KR20230031774A - Drawing apparatus, drawing method and, program recorded on storage medium - Google Patents

Abstract

The invention provides a drawing apparatus, a drawing method, and a storage medium on which a program is recorded. A position detection unit (113) detects the position of a substrate by performing pattern matching using a template on a captured image acquired by an imaging unit. A storage unit (111) stores second CAD data, which is CAD data for a second pattern drawn on a first pattern. A data generation unit (115) rasterizes the second CAD data to generate second raster data. The storage unit (111) further stores coordinates indicating a matching position on the first pattern at which pattern matching is performed by the position detection unit (113). The data generation unit (115) rasterizes the CAD data of the first pattern to create intermediate data, and generates, from the corresponding intermediate data, image data of a region of a predetermined size corresponding to the matching position as a template. As a result, it is possible to easily and quickly generate a template.

Description

Drawing device, drawing method, and program recorded on a storage medium

The present invention relates to a technique of drawing a pattern by irradiating a substrate with light.

[Reference of related application]

This application claims the benefit of priority from Japanese Patent Application JP2021-139063 filed on August 27, 2021, and all disclosures of the application are incorporated herein.

Conventionally, pattern drawing is performed by irradiating light to a photosensitive material formed on a semiconductor substrate, a printed circuit board, or a glass substrate for an organic EL display device or a liquid crystal display device (hereinafter referred to as a "substrate"). In a drawing device that performs such drawing, alignment processing is performed in which the position of an alignment mark formed on a substrate is detected and the drawing position of a pattern is automatically adjusted.

In recent years, in drawing on a printed circuit board, reduction of space for arranging alignment marks has been demanded in order to increase the number of pieces that can be extracted from one substrate. Therefore, it is being practiced to use a part of a pattern on a substrate as an alignment mark without forming a mark exclusively for alignment on the substrate.

For example, in the exposure apparatus of Unexamined-Japanese-Patent No. 2013-171988 (Document 1), in an image obtained by imaging a pattern on a substrate, a part of the pattern is a reference mark model used for alignment processing (i.e., a template ) and registered in advance. Then, when the substrate to be exposed is carried into the exposure apparatus, a part of the pattern on the substrate is imaged, pattern matching between the obtained image and the reference mark model is performed, and alignment processing of the substrate is performed.

By the way, in the exposure apparatus of Document 1, in order to obtain a template for pattern matching, it is necessary to install a substrate at a predetermined position in the exposure apparatus, image a pattern on the substrate, and extract a partial pattern serving as a template from the obtained image. For this reason, the amount of work required to generate the template increases, and the work time also increases.

The present invention is aimed at a drawing device that draws a pattern by irradiating light onto a substrate, and aims at easily and rapidly generating a template.

A drawing device according to one preferred aspect of the present invention includes a stage holding a substrate having a first pattern pre-formed on an upper surface thereof, a drawing head for irradiating modulated light onto the upper surface of the substrate, and a scanning mechanism for moving the stage relative to the drawing head in a scanning direction parallel to the image plane; an imaging unit for imaging part of the first pattern; and a template for a captured image acquired by the imaging unit. A position detection unit that detects the position of the substrate by performing pattern matching using , a storage unit that stores second CAD data that is CAD data of a second pattern drawn on the first pattern, and the second CAD data A data generating unit that rasterizes to generate second raster data, and controls the drawing head and the scanning mechanism based on the second raster data and the position of the substrate detected by the position detection unit, so that the drawing head and a drawing controller for executing drawing of the second pattern on the substrate moving relative to the scanning direction. The storage unit further stores coordinates indicating a matching position on the first pattern at which pattern matching by the position detection unit is performed. The data generating unit creates intermediate data by rasterizing the CAD data of the first pattern, and generates image data of a region of a predetermined size corresponding to the matching position from the intermediate data as the template.

According to the drawing device, the creation of the template can be performed easily and quickly.

Preferably, on the upper surface of the substrate, a plurality of partial writing areas are provided that are arranged in a matrix in the scanning direction and in a width direction perpendicular to the scanning direction, and in which the same pattern is respectively drawn. In two or more partial rendering areas in which the matching position is set among the plurality of partial rendering areas, the relative position of the matching position in each partial rendering area of the two or more partial rendering areas with respect to the respective partial rendering areas. is the same The data generating unit generates the template corresponding to the matching position of one partial drawing area among the two or more partial drawing areas. The template is shared for pattern matching in the matching position of each of the two or more partial drawing areas by the position detection unit.

Preferably, on the upper surface of the substrate, a plurality of partial drawing areas arranged in a matrix in the scanning direction and in a width direction perpendicular to the scanning direction are set. Among the plurality of partial drawing areas, in a partial drawing area on the one side most in the scanning direction and on the one side in the width direction, the matching position is a corner on the one side in the scanning direction and on the one side in the width direction. placed adjacent to the Among the plurality of partial drawing areas, in a partial drawing area at the farthest side in the scanning direction and at the farthest other side in the width direction, the matching position is at the one side in the scanning direction and the other side in the width direction. It is placed adjacent to the corner portion. Among the plurality of partial drawing areas, in a partial drawing area on the farthest side in the scanning direction and on the farthest one side in the width direction, the matching position is at the other side in the scanning direction and on the one side in the width direction. It is placed adjacent to the corner portion. Among the plurality of partial drawing areas, in a partial drawing area furthest on the other side in the scanning direction and furthest on the other side in the width direction, the matching position is on the other side in the scanning direction and on the other side in the width direction. It is disposed adjacent to the corner portion of.

Preferably, in the data generation unit, only partial data that is CAD data corresponding to a predetermined area including the matching position among the first patterns is rasterized to create the intermediate data.

Preferably, on the upper surface of the substrate, a plurality of partial drawing areas arranged in a matrix in the scanning direction and in a width direction perpendicular to the scanning direction are set. The partial data corresponds to a set of partial rendering areas including the matching position.

The present invention also targets a drawing method in which a substrate is irradiated with light to draw a pattern. A drawing method related to one preferred aspect of the present invention includes: a) a step of holding a substrate on which a first pattern is pre-formed on an upper surface; b) a step of generating a template used for detecting the position of the substrate; c) a step of imaging a part of the first pattern; d) a step of detecting the position of the substrate by performing pattern matching using the template on the captured image acquired in the step c); e) a step of generating second raster data by rasterizing second CAD data, which is CAD data of a second pattern drawn on a first pattern; f) the second raster data and the substrate detected in step d) By controlling, based on the position, a drawing head that irradiates the top surface of the substrate with modulated light and a scanning mechanism that moves the substrate relative to the writing head in a scanning direction parallel to the top surface of the substrate, and a step of drawing the second pattern on the substrate moving relative to the drawing head in the scanning direction. Step b) includes b1) preparing coordinates indicating a matching position where the pattern matching is performed on the first pattern; b2) rasterizing the CAD data of the first pattern to create intermediate data; , a step of generating, as the template, image data of an area of a predetermined size corresponding to the matching position from the intermediate data.

The present invention also targets a program recorded in a storage medium that is executed in a drawing device that draws a pattern by irradiating a substrate with light. The drawing device includes a stage holding a substrate on which a first pattern is previously formed on an upper surface, a drawing head for irradiating modulated light onto the upper surface of the substrate, and a scanning direction parallel to the upper surface of the substrate. , a scanning mechanism for moving the stage relative to the drawing head, an imaging unit for imaging a part of the first pattern, and pattern matching using a template for a captured image acquired by the imaging unit, A position detection unit that detects the position of the substrate, a storage unit that stores second CAD data that is CAD data of a second pattern drawn on the first pattern, and rasterizes the second CAD data to obtain second raster data. relative movement in the scanning direction with respect to the drawing head by controlling the drawing head and the scanning mechanism based on a generating data generating unit and the second raster data and the position of the substrate detected by the position detecting unit; and a drawing controller for executing drawing of the second pattern on the substrate. The storage unit further stores coordinates indicating a matching position on the first pattern at which pattern matching by the position detection unit is performed. As the program is executed by a computer, the data generation unit rasterizes the CAD data of the first pattern to create intermediate data, and from the intermediate data, image data of a region of a predetermined size corresponding to the matching position. is created as the template.

The above-described object and other objects, features, aspects and advantages are clarified by the detailed description of the present invention implemented below with reference to the accompanying drawings.

1 is a perspective view showing a drawing device according to one embodiment.
2 is a plan view showing a substrate.
Fig. 3 is a diagram showing the configuration of a computer included in the control unit.
4 is a block diagram showing functions of a control unit.
Fig. 5A is a diagram showing the flow of drawing a pattern on a substrate.
Fig. 5B is a diagram showing the flow of drawing a pattern on a substrate.
Fig. 6 is a diagram showing a matching position and an extraction area.
Fig. 7 is a diagram showing an example of a template.
8 is a diagram showing an example of arrangement of a plurality of matching positions.
Fig. 9 is a diagram showing another example of arrangement of a plurality of matching positions.
10 is a diagram showing another example of arrangement of a plurality of matching positions.

1 is a perspective view showing a drawing device 1 according to one embodiment of the present invention. The drawing device 1 is a direct drawing device that draws a pattern by irradiating a photosensitive material on a substrate 9 with light in the form of a spatially modulated substantially beam and scanning an irradiated area of the light on the substrate 9 . In Fig. 1, three directions orthogonal to each other are indicated by arrows as X, Y, and Z directions. In the example shown in FIG. 1, the X direction and the Y direction are mutually perpendicular horizontal directions, and the Z direction is a vertical direction. It is the same also in other drawings.

In addition, in FIG. 1, the data processing device 6 connected to the drawing device 1 is also drawn. The data processing device 6 is a device that preprocesses data used for drawing in the drawing device 1 and the like. The data processing device 6 is, for example, a normal computer, but is conceptually depicted as a substantially rectangular parallelepiped in FIG. 1 .

2 is a plan view showing a main surface (hereinafter, also referred to as "upper surface 90") on the (+Z) side of the substrate 9 . The substrate 9 is, for example, a substantially rectangular plate-like member in plan view. The substrate 9 is, for example, a multilayer printed wiring board (hereinafter simply referred to as a "printed board"). In this embodiment, a circuit pattern made of copper (Cu) or the like is formed in advance on the upper surface 90 of the substrate 9, and a resist film made of a photosensitive material is formed on the circuit pattern. Then, in the drawing device 1, a solder pattern is drawn (namely, formed) on the resist film of the substrate 9. The said solder pattern is drawn on the circuit pattern mentioned above according to the said circuit pattern.

In the following description, a pattern (ie, a circuit pattern) previously formed on the upper surface 90 of the substrate 9 is also referred to as a "first pattern", and in the drawing device 1, the upper surface of the substrate 9 ( 90) The pattern to be drawn on (i.e., the solder pattern) is also referred to as a "second pattern". In addition, the type and shape of the substrate 9 may be variously changed. Moreover, the pattern drawn on the board|substrate 9 by the drawing apparatus 1 is not limited to the solder pattern, You may change variously.

On the upper surface 90 of the substrate 9 illustrated in FIG. 2 , a plurality of (for example, four) division regions 92 partitioned by substantially rectangular first division lines 91 are set. . Within each division region 92, a plurality of partial drawing regions 94 each divided into a substantially rectangular shape by grid-shaped division lines 93 are set. The number and arrangement of the plurality of partial drawing areas 94 in each partition area 92 are the same. The same pattern is respectively drawn on the plurality of partial drawing regions 94 . Each partition area 92 and each partial drawing area 94 respectively correspond to a sheet and piece finally obtained from the substrate 9 . In the example shown in FIG. 2 , each partial drawing region 94 has a substantially square shape. A plurality of partial drawing regions 94 are arranged in a matrix in the X direction and the Y direction. In FIG. 2, each partial drawing area 94 is drawn larger than actual, and the number of partial drawing areas 94 is drawn smaller than actual. Alignment marks dedicated to position detection processing (ie, alignment processing) described later are not formed on the substrate 9 .

As shown in FIG. 1 , the drawing device 1 includes a stage 21 , a stage moving mechanism 22 , an imaging unit 3 , a drawing unit 4 , and a control unit 10 . The control unit 10 controls the stage moving mechanism 22, the imaging unit 3, the drawing unit 4, and the like. The stage 21 is a substantially flat substrate holding unit that holds the substrate 9 in a horizontal state from the lower side below the imaging unit 3 and the drawing unit 4 (that is, on the (-Z) side). . The stage 21 is, for example, a vacuum chuck that adsorbs and holds the lower surface of the substrate 9 . The stage 21 may have a structure other than a vacuum chuck. An upper surface 90 of the substrate 9 placed on the stage 21 is substantially perpendicular to the Z direction and substantially parallel to the X and Y directions.

The stage moving mechanism 22 moves the stage 21 relative to the imaging unit 3 and the drawing unit 4 in a horizontal direction (ie, a direction substantially parallel to the upper surface 90 of the substrate 9) It is a moving device that The stage moving mechanism 22 includes a first moving mechanism 23 and a second moving mechanism 24 . The second moving mechanism 24 linearly moves the stage 21 in the X direction along the guide rail. The 1st moving mechanism 23 linearly moves the stage 21 along the guide rail with the 2nd moving mechanism 24 in the Y direction. As for the drive source of the 1st moving mechanism 23 and the 2nd moving mechanism 24, the motor was attached to the linear servomotor or the ball screw, for example. The structure of the 1st moving mechanism 23 and the 2nd moving mechanism 24 may be changed variously.

In the drawing device 1, a stage rotation mechanism that rotates the stage 21 around a rotation axis extending in the Z direction may be provided. In addition, a stage elevating mechanism for moving the stage 21 in the Z direction may be provided in the drawing device 1 . As the stage rotation mechanism, for example, a servo motor can be used. As the stage elevating mechanism, a linear servo motor can be used, for example. The structures of the stage rotation mechanism and the stage elevating mechanism may be variously changed.

The imaging unit 3 includes a plurality of imaging heads 31 (two in the example shown in FIG. 1 ) arranged in the X direction. Each imaging head 31 is supported above the stage 21 and the stage moving mechanism 22 by a head support 30 formed across the stage 21 and the stage moving mechanism 22 . Among the two imaging heads 31, one imaging head 31 is fixed to the head support 30, and the other imaging head 31 is movable in the X direction on the head support 30. In this way, the distance in the X direction between the two imaging heads 31 can be changed. In addition, the number of imaging heads 31 of the imaging unit 3 may be 1 or may be 3 or more.

Each imaging head 31 is a camera provided with an imaging sensor and an optical system not shown. Each imaging head 31 is an area camera that acquires a two-dimensional image, for example. An image sensor includes, for example, elements such as a plurality of CCD (Charge Coupled Devices) arranged in a matrix. In each imaging head 31, reflected light of illumination light guided from a light source (not shown) to the upper surface 90 of the substrate 9 is guided to an imaging sensor via an optical system. The imaging sensor receives reflected light from the upper surface 90 of the substrate 9 and acquires an image of a substantially rectangular imaging area. As the light source, various light sources such as LED (Light Emitting Diode) can be used. In addition, each imaging head 31 may be a camera of another type, such as a line camera.

The drawing unit 4 includes a plurality (five in the example shown in FIG. 1 ) of drawing heads 41 arranged in the X direction and the Y direction. Each drawing head 41 is supported above the stage 21 and the stage moving mechanism 22 by a head support 40 formed across the stage 21 and the stage moving mechanism 22 . The head support unit 40 is disposed on the (+Y) side of the imaging unit 3 relative to the head support unit 30 . In addition, the number of drawing heads 41 of the drawing unit 4 may be one or plural.

Each drawing head 41 includes a light source, an optical system, and a spatial light modulating element not shown. As spatial light modulating elements, various elements such as DMD (Digital Micro Mirror Device) and GLV (Grating Light Valve) (registered trademark of Silicon Light Machines (Sunny Vale, California)) are used. possible. As the light source, various light sources such as LD (Laser Diode) can be used. A plurality of drawing heads 41 have substantially the same structure.

In the drawing device 1, the stage moving mechanism while irradiating modulated (ie, spatial light modulated) light from the plurality of drawing heads 41 of the drawing unit 4 onto the upper surface 90 of the substrate 9 The substrate 9 is moved in the Y direction by (22). Thereby, the irradiation area of the light from the plurality of drawing heads 41 is scanned in the Y direction on the substrate 9, and the pattern on the substrate 9 is drawn. In the following description, the Y direction is also referred to as a "scanning direction", and the X direction is also referred to as a "width direction". The stage moving mechanism 22 is a scanning mechanism that moves the irradiation area of light from each drawing head 41 on the substrate 9 in the scanning direction.

In the drawing device 1, drawing on the substrate 9 is performed in a so-called single-pass (one-pass) method. Specifically, the stage 21 is relatively moved in the Y direction with respect to the plurality of drawing heads 41 by the stage moving mechanism 22, and the irradiation area of the light from the plurality of drawing heads 41 is the substrate ( 9) is scanned only once in the Y direction (i.e., the scanning direction) on the upper surface 90. With this, drawing on the substrate 9 is completed. In addition, in the drawing apparatus 1, the drawing with respect to the board|substrate 9 may be performed by the multi-pass method in which the movement of the stage 21 in the Y direction and the step movement in the X direction are repeated. In the case where multi-pass writing is performed in the drawing device 1, the Y direction is the main scanning direction and the X direction is the sub scanning direction. In addition, the first moving mechanism 23 of the stage moving mechanism 22 is a main scanning mechanism that moves the stage 21 in the main scanning direction, and the second moving mechanism 24 moves the stage 21 in the sub scanning direction. It is a sub-injection mechanism that moves.

3 is a diagram showing the configuration of the computer 100 included in the control unit 10. As shown in FIG. The computer 100 is a conventional computer including a processor 101, a memory 102, an input/output unit 103, and a bus 104. The bus 104 is a signal circuit that connects the processor 101, the memory 102, and the input/output unit 103. The memory 102 stores various types of information. The memory 102 reads out and stores the program 109 previously stored in the storage medium 81, which is a program product, for example. The storage medium 81 is, for example, a USB memory or a CD-ROM.

The processor 101 executes various processes (e.g., numerical calculations and image processing) while using the memory 102 or the like according to the program 109 or the like stored in the memory 102. The input/output unit 103 includes a keyboard 105 and a mouse 106 that receive input from an operator, and a display 107 that displays output from the processor 101 and the like. In addition, the control unit 10 may be a programmable logic controller (PLC: Programmable Logic Controller), a circuit board, or the like, or may be a combination of these and one or more computers.

4 is a block diagram showing functions of the control unit 10 realized by executing the program 109 by the computer 100. As shown in FIG. In FIG. 4, configurations other than the control unit 10 are also shown. The control unit 10 includes a storage unit 111, an imaging control unit 112, a position detection unit 113, a drawing control unit 114, and a data generation unit 115.

The storage unit 111 is mainly realized by the memory 102 and stores various types of information related to pattern drawing in the drawing device 1 in advance. The information stored in the storage unit 111 includes information sent from the data processing device 6 to the drawing device 1, for example. From the data processing device 6, for example, CAD data of a second pattern scheduled to be drawn on the substrate 9 (hereinafter, also referred to as "second CAD data") and a template to be described later are generated. Information such as template generation information is sent to the drawing device 1.

The imaging control unit 112, the position detection unit 113, the drawing control unit 114, and the data generation unit 115 are mainly realized by the processor 101. The imaging control unit 112 causes the imaging unit 3 to image a part of the upper surface 90 (see FIG. 2) of the substrate 9 by controlling the imaging unit 3 and the stage moving mechanism 22, An image of a part of one pattern (hereinafter also referred to as a "captured image") is acquired. The captured image is sent to and stored in the storage unit 111 . The data generation unit 115 rasterizes the second CAD data stored in the storage unit 111 to generate raster data used for drawing the second pattern in the drawing device 1 (hereinafter referred to as “second CAD data”). Also called “raster data”). The second raster data is run length data, for example. Also, the data generating unit 115 generates a template (ie, a reference image) used for detecting the position of the substrate 9 .

The position detection unit 113 performs pattern matching using the template for the captured image of the first pattern described above, thereby determining the position of the substrate 9 on the stage 21 (see Fig. 1) (that is, The relative position of the substrate 9 with respect to the drawing unit 4) is detected. The drawing control unit 114 controls the drawing unit 4 and the stage moving mechanism 22 based on the above-described second raster data and the position of the substrate 9 detected by the position detection unit 113, etc. , while adjusting the drawing position on the substrate 9, the drawing unit 4 is made to draw the second pattern on the substrate 9.

Next, the flow of pattern drawing with respect to the board|substrate 9 by the drawing apparatus 1 is demonstrated, referring FIG. 5A and FIG. 5B. In drawing on the substrate 9, first, the substrate 9 is carried into the drawing apparatus 1 shown in Fig. 1 and held by the stage 21 (step S11). The stage 21 is located on the (-Y) side of the imaging unit 3 and the drawing unit 4 . A first pattern is formed in advance on the upper surface 90 of the substrate 9 held on the stage 21 . The upper surface 90 of the substrate 9 is substantially parallel to the X and Y directions.

Subsequently, the template used for the pattern matching is generated by the data generation unit 115 (see Fig. 4) of the control unit 10 (step S12). In step S12, first, the second CAD data and template generation information are sent from the data processing device 6 to the drawing device 1, and are stored in the storage unit 111. In this way, in the drawing device 1, the second CAD data and template generation information are prepared (step S121). In the template generation information, coordinates indicating first CAD data, which is CAD data of the first pattern, and a position on the first pattern at which pattern matching is performed by the position detection unit 113 (hereinafter, also referred to as "matching position") is included In addition, the template generation information includes template size information indicating the size of the template used for the pattern matching.

In the control unit 10, the template generation information stored in the storage unit 111 is read out by the data generation unit 115. The data generation unit 115 rasterizes the first CAD data included in the template generation information to generate first raster data (hereinafter also referred to as "intermediate data"). The first raster data is run length data, for example.

In addition, the data generation unit 115 generates a predetermined size (i.e., template size information) corresponding to the matching position from the first raster data based on the template size information and the coordinates indicating the matching position included in the template generation information. The size indicated by ) is extracted. As shown in Fig. 6, the region (hereinafter also referred to as "extraction region 96") extracted from the first raster data has a width of 2 mm centered on a matching position 95 indicated by a cross, for example. is an approximately square-shaped area of In FIG. 6 , of the plurality of partial drawing areas 94 of the substrate 9 on which the first pattern is drawn, the partial drawing area 94 of the upper left corner (that is, the vertex on the (−X) side and the (+Y) side) The area near the apex at the top left of is enlarged and drawn. Note that the extraction area 96 does not necessarily have to be extracted centering on the matching position 95, and may be, for example, a substantially square area with the matching position 95 as the upper left vertex. In addition, the shape and size of the extraction area 96 may be variously changed.

The data generation unit 115 generates a template by converting the data of the extraction area 96 extracted from the first raster data into image data in a format usable for pattern matching (step S122). FIG. 7 is a diagram showing an example of a template 97 generated by the data generating unit 115. As shown in FIG. As described above, the template 97 includes a part of the first pattern. In addition, the shape of the pattern included in the template 97 is not limited to that shown in FIG. 7, and may be variously changed. In this embodiment, the template is bitmap data. In addition, the data format of the template may be other than the bitmap format.

The template generation information usually includes coordinates of a plurality of (eg, four or more) matching positions 95 . The plurality of matching positions 95 are set in advance by a designer in the data processing device 6 and are included in the template generation information. In step S12 described above, a plurality of templates 97 respectively corresponding to the plurality of matching positions 95 are generated by the data generation unit 115 and stored in the storage unit 111.

8 is a diagram showing an example of arrangement of a plurality of matching positions 95 on the substrate 9 . Below, paying attention to one partitioned area 92 in FIG. 8, the arrangement|positioning of the matching position 95 with respect to several partial drawing areas 94 in the said divided area 92 is demonstrated. In addition, the arrangement of the matching positions 95 in the plurality of partition areas 92 is the same. The same applies to the description of FIGS. 9 and 10 to be described later. In the example shown in FIG. 8 , four matching positions 95 are located at four corners among a plurality of partial drawing areas 94 arranged in a matrix in the partition area 92 ( 94), respectively. In addition, in each partial drawing area 94 where the matching position 95 is arranged, the matching position 95 is furthest from the center of the divided area 92 among the four corners of the partial drawing area 94. It is arranged near one corner part.

Specifically, the partial drawing area 94 located at the corner on the (-X) side and (+Y) side of the partition area 92 (that is, the portion on the most one side in the width direction and the most one side in the scanning direction) In the drawing area 94 , the matching position 95 is disposed adjacent to the corner portion on the (-X) side and the (+Y) side of the partial drawing area 94 . In addition, the extraction area 96 corresponding to the matching position 95 is also disposed adjacent to the corner portion of the partial drawing area 94 . The extraction area 96 is entirely located within the partial drawing area 94 (ie, on the outer periphery of the partial drawing area 94 and inside the outer periphery). Preferably, the corner portion on the (−X) side and (+Y) side of the extraction area 96 overlaps the corner portion on the (−X) side and (+Y) side of the partial drawing area 94, and the extraction area ( 96), the edge on the (-X) side and the edge on the (+Y) side overlap the edge on the (-X) side and the edge on the (+Y) side of the partial rendering area 94.

In addition, the extraction area 96 may be spaced inward from the outer periphery of the partial drawing area 94 . In this case, the distance between the side of the extraction area 96 on the (-X) side and the side of the partial drawing area 94 on the (-X) side is, for example, 2 mm or less (that is, of the extraction area 96 100% or less of the length of one side), preferably 1 mm or less (ie, 50% or less of the length of one side of the extraction region 96). The same applies to the distance between the side of the extraction area 96 on the (+Y) side and the side of the partial rendering area 94 on the (+Y) side.

In the partial drawing area 94 located at the corner on the (+X) side and (+Y) side (that is, the partial drawing area 94 on the farthest side in the width direction and on the most one side in the scanning direction), the matching position ( 95) and the extraction area 96 are disposed adjacent to corner portions on the (+X) side and (+Y) side of the partial drawing area 94. The extraction area 96 is entirely located within the partial drawing area 94 . Preferably, the corner portions on the (+X) side and (+Y) side of the extraction area 96 overlap with the corner portions on the (+X) side and (+Y) side of the partial drawing area 94, and the extraction area 96 The edge on the (+X) side and the edge on the (+Y) side of each overlap the edge on the (+X) side and the edge on the (+Y) side of the partial rendering area 94 , respectively. In addition, the extraction area|region 96 may be spaced inward from the outer periphery of the partial drawing area|region 94 similarly to the above. In this case, with respect to the distance between the extraction area 96 and the partial rendering area 94, the extraction area 96 disposed in the partial rendering area 94 on the most (−X) side and the most (+Y) side described above ) is approximately equal to

In the partial drawing area 94 located at the corner on the (+X) side and (-Y) side (that is, the partial drawing area 94 on the farthest side in the width direction and on the farthest other side in the scanning direction), the matching position (95) and the extraction area|region 96 are arrange|positioned adjacent to the corner part of the (+X) side and (-Y) side of the partial drawing area|region 94. The extraction area 96 is entirely located within the partial drawing area 94 . Preferably, the corner portion on the (+X) side and (−Y) side of the extraction area 96 overlaps the corner portion on the (+X) side and (−Y) side of the partial drawing area 94, and the extraction area ( The (+X) side and (-Y) side of 96) overlap the (+X) side and (-Y) side of the partial drawing area 94, respectively. In addition, the extraction area|region 96 may be spaced inward from the outer periphery of the partial drawing area|region 94 similarly to the above. In this case, with respect to the distance between the extraction area 96 and the partial rendering area 94, the extraction area 96 disposed in the partial rendering area 94 on the most (−X) side and the most (+Y) side described above ) is approximately equal to

In the partial drawing area 94 located at the corner on the (-X) side and the (-Y) side (that is, the partial drawing area 94 on the farthest one side in the width direction and the farthest other side in the scanning direction), matching Position 95 and extraction area 96 are disposed adjacent to corner portions on the (-X) side and (-Y) side of partial drawing area 94 . The extraction area 96 is entirely located within the partial drawing area 94 . Preferably, the corner portion on the (-X) side and (-Y) side of the extraction area 96 overlaps the corner portion on the (-X) side and (-Y) side of the partial drawing area 94, and extraction The (-X) side and (-Y) side sides of the region 96 overlap the (-X) side and (-Y) side sides of the partial drawing area 94 , respectively. In addition, the extraction area|region 96 may be spaced inward from the outer periphery of the partial drawing area|region 94 similarly to the above. In this case, with respect to the distance between the extraction area 96 and the partial rendering area 94, the extraction area 96 arranged in the partial rendering area 94 on the most (−X) side and the most (+Y) side described above ) is approximately equal to

In step S12, when a plurality of templates 97 respectively corresponding to a plurality of matching positions 95 are generated, the substrate 9 is moved together with the stage 21 by the stage moving mechanism 22 shown in FIG. It moves in the (+Y) direction and moves downward of the imaging unit 3. Incidentally, step S12 may be performed prior to carrying in and holding of the substrate 9 in step S11, or may be performed in parallel with step S11.

Subsequently, by controlling the imaging unit 3 and the stage moving mechanism 22 by the imaging control unit 112 (see Fig. 4), a predetermined size corresponding to each matching position 95 on the substrate 9 is obtained. The imaging area of is imaged, and a captured image including a part of the first pattern is obtained (step S13). The imaging area is a substantially rectangular area centered on the matching position 95 when the substrate 9 is accurately held at the designed position on the stage 21 . The imaging area has a pair of sides parallel to the X and Y directions, respectively, and is larger than the extraction area 96 described above in both the X and Y directions.

For example, the imaging area has a substantially rectangular shape obtained by enlarging the extraction area 96 by a predetermined size on each of the (+X) side, (-X) side, (+Y) side, and (-Y) side. . For example, the respective lengths of the X and Y directions of the imaging area (ie, the respective lengths of the X and Y directions of the imaging visual field of the imaging head 31) are 14 mm and 7 mm. Therefore, even if the position of the substrate 9 on the stage 21 is slightly shifted from the design position, the pattern corresponding to the template 97 is included in the captured image. In step S13, a plurality of captured images respectively corresponding to the plurality of matching positions 95 are obtained and stored in the storage unit 111. In addition, step S13 may be performed before step S12, or may be performed in parallel with step S12. In addition, the size of the imaging area may be variously changed.

Next, the position detection unit 113 of the control unit 10 performs pattern matching on the captured image corresponding to each matching position 95 using the template 97 corresponding to the matching position 95 . The pattern matching is performed by a known pattern matching method (for example, geometric pattern matching, normalized correlation search, etc.). Then, on the stage 21 based on the position of the same pattern as the template 97 in each captured image and the relative position of the substrate 9 and the imaging unit 3 at the time of acquiring each captured image, etc. The position of the substrate 9 is detected by the position detection unit 113 (see Fig. 4) (step S14).

The position of the substrate 9 detected by the position detection unit 113 in step S14 is the coordinates of the substrate 9 on the stage 21 in the X and Y directions, and the direction of the substrate 9 , and information indicating deformation due to warping or the like of the substrate 9. Further, the information indicating the deformation of the substrate 9 is information such as the shape of the deformed substrate 9 and the positions of a plurality of partial drawing regions 94 on the substrate 9 .

In the control unit 10, the second CAD data is read out from the storage unit 111 by the data generation unit 115 (see Fig. 4), rasterization of the second CAD data is performed, and the second raster data is generated. is generated (step S15). The second raster data is run length data, for example. Step S15 may be performed later than step S14, may be performed in parallel with step S14, or may be performed before step S14. When step S15 is performed before step S14, for example, step S15 may be performed in parallel with any of steps S11 to S13, or may be performed between any two steps of steps S11 to S14, and step S11 It may be carried out earlier.

When the second raster data is generated, based on the second raster data and the position of the substrate 9 detected in step S14, the drawing unit 4 and the stage moving mechanism 22 move the drawing control unit 114 (see Fig. 4). ) is controlled by Thereby, the above-described modulated light is radiated to the substrate 9 that is relatively moved in the Y direction with respect to the drawing head 41 of the drawing unit 4, and the light is projected onto the upper surface 90 of the substrate 9. Two patterns are drawn (step S16). In step S16, based on the position of the substrate 9 detected in step S14, the modulation interval and modulation timing of the light beam irradiated from the drawing unit 4 to the substrate 9, and on the substrate 9 The scanning position and the like of the light beam in the drawing unit 4 and the stage moving mechanism 22 are mechanically and automatically corrected by a known correction method. This makes it possible to draw the second pattern on the first pattern with good positional accuracy.

In the above description, in step S12, the first raster data obtained by rasterizing all of the first CAD data (ie, the entire first pattern) is used as intermediate data, and the matching position (95 ) to generate the template 97 by extracting the extraction area 96, but it is not limited to this. For example, in step S12, only the partial data that is a part of the first CAD data may be rasterized by the data generating unit 115 to create the intermediate data. In this case, the partial data is CAD data corresponding to an area of a predetermined size including each matching position 95 in the first pattern (hereinafter also referred to as a "clipping area"). As described above, when a plurality of matching positions 95 are set, the partial data is CAD data corresponding to a set of a plurality of clipping regions corresponding to the plurality of matching positions 95, respectively. The positions and sizes of the plurality of clipping areas are preset by a designer in the data processing device 6 and included in the template generation information.

Each clipping area includes one matching position 95 as described above, and includes the entire extraction area 96 corresponding to the matching position 95. The clipping area is, for example, a substantially rectangular area having a pair of sides parallel to the X and Y directions, and having a size equal to or larger than the extraction area 96 in both the X and Y directions. The clipping area is, for example, a predetermined size (for example, an assumed substrate ( 9) has a shape enlarged by the maximum amount of positional displacement in the X and Y directions). Alternatively, the clipping area may be the same area as one partial drawing area 94 including the matching position 95 included in the clipping area. In this case, the partial data corresponds to a plurality of partial drawing areas 94 each including a plurality of matching positions 95 (ie, a set of partial drawing areas 94 including matching positions 95). CAD data. In this way, by rasterizing only a part of the first CAD data in the data generation unit 115, the time required for rasterization can be shortened.

As described above, the drawing device 1 is a device that irradiates the substrate 9 with light to draw a pattern. The drawing device 1 includes a stage 21, a drawing head 41, a scanning mechanism (in the above example, the stage moving mechanism 22), an imaging unit 3, a position detection unit 113, A storage unit 111, a data generation unit 115, and a drawing control unit 114 are provided. The stage 21 holds the substrate 9 on which the first pattern has been previously formed on the upper surface 90 . The drawing head 41 irradiates the upper surface 90 of the substrate 9 with modulated light. The scanning mechanism moves the stage 21 relative to the drawing head 41 in a scanning direction (Y direction in the above example) parallel to the upper surface 90 of the substrate 9 . The imaging unit 3 images a part of the first pattern.

The position detection unit 113 detects the position of the substrate 9 by performing pattern matching using the template 97 on the captured image acquired by the imaging unit 3 . The storage unit 111 stores second CAD data, which is CAD data of a second pattern drawn on the first pattern. The data generation unit 115 rasterizes the second CAD data to generate second raster data. The drawing control unit 114 scans the drawing head 41 by controlling the drawing head 41 and the scanning mechanism based on the second raster data and the position of the substrate 9 detected by the position detection unit 113. Drawing of the second pattern for the substrate 9 relatively moving in the direction is executed.

The storage unit 111 further stores coordinates indicating a matching position 95 at which pattern matching by the position detection unit 113 is performed on the first pattern. The data generation unit 115 rasterizes the CAD data of the first pattern to create intermediate data, and from the intermediate data, an area of a predetermined size corresponding to the matching position 95 (i.e., an extraction area 96) ) is generated as a template (97).

In this way, in the drawing device 1, when generating the template 97 used in pattern matching at the time of detecting the position of the substrate 9, the first pattern on the substrate 9 is not imaged, and the first pattern A template 97 can be created from CAD data of . Therefore, when creating the template 97, it is not necessary to accurately place the substrate 9 at the designed position on the stage 21 or to image the first pattern on the substrate 9 with the imaging unit 3. . For this reason, the creation of the template 97 can be performed easily and quickly.

As described above, in the data generation unit 115, only partial data that is CAD data corresponding to a predetermined area (ie, clipping area) including the matching position 95 of the first pattern is rasterized, It is desirable that the data be written. In this way, compared to the case of rasterizing all of the first CAD data, the time required for rasterization can be shortened, and the time required for generating the template 97 can be shortened.

As described above, on the upper surface 90 of the substrate 9, a plurality of partial drawing regions arranged in a matrix in the scanning direction and the width direction perpendicular to the scanning direction (Y direction and X direction in the above example) (94) may be set. In this case, the partial data preferably corresponds to a set of partial drawing areas 94 including matching positions 95 . In this way, setting of the clipping area by the designer can be facilitated, and the time required for creation of template generation information in the data processing device 6 can be shortened.

As shown in FIG. 8 , when a plurality of divided regions 92 are set on the upper surface 90 of the substrate 9, the arrangement of matching positions 95 in each divided region 92 may be the same. . In this case, the data generation unit 115 extracts four extraction areas 96 respectively corresponding to the four matching positions 95 in one partition area 92 to generate four templates 97. do. Then, pattern matching at the four matching positions 95 of each partitioned area 92 by the position detection unit 113 without creating templates corresponding to the matching positions 95 of the other partitioned areas 92. , the four templates 97 are shared. In this way, the time required to generate the template 97 can be shortened.

As shown in FIG. 8 , a plurality of partial drawing regions 94 arranged in a matrix on the upper surface 90 of the substrate 9 in the scanning direction and in the width direction perpendicular to the scanning direction (in the example described above, When a plurality of partial drawing areas 94 arranged in one divided area 92 are set, the most one side in the scanning direction and the most one side in the width direction among the plurality of partial drawing areas 94 (above) In the example, in the partial drawing area 94 on the furthest (+Y) side and furthest (−X) side), the matching position 95 is on one side in the scanning direction and one side in the width direction (in the above example, It is preferable to arrange|position adjacent to the corner part of (+Y) side and (-X) side). Further, among the plurality of partial drawing areas 94, the partial drawing area 94 on the onemost side in the scanning direction and the most other side in the width direction (in the above example, the most (+Y) side and the most (+X) side) , the matching position 95 is preferably disposed adjacent to a corner portion on one side in the scanning direction and the other side in the width direction ((+Y) side and (+X) side in the above example). In addition, among the plurality of partial drawing areas 94, the partial drawing area 94 on the othermost side in the scanning direction and the othermost side in the width direction (in the above example, the most (−Y) side and the most (+X) side) ), the matching position 95 is preferably disposed adjacent to the corner portion on the other side in the scanning direction and the other side in the width direction ((−Y) side and (+X) side in the above example). . Then, among the plurality of partial drawing areas 94, the partial drawing area on the othermost side in the scanning direction and on the most one side in the width direction (the most (-Y) side and the most (-X) side in the above example) In (94), the matching position 95 is disposed adjacent to the corner portion on the other side in the scanning direction and on the one side in the width direction (in the above example, the (-Y) side and the (-X) side) it is desirable

In this way, the plurality of partial drawing regions 94 arranged in a matrix on the substrate 9 (in the example described above, the plurality of partial drawing regions 94 arranged in one partitioned region 92) are circumscribed. By arranging the four matching positions 95 at the four corners of the minimum rectangle, substantially the entirety of the area where the second pattern is drawn can be surrounded by the four matching positions 95 . As a result, it is possible to align substantially the entire area in which the second pattern is drawn with good precision, and the drawing precision of the second pattern can be improved.

The number and arrangement of the matching positions 95 on the substrate 9 are not limited to those shown in FIG. 8 and may be variously changed. For example, among a plurality of partial drawing areas 94 arranged in each divided area 92, matching positions 95 are also provided in partial drawing areas 94 other than the partial drawing areas 94 located at four corners. may be placed. For example, as shown in FIG. 9 , a matching position 95 may be arranged in each partial drawing area 94 of a plurality of partial drawing areas 94 arranged in a matrix in each partitioned area 92. . In the example shown in FIG. 9 , in each partial drawing area 94 located on the most (-Y) side in a plurality of partial drawing areas 94 in each partitioned area 92, the matching position 95 is (-Y ) side, and in each partial drawing area 94 located at the most (+Y) side, the matching position 95 is arranged adjacent to the (+Y) side side. In addition, in each partial drawing area 94 located at the most (-X) side in the plurality of partial drawing areas 94, the matching position 95 is arranged adjacent to the side on the (-X) side, and is the most In each partial drawing area 94 located on the (+X) side, the matching position 95 is arranged adjacent to the side on the (+X) side. In this way, since substantially the entirety of the region where the second pattern is drawn can be surrounded by a large number of matching positions 95, it is possible to align substantially the entirety of the region where the second pattern is drawn with better precision.

In the example shown in FIG. 9 , it is preferable that the plurality of matching positions 95 respectively arranged in the plurality of partial drawing regions 94 arranged in the Y direction are located at the same position in the X direction. In this way, at the time of acquisition of the captured image at each matching position 95 in step S13, the board 9 is not moved relative to the imaging unit 3 in the X direction, but to the plurality of matching positions 95 imaging can be performed. As a result, the time required for acquisition of the captured image in step S13 can be shortened, and the time required for the alignment process can be shortened.

Alternatively, as shown in FIG. 10 , in the partial drawing areas 94 located at four corners among a plurality of partial drawing areas 94 arranged in a matrix in each partitioned area 92, each partial drawing area The relative position of the matching position 95 in (94) with respect to each partial drawing area 94 (for example, the corner on the (-X) side and (+Y) side of the partial drawing area 94 as the origin) relative coordinates) may be the same. In the example shown in FIG. 10 , in each of the four partial drawing areas 94, the matching position 95 is adjacent to the corner portion on the (-X) side and (+Y) side of the partial drawing area 94. are placed by In this case, the data generating unit 115 does not create four templates 97 by extracting four extraction areas 96 respectively corresponding to the four matching positions 95, but parts located at four corners. One template 97 corresponding to the matching position 95 of one partial drawing area 94 of the drawing areas 94 is generated. And the said one template 97 is shared for pattern matching in each matching position 95 of the said 4 partial drawing area|region 94 by the position detection part 113. In this way, the time required to generate the template 97 can be shortened.

In addition, in the example shown in FIG. 10 , in the partial drawing areas 94 located at four corners among the plurality of partial drawing areas 94 in each partitioned area 92, within each partial drawing area 94 Although the case where the matching positions 95 are arranged at the same position has been described, in two or more partial drawing areas 94 regardless of their positions in the plurality of partial drawing areas 94, each partial drawing area 94 ), substantially the same effect is exhibited even when the matching position 95 is arranged at the same position in .

That is, in two or more partial drawing areas 94 among the plurality of partial drawing areas 94, the relative position of the matching position 95 in each partial drawing area 94 with respect to each partial drawing area 94 is the same, the data generation unit 115 generates one template 97 corresponding to the matching position 95 of one partial drawing area 94 among the two or more partial drawing areas 94; It is preferable that the said one template 97 be shared for pattern matching in each matching position 95 of the said two or more partial drawing area 94 by the position detection part 113. In this way, the time required to generate the template 97 can be shortened.

As described above, the drawing method of drawing a pattern by irradiating the substrate with light includes the step of holding the substrate 9 on which the first pattern is previously formed on the upper surface 90 (step S11); A step of generating a template 97 used for detecting the position of the substrate 9 (step S12), a step of imaging a part of the first pattern (step S13), and a template for the captured image acquired in step S13 The step of detecting the position of the substrate 9 by performing pattern matching using (97) (step S14), and rasterizing the second CAD data, which is the CAD data of the second pattern drawn on the first pattern, to obtain the second A process of generating raster data (step S15), and a drawing head that irradiates modulated light to the upper surface 90 of the substrate 9 based on the second raster data and the position of the substrate 9 detected in step S14 41 and a scanning mechanism for moving the substrate 9 relative to the drawing head 41 in a scanning direction (Y direction in the above example) parallel to the upper surface 90 of the substrate 9 (in the above example, , the process of executing drawing of the 2nd pattern with respect to the board|substrate 9 which moves relative to the drawing head 41 in the scanning direction by controlling the stage moving mechanism 22 (step S16).

Step S12 includes a step of preparing coordinates indicating a matching position 95 where pattern matching is performed on the first pattern (step S121), rasterizing the CAD data of the first pattern to create intermediate data, and A process of generating image data of a predetermined size area corresponding to the matching position 95 as a template 97 from the intermediate data (step S122) is provided. This makes it possible to easily and rapidly generate the template 97, similar to the above.

In the example described above, the program 109 related to the generation of the template 97 is stored in advance in the computer 100 of the drawing device 1, but it is not limited thereto. For example, the program 109 may be later introduced into the drawing device 1 already in use (ie, retrofit). In this case, when the program 109 is executed by the computer 100, the data generation unit 115 rasterizes the CAD data of the first pattern to create intermediate data, and from the intermediate data, the matching position ( 95) is generated as a template 97 (i.e., the extraction area 96) of a predetermined size. This makes it possible to easily and rapidly generate the template 97, similar to the above.

The above-described drawing device 1, drawing method, and program 109 can be modified in various ways.

For example, in the above-described example, the drawing on one main surface of the substrate 9 has been described, but in the drawing device 1, the drawing of a pattern may be performed on both main surfaces of the substrate 9. . In this case, also at the time of drawing on the other main surface of the substrate 9, a template used for pattern matching is generated from CAD data of a pattern previously formed on the other main surface, similarly to the above.

In the substrate 9 described above, the plurality of partition regions 92 need not necessarily be set. That is, only one partition area 92 may be set on the substrate 9 . In this case, the first division line 91 may be omitted. In addition, in the partition area 92, the some partial drawing area 94 need not necessarily be set. In addition, the board|substrate 9 is not necessarily limited to a printed board. In the drawing device 1, for example, drawing on a semiconductor substrate, a glass substrate for a flat panel display device such as a liquid crystal display device or an organic EL display device, a glass substrate for a photomask, a substrate for a solar cell panel, etc. may be carried out.

Configurations in the above embodiment and each modified example may be appropriately combined as long as they do not contradict each other.

Although the invention was described and demonstrated in detail, the description given is illustrative and not limited. Therefore, it can be said that many modifications and aspects are possible as long as they do not deviate from the scope of the present invention.

1: drawing device
3: imaging unit
9: Substrate
21 : Stage
22: stage movement mechanism
41: drawing head
90: upper surface (of substrate)
94: partial drawing area
95: matching position
96: extraction area
97: template
109: program
111: storage unit
113: position detection unit
114: drawing control unit
115: data generating unit
S11 to S16, S121 to S122: Step

Claims (7)

As a drawing device for drawing a pattern by irradiating light to a substrate,
a stage holding a substrate on which a first pattern is pre-formed on an upper surface thereof;
a drawing head for irradiating modulated light onto the upper surface of the substrate;
a scanning mechanism for moving the stage relative to the writing head in a scanning direction parallel to the upper surface of the substrate;
an imaging unit that captures a part of the first pattern;
a position detection unit for detecting a position of the substrate by performing pattern matching using a template on the captured image acquired by the imaging unit;
a storage unit for storing second CAD data which is CAD data of a second pattern drawn on the first pattern;
a data generating unit generating second raster data by rasterizing the second CAD data;
By controlling the drawing head and the scanning mechanism based on the second raster data and the position of the substrate detected by the position detecting section, the drawing head relative to the substrate moved in the scanning direction relative to the drawing head A drawing control unit that executes drawing of a pattern;
The storage unit further stores coordinates indicating a matching position on the first pattern at which pattern matching by the position detection unit is performed;
The data generation unit rasterizes the CAD data of the first pattern to create intermediate data, and generates image data of a region of a predetermined size corresponding to the matching position from the intermediate data as the template. . According to claim 1,
On the upper surface of the substrate, a plurality of partial drawing areas arranged in a matrix in the scanning direction and in a width direction perpendicular to the scanning direction and in which the same pattern is drawn, respectively, are set;
In two or more partial rendering areas in which the matching position is set among the plurality of partial rendering areas, the relative position of the matching position in each partial rendering area of the two or more partial rendering areas with respect to the respective partial rendering areas. is the same,
The data generator generates the template corresponding to the matching position of one partial drawing area among the two or more partial drawing areas;
The drawing device wherein the template is shared for pattern matching at the matching position of each of the two or more partial drawing areas by the position detection unit. According to claim 1,
On the upper surface of the substrate, a plurality of partial drawing areas arranged in a matrix in the scanning direction and in a width direction perpendicular to the scanning direction are set;
Among the plurality of partial drawing areas, in a partial drawing area on the one side most in the scanning direction and on the one side in the width direction, the matching position is a corner on the one side in the scanning direction and on the one side in the width direction. placed adjacent to the
Among the plurality of partial drawing areas, in a partial drawing area at the farthest side in the scanning direction and at the farthest other side in the width direction, the matching position is at the one side in the scanning direction and the other side in the width direction. disposed adjacent to the corner portion;
Among the plurality of partial drawing areas, in a partial drawing area on the farthest side in the scanning direction and on the farthest one side in the width direction, the matching position is at the other side in the scanning direction and on the one side in the width direction. disposed adjacent to the corner portion;
Among the plurality of partial drawing areas, in a partial drawing area furthest on the other side in the scanning direction and furthest on the other side in the width direction, the matching position is on the other side in the scanning direction and on the other side in the width direction. Arranged adjacent to the corner portion of the, writing device. According to any one of claims 1 to 3,
and in the data generating unit, only partial data that is CAD data corresponding to a predetermined area including the matching position among the first patterns is rasterized to create the intermediate data. According to claim 4,
On the upper surface of the substrate, a plurality of partial drawing areas arranged in a matrix in the scanning direction and in a width direction perpendicular to the scanning direction are set;
The partial data corresponds to a set of partial rendering areas including the matching position. As a drawing method for drawing a pattern by irradiating light to a substrate,
a) a step of holding a substrate having a first pattern previously formed on its upper surface;
b) a step of generating a template used for detecting the position of the substrate;
c) a step of imaging a part of the first pattern;
d) a step of detecting the position of the substrate by performing pattern matching using the template on the captured image acquired in the step c);
e) generating second raster data by rasterizing second CAD data, which is CAD data of a second pattern drawn on the first pattern;
f) a drawing head for radiating modulated light to the upper surface of the substrate based on the second raster data and the position of the substrate detected in step d); and a scanning direction parallel to the upper surface of the substrate. a step of executing drawing of the second pattern on the substrate moving relative to the drawing head in the scanning direction by controlling a scanning mechanism that moves the substrate relative to the drawing head;
In step b),
b1) preparing coordinates indicating a matching position where the pattern matching is performed on the first pattern;
b2) rasterizing the CAD data of the first pattern to create intermediate data, and generating image data of a region of a predetermined size corresponding to the matching position from the intermediate data as the template; method. A program recorded in a storage medium executed in a drawing device for drawing a pattern by irradiating light to a substrate,
The drawing device,
a stage holding a substrate on which a first pattern is pre-formed on an upper surface thereof;
a drawing head for irradiating modulated light onto the upper surface of the substrate;
a scanning mechanism for moving the stage relative to the writing head in a scanning direction parallel to the upper surface of the substrate;
an imaging unit that captures a part of the first pattern;
a position detection unit for detecting a position of the substrate by performing pattern matching using a template on the captured image acquired by the imaging unit;
a storage unit for storing second CAD data which is CAD data of a second pattern drawn on the first pattern;
a data generating unit generating second raster data by rasterizing the second CAD data;
By controlling the drawing head and the scanning mechanism based on the second raster data and the position of the substrate detected by the position detecting section, the drawing head relative to the substrate moved in the scanning direction relative to the drawing head A drawing control unit that executes drawing of a pattern;
The storage unit further stores coordinates indicating a matching position on the first pattern at which pattern matching by the position detection unit is performed;
As the program is executed by the computer,
The data generation unit rasterizes the CAD data of the first pattern to create intermediate data, and generates image data of a region of a predetermined size corresponding to the matching position from the intermediate data as the template. program recorded in .

Images