JP2023032758A - Drawing apparatus, drawing method, and program - Google Patents

Abstract

To generate templates easily and quickly.SOLUTION: A position detection part 113 detects a position of a substrate by performing pattern matching using a template on a captured image obtained by an imaging part. A storage part 111 stores a second CAD data, the CAD data of the second pattern drawn on a first pattern. A data generation part 115 generates the second rasterized data by rasterizing the second CAD data. A storage part 111 further stores coordinates indicating the matching position where a pattern matching is performed by the position detection part 113 on the first pattern. A data generation part 115 creates an intermediate data by rasterizing the CAD data of the first pattern, and generates an image data having a predetermined size corresponding to the matching position as a template from the intermediate data, thereby generating the template easily and quickly.SELECTED DRAWING: Figure 4

Description

The present invention relates to a technique of drawing a pattern by irradiating a substrate with light.

Conventionally, a pattern can be drawn by irradiating light onto a photosensitive material formed on a semiconductor substrate, a printed circuit board, or a glass substrate for an organic EL display device or a liquid crystal display device (hereinafter referred to as "substrate"). It is done. A drawing apparatus that performs such drawing performs an alignment process that automatically adjusts the drawing position of a pattern by detecting the position of an alignment mark provided on a substrate.

In recent years, in drawing on a printed circuit board, there is a demand for reducing the space for arranging alignment marks in order to increase the number of pieces that can be taken from one board. Therefore, a part of the pattern on the substrate is used as an alignment mark without providing a mark dedicated to alignment on the substrate.

For example, in the exposure apparatus of Patent Document 1, in an image obtained by imaging a pattern on a substrate, part of the pattern is set as a reference mark model (that is, a template) used for alignment processing. Registered in advance. Then, when the substrate to be exposed is carried into the exposure apparatus, a part of the pattern on the substrate is imaged, pattern matching is performed between the obtained image and the reference mark model, and alignment processing of the substrate is performed. done.

JP 2013-171988 A

By the way, in the exposure apparatus of Patent Document 1, in order to obtain a template for pattern matching, a substrate is placed at a predetermined position of the exposure apparatus, an image of the pattern on the substrate is captured, and a partial pattern serving as a template is determined from the obtained image. need to extract. Therefore, the amount of work required to generate the template increases, and the work time also increases.

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and an object of the present invention is to easily and quickly generate a template.

According to a first aspect of the present invention, there is provided a drawing apparatus for drawing a pattern by irradiating a substrate with light, comprising: a stage for holding a substrate on which a first pattern is provided in advance; a writing head that irradiates an upper surface with modulated light; a scanning mechanism that moves the stage relative to the writing head in a scanning direction parallel to the upper surface of the substrate; and a portion of the first pattern. a position detection unit for detecting the position of the substrate by performing pattern matching using a template on the captured image acquired by the imaging unit; and a position of the substrate drawn on the first pattern. Detected by a storage unit that stores second CAD data that is CAD data of a second pattern, a data generation unit that rasterizes the second CAD data to generate second raster data, and the second raster data and the position detection unit drawing control for executing drawing of the second pattern on the substrate moving in the scanning direction relative to the drawing head by controlling the drawing head and the scanning mechanism based on the determined position of the substrate; the storage unit further stores coordinates indicating a matching position on the first pattern where pattern matching is performed by the position detection unit; and the data generation unit stores CAD data of the first pattern. Intermediate data is created by rasterization, and image data of a region of a predetermined size corresponding to the matching position is generated as the template from the intermediate data.

The invention according to claim 2 is the drawing apparatus according to claim 1, wherein the upper surface of the substrate is arranged in a matrix in the scanning direction and in the width direction perpendicular to the scanning direction. a plurality of partial drawing areas in which the same pattern is drawn are set in each of the plurality of partial drawing areas, and in two or more partial drawing areas in which the matching position is set among the plurality of partial drawing areas, the two or more partial drawing relative positions of the matching positions in each partial drawing area of the area are the same with respect to each partial drawing area, and the data generation unit determines the matching position of one partial drawing area among the two or more partial drawing areas. and the template is shared for pattern matching at the matching positions of the two or more partial drawing areas by the position detection unit.

The invention according to claim 3 is the drawing apparatus according to claim 1 or 2, wherein the substrate is arranged in a matrix on the top surface of the substrate in the scanning direction and in the width direction perpendicular to the scanning direction. A plurality of partial drawing areas are set, and in the partial drawing area on the one side in the scanning direction and the one side in the width direction among the plurality of drawing partial areas, the matching position is the one in the scanning direction. In a partial drawing area that is arranged adjacent to a corner on one side and on the one side in the width direction and that is the most one side in the scanning direction and the most other side in the width direction among the plurality of partial drawing areas, The matching position is arranged adjacent to a corner portion on the one side in the scanning direction and the other side in the width direction, and is positioned on the most other side in the scanning direction and in the width direction among the plurality of partial drawing areas. In the partial drawing area closest to the one side, the matching position is arranged adjacent to a corner portion on the other side in the scanning direction and the one side in the width direction. In the partial drawing area on the most other side in the direction and the most on the other side in the width direction, the matching position is arranged adjacent to a corner portion on the other side in the scanning direction and the other side in the width direction. be.

The invention according to claim 4 is the drawing apparatus according to any one of claims 1 to 3, wherein the data generation unit generates data corresponding to a predetermined region including the matching position in the first pattern. The intermediate data is created by rasterizing only the partial data which is the CAD data.

The invention according to claim 5 is the drawing apparatus according to claim 4, wherein on the top surface of the substrate, a plurality of scanning lines are arranged in a matrix in the scanning direction and in the width direction perpendicular to the scanning direction. A partial drawing area is set, and the partial data corresponds to a set of partial drawing areas including the matching position.

According to a sixth aspect of the present invention, there is provided a drawing method for drawing a pattern by irradiating a substrate with light, comprising: a) holding a substrate on which a first pattern is previously provided; c) capturing an image of a portion of the first pattern; and d) using the template for the captured image obtained in the c) step. a step of detecting the position of the substrate by performing pattern matching; and e) a step of rasterizing second CAD data, which is CAD data of a second pattern drawn on the first pattern, to generate second raster data. f) a drawing head for irradiating the upper surface of the substrate with modulated light based on the second raster data and the position of the substrate detected in the step d); and a scanning mechanism that moves the substrate relatively to the drawing head in a parallel scanning direction, thereby forming the second pattern on the substrate that relatively moves in the scanning direction with respect to the drawing head. and b) the step of b1) preparing coordinates indicating a matching position where the pattern matching is performed on the first pattern; and b2) CAD data of the first pattern. is rasterized to create intermediate data, and from the intermediate data, image data of a region of a predetermined size corresponding to the matching position is generated as the template.

According to a seventh aspect of the present invention, there is provided a program to be executed in a drawing apparatus that draws a pattern by irradiating a substrate with light, wherein the drawing apparatus includes a substrate having a first pattern provided in advance on an upper surface thereof. a drawing head for irradiating the upper surface of the substrate with modulated light; and a scan for moving the stage relative to the drawing head in a scanning direction parallel to the upper surface of the substrate. a mechanism, an imaging unit that captures an image of part of the first pattern, and a position detection unit that detects the position of the substrate by performing pattern matching using a template on the captured image acquired by the imaging unit. a storage unit for storing second CAD data which is CAD data for a second pattern to be drawn on the first pattern; a data generation unit for rasterizing the second CAD data to generate second raster data; By controlling the drawing head and the scanning mechanism based on the two raster data and the position of the substrate detected by the position detection unit, the substrate is moved relative to the drawing head in the scanning direction. a drawing control unit for executing drawing of a second pattern, wherein the storage unit further stores coordinates indicating a matching position where pattern matching is performed by the position detection unit on the first pattern; , the data generation unit rasterizes the CAD data of the first pattern to create intermediate data, and from the intermediate data, image data of a region of a predetermined size corresponding to the matching position is generated as the template.

In the present invention, template generation can be performed easily and quickly.

1 is a perspective view showing a drawing device according to one embodiment; FIG. It is a top view which shows a board|substrate. It is a figure which shows the structure of the computer with which a control part is provided. 3 is a block diagram showing functions of a control unit; FIG. FIG. 10 is a diagram showing the flow of drawing a pattern on a substrate; FIG. 10 is a diagram showing the flow of drawing a pattern on a substrate; FIG. 10 is a diagram showing matching positions and extraction regions; FIG. 4 is a diagram showing an example of a template; FIG. 10 is a diagram showing an example of arrangement of a plurality of matching positions; FIG. 10 is a diagram showing another example of arrangement of a plurality of matching positions; FIG. 10 is a diagram showing another example of arrangement of a plurality of matching positions;

FIG. 1 is a perspective view showing a drawing apparatus 1 according to one embodiment of the invention. The drawing apparatus 1 is a direct drawing apparatus that draws a pattern by irradiating a photosensitive material on a substrate 9 with spatially modulated substantially beam-like light and scanning the irradiation area of the light on the substrate 9. . In FIG. 1, three directions orthogonal to each other are indicated by arrows as the X direction, the Y direction, and the Z direction. In the example shown in FIG. 1, the X and Y directions are horizontal directions perpendicular to each other, and the Z direction is the vertical direction. The same applies to other drawings.

Note that FIG. 1 also illustrates a data processing device 6 connected to the drawing device 1 . The data processing device 6 is a device that performs preprocessing and the like of data used for drawing in the drawing device 1 . The data processing device 6 is, for example, a normal computer, which is conceptually drawn as a substantially rectangular parallelepiped in FIG.

FIG. 2 is a plan view showing the main surface of the substrate 9 on the (+Z) side (hereinafter also referred to as "upper surface 90"). The substrate 9 is, for example, a substantially rectangular plate member in a plan view. The board 9 is, for example, a multilayer printed wiring board (hereinafter simply referred to as "printed board"). In this embodiment, a circuit pattern made of copper (Cu) or the like is formed in advance on the upper surface 90 of the substrate 9, and a resist film made of a photosensitive material is provided on the circuit pattern. . Then, a solder pattern is drawn (that is, formed) on the resist film of the substrate 9 in the drawing device 1 . The solder pattern is drawn on the circuit pattern described above so as to match the circuit pattern.

In the following description, a pattern (that is, a circuit pattern) formed in advance on the upper surface 90 of the substrate 9 is also called a "first pattern", and a pattern to be drawn on the upper surface 90 of the substrate 9 by the drawing apparatus 1. (that is, solder pattern) is also called a "second pattern". Note that the type and shape of the substrate 9 may be changed variously. Also, the pattern drawn on the substrate 9 by the drawing device 1 is not limited to the solder pattern, and may be variously changed.

A plurality of (for example, four) partitioned areas 92 partitioned by substantially rectangular first dividing lines 91 are set on the upper surface 90 of the substrate 9 illustrated in FIG. 2 . In each partitioned area 92, a plurality of partial drawing areas 94, each of which is partitioned into a substantially rectangular shape by grid-like dividing lines 93, are set. The number and arrangement of the plurality of partial drawing areas 94 in each partitioned area 92 are the same. The same pattern is drawn in each of the plurality of partial drawing regions 94 . Each demarcated area 92 and each partial drawing area 94 respectively correspond to the sheet and piece that will finally be obtained from the substrate 9 . In the example shown in FIG. 2, each partial drawing area 94 has a substantially square shape. A plurality of partial drawing areas 94 are arranged in a matrix in the X direction and the Y direction. In FIG. 2, each partial drawing area 94 is drawn larger than it actually is, and the number of partial drawing areas 94 is drawn smaller than it actually is. The substrate 9 is not provided with alignment marks dedicated to position detection processing (that is, alignment processing), which will be described later.

As shown in FIG. 1 , the drawing apparatus 1 includes a stage 21 , a stage moving mechanism 22 , an imaging section 3 , a drawing section 4 and a control section 10 . The control unit 10 controls the stage moving mechanism 22, the imaging unit 3, the drawing unit 4, and the like. The stage 21 is a substantially flat substrate holding portion that holds the substrate 9 in a horizontal state from below below the imaging portion 3 and the drawing portion 4 (that is, on the (-Z) side). The stage 21 is, for example, a vacuum chuck that holds the lower surface of the substrate 9 by suction. The stage 21 may have a structure other than the vacuum chuck. A top surface 90 of the substrate 9 placed on the stage 21 is substantially perpendicular to the Z direction and substantially parallel to the X and Y directions.

The stage moving mechanism 22 is a moving mechanism that moves the stage 21 relative to the imaging unit 3 and the drawing unit 4 in the horizontal direction (that is, the direction substantially parallel to the upper surface 90 of the substrate 9). The stage moving mechanism 22 has a first moving mechanism 23 and a second moving mechanism 24 . The second moving mechanism 24 linearly moves the stage 21 along the guide rails in the X direction. The first moving mechanism 23 linearly moves the stage 21 together with the second moving mechanism 24 along the guide rails in the Y direction. The driving source of the first moving mechanism 23 and the second moving mechanism 24 is, for example, a linear servomotor or a motor attached to a ball screw. The structures of the first moving mechanism 23 and the second moving mechanism 24 may be changed variously.

The drawing apparatus 1 may be provided with a stage rotation mechanism that rotates the stage 21 around a rotation axis extending in the Z direction. Also, the drawing apparatus 1 may be provided with a stage lifting mechanism that moves the stage 21 in the Z direction. A servomotor, for example, can be used as the stage rotation mechanism. A linear servo motor, for example, can be used as the stage lifting mechanism. The structures of the stage rotation mechanism and the stage elevating mechanism may be modified in various ways.

The imaging unit 3 includes a plurality of (two in the example shown in FIG. 1) imaging heads 31 arranged in the X direction. Each imaging head 31 is supported above the stage 21 and the stage moving mechanism 22 by a head support section 30 provided straddling the stage 21 and the stage moving mechanism 22 . Of the two imaging heads 31, one imaging head 31 is fixed to the head supporting portion 30, and the other imaging head 31 is movable on the head supporting portion 30 in the X direction. Thereby, the distance in the X direction between the two imaging heads 31 can be changed. Note that the number of imaging heads 31 of the imaging unit 3 may be one, or may be three or more.

Each imaging head 31 is a camera including an imaging sensor and an optical system (not shown). Each imaging head 31 is, for example, an area camera that acquires a two-dimensional image. An imaging sensor includes, for example, elements such as a plurality of CCDs (Charge Coupled Devices) arranged in a matrix. In each imaging head 31, reflected light of illumination light guided from a light source (not shown) to the upper surface 90 of the substrate 9 is guided to an imaging sensor via an optical system. The imaging sensor receives reflected light from the upper surface 90 of the substrate 9 and acquires an image of a substantially rectangular imaging area. Various light sources such as LEDs (Light Emitting Diodes) can be used as the light source. Note that each imaging head 31 may be another type of camera such as a line camera.

The drawing unit 4 includes a plurality of (five in the example shown in FIG. 1) drawing heads 41 arranged in the X direction and the Y direction. Each drawing head 41 is supported above the stage 21 and the stage moving mechanism 22 by a head supporting portion 40 provided straddling the stage 21 and the stage moving mechanism 22 . The head support section 40 is arranged on the (+Y) side of the head support section 30 of the imaging section 3 . The number of drawing heads 41 of the drawing unit 4 may be one or plural.

Each drawing head 41 includes a light source, an optical system, and a spatial light modulator (not shown). Various elements such as DMD (Digital Micro Mirror Device) and GLV (Grating Light Valve) (registered trademark of Silicon Light Machines (Sunnyvale, Calif.)) are used as spatial light modulation elements. It is possible. Various light sources such as LD (Laser Diode) can be used as the light source. The multiple drawing heads 41 have substantially the same structure.

In the drawing apparatus 1 , while the upper surface 90 of the substrate 9 is irradiated with modulated (that is, spatially modulated) light from the plurality of drawing heads 41 of the drawing unit 4 , the substrate 9 is moved in the Y direction by the stage moving mechanism 22 . move to As a result, the area irradiated with light from the plurality of drawing heads 41 is scanned on the substrate 9 in the Y direction, and a pattern is drawn on the substrate 9 . In the following description, the Y direction is also called "scanning direction", and the X direction is also called "width direction". The stage moving mechanism 22 is a scanning mechanism that moves the irradiation area of the light from each drawing head 41 on the substrate 9 in the scanning direction.

In the drawing apparatus 1, drawing on the substrate 9 is performed by a so-called single-pass (one-pass) method. Specifically, the stage 21 is relatively moved in the Y direction with respect to the plurality of drawing heads 41 by the stage moving mechanism 22, and the irradiation area of the light from the plurality of drawing heads 41 is shifted on the upper surface 90 of the substrate 9. It is scanned only once in the Y direction (ie, scan direction). This completes drawing on the substrate 9 . Note that the drawing apparatus 1 may perform drawing on the substrate 9 by a multi-pass method in which the stage 21 is repeatedly moved in the Y direction and stepped in the X direction. When multi-pass drawing is performed in the drawing apparatus 1, the Y direction is the main scanning direction, and the X direction is the sub scanning direction. The first moving mechanism 23 of the stage moving mechanism 22 is a main scanning mechanism that moves the stage 21 in the main scanning direction, and the second moving mechanism 24 is a sub-scanning mechanism that moves the stage 21 in the sub-scanning direction. .

FIG. 3 is a diagram showing the configuration of the computer 100 included in the control unit 10. As shown in FIG. Computer 100 is a normal computer comprising processor 101 , memory 102 , input/output unit 103 and bus 104 . A bus 104 is a signal circuit that connects the processor 101 , memory 102 and input/output unit 103 . The memory 102 stores various information. The memory 102 reads and stores a program 109 pre-stored in the storage medium 81, for example. The storage medium 81 is, for example, a USB memory or a CD-ROM.

The processor 101 executes various processes (for example, numerical calculation and image processing) while using the memory 102 and the like according to the program 109 and the like stored in the memory 102 . The input/output unit 103 includes a keyboard 105 and a mouse 106 for receiving inputs from an operator, and a display 107 for displaying outputs from the processor 101 and the like. The control unit 10 may be a programmable logic controller (PLC: Programmable Logic Controller), a circuit board, or the like, or may be a combination of these and one or more computers.

FIG. 4 is a block diagram showing functions of the control unit 10 realized by executing the program 109 by the computer 100. As shown in FIG. In FIG. 4, configurations other than the control unit 10 are also shown. The control unit 10 includes a storage unit 111 , an imaging control unit 112 , a position detection unit 113 , a drawing control unit 114 and a data generation unit 115 .

The storage unit 111 is mainly implemented by the memory 102 and stores in advance various information related to pattern drawing in the drawing apparatus 1 . Information stored in the storage unit 111 includes, for example, information sent from the data processing device 6 to the drawing device 1 . From the data processing device 6, for example, CAD data of a second pattern to be drawn on the substrate 9 (hereinafter also referred to as "second CAD data"), and a template which is information used to generate a template to be described later. Generation information and the like are sent to the drawing apparatus 1 .

The imaging control unit 112 , the position detection unit 113 , the drawing control unit 114 and the data generation unit 115 are mainly realized by the processor 101 . The image capturing control unit 112 controls the image capturing unit 3 and the stage moving mechanism 22 to cause the image capturing unit 3 to capture a portion of the upper surface 90 (see FIG. 2) of the substrate 9, thereby obtaining a partial image of the first pattern. (hereinafter also referred to as “captured image”). The captured image is sent to and stored in the storage unit 111 . The data generation unit 115 rasterizes the second CAD data stored in the storage unit 111, and generates raster data (hereinafter also referred to as “second raster data”) used for drawing the second pattern in the drawing apparatus 1. to generate The second raster data is run length data, for example. The data generator 115 also generates a template (that is, a reference image) used for position detection of the substrate 9 .

The position detection unit 113 performs pattern matching using the template on the captured image of the first pattern described above to determine the position of the substrate 9 on the stage 21 (see FIG. 1) (that is, the substrate relative to the drawing unit 4). 9 relative position). The drawing control unit 114 controls the drawing unit 4 and the stage moving mechanism 22 based on the above-described second raster data and the position of the substrate 9 detected by the position detection unit 113, thereby While adjusting the drawing position, the drawing unit 4 is caused to draw the second pattern on the substrate 9 .

Next, the flow of pattern drawing on the substrate 9 by the drawing apparatus 1 will be described with reference to FIGS. 5A and 5B. When performing drawing on the substrate 9, the substrate 9 is first carried into the drawing apparatus 1 shown in FIG. 1 and held by the stage 21 (step S11). The stage 21 is located on the (−Y) side of the imaging unit 3 and the drawing unit 4 . A first pattern is provided in advance on the upper surface 90 of the substrate 9 held on the stage 21 . A top surface 90 of the substrate 9 is substantially parallel to the X and Y directions.

Subsequently, a template used for pattern matching is generated by the data generator 115 (see FIG. 4) of the controller 10 (step S12). In step S<b>12 , second CAD data and template generation information are first sent from the data processing device 6 to the drawing device 1 and stored in the storage unit 111 . As a result, the drawing apparatus 1 prepares the second CAD data and the template generation information (step S121). The template generation information includes the first CAD data, which is the CAD data of the first pattern, and the coordinates indicating the position where pattern matching is performed by the position detection unit 113 on the first pattern (hereinafter also referred to as "matching position"). is included. The template generation information also includes template size information indicating the size of the template used for the pattern matching.

In the control unit 10 , the template generation information stored in the storage unit 111 is read out by the data generation unit 115 . The data generator 115 rasterizes the first CAD data included in the template generation information to generate first raster data (hereinafter also referred to as “intermediate data”). The first raster data is run length data, for example.

Further, based on the coordinates indicating the matching position and the template size information included in the template generation information, the data generation unit 115 extracts a predetermined size corresponding to the matching position from the first raster data (that is, the template size information is (size shown) is extracted. As shown in FIG. 6, the area extracted from the first raster data (hereinafter also referred to as "extraction area 96") is, for example, a substantially square of 2 mm square centered on matching position 95 indicated by a cross. It is a shaped area. In FIG. 6, of the plurality of partial drawing regions 94 of the substrate 9 on which the first pattern is drawn, the vicinity of the upper left vertex of the upper left (that is, the vertex on the (-X) side and the (+Y) side) partial drawing region 94 The part of is enlarged and drawn. Note that the extraction area 96 does not necessarily have to be extracted with the matching position 95 as the center, and may be, for example, a substantially square area with the matching position 95 as the upper left vertex. Also, the shape and size of the extraction region 96 may be varied.

The data generation unit 115 generates a template by converting the data of the extraction region 96 extracted from the first raster data into image data in a format that can be used for pattern matching (step S122). FIG. 7 is a diagram showing an example of the template 97 generated by the data generator 115. As shown in FIG. Template 97 includes a portion of the first pattern, as described above. Note that the shape of the pattern included in the template 97 is not limited to that shown in FIG. 7, and may be changed in various ways. In this embodiment, the template is bitmap data. Note that the template data format may be other than the bitmap format.

The template generation information typically includes the coordinates of multiple (eg, four or more) matching locations 95 . The plurality of matching positions 95 are preset by the designer in the data processing device 6 and included in the template generation information. In step S<b>12 described above, a plurality of templates 97 corresponding to the plurality of matching positions 95 are generated by the data generation unit 115 and stored in the storage unit 111 .

FIG. 8 is a diagram showing an example of arrangement of a plurality of matching positions 95 on the substrate 9. As shown in FIG. Focusing on one partitioned area 92 in FIG. 8, the arrangement of matching positions 95 for a plurality of partial drawing areas 94 in the partitioned area 92 will be described below. Also, the arrangement of the matching positions 95 in the plurality of divided areas 92 is the same. The same applies to the descriptions of FIGS. 9 and 10 that will be described later. In the example shown in FIG. 8, four matching positions 95 are respectively arranged in four partial drawing areas 94 located at four corners among a plurality of partial drawing areas 94 arranged in a matrix in the partitioned area 92. . Also, in each partial drawing area 94 in which the matching position 95 is arranged, the matching position 95 is arranged near one of the four corners of the partial drawing area 94 that is farthest from the center of the partitioned area 92 . be done.

Specifically, the partial drawing area 94 positioned at the corner on the (−X) side and the (+Y) side of the partitioned area 92 (that is, the partial drawing area 94 on the farthest side in the width direction and the farthest side in the scanning direction) ), the matching position 95 is arranged adjacent to the corner on the (−X) side and the (+Y) side of the partial drawing area 94 . An extraction area 96 corresponding to the matching position 95 is also arranged adjacent to the corner of the partial drawing area 94 . The extraction area 96 is wholly located within the partial drawing area 94 (that is, on the outer peripheral edge of the partial drawing area 94 and inside the outer peripheral edge). Preferably, the (-X) side and (+Y) side corner of the extraction region 96 overlaps the (-X) side and (+Y) side corner of the partial drawing region 94, and the (-X) side corner of the extraction region 96 ) side and (+Y) side overlap with the (−X) side and (+Y) side of the partial drawing area 94 .

Note that the extraction area 96 may be spaced inward from the outer peripheral edge of the partial drawing area 94 . In this case, the distance between the (−X) side of the extraction region 96 and the (−X) side of the partial drawing region 94 is, for example, 2 mm or less (that is, 100 mm of the length of one side of the extraction region 96). % or less), preferably 1 mm or less (that is, 50% or less of the length of one side of the extraction region 96). The same applies to the distance between the (+Y) side of the extraction area 96 and the (+Y) side of the partial drawing area 94 .

In the partial drawing area 94 positioned at the corner on the (+X) side and the (+Y) side (that is, the partial drawing area 94 on the othermost side in the width direction and the most side in the scanning direction), the matching position 95 and the extraction area 96 is arranged adjacent to the (+X) side and (+Y) side corner of the partial drawing area 94 . The extraction area 96 is entirely located within the partial drawing area 94 . Preferably, the (+X) side and (+Y) side corner of the extraction region 96 overlaps the (+X) side and (+Y) side corner of the partial drawing region 94 , and the (+X) side corner of the extraction region 96 The side and the (+Y) side overlap the (+X) side and the (+Y) side of the partial drawing area 94, respectively. Note that the extraction area 96 may be spaced inward from the outer peripheral edge of the partial drawing area 94 in the same manner as described above. In this case, the distance between the extraction area 96 and the partial drawing area 94 is substantially the same as the extraction area 96 arranged in the partial drawing area 94 on the most (−X) side and the most (+Y) side described above. .

In the partial drawing area 94 positioned at the corner on the (+X) side and the (−Y) side (that is, the partial drawing area 94 on the othermost side in the width direction and on the othermost side in the scanning direction), the matching position 95 and the extraction area 96 is arranged adjacent to the (+X) side and (−Y) side corner of the partial drawing area 94 . The extraction area 96 is entirely located within the partial drawing area 94 . Preferably, the (+X) side and (−Y) side corners of the extraction region 96 overlap the (+X) side and (−Y) side corners of the partial drawing region 94, and the (+X) side corners of the extraction region 96 overlap each other. side and (-Y) side overlap with the (+X) side and (-Y) side of the partial drawing area 94, respectively. Note that the extraction area 96 may be spaced inward from the outer peripheral edge of the partial drawing area 94 in the same manner as described above. In this case, the distance between the extraction area 96 and the partial drawing area 94 is substantially the same as the extraction area 96 arranged in the partial drawing area 94 on the most (−X) side and the most (+Y) side described above. .

In the partial drawing area 94 located at the corner on the (-X) side and the (-Y) side (that is, the partial drawing area 94 on the farthest side in the width direction and the farthest side in the scanning direction), the matching position 95 and the extraction The area 96 is arranged adjacent to the (−X) side and (−Y) side corner of the partial drawing area 94 . The extraction area 96 is entirely located within the partial drawing area 94 . Preferably, the (-X) side and (-Y) side corner of the extraction area 96 overlaps the (-X) side and (-Y) side corner of the partial drawing area 94, and the (-X) side and (-Y) side corner of the extraction area 96 The -X) side and the (-Y) side overlap the (-X) side and the (-Y) side of the partial drawing area 94, respectively. Note that the extraction area 96 may be spaced inward from the outer peripheral edge of the partial drawing area 94 in the same manner as described above. In this case, the distance between the extraction area 96 and the partial drawing area 94 is substantially the same as the extraction area 96 arranged in the partial drawing area 94 on the most (−X) side and the most (+Y) side described above. .

In step S12, when a plurality of templates 97 respectively corresponding to a plurality of matching positions 95 are generated, the substrate 9 is moved in the (+Y) direction together with the stage 21 by the stage moving mechanism 22 shown in FIG. Move down to 3. Note that step S12 may be performed before carrying in and holding the substrate 9 in step S11, or may be performed in parallel with step S11.

Subsequently, the image capturing unit 3 and the stage moving mechanism 22 are controlled by the image capturing control unit 112 (see FIG. 4), so that an image capturing area having a predetermined size corresponding to each matching position 95 on the substrate 9 is captured. A captured image including part of the first pattern is acquired (step S13). The imaging area is a substantially rectangular area centered on the matching position 95 when the substrate 9 is accurately held at the designed position on the stage 21 . The imaging area has a pair of sides parallel to the X direction and the Y direction, respectively, and is larger than the extraction area 96 described above in both the X direction and the Y direction.

For example, the imaging area has a substantially rectangular shape obtained by enlarging the extraction area 96 by a predetermined size on each of the (+X) side, (−X) side, (+Y) side and (−Y) side. For example, the X-direction and Y-direction lengths of the imaging area (that is, the X-direction and Y-direction lengths of the imaging field of view of the imaging head 31) are 14 mm and 7 mm, respectively. Therefore, even if the position of the substrate 9 on the stage 21 is slightly deviated from the designed position, the pattern corresponding to the template 97 is included in the captured image. In step S<b>13 , a plurality of picked-up images respectively corresponding to a plurality of matching positions 95 are obtained and stored in the storage section 111 . Note that step S13 may be performed before step S12 or may be performed in parallel with step S12. Also, the size of the imaging area may be changed in various ways.

Next, the position detection unit 113 of the control unit 10 performs pattern matching on the captured image corresponding to each matching position 95 using the template 97 corresponding to the matching position 95 . The pattern matching is performed by a known pattern matching method (eg, geometric shape pattern matching, normalized correlation search, etc.). Then, the position of the substrate 9 on the stage 21 is detected based on the position of the same pattern as the template 97 in each captured image and the relative position between the substrate 9 and the imaging unit 3 when each captured image is acquired. It is detected by the unit 113 (see FIG. 4) (step S14).

The position of the substrate 9 detected by the position detection unit 113 in step S14 includes information indicating the coordinates of the substrate 9 in the X and Y directions on the stage 21, the orientation of the substrate 9, and deformation due to distortion or the like of the substrate 9. including. The information indicating the deformation of the substrate 9 is information such as the shape of the deformed substrate 9 and the positions of the plurality of partial drawing areas 94 on the substrate 9 .

In the control unit 10, the data generation unit 115 (see FIG. 4) reads the second CAD data from the storage unit 111 and rasterizes the second CAD data to generate the second raster data (step S15). ). The second raster data is run length data, for example. Step S15 may be performed after step S14, may be performed in parallel with step S14, or may be performed before step S14. When step S15 is performed before step S14, for example, step S15 may be performed in parallel with any one of steps S11 to S13, or may be performed between any two of steps S11 to S14. Alternatively, it may be performed before step S11.

When the second raster data is generated, the drawing unit 4 and the stage moving mechanism 22 are controlled by the drawing control unit 114 (see FIG. 4) based on the second raster data and the position of the substrate 9 detected in step S14. be done. As a result, the substrate 9 moved in the Y direction relative to the drawing head 41 of the drawing unit 4 is irradiated with the above-described modulated light, and the second pattern is drawn on the upper surface 90 of the substrate 9. (Step S16). In step S16, based on the position of the substrate 9 detected in step S14, the modulation interval and modulation timing of the light beam irradiated from the drawing unit 4 to the substrate 9, and the scanning position of the light beam on the substrate 9 are determined. etc. are mechanically and automatically corrected by a known correction method in the drawing unit 4 and the stage moving mechanism 22 . Thereby, the second pattern can be drawn on the first pattern with good positional accuracy.

In the above description, in step S12, the first raster data obtained by rasterizing the entire first CAD data (that is, the entire first pattern) is used as intermediate data, and the extraction corresponding to the matching position 95 is performed from the intermediate data. Although the template 97 is generated by extracting the region 96, it is not limited to this. For example, in step S12, only the partial data that is part of the first CAD data may be rasterized by the data generator 115 to create the intermediate data. In this case, the partial data is CAD data corresponding to an area of a predetermined size (hereinafter also referred to as a "clipping area") containing each matching position 95 in the first pattern. As described above, when a plurality of matching positions 95 are set, the partial data is CAD data corresponding to a set of clipping areas respectively corresponding to the plurality of matching positions 95 . The positions and sizes of the plurality of clipping regions are preset by the designer in the data processing device 6 and included in the template generation information.

Each clipping region includes one matching position 95 as described above and includes the entire extraction region 96 corresponding to that matching position 95 . The clipping area is, for example, a substantially rectangular area having a pair of sides parallel to the X direction and the Y direction and having a size equal to or larger than the extraction area 96 in both the X direction and the Y direction. For example, the clipping area has a predetermined size (for example, the X direction and the It has a shape enlarged by the maximum amount of positional deviation in the Y direction). Alternatively, the clipping area may be the same area as one partial drawing area 94 including the matching position 95 included in the clipping area. In this case, the partial data is CAD data corresponding to a plurality of partial drawing areas 94 each including a plurality of matching positions 95 (that is, a set of partial drawing areas 94 including matching positions 95). By rasterizing only a part of the first CAD data in the data generator 115 in this way, the time required for rasterization can be shortened.

As described above, the drawing apparatus 1 is a device that draws a pattern by irradiating the substrate 9 with light. The drawing apparatus 1 includes a stage 21, a drawing head 41, a scanning mechanism (stage moving mechanism 22 in the above example), an imaging unit 3, a position detection unit 113, a storage unit 111, a data generation unit 115, and a drawing control unit 114 . The stage 21 holds the substrate 9 on which the first pattern is previously provided on the upper surface 90 . The drawing head 41 irradiates the upper surface 90 of the substrate 9 with modulated light. The scanning mechanism relatively moves the stage 21 with respect to the drawing head 41 in the scanning direction parallel to the upper surface 90 of the substrate 9 (the Y direction in the above example). The imaging unit 3 images part of the first pattern.

The position detection unit 113 detects the position of the substrate 9 by performing pattern matching using the template 97 on the captured image acquired by the imaging unit 3 . The storage unit 111 stores second CAD data, which is CAD data of a second pattern drawn on the first pattern. The data generator 115 rasterizes the second CAD data to generate second raster data. The drawing control unit 114 controls the drawing head 41 and the scanning mechanism based on the second raster data and the position of the substrate 9 detected by the position detection unit 113, thereby moving relative to the drawing head 41 in the scanning direction. The drawing of the second pattern on the substrate 9 is executed.

The storage unit 111 further stores coordinates indicating a matching position 95 where pattern matching is performed by the position detection unit 113 on the first pattern. The data generation unit 115 rasterizes the CAD data of the first pattern to create intermediate data, and from the intermediate data, extracts image data of an area of a predetermined size (that is, an extraction area 96) corresponding to the matching position 95. It is generated as a template 97.

As described above, in the drawing apparatus 1 , when generating the template 97 used in pattern matching when detecting the position of the substrate 9 , the template is generated from the CAD data of the first pattern without imaging the first pattern on the substrate 9 . 97 can be generated. Therefore, when generating the template 97, it is not necessary to accurately place the substrate 9 at the design position on the stage 21 or to image the first pattern on the substrate 9 by the imaging unit 3. FIG. Therefore, the template 97 can be generated easily and quickly.

As described above, the data generator 115 writes only the partial data, which is the CAD data corresponding to the predetermined area (that is, the clipping area) including the matching position 95 in the first pattern, to create the intermediate data. preferably. As a result, the time required for rasterization can be shortened, and the time required for generating the template 97 can be shortened, as compared with the case where all of the first CAD data is rasterized.

As described above, the upper surface 90 of the substrate 9 is provided with a plurality of partial drawing areas 94 arranged in a matrix in the scanning direction and the width direction perpendicular to the scanning direction (the Y direction and the X direction in the above example). may have been In this case, the partial data preferably correspond to a set of partial drawing areas 94 containing matching positions 95 . As a result, the designer can easily set the clipping region, and the time required for creating the template generation information in the data processing device 6 can be shortened.

As shown in FIG. 8, when a plurality of partitioned regions 92 are set on the upper surface 90 of the substrate 9, the arrangement of the matching positions 95 in each partitioned region 92 may be the same. In this case, the data generator 115 extracts four extraction regions 96 respectively corresponding to four matching positions 95 in one partitioned region 92 to generate four templates 97 . Then, the four templates 97 are shared for pattern matching at the four matching positions 95 of each of the partitioned regions 92 by the position detection unit 113 without creating templates corresponding to the matching positions 95 of the other partitioned regions 92. . As a result, the time required to generate the template 97 can be shortened.

As shown in FIG. 8, on the upper surface 90 of the substrate 9, a plurality of partial drawing areas 94 (in the above example, in one partitioned area 92) are arranged in a matrix in the scanning direction and in the width direction perpendicular to the scanning direction. When a plurality of partial drawing areas 94 arranged in the same direction are set, the most one side in the scanning direction and the most one side in the width direction (the most (+Y) side in the above example) among the plurality of partial drawing areas 94 In the partial drawing area 94 closest to the (−X) side, the matching position 95 is located on the one side in the scanning direction and the one side in the width direction (in the above example, the (+Y) side and the (−X) side). It is preferably located adjacent to a corner. Further, in the partial drawing area 94 on the most one side in the scanning direction and the most on the other side in the width direction (the most (+Y) side and the most (+X) side in the above example) of the plurality of partial drawing areas 94, the matching The position 95 is preferably arranged adjacent to the corner on the one side in the scanning direction and the other side in the width direction (the (+Y) side and the (+X) side in the above example). Furthermore, in the partial drawing area 94 on the othermost side in the scanning direction and the othermost side in the width direction (the most (-Y) side and the most (+X) side in the above example) of the plurality of partial drawing areas 94, The matching position 95 is preferably arranged adjacent to the corner on the other side in the scanning direction and the other side in the width direction (in the above example, the (-Y) side and the (+X) side). Then, of the plurality of partial drawing areas 94, the partial drawing area 94 on the othermost side in the scanning direction and on the onemost side in the width direction (the most (-Y) side and the most (-X) side in the above example) Then, the matching position 95 is preferably arranged adjacent to the corner on the other side in the scanning direction and the one side in the width direction (the (-Y) side and the (-X) side in the above example). .

In this way, a minimum rectangular shape circumscribing a plurality of partial drawing areas 94 arranged in a matrix on the substrate 9 (in the above example, a plurality of partial drawing areas 94 arranged in one partitioned area 92). By arranging the four matching positions 95 at the four corners, substantially the entire area in which the second pattern is drawn can be surrounded by the four matching positions 95 . As a result, substantially the entire area in which the second pattern is to be drawn can be aligned with high accuracy, and the drawing accuracy of the second pattern can be improved.

The number and arrangement of matching positions 95 on substrate 9 are not limited to those shown in FIG. 8, and may be variously changed. For example, the matching positions 95 may be arranged in the partial drawing areas 94 other than the partial drawing areas 94 located at the four corners among the plurality of partial drawing areas 94 arranged in each partitioned area 92 . For example, as shown in FIG. 9, a matching position 95 may be arranged in each partial drawing area 94 of a plurality of partial drawing areas 94 arranged in a matrix in each partitioned area 92 . In the example shown in FIG. 9, in each partial drawing area 94 positioned closest to the (-Y) side in a plurality of partial drawing areas 94 in each partitioned area 92, the matching position 95 is adjacent to the (-Y) side. In each partial drawing area 94 positioned closest to the (+Y) side, the matching position 95 is arranged adjacent to the (+Y) side. In addition, in each partial drawing area 94 located on the most (-X) side of the plurality of partial drawing areas 94, the matching position 95 is arranged adjacent to the (-X) side and is located on the most (+X) side. In each partial drawing area 94, the matching position 95 is arranged adjacent to the (+X) side. As a result, since substantially the entire region in which the second pattern is drawn can be surrounded by a large number of matching positions 95, substantially the entire region in which the second pattern is drawn can be aligned with higher accuracy.

In the example shown in FIG. 9, the plurality of matching positions 95 arranged in the plurality of partial drawing areas 94 aligned in the Y direction are preferably positioned at the same position in the X direction. As a result, it is possible to perform imaging at the plurality of matching positions 95 without moving the substrate 9 relative to the imaging unit 3 in the X direction when obtaining the captured images at each matching position 95 in step S13. . As a result, it is possible to shorten the time required for acquiring the captured image in step S13, and shorten the time required for the alignment process.

Alternatively, as shown in FIG. 10, in partial drawing regions 94 located at four corners of a plurality of partial drawing regions 94 arranged in a matrix in each partitioned region 92, matching positions within each partial drawing region 94 The relative position of 95 with respect to each partial drawing area 94 (for example, the relative coordinates with the corners of the (−X) side and (+Y) side of the partial drawing area 94 as the origin) may be the same. In the example shown in FIG. 10 , in each of the four partial drawing areas 94 , the matching position 95 is arranged adjacent to the (−X) side and (+Y) side corner of the partial drawing area 94 . In this case, the data generator 115 does not generate four templates 97 by extracting the four extraction regions 96 corresponding to the four matching positions 95, but rather extracts one of the partial drawing regions 94 located at the four corners. One template 97 corresponding to the matching position 95 of the partial drawing area 94 of is generated. The one template 97 is shared for pattern matching at the matching positions 95 of the four partial drawing areas 94 by the position detection unit 113 . As a result, the time required to generate the template 97 can be shortened.

In the example shown in FIG. 10, the matching positions 95 are arranged at the same positions in the partial drawing areas 94 located at the four corners of the plurality of partial drawing areas 94 in each partitioned area 92. Although the case has been described, the matching position 95 is arranged at the same position in each partial drawing area 94 in two or more partial drawing areas 94 regardless of the position in the plurality of partial drawing areas 94. substantially the same effect.

That is, in two or more partial drawing areas 94 among the plurality of partial drawing areas 94, when the relative position of the matching position 95 in each partial drawing area 94 with respect to each partial drawing area 94 is the same, the data generation unit 115 , one template 97 corresponding to the matching position 95 of one partial drawing area 94 out of the two or more partial drawing areas 94 is generated, and the position detection unit 113 detects each of the two or more partial drawing areas 94 Preferably, the one template 97 is shared for pattern matching at matching positions 95 . As a result, the time required to generate the template 97 can be shortened.

As described above, the drawing method for drawing a pattern by irradiating the substrate with light includes the step of holding the substrate 9 having the first pattern provided in advance on the upper surface 90 (step S11), and the step of holding the substrate 9 in position. a step of generating a template 97 used for detection (step S12); a step of capturing an image of a part of the first pattern (step S13); and a step of rasterizing the second CAD data, which is the CAD data of the second pattern drawn on the first pattern, to generate the second raster data (step S14). Step S15) and the drawing head 41 for irradiating the upper surface 90 of the substrate 9 with modulated light based on the second raster data and the position of the substrate 9 detected in step S14, and By controlling the scanning mechanism (the stage moving mechanism 22 in the above example) that relatively moves the substrate 9 with respect to the drawing head 41 in the scanning direction (the Y direction in the above example), the drawing head 41 and a step of drawing the second pattern on the substrate 9 that relatively moves in the scanning direction (step S16).

Step S12 is a step of preparing coordinates indicating a matching position 95 where pattern matching is performed on the first pattern (step S121), creating intermediate data by rasterizing the CAD data of the first pattern, , and a step of generating image data of a region of a predetermined size corresponding to the matching position 95 as a template 97 (step S122). As a result, the template 97 can be easily and quickly generated in the same manner as described above.

In the above example, the computer 100 of the drawing apparatus 1 pre-stores the program 109 for generating the template 97, but is not limited to this. For example, the program 109 may be retrofitted (that is, retrofitted) into the rendering device 1 already in use. In this case, the program 109 is executed by the computer 100 so that the data generator 115 rasterizes the CAD data of the first pattern to create intermediate data. Image data of an area having a size of (that is, an extraction area 96) is generated as a template 97. FIG. As a result, the template 97 can be easily and quickly generated in the same manner as described above.

Various modifications are possible for the drawing apparatus 1, the drawing method, and the program 109 described above.

For example, in the above example, drawing on one main surface of the substrate 9 has been described, but the drawing apparatus 1 may draw patterns on both main surfaces of the substrate 9 . In this case, when drawing on the other main surface of the substrate 9, a template used for pattern matching is generated from the CAD data of the pattern previously formed on the other main surface in the same manner as described above. .

A plurality of partitioned areas 92 need not always be set on the substrate 9 described above. That is, only one partitioned area 92 may be set on the substrate 9 . In this case, the first dividing line 91 may be omitted. Moreover, it is not always necessary to set a plurality of partial drawing areas 94 within the partitioned area 92 . Also, the board 9 is not necessarily limited to a printed board. In the drawing apparatus 1, for example, even if drawing is performed on a semiconductor substrate, a glass substrate for a flat panel display device such as a liquid crystal display device or an organic EL display device, a glass substrate for a photomask, a substrate for a solar cell panel, or the like. good.

The configurations in the above embodiment and each modified example may be combined as appropriate as long as they do not contradict each other.

1 drawing device 3 imaging unit 9 substrate 21 stage 22 stage moving mechanism 41 drawing head 90 upper surface (of substrate) 94 partial drawing area 95 matching position 96 extraction area 97 template 109 program 111 storage unit 113 position detection unit 114 drawing control unit 115 data Generation unit S11 to S16, S121 to S122 Step

Claims (7)

A drawing apparatus for drawing a pattern by irradiating a substrate with light,
a stage for holding a substrate on which a first pattern is provided in advance;
a drawing head for irradiating the upper surface of the substrate with modulated light;
a scanning mechanism that moves the stage relative to the drawing head in a scanning direction parallel to the upper surface of the substrate;
an imaging unit that images a part of the first pattern;
a position detection unit that detects the position of the substrate by performing pattern matching using a template on the captured image acquired by the imaging unit;
a storage unit that stores second CAD data that is CAD data of a second pattern to be drawn on the first pattern;
a data generation unit that rasterizes the second CAD data to generate second raster data;
By controlling the drawing head and the scanning mechanism based on the second raster data and the position of the substrate detected by the position detection unit, the substrate moves relative to the drawing head in the scanning direction. a drawing control unit that executes drawing of the second pattern of
with
The storage unit further stores coordinates indicating a matching position where pattern matching is performed by the position detection unit on the first pattern,
The data generation unit rasterizes the CAD data of the first pattern to create intermediate data, and generates image data of a region of a predetermined size corresponding to the matching position from the intermediate data as the template. A drawing device characterized by: The drawing apparatus according to claim 1,
a plurality of partial drawing areas are set on the upper surface of the substrate, and are arranged in a matrix in the scanning direction and in a width direction perpendicular to the scanning direction, and each of which has the same pattern drawn thereon;
In two or more partial drawing areas in which the matching position is set among the plurality of partial drawing areas, the matching position in each partial drawing area of the two or more partial drawing areas is relative to each of the partial drawing areas. are in the same position and
The data generation unit generates the template corresponding to the matching position of one partial drawing area among the two or more partial drawing areas,
A drawing apparatus, wherein the template is shared for pattern matching at the matching positions of the two or more partial drawing regions by the position detection unit. The drawing apparatus according to claim 1 or 2,
a plurality of partial drawing areas arranged in a matrix in the scanning direction and in a width direction perpendicular to the scanning direction are set on the upper surface of the substrate;
In the partial drawing area on the one side in the scanning direction and the one side in the width direction among the plurality of drawing partial areas, the matching position is on the one side in the scanning direction and on the one side in the width direction. located adjacent to the corner,
In the partial drawing area on the one side in the scanning direction and on the other side in the width direction among the plurality of drawing partial areas, the matching position is on the one side in the scanning direction and the other side in the width direction. located adjacent to the corner of the
In the partial drawing area on the othermost side in the scanning direction and on the one side in the width direction among the plurality of drawing partial areas, the matching position is the other side in the scanning direction and the one side in the width direction. located adjacent to the corner of the
In the partial drawing area on the other side in the scanning direction and on the other side in the width direction among the plurality of partial drawing areas, the matching position is the other side in the scanning direction and the other side in the width direction. A drawing device, characterized in that it is arranged adjacent to a corner of a side. The drawing apparatus according to any one of claims 1 to 3,
The drawing apparatus, wherein the data generation unit rasterizes only partial data, which is CAD data corresponding to a predetermined area including the matching position, of the first pattern to generate the intermediate data. The drawing device according to claim 4,
a plurality of partial drawing areas arranged in a matrix in the scanning direction and in a width direction perpendicular to the scanning direction are set on the upper surface of the substrate;
The drawing apparatus, wherein the partial data corresponds to a set of partial drawing areas including the matching position. A drawing method for drawing a pattern by irradiating a substrate with light,
a) holding a substrate having a first pattern already provided on its top surface;
b) generating a template to be used for position detection of said substrate;
c) imaging a portion of the first pattern;
d) a step of detecting the position of the substrate by performing pattern matching using the template on the captured image obtained in the step c);
e) a step of rasterizing second CAD data, which is CAD data of a second pattern drawn on the first pattern, to generate second raster data;
f) a drawing head for irradiating the upper surface of the substrate with modulated light based on the second raster data and the position of the substrate detected in the step d); and a scanning mechanism that moves the substrate relative to the drawing head in the scanning direction, thereby drawing the second pattern on the substrate that moves relative to the drawing head in the scanning direction. and
with
The step b) is
b1) preparing coordinates indicating a matching position where the pattern matching is performed on the first pattern;
b2) creating intermediate data by rasterizing the CAD data of the first pattern, and generating image data of a region of a predetermined size corresponding to the matching position from the intermediate data as the template;
A drawing method comprising: A program to be executed in a drawing apparatus that draws a pattern by irradiating a substrate with light,
The drawing device
a stage for holding a substrate on which a first pattern is provided in advance;
a drawing head for irradiating the upper surface of the substrate with modulated light;
a scanning mechanism that moves the stage relative to the drawing head in a scanning direction parallel to the upper surface of the substrate;
an imaging unit that images a part of the first pattern;
a position detection unit that detects the position of the substrate by performing pattern matching using a template on the captured image acquired by the imaging unit;
a storage unit that stores second CAD data that is CAD data of a second pattern to be drawn on the first pattern;
a data generation unit that rasterizes the second CAD data to generate second raster data;
By controlling the drawing head and the scanning mechanism based on the second raster data and the position of the substrate detected by the position detection unit, the substrate moves relative to the drawing head in the scanning direction. a drawing control unit that executes drawing of the second pattern of
with
The storage unit further stores coordinates indicating a matching position where pattern matching is performed by the position detection unit on the first pattern,
By executing the program by a computer,
The data generation unit rasterizes the CAD data of the first pattern to create intermediate data, and generates image data of a region of a predetermined size corresponding to the matching position from the intermediate data as the template. A program characterized by

Images