JP2023094565A - 架橋性組成物、部材および架橋性組成物の使用 - Google Patents
架橋性組成物、部材および架橋性組成物の使用 Download PDFInfo
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- 239000003365 glass fiber Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- RZTIWMXQXBQJNE-UHFFFAOYSA-N isoanthraflavin Chemical compound C1=C(O)C=C2C(=O)C3=CC(O)=CC=C3C(=O)C2=C1 RZTIWMXQXBQJNE-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- JZMJDSHXVKJFKW-UHFFFAOYSA-M methyl sulfate(1-) Chemical compound COS([O-])(=O)=O JZMJDSHXVKJFKW-UHFFFAOYSA-M 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- BLYOHBPLFYXHQA-UHFFFAOYSA-N n,n-bis(prop-2-enyl)prop-2-enamide Chemical compound C=CCN(CC=C)C(=O)C=C BLYOHBPLFYXHQA-UHFFFAOYSA-N 0.000 description 1
- DYUWTXWIYMHBQS-UHFFFAOYSA-N n-prop-2-enylprop-2-en-1-amine Chemical compound C=CCNCC=C DYUWTXWIYMHBQS-UHFFFAOYSA-N 0.000 description 1
- FZZQNEVOYIYFPF-UHFFFAOYSA-N naphthalene-1,6-diol Chemical compound OC1=CC=CC2=CC(O)=CC=C21 FZZQNEVOYIYFPF-UHFFFAOYSA-N 0.000 description 1
- ZUVBIBLYOCVYJU-UHFFFAOYSA-N naphthalene-1,7-diol Chemical compound C1=CC=C(O)C2=CC(O)=CC=C21 ZUVBIBLYOCVYJU-UHFFFAOYSA-N 0.000 description 1
- MNZMMCVIXORAQL-UHFFFAOYSA-N naphthalene-2,6-diol Chemical compound C1=C(O)C=CC2=CC(O)=CC=C21 MNZMMCVIXORAQL-UHFFFAOYSA-N 0.000 description 1
- DFQICHCWIIJABH-UHFFFAOYSA-N naphthalene-2,7-diol Chemical compound C1=CC(O)=CC2=CC(O)=CC=C21 DFQICHCWIIJABH-UHFFFAOYSA-N 0.000 description 1
- 229930014626 natural product Natural products 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 150000003891 oxalate salts Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- OGCYGKRWXWQOAK-UHFFFAOYSA-N oxobismuthanyl nitrate Chemical class [O-][N+](=O)O[Bi]=O OGCYGKRWXWQOAK-UHFFFAOYSA-N 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- ZTQUBBFVYUHQRC-UHFFFAOYSA-N spiro[fluorene-9,9'-xanthene]-3',6'-diol Chemical compound C12=CC=CC=C2C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 ZTQUBBFVYUHQRC-UHFFFAOYSA-N 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- PNWOTXLVRDKNJA-UHFFFAOYSA-N tert-butylperoxybenzene Chemical compound CC(C)(C)OOC1=CC=CC=C1 PNWOTXLVRDKNJA-UHFFFAOYSA-N 0.000 description 1
- IBWGNZVCJVLSHB-UHFFFAOYSA-M tetrabutylphosphanium;chloride Chemical compound [Cl-].CCCC[P+](CCCC)(CCCC)CCCC IBWGNZVCJVLSHB-UHFFFAOYSA-M 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- XLAIWHIOIFKLEO-OWOJBTEDSA-N trans-stilbene-4,4'-diol Chemical compound C1=CC(O)=CC=C1\C=C\C1=CC=C(O)C=C1 XLAIWHIOIFKLEO-OWOJBTEDSA-N 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- KSMYREBPTSSZDR-UHFFFAOYSA-M tributyl(prop-2-enyl)phosphanium;chloride Chemical compound [Cl-].CCCC[P+](CCCC)(CCCC)CC=C KSMYREBPTSSZDR-UHFFFAOYSA-M 0.000 description 1
- GRPURDFRFHUDSP-UHFFFAOYSA-N tris(prop-2-enyl) benzene-1,2,4-tricarboxylate Chemical compound C=CCOC(=O)C1=CC=C(C(=O)OCC=C)C(C(=O)OCC=C)=C1 GRPURDFRFHUDSP-UHFFFAOYSA-N 0.000 description 1
- XHGIFBQQEGRTPB-UHFFFAOYSA-N tris(prop-2-enyl) phosphate Chemical compound C=CCOP(=O)(OCC=C)OCC=C XHGIFBQQEGRTPB-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/14—Peroxides
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/24—Acids; Salts thereof
- C08K3/26—Carbonates; Bicarbonates
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- C08L15/02—Rubber derivatives containing halogen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F02—COMBUSTION ENGINES; HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
- F02M—SUPPLYING COMBUSTION ENGINES IN GENERAL WITH COMBUSTIBLE MIXTURES OR CONSTITUENTS THEREOF
- F02M25/00—Engine-pertinent apparatus for adding non-fuel substances or small quantities of secondary fuel to combustion-air, main fuel or fuel-air mixture
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- F02M35/00—Combustion-air cleaners, air intakes, intake silencers, or induction systems specially adapted for, or arranged on, internal-combustion engines
- F02M35/10—Air intakes; Induction systems
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T10/00—Road transport of goods or passengers
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Abstract
Description
(a)受酸剤として、ハイドロタルサイトを含有し、または、
(b)受酸剤として、ハイドロタルサイト以外の受酸剤を含有し、もしくは、含有しておらず、ハイドロタルサイト以外の受酸剤の含有量が、フッ素ゴム100質量部に対して、0質量部以上1質量部未満である、架橋性組成物が提供される。
(a)の場合において、ハイドロタルサイト以外の受酸剤の含有量が、フッ素ゴム100質量部に対して、0質量部以上1質量部未満であることが好ましい。
(b)の場合において、ハイドロタルサイトの含有量が、フッ素ゴム100質量部に対して、0.1質量部未満であることが好ましい。
(b)の場合において、ハイドロタルサイト以外の受酸剤が、金属酸化物、金属水酸化物、アルカリ金属ケイ酸塩および弱酸の金属塩からなる群より選択される少なくとも1種であることが好ましい。
フッ素ゴムが、パーオキサイド架橋可能なフッ素ゴムであることが好ましい。
フッ素ゴムが、ビニリデンフルオライド系フッ素ゴム、テトラフルオロエチレン/プロピレン系フッ素ゴム、および、パーフルオロゴムからなる群より選択される少なくとも1種であることが好ましい。
フッ素ゴムが、ビニリデンフルオライド単位および下記一般式(1):
CHX1=CX2Rf (1)
(式中、X1およびX2は、一方がHであり、他方がFであり、Rfは炭素数1~12の直鎖または分岐したフルオロアルキル基である。)で表される含フッ素単量体(1)単位を含有するフッ素ゴム(1)、ならびに、テトラフルオロエチレン/プロピレン系フッ素ゴムからなる群より選択される少なくとも1種であることが好ましい。
含フッ素単量体(1)が、2,3,3,3-テトラフルオロプロペンであることが好ましい。
フッ素ゴム(1)が、ヨウ素原子および臭素原子の少なくとも一方を有し、ヨウ素原子および臭素原子の含有量の合計が0.001~10質量%であることが好ましい。
架橋剤が、パーオキサイドであることが好ましい。
共架橋剤をさらに含有することが好ましい。
[(M1 2+)1-xM3+ x(OH)2]x+[An- x/n・mH2O]x-
(式中、M1 2+は2価の金属イオンであり、M3+は3価の金属イオンであり、An-はn価のアニオンであり、xは0<x<0.5を満たす数であり、mは0≦mを満たす数である。)で示される化合物であることが入手容易の点からより好ましい。ハイドロタルサイト類としては、天然品であっても合成品であってもよい。
一般式(11):CF2=CF-ORf111
(式中、Rf111は、炭素数1~10のパーフルオロアルキル基を表す。)で表されるフルオロモノマーが好ましい。Rf111は、炭素数が1~5のパーフルオロアルキル基であることが好ましい。
一般式(12):CF2=CFOCF2ORf121
(式中、Rf121は炭素数1~6の直鎖又は分岐状パーフルオロアルキル基、炭素数5~6の環式パーフルオロアルキル基、1~3個の酸素原子を含む炭素数2~6の直鎖又は分岐状パーフルオロオキシアルキル基である。)で表されるフルオロモノマー
一般式(13):CF2=CFO(CF2CF(Y131)O)m(CF2)nF
(式中、Y131はフッ素原子又はトリフルオロメチル基を表す。mは1~4の整数である。nは1~4の整数である。)で表されるフルオロモノマー
CHX1=CX2Rf (1)
(式中、X1およびX2は、一方がHであり、他方がFであり、Rfは炭素数1~12の直鎖または分岐したフルオロアルキル基である。)で表される含フッ素単量体(1)単位を含有するフッ素ゴム(1)、ならびに、テトラフルオロエチレン/プロピレン系フッ素ゴムからなる群より選択される少なくとも1種が好ましい。
一般式(2):CX3 2=CX3-Rf1CHR1X4
(式中、X3は、同一または異なって、H、Fまたは-CH3、Rf1は、フルオロアルキレン基、パーフルオロアルキレン基、フルオロ(ポリ)オキシアルキレン基またはパーフルオロ(ポリ)オキシアルキレン基、R1は、Hまたは-CH3、X4は、IまたはBrである。)で表されるヨウ素または臭素含有単量体、
一般式(3):CX5 2=CX5-Rf2X6
(式中、X5は、同一または異なって、H、Fまたは-CH3、Rf2は、フルオロアルキレン基、パーフルオロアルキレン基、フルオロ(ポリ)オキシアルキレン基またはパーフルオロ(ポリ)オキシアルキレン基、X6は、IまたはBrである。)で表されるヨウ素または臭素含有単量体(好ましくは、一般式:CH2=CH(CF2)nI(nは2~8の整数である。)で表されるヨウ素含有単量体)、
一般式(4):CF2=CFO(CF2CF(CF3)O)m(CF2)n-X7
(式中、mは0~5の整数、nは1~3の整数、X7は、シアノ基、カルボキシル基、アルコキシカルボニル基、IまたはBrである。)で表される単量体、
一般式(5):CH2=CFCF2O(CF(CF3)CF2O)m(CF(CF3))n-X8
(式中、mは0~5の整数、nは1~3の整数、X8は、シアノ基、カルボキシル基、アルコキシカルボニル基、I、Brまたは-CH2OHである。)で表される単量体、
一般式(6):CR2R3=CR4-Z-CR5=CR6R7
(式中、R2~R7は、同一または異なって、Hまたは炭素数1~5のアルキル基である。Zは、直鎖または分岐状で酸素原子を有していてもよい、炭素数1~18のアルキレン基、炭素数3~18のシクロアルキレン基、少なくとも部分的にフッ素化している炭素数1~10のアルキレン若しくはオキシアルキレン基、または、
-(Q)p-CF2O-(CF2CF2O)m(CF2O)n-CF2-(Q)p-
(式中、Qはアルキレンまたはオキシアルキレン基である。pは0または1である。m/nが0.2~5である。)で表され、分子量が500~10000である(パー)フルオロポリオキシアルキレン基である。)で表される単量体等が挙げられる。
一般式:R8IxBry
(式中、xおよびyはそれぞれ0~2の整数であり、かつ1≦x+y≦2を満たすものであり、R8は炭素数1~16の飽和もしくは不飽和のフルオロ炭化水素基またはクロロフルオロ炭化水素基、または、炭素数1~3の炭化水素基であり、酸素原子を含んでいてもよい)で表される化合物があげられる。臭素化合物またはヨウ素化合物を使用することによって、ヨウ素原子または臭素原子がポリマーに導入され、架橋点として機能する。
19F-NMR(Bruker社製AC300P型)を用いて測定した。
ASTM D1646-15およびJIS K6300-1:2013に準拠して測定した。測定温度は100℃である。
Na2CO3とK2CO3とを1対1(重量比)で混合し、得られた混合物を純水20mlに溶解することにより、吸収液を調製した。試料(フッ素ゴム)12mgにNa2SO3を5mg混ぜて混合物を調製し、石英製のフラスコ中、酸素中で燃焼させ、発生した燃焼ガスを吸収液に導入した。得られた吸収液を30分間放置した後、吸収液中のヨウ素イオンの濃度を、島津20Aイオンクロマトグラフを用いて測定した。ヨウ素イオン0.5ppmを含むKI標準溶液および1.0ppmを含むKI標準溶液を用いて作成した検量線を用いて、ヨウ素イオンの含有量を決定した。
架橋性組成物について、一次架橋時に加硫試験機(MDR H2030、エムアンドケー社製)または加硫試験機(RUBBER PROCESSANALY ANALYZER RPA2000、アルファテクノロジーズアクイジション社製)を用いて、表1~3に記載の条件で架橋曲線を求め、トルクの変化より、最大トルク(MH)および最適架橋時間(T90)を求めた。
厚さ2mmの架橋シートを用いて、ダンベル6号形状の試験片を作製した。得られた試験片および引張試験機(エー・アンド・デイ社製テンシロンRTG-1310)を使用して、JIS K6251:2010に準じて、500mm/分の条件下、23℃における引張強さおよび切断時伸びを測定した。
厚さ2mmの架橋シートを3枚重ねたものを用いて、タイプAデュロメーターを使用して、JIS K6253-3:2012に準拠して、硬さ(Peak値、3秒後の値)を測定した。
5質量%硝酸水溶液中に、厚さ2mmの架橋シートを90℃で72時間浸漬させ、架橋シートを回収した。浸漬前後の架橋シートの比重と質量を測定して、体積変化率を以下の式に従って算出した。比重は、自動比重計DMA-220H(新光電子社製)を用いて測定した。
体積変化率(%)={[(浸漬後の架橋シートの質量)/(浸漬後の架橋シートの比重)]-[(浸漬前の架橋シートの質量)/(浸漬前の架橋シートの比重)]}/[(浸漬前の架橋シートの質量)]/(浸漬前の架橋シートの比重)]×100
60質量%硝酸水溶液中に、厚さ2mmの架橋シートを80℃で72時間浸漬させ、架橋シートを回収した。浸漬前後の架橋シートの比重と質量を測定して、体積変化率を以下の式に従って算出した。
体積変化率(%)={[(浸漬後の架橋シートの質量)/(浸漬後の架橋シートの比重)]-[(浸漬前の架橋シートの質量)/(浸漬前の架橋シートの比重)]}/[(浸漬前の架橋シートの質量)]/(浸漬前の架橋シートの比重)]×100
フッ素ゴムA
パーオキサイド架橋可能なフッ素ゴム
VdF/TFE/HFP=50/30/20(モル比)
ムーニー粘度(ML(1+10)100℃):52
ヨウ素含有量:0.23質量%
フッ素ゴムB
パーオキサイド架橋可能なフッ素ゴム
VdF/2,3,3,3-テトラフルオロプロペン=77/23(モル比)
ムーニー粘度(ML(1+10)100℃):45
ヨウ素含有量:0.21質量%
フッ素ゴムC
ポリオール架橋可能なフッ素ゴム
VdF/TFE/HFP=58/20/22(モル比)
ムーニー粘度(ML(1+10)100℃):42
フッ素ゴムD
ポリオール架橋可能なフッ素ゴム
VdF/HFP=78/22(モル比)
ムーニー粘度(ML(1+10)100℃):55
パーオキサイド系架橋剤A:2,5-ジメチル-2,5-ビス(t-ブチルパーオキシ)ヘキサン
ポリオール系架橋剤:ビスフェノールAF
架橋促進剤:DBU-B
ハイドロタルサイト:DHT-4A(協和化学工業株式会社)、Mg4.3Al2(OH)12.6CO3・mH2O
表1~3の処方に従ってそれぞれの成分を配合し、オープンロール上で混練りして、架橋性組成物を調製した。得られた架橋性組成物の最大トルク(MH)および最適架橋時間(T90)を表1~3に示す。次に、表1~3に記載の条件の一次架橋(プレス架橋)、および、表1~3に記載の条件の二次架橋(オーブン架橋)により、架橋性組成物を架橋させ、架橋シート(厚さ2mm)を得た。得られた架橋シートの評価結果を表1~3に示す。
Claims (14)
- アンモニア燃焼機関の空気管理システムの部材に用いる架橋性組成物であって、
フッ素ゴムおよび架橋剤を含有しており、
さらに、
(a)受酸剤として、ハイドロタルサイトを含有し、または、
(b)受酸剤として、ハイドロタルサイト以外の受酸剤を含有し、もしくは、含有しておらず、ハイドロタルサイト以外の受酸剤の含有量が、フッ素ゴム100質量部に対して、0質量部以上1質量部未満である、
架橋性組成物。 - (a)の場合において、ハイドロタルサイトの含有量が、フッ素ゴム100質量部に対して、0.1~10質量部である請求項1に記載の架橋性組成物。
- (a)の場合において、ハイドロタルサイト以外の受酸剤の含有量が、フッ素ゴム100質量部に対して、0質量部以上1質量部未満である請求項1または2に記載の架橋性組成物。
- (b)の場合において、ハイドロタルサイトの含有量が、フッ素ゴム100質量部に対して、0.1質量部未満である請求項1に記載の架橋性組成物。
- (b)の場合において、ハイドロタルサイト以外の受酸剤が、金属酸化物、金属水酸化物、アルカリ金属ケイ酸塩および弱酸の金属塩からなる群より選択される少なくとも1種である請求項1または4に記載の架橋性組成物。
- フッ素ゴムが、パーオキサイド架橋可能なフッ素ゴムである請求項1、2または4に記載の架橋性組成物。
- フッ素ゴムが、ビニリデンフルオライド系フッ素ゴム、テトラフルオロエチレン/プロピレン系フッ素ゴム、および、パーフルオロゴムからなる群より選択される少なくとも1種である請求項1、2または4に記載の架橋性組成物。
- フッ素ゴムが、ビニリデンフルオライド単位および下記一般式(1):
CHX1=CX2Rf (1)
(式中、X1およびX2は、一方がHであり、他方がFであり、Rfは炭素数1~12の直鎖または分岐したフルオロアルキル基である。)で表される含フッ素単量体(1)単位を含有するフッ素ゴム(1)、ならびに、テトラフルオロエチレン/プロピレン系フッ素ゴムからなる群より選択される少なくとも1種である請求項1、2または4に記載の架橋性組成物。 - 含フッ素単量体(1)が、2,3,3,3-テトラフルオロプロペンである請求項8に記載の架橋性組成物。
- フッ素ゴム(1)が、ヨウ素原子および臭素原子の少なくとも一方を有し、ヨウ素原子および臭素原子の含有量の合計が0.001~10質量%である請求項8に記載の架橋性組成物。
- 架橋剤が、パーオキサイドである請求項1、2または4に記載の架橋性組成物。
- 共架橋剤をさらに含有する請求項11に記載の架橋性組成物。
- アンモニア燃焼機関の空気管理システムの部材であって、
前記部材が、請求項1、2または4に記載の架橋性組成物を架橋することにより得られるフッ素ゴム架橋物を含有する部材。 - アンモニア燃焼機関の空気管理システムの部材を形成するための、請求項1、2または4に記載の架橋性組成物の使用。
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