JP2023032758A - 描画装置、描画方法およびプログラム - Google Patents

描画装置、描画方法およびプログラム Download PDF

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Publication number
JP2023032758A
JP2023032758A JP2021139063A JP2021139063A JP2023032758A JP 2023032758 A JP2023032758 A JP 2023032758A JP 2021139063 A JP2021139063 A JP 2021139063A JP 2021139063 A JP2021139063 A JP 2021139063A JP 2023032758 A JP2023032758 A JP 2023032758A
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JP
Japan
Prior art keywords
pattern
substrate
data
partial
matching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021139063A
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English (en)
Japanese (ja)
Inventor
道昭 坂本
Michiaki Sakamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Original Assignee
Screen Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP2021139063A priority Critical patent/JP2023032758A/ja
Priority to TW111123555A priority patent/TWI831264B/zh
Priority to KR1020220084630A priority patent/KR20230031774A/ko
Priority to CN202210992521.4A priority patent/CN115729053A/zh
Publication of JP2023032758A publication Critical patent/JP2023032758A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Image Analysis (AREA)
JP2021139063A 2021-08-27 2021-08-27 描画装置、描画方法およびプログラム Pending JP2023032758A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2021139063A JP2023032758A (ja) 2021-08-27 2021-08-27 描画装置、描画方法およびプログラム
TW111123555A TWI831264B (zh) 2021-08-27 2022-06-24 描繪裝置、描繪方法以及記錄了程式的程式產品
KR1020220084630A KR20230031774A (ko) 2021-08-27 2022-07-08 묘화 장치, 묘화 방법, 및 기억 매체에 기록된 프로그램
CN202210992521.4A CN115729053A (zh) 2021-08-27 2022-08-18 绘制装置、绘制方法及记录有程序的存储介质

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021139063A JP2023032758A (ja) 2021-08-27 2021-08-27 描画装置、描画方法およびプログラム

Publications (1)

Publication Number Publication Date
JP2023032758A true JP2023032758A (ja) 2023-03-09

Family

ID=85292838

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021139063A Pending JP2023032758A (ja) 2021-08-27 2021-08-27 描画装置、描画方法およびプログラム

Country Status (4)

Country Link
JP (1) JP2023032758A (zh)
KR (1) KR20230031774A (zh)
CN (1) CN115729053A (zh)
TW (1) TWI831264B (zh)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4275345B2 (ja) * 2002-01-30 2009-06-10 株式会社日立製作所 パターン検査方法及びパターン検査装置
JP5015721B2 (ja) * 2007-03-30 2012-08-29 大日本スクリーン製造株式会社 欠陥検査装置、欠陥検査プログラム、図形描画装置および図形描画システム
US10867382B2 (en) * 2018-05-24 2020-12-15 Keysight Technologies, Inc. Detecting mura defects in master panel of flat panel displays during fabrication

Also Published As

Publication number Publication date
TWI831264B (zh) 2024-02-01
KR20230031774A (ko) 2023-03-07
TW202309476A (zh) 2023-03-01
CN115729053A (zh) 2023-03-03

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