Family

ID=69526171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022547977A Active JP7747642B2 (ja) 2020-02-07 2021-02-05 被加工物を電解処理するための電極ならびに装置、装置のセルを形成するためのアセンブリ、方法、およびコンピュータプログラム

Country Status (8)

Country Link
US (1) US12522942B2 (enExample)
EP (1) EP4100562A1 (enExample)
JP (1) JP7747642B2 (enExample)
KR (1) KR20220139354A (enExample)
CN (1) CN115349035B (enExample)
PH (1) PH12022552031A1 (enExample)
TW (1) TWI878447B (enExample)
WO (1) WO2021156415A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117802557A (zh) * 2022-09-23 2024-04-02 奥特斯科技(重庆)有限公司 用于对部件承载件结构进行电镀覆的电镀覆设备和方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06306693A (ja) * 1993-04-27 1994-11-01 Kawasaki Steel Corp 金属ストリップの幅方向めっき付着量制御用めっき電極ならびにめっき付着量制御方法
JPH10287997A (ja) * 1997-04-17 1998-10-27 Tomoji Watanabe メッキ装置
US6919010B1 (en) 2001-06-28 2005-07-19 Novellus Systems, Inc. Uniform electroplating of thin metal seeded wafers using rotationally asymmetric variable anode correction
US6322673B1 (en) * 1999-12-18 2001-11-27 Electroplating Technologies, Ltd. Apparatus for electrochemical treatment of a continuous web
US7682498B1 (en) * 2001-06-28 2010-03-23 Novellus Systems, Inc. Rotationally asymmetric variable electrode correction
DE10141056C2 (de) 2001-08-22 2003-12-24 Atotech Deutschland Gmbh Verfahren und Vorrichtung zum elektrolytischen Behandeln von elektrisch leitfähigen Schichten in Durchlaufanlagen
US10011917B2 (en) * 2008-11-07 2018-07-03 Lam Research Corporation Control of current density in an electroplating apparatus
US8858774B2 (en) * 2008-11-07 2014-10-14 Novellus Systems, Inc. Electroplating apparatus for tailored uniformity profile
KR101668052B1 (ko) 2009-11-03 2016-10-20 뉴사우스 이노베이션즈 피티와이 리미티드 태양 전지들을 위한 금속 전극들의 포토플레이팅
TWI530593B (zh) * 2014-08-11 2016-04-21 亞智科技股份有限公司 多陽極控制裝置及具有該裝置的電鍍設備

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