JP5875904B2 - Drawing apparatus and drawing method - Google Patents

Description

  The present invention relates to a technique for drawing a pattern on a substrate by irradiating light onto a substrate on which a photosensitive material is formed. As used herein, the term “substrate” refers to a substrate for a color filter provided in a semiconductor substrate, a printed board, a liquid crystal display device, etc., a glass substrate for a flat panel display provided in a liquid crystal display device, a plasma display device, etc. And various substrates such as panels for solar cells.

  In drawing a pattern such as a circuit on a photosensitive material applied on a substrate, in recent years, for example, by scanning the photosensitive material on the substrate with a light beam (drawing light) modulated according to CAD data or the like, A drawing apparatus that directly exposes a pattern on a photosensitive material has attracted attention. This drawing apparatus includes, for example, a spatial light modulator for performing on / off modulation of a light beam on a pixel basis (for example, an on state in which a light beam supplied from a light source is reflected and applied to a substrate, Is moved relative to the drawing head from a drawing head having a reflective spatial modulator that switches an off state, which reflects in a direction different from the state, in a pixel unit by a control signal representing an exposure pattern. The substrate is irradiated with drawing light to draw a pattern on the substrate.

  In the drawing apparatus, when the substrate to be processed is enlarged, the time required for the drawing process increases. In view of this, some drawing apparatuses are provided with a plurality of drawing heads, and irradiation of drawing light to the substrate is performed in parallel with each of the plurality of drawing heads, thereby improving throughput. (For example, see Patent Documents 1 and 2).

JP 2001-322212 A JP 2005-243870 A

  By the way, in the drawing apparatus, in addition to high throughput, high processing accuracy (that is, a technique capable of accurately irradiating drawing light at a position where a pattern is to be formed) is required.

  For example, in the case of performing multiple exposure, the next pattern (upper layer pattern) must be drawn so as to be superimposed with high accuracy on the base pattern (existing pattern) previously formed on the substrate. However, the substrate on which the base pattern is formed is then subjected to a heat treatment step. Through this heat treatment step, the substrate may undergo changes in shape such as distortion, shrinkage and expansion. There is a high possibility that the base pattern formed on the substrate changes irregularly due to the change. It is not easy to draw an upper layer pattern by superimposing on a changed base pattern with high accuracy. Also, when the upper layer pattern is drawn by an apparatus different from the apparatus that formed the base pattern, in order to draw the next pattern by superimposing on the base pattern with a high degree of accuracy, the difference between the equipment and the accuracy of Even the difference must be taken into account, and it is difficult to adjust the apparatus.

  The present invention has been made in view of the above problems, and an object thereof is to provide a technique capable of realizing high drawing accuracy while improving throughput.

A first aspect is a drawing apparatus that draws a pattern by irradiating a substrate with light, the head unit group including a plurality of head units arranged at intervals along a predetermined axis, and the head unit group And a moving mechanism for moving the head unit relative to the substrate along the predetermined axis, and each of the plurality of head units is moved relative to the substrate along the predetermined axis. Meanwhile, a drawing head for emitting drawing light according to a pattern to be formed on the substrate toward the substrate, an imaging head for imaging a partial area in the plane of the substrate, and imaging data acquired by the imaging head based on includes a drawing position correcting unit for correcting the irradiation position of the drawing light, and a control unit for independently controlling irradiation of the drawing beam in each of the plurality of head units, the When a plurality of drawing areas separated from each other across a non-drawing area are set in the surface of the substrate to be processed, the control unit sets each of the plurality of drawing areas to the plurality of head units. Each of the plurality of head units is in charge of irradiation of the drawing light with respect to the drawing region associated with the head unit.

  A 2nd aspect is a drawing apparatus which concerns on a 1st aspect, Comprising: The said head unit group is provided with two or more, The said several head unit group is arranged along the axis | shaft orthogonal to the said predetermined axis.

A 3rd aspect is a drawing apparatus which concerns on the 1st or 2nd aspect, Comprising: The said control part WHEREIN: From the imaging data which the said imaging head with which the said head unit is provided, the said non-drawing area | region and the said drawing area | region , And the timing for starting the emission of the drawing light from the drawing head included in the head unit is determined based on the detected boundary position.

A 4th aspect is a drawing apparatus which concerns on any one 1st thru | or 3rd aspect, Comprising : The said control part makes the said non-drawing area | region along the said predetermined axis among these drawing areas. Each of a pair of drawing areas adjacent to each other is associated with a separate head unit.

A fifth aspect is a drawing method for drawing a pattern by irradiating a substrate with light, and a) a head unit group including a plurality of head units arranged at intervals along a predetermined axis, A drawing light corresponding to a pattern to be formed on the substrate by a drawing head included in the head unit while the step a) is performed relative to the predetermined axis and b) the step a). And c) a step in which an imaging head included in the head unit images a partial region in the plane of the substrate, and d) the b. And a step of correcting the irradiation position of the drawing light based on the imaging data acquired by the imaging head while the process is performed, and sandwiching a non-drawing area within the surface of the substrate to be processed Separated from each other by When a plurality of drawing areas are set, each of the plurality of drawing areas is associated with one of the plurality of head units, and each of the plurality of head units is associated with the head unit. Responsible for irradiating the drawing area with the drawing light.

A sixth aspect is a drawing method according to the fifth aspect, comprising a plurality of the head unit groups, wherein the plurality of head unit groups are arranged along an axis orthogonal to the predetermined axis, and a) In the step, the plurality of head unit groups are moved relative to the substrate along the predetermined axis.

A seventh aspect is a drawing method according to the fifth or sixth aspect, and e) a boundary position between the non-drawing area and the drawing area from imaging data acquired by the imaging head included in the head unit. And determining a timing to start emitting the drawing light from the drawing head included in the head unit based on the detected boundary position.

An eighth aspect is a drawing method according to any one of the fifth to seventh aspects, wherein a pair of adjacent ones of the plurality of drawing areas along the predetermined axis with the non-drawing area interposed therebetween. Each drawing area is associated with a separate head unit.

According to the first and fifth aspects, the head unit includes a plurality of head units arranged at intervals along a predetermined axis, and the drawing head included in the head unit is relatively relative to the substrate along the predetermined axis. The substrate is irradiated with drawing light while being moved. According to this configuration, each head unit can execute irradiation of drawing light on each of the partial areas (each partial area arranged along a predetermined axis) in the in-plane area of the substrate in parallel. The throughput of the drawing process is improved. On the other hand, each head unit is equipped with an imaging head, and the irradiation position of the drawing light emitted from the drawing head is corrected based on the imaging data acquired by the imaging head, realizing high processing accuracy in each partial area can do. Therefore, high drawing accuracy can be realized while improving the throughput.
Further, according to the first and fifth aspects, the irradiation of the drawing light to each of the plurality of drawing areas set in the plane of the substrate is assigned to one head unit associated with the drawing area. According to this configuration, since irradiation of drawing light to one drawing area is not shared by a plurality of head units, a joint portion between the head units does not occur in the drawing area. A gap or an unnecessary overlapping exposure portion is likely to occur at the joint between the head units. However, according to the above configuration, there is no possibility that such a gap or overlapping exposure portion is generated in each drawing area. Therefore, a pattern can be appropriately drawn in each drawing area without waste.

According to the second and sixth aspects, a plurality of head unit groups are arranged along an axis orthogonal to the predetermined axis. According to this configuration, each head unit group can execute drawing processing on each partial region (each partial region arranged along an axis orthogonal to the predetermined axis) in the in-plane region of the substrate in parallel. Further, the throughput of the drawing process is further improved.

According to the third and seventh aspects, the boundary position between the non-drawing area and the drawing area is detected from the imaging data acquired by the imaging head, and the drawing light is emitted from the drawing head based on the detected boundary position. Decide when to start. According to this configuration, it is possible to easily and appropriately determine the start timing of drawing light emission from the drawing head.

According to the fourth and eighth aspects, each of a pair of drawing areas adjacent to each other across the non-drawing area along a predetermined axis among the plurality of drawing areas is associated with a separate head unit. That is, the irradiation of the drawing light to each of the pair of drawing areas is handled by separate head units. Therefore, there is no situation in which one head unit continuously executes drawing light irradiation to a pair of adjacent drawing areas, and after the head unit executes drawing light irradiation to a certain drawing area. A sufficient rest period is always ensured before the irradiation of the drawing light to the next drawing area is started. Therefore, the head unit can always start irradiation of the drawing light to each drawing area in an appropriate state.

It is a top view of a drawing apparatus. It is a block diagram which shows the hardware constitutions of a control part. It is a block diagram which shows the structure of a head unit. It is a figure which shows typically the structural example of an optical path correction | amendment part. It is a top view which shows an example of a board | substrate. It is a top view which shows an example of a board | substrate. It is a figure for demonstrating a drawing process. It is a figure which shows the flow of the process which concerns on the outward main scanning accompanying a drawing process. It is a figure for demonstrating the irradiation start timing of the drawing light from a head unit in the outward main scanning accompanying a drawing process. It is a figure for demonstrating the irradiation start timing of the drawing light from a head unit in the outward main scanning accompanying a drawing process. It is a figure for demonstrating the irradiation start timing of the drawing light from a head unit in the outward main scanning accompanying a drawing process. It is a figure for demonstrating the irradiation start timing of the drawing light from a head unit in the outward main scanning accompanying a drawing process. It is a figure for demonstrating the irradiation start timing of the drawing light from a head unit in the outward main scanning accompanying a drawing process. It is a figure for demonstrating the irradiation start timing of the drawing light from a head unit in the outward main scanning accompanying a drawing process.

  Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. The following embodiment is an example embodying the present invention, and does not limit the technical scope of the present invention.

<1. Device configuration>
The configuration of the drawing apparatus 1 according to the embodiment will be described with reference to FIG. FIG. 1 is a plan view schematically showing the configuration of the drawing apparatus 1. In each drawing referred to below, for convenience of explanation, an XYZ coordinate system in which the X axis is along the sub-scanning axis, the Y axis is along the main scanning axis, and the Z axis is along the vertical axis is appropriately attached.

  The drawing apparatus 1 is an apparatus that draws a predetermined pattern by irradiating light on the upper surface of the substrate 9 on which a layer of a photosensitive material such as a resist is formed. The drawing apparatus 1 includes a holding and transport mechanism 20 and a plurality of (in this embodiment). Are mainly provided with two head unit groups 30, 30, a head moving mechanism 40, and a control unit 50.

<Holding and transporting mechanism 20>
The holding and conveying mechanism 20 conveys the substrate 9 along the main scanning axis (Y axis) while holding the substrate 9 in a horizontal posture. The holding conveyance mechanism 20 includes, for example, a pair of guide rails 21, 21, four sliders 22, 22, 22, 22, four holding members 23, 23, 23, 23, and a plurality of air levitation rails 24. , 24,...

  Each guide rail 21 extends on the base 11 of the drawing apparatus 1 so as to extend in the main scanning direction (Y direction). Here, the pair of guide rails 21 and 21 are arranged in parallel to each other with a space slightly larger than the width of the substrate 9. On the other hand, two sliders 22 are provided on each guide rail 21. Each slider 22 is provided with a mover, and this mover constitutes a linear motor in cooperation with a stator disposed along the guide rail 21. By operating this linear motor, each slider 22 moves smoothly along the main scanning axis while being guided by the guide rail 21. On the other hand, one holding member 23 is provided for each slider 22 and is fixed to the slider 22. For example, a suction hole (not shown) is formed on the upper surface of the holding member 23, and a negative pressure (suction pressure) is formed in the suction hole so that a part of the substrate 9 can be fixedly held. It has become. Further, each of the group of air levitation rails 24, 24,..., 24 is laid on the base 11 so as to extend in the main scanning direction between the pair of guide rails 21, 21. Each air levitation rail 24 supports the substrate 9 in a non-contact state in a state where the substrate 9 is levitated by ejecting air along a vertically upward direction.

  In this configuration, the substrate 9 is fixed and held by the holding members 23 at the four corners while being supported in a non-contact state by the group of air levitation rails 24, 24,. When the linear motor is operated in this state, the slider 22 is moved along the main scanning axis while being guided by the guide rail 21, thereby moving the substrate 9 smoothly along the main scanning axis. Become.

<Head unit group 30>
A plurality (two in this embodiment) of head unit groups 30 and 30 are arranged along a sub-scanning axis (X axis) orthogonal to the main scanning axis (Y axis). Specifically, each of the plurality of head unit groups 30 and 30 is movably held by a frame 12 that is installed on the base 11 so as to straddle the holding and transporting mechanism 20 and extends along the sub-scanning direction. It is supported via the member 43.

  Each head unit group 30 has the same configuration. That is, each head unit group 30 includes a plurality (two in this embodiment) of head units 310 and 310 arranged at intervals along the main scanning direction. Specifically, each of the two head units 310 and 310 belonging to the same head unit group 30 is provided at both end portions along the extending direction of the long movable holding member 43 extending along the main scanning direction. Each is supported in a suspended state. Note that the distance between the head units 310 is not necessarily fixed, and the position of at least one of the two head units 310, 310 is extended by the movable holding member 43. A mechanism that can be changed along the current direction (that is, the main scanning direction) may be provided so that the distance between them can be adjusted. A specific configuration of each head unit 310 will be described later.

<Head moving mechanism 40>
The head moving mechanism 40 is a mechanism that moves each head unit group 30 along the sub-scanning direction (X-axis direction). The head moving mechanism 40 includes, for example, a guide member 41 extending in the sub-scanning direction on the frame 12 and a plurality of (same number as the head unit group 30) sliders 42 provided on the guide member 41. And a movable holding member 43 fixed to each slider 42. Each slider 42 is provided with a mover, and this mover constitutes a linear motor in cooperation with a stator disposed along the guide member 41. By operating this linear motor, each slider 42 moves along the sub-scanning axis while being guided by the guide member 41. On the other hand, each movable holding member 43 is a long member extending along the main scanning axis, and is fixed to the slider 42 in the vicinity of the center along the extending direction. Here, the head unit group 30 is held by each movable holding member 43. That is, the two head units 310 included in the head unit group 30 are supported in a suspended state at both ends of the movable holding member 43 along the longitudinal direction.

  In this configuration, when the linear motor is operated, the slider 42 is moved along the sub-scanning axis while being guided by the guide member 41, whereby the head unit group 30 held by the movable holding member 43 is sub-scanned. It will move along the axis.

<Control unit 50>
The control unit 50 is electrically connected to each unit included in the drawing apparatus 1 and controls the operation of each unit of the drawing apparatus 1 while executing various arithmetic processes.

  FIG. 2 is a block diagram illustrating a hardware configuration of the control unit 50. The control unit 50 is configured by, for example, a general computer in which a CPU 51, a ROM 52, a RAM 53, a storage device 54, and the like are interconnected via a bus line 55. The ROM 52 stores basic programs and the like, and the RAM 53 is used as a work area when the CPU 51 performs predetermined processing. The storage device 54 is configured by a nonvolatile storage device such as a flash memory or a hard disk device. A program P is stored in the storage device 54, and various functions are realized by the CPU 51 as the main control unit performing arithmetic processing according to the procedure described in the program P. The program P is normally stored and used in advance in a memory such as the storage device 54, but is recorded in a recording medium such as a CD-ROM or DVD-ROM or an external flash memory (program product). (Or provided by downloading from an external server via a network) and may be additionally or exchanged stored in a memory such as the storage device 54. Note that some or all of the functions realized in the control unit 50 may be realized in hardware by a dedicated logic circuit or the like.

  In the control unit 50, the input unit 56, the display unit 57, and the communication unit 58 are also connected to the bus line 55. The input unit 56 includes various switches, a touch panel, and the like, and receives various input setting instructions from an operator. The display unit 57 includes a liquid crystal display device, a lamp, and the like, and displays various types of information under the control of the CPU 51. The communication unit 58 has a data communication function via a LAN or the like.

  In the control unit 50, the CPU 51 as the main control unit performs arithmetic processing according to the procedure described in the program P, thereby causing each unit of the drawing apparatus 1 to perform drawing processing on the substrate 9. As will become clear later, the control unit 50 drives the holding and conveying mechanism 20 to convey the substrate 9, and spatially modulates the substrate 9 being conveyed from each head unit 310 according to the pattern data D. Irradiated light (drawing light). However, “pattern data D” is data describing a circuit pattern or the like to be drawn on the substrate 9. Specifically, the pattern data D is, for example, data obtained by rasterizing CAD data generated using CAD (computer aided design), and position information on the substrate 9 to be irradiated with light is recorded in units of pixels. The The control unit 50 acquires the pattern data D and stores it in the storage device 54 prior to a series of processes for the substrate 9 or in parallel with the processes. The pattern data D may be acquired by receiving from an external terminal device connected via, for example, a network or by reading from a recording medium.

<2. Head Unit 310>
The configuration of the head unit 310 will be described with reference to FIG. FIG. 3 is a block diagram showing the configuration of the head unit 310.

  As described above, the drawing apparatus 1 includes a plurality of head units 310, 310,..., 310, and each of these head units 310 has the same configuration. That is, each head unit 310 includes a drawing head 311 and an imaging head 312 associated therewith.

<Drawing head 311>
The drawing head 311 moves drawing light corresponding to a pattern to be formed on the substrate 9 while moving relatively along the main scanning axis (Y axis) with respect to the substrate 9 in the forward main scanning described later. Exit toward The drawing head 311 mainly includes, for example, a laser driving unit 81, a laser oscillator 82, an illumination optical system 83, a spatial light modulation unit 84, a projection optical system 85, and an optical path correction unit 86.

  The laser oscillator 82 receives driving from the laser driving unit 81 and emits laser light from an output mirror (not shown). The illumination optical system 83 converts the light (spot beam) emitted from the laser oscillator 82 into linear light having a uniform intensity distribution (line beam having a linear beam cross section).

  The light emitted from the laser oscillator 82 and converted into a line beam by the illumination optical system 83 enters the spatial light modulation unit 84 at a predetermined angle via a mirror or the like as necessary. The spatial light modulation unit 84 spatially modulates the incident light to form drawing light. However, spatially modulating light means changing the spatial distribution (amplitude, phase, polarization, etc.) of the light.

  Specifically, the spatial light modulation unit 84 spatially modulates incident light by electrical control, and converts necessary light that contributes to pattern drawing and unnecessary light that does not contribute to pattern drawing in different directions. A spatial light modulator 841 for reflection is provided.

  The spatial light modulator 841 is arranged such that the normal line of the reflection surface is inclined with respect to the optical axis of the incident light, and the incident light is spatially modulated according to the control of the control unit 50 to form drawing light. Then, the drawing light is emitted toward the substrate 9. The spatial light modulator 841 is configured using, for example, a diffraction grating type spatial modulator (for example, GLV (Grating Light Valve) (“GLV” is a registered trademark)). The type of spatial modulator is a diffraction grating capable of changing the depth of the grating, and is manufactured using, for example, a semiconductor device manufacturing technique.

  A configuration example of the spatial light modulator 841 will be described more specifically. The spatial light modulator 841 has, for example, a configuration in which a plurality of spatial light modulation elements are arranged one-dimensionally. The operation of each spatial light modulator is controlled by turning on / off the voltage. That is, for example, when the voltage is turned off, the surface of the spatial light modulator is flat, and when light enters the spatial light modulator in this state, the incident light is regularly reflected without being diffracted. Thereby, regular reflection light (0th order diffracted light) is generated. On the other hand, for example, when the voltage is turned on, a plurality of parallel grooves are periodically formed on the surface of the spatial light modulator. When light enters the spatial light modulator in this state, the specularly reflected light (0th order diffracted light) cancels out and disappears, and other orders of diffracted light (± 1st order diffracted light, ± 2nd order diffracted light, and higher order light) Diffracted light). More precisely, the intensity of the 0th-order diffracted light is minimized, and the intensity of other orders of diffracted light is maximized.

  The spatial light modulator 841 includes a driver circuit unit that can independently apply a voltage to each of the plurality of spatial light modulation elements, and the voltage of each spatial light modulation element can be switched independently. . When the driver circuit unit applies a voltage to the intended spatial light modulation element, light individually modulated by each spatial light modulation element is formed and emitted toward the substrate 9. If the number of spatial light modulators included in the spatial light modulator 841 is “N”, the spatial light modulator 841 emits spatially modulated light (drawing light) for N pixels along the sub-scanning axis. Will be.

  The projection optical system 85 blocks unnecessary light that should not contribute to pattern drawing out of the light spatially modulated by the spatial light modulator 841 and supplies necessary light that should contribute to pattern drawing to the upper surface of the substrate 9. Guide and image on the top surface. However, the light spatially modulated by the spatial light modulator 841 includes zero-order diffracted light, diffracted light of orders other than the zeroth order (specifically, ± first-order diffracted light, ± second-order diffracted light, and relatively A small amount of high-order diffracted light of ± 3rd order or higher), the 0th-order diffracted light is necessary light that should contribute to pattern drawing, and other diffracted light that should not contribute to pattern drawing It is. The necessary light and the unnecessary light are emitted along different directions. That is, the necessary light is emitted in the −Z direction along the Z axis, and the unnecessary light is emitted in the −Z direction along an axis slightly inclined from the Z axis. The projection optical system 85 blocks, for example, unnecessary light traveling along an axis slightly inclined from the Z axis by a blocking plate and allows only necessary light traveling along the Z axis to pass therethrough. The projection optical system 85 includes, for example, a plurality of lenses constituting a zoom unit that widens (or narrows) the incident light in addition to the blocking plate, and an objective that forms an image of the incident light on the substrate 9 with a predetermined magnification. It further includes a lens and the like.

  The optical path correction unit 86 is provided between the spatial light modulation unit 84 and the projection optical system 85, and shifts the path of light spatially modulated by the spatial light modulation unit 84 along the sub-scanning direction (X direction). When the optical path correction unit 86 shifts the path of the light as necessary, the light irradiation position on the upper surface of the substrate 9 can be finely adjusted along the sub-scanning direction.

  The optical path correction unit 86 includes one or more optical components, and shifts the optical path of incident light by changing the position (or posture) of at least one optical component. Here, a configuration example of the optical path correction unit 86 will be described with reference to FIG. FIG. 4 is a diagram schematically illustrating a configuration example of the optical path correction unit 86.

  The optical path correction unit 86 includes, for example, two wedge prisms 861 and 861 and one wedge prism 861 with respect to the other wedge prism 861 along the direction of the optical axis H of incident light (Z-axis direction). A wedge prism moving mechanism 862 that moves linearly may be included.

  The wedge prism 861 is a prism that can change the optical path of incident light by including non-parallel optical surfaces M1 and M2. The two wedge prisms 861 and 861 have substantially the same structure (for example, a structure in which the apex angle and the refractive index are the same). Each of the two wedge prisms 861 and 861 is fixed to a fixed stage 8610 and a movable stage 8611, and the optical axis H of the incident light is such that the optical surfaces M1 facing each other are parallel to each other and opposite to each other. Are arranged side by side along the direction (Z-axis direction). Each wedge prism 861 is fixed to each stage 8610, 8611 using a fixed band 8612, for example.

  A fixed stage 8610 on which one wedge prism 861 is arranged is fixed on the base portion 8621. The movable stage 8611 on which the other wedge prism 861 is disposed is movable along a pair of guide rails 8622 formed on the base portion 8621. The guide rail 8622 is formed on the base portion 8621 so as to extend along the Z-axis direction. On the other hand, the base portion 8621 is provided with a ball screw 8624 that is rotated by a rotary motor 8623. The ball screw 8624 extends along the extending direction of the guide rail 8622 and is screwed into the female screw portion of the bracket 86111 of the movable stage 8611. In this configuration, the ball screw 8624 is rotated by the rotation motor 8623, so that the movable stage 8611 moves in the Z direction along the guide rail 8622. That is, the wedge prism 861 fixed to the movable stage 8611 moves in the Z direction (arrow AR86). That is, one wedge prism 861 (wedge prism 861 fixed to the movable stage 8611) is moved in the direction of the optical axis H of incident light (Z-axis direction) by the movable stage 8611, the guide rail 8622, the rotation motor 8623, and the ball screw 8624. ) Is configured to move linearly along the wedge prism moving mechanism 862.

  In the optical path correction unit 86 having the above configuration, the wedge prism moving mechanism 862 is fixed to the movable stage 8611 by changing the separation distance along the optical axis of the two wedge prisms 861. By moving the wedge prism 861 linearly along the optical axis direction (Z-axis direction) with respect to the wedge prism 861 fixed to the fixed stage 8610), the path of light incident on the wedge prism 861 is changed to the X axis. It can be shifted along the direction. However, this shift amount Δx is determined according to the separation distance of each wedge prism 861. The control unit 50 controls the wedge prism moving mechanism 862 to adjust the separation distance along the Z-axis direction of the two wedge prisms 861, thereby determining the path of the light emitted from the spatial light modulation unit 84. Is shifted along the X-axis direction to correct the drawing light irradiation position (drawing position) on the upper surface of the substrate 9.

<Imaging head 312>
Refer to FIG. 3 again. The imaging head 312 images a partial region in the plane of the substrate 9 ahead of the corresponding drawing head 311 in the moving direction in which the head unit 310 moves relative to the substrate 9 in the forward main scanning. As will become apparent later, in this embodiment, in the forward main scanning, the head unit 310 is moved relative to the substrate 9 in the −Y direction along the Y axis. Is arranged on the −Y side of the corresponding drawing head 311 (that is, on the downstream side of the corresponding drawing head 311 in the movement direction), for example, and the position just below the drawing head 311 (that is, from the drawing head 311). A position on the −Y side (that is, a position downstream of the position just below the drawing head 311 in the moving direction) is imaged by a predetermined distance d from the position irradiated with the drawing light.

  The imaging head 312 can be configured to include a CCD image sensor including, for example, a light source, a lens barrel, an objective lens, and a linear image sensor (one-dimensional image sensor). However, the light source of the imaging head 312 emits light having a wavelength that does not expose the resist or the like on the substrate 9. In the case of the above configuration, the light emitted from the light source is guided to the upper surface of the substrate 9 through the lens barrel, and the reflected light is received by the CCD image sensor through the objective lens. As a result, imaging data of the upper surface of the substrate 9 is acquired. The imaging head 312 is electrically connected to the control unit 50, images the upper surface of the substrate 9 in accordance with an instruction from the control unit 50, acquires imaging data, and transmits the acquired imaging data to the control unit 50. To do.

<3. Assignment of head unit 310>
Here, the substrate 9 to be processed by the drawing apparatus 1 will be described with reference to FIGS. 5 and 6 illustrate plan views of the substrate 9, respectively.

  As described above, the photosensitive material is formed in layers on the main surface of the substrate 9 to be processed. Here, it is assumed that a plurality of drawing regions 91, 91,... 91 separated from each other are set on the photosensitive material. Each drawing area 91 is, for example, a rectangular area, and a plurality of drawing areas 91, 91,... 91 have the same shape. For example, the same pattern is formed in each drawing area 91. A grid-like area around the drawing area 91 (that is, an area other than the plurality of drawing areas 91) is a non-drawing area 92 where no pattern is drawn. That is, a plurality of drawing areas 91, 91,... 91 separated from each other across the non-drawing area 92 are set on the substrate 9. The substrate 9 is, for example, a substrate that is to be multi-faced in accordance with a plurality of drawing regions 91. A plurality of substrates obtained from one substrate 9 is finally subjected to, for example, a liquid crystal display through a subsequent process. It becomes a color filter substrate which is an assembly part of the apparatus.

  When a plurality of drawing areas 91, 91,... 91 are set in the surface of the substrate 9 to be processed, the control unit 50 associates each drawing area 91 with one of the plurality of head units 310. . Then, as will be apparent later, each of the plurality of head units 310 is in charge of irradiation of the drawing light to each of the one or more drawing areas 91 associated with the head unit 310.

  A mode in which each drawing area 91 is associated with one of the head units 310 will be described. First, in a state where the substrate 9 is held by the holding and conveying mechanism 20, a group of drawing regions 91 and 91 (that is, the sub-scanning axis (X axis)) to be arranged along the main scanning axis (Y axis). A group of drawing areas 91 and 91 to be arranged at the same position (hereinafter also referred to as “drawing area group 910”) is associated with one head unit group 30. For example, in each example of FIGS. 5 and 6, the drawing area group 910 arranged on the + X side is associated with the head unit group 30 arranged on the + X side and is arranged on the −X side. The group 910 is associated with the head unit group 30 disposed on the −X side.

  Of the group of drawing areas 91 and 91 belonging to the drawing area group 910, the i-th (i = 1, 2,..., N (provided that the substrate 9 is held by the holding and transporting mechanism 20) from the + Y side. , “N” is the number of head units 310 included in the head unit group 30)), and the drawing area 91 (i) is counted from the + Y side in the head unit group 30 associated with the drawing area group 910. It is associated with the i-th head unit 310 (i). For example, in each example of FIGS. 5 and 6, among the drawing areas 91 belonging to the drawing area group 910, the first drawing area 91 (1) counted from the + Y side is associated with the drawing area group 910. In the head unit group 30, the first head unit 310 (1) is counted from the + Y side. The second drawing area 91 (2) counted from the + Y side is associated with the second head unit 310 (2) counted from the + Y side.

  On the other hand, of the group of drawing areas 91 and 91 belonging to the drawing area group 910, the i-th (i = n + 1, n + 2,...) Counted from the + Y side in the state where the substrate 9 is held by the holding and transport mechanism 20. The drawing area 91 (i) is one of the head units 310 belonging to the head unit group 30 associated with the drawing area group 910, and the drawing area 91 (i) on the + Y side of the drawing area 91 (i). -1) is associated with a head unit other than the head unit 310 associated with. For example, in the example of FIG. 6, the third drawing area 91 (3) counted from the + Y side is associated with the drawing area 91 (2) adjacent to the + Y side of the drawing area 91 (3). It is associated with a head unit other than the unit 310 (2), that is, the first head unit 310 (1) counted from the + Y side.

  According to this allocation mode, among a group of drawing areas 91,... 91 belonging to the target drawing area group 910, a pair of drawing areas 91 and 92 adjacent to each other across the non-drawing area 92 along the main scanning axis. Each will be associated with a separate head unit 310. Therefore, there is no case where one head unit 310 continuously executes the irradiation of the drawing light to each of the adjacent drawing areas 91 and 91.

<4. Process Flow for Substrate 9>
<4-1. Overall flow>
In the drawing process on the substrate 9 executed in the drawing apparatus 1, the holding and transport mechanism 20 moves the substrate 9 along the main scanning axis with respect to each head unit group 30, thereby moving each head unit group 30 to the substrate 9. Each head unit 310 included in each head unit group 30 is irradiated with drawing light on the upper surface of the substrate 9 while being moved relatively along the main scanning axis.

  The overall flow of the drawing process on the substrate 9 will be specifically described with reference to FIG. FIG. 7 is a diagram for explaining the processing, and the relative positional relationship between the head unit group 30 and the substrate 9 is schematically shown. A series of operations described below is performed under the control of the control unit 50.

  When the substrate 9 to be processed is loaded from the outside and held by the holding and transporting mechanism 20, the control unit 50 causes the holding and transporting mechanism 20 to move the substrate 9 along the main scanning axis (Y axis) in the forward direction (here). Then, for example, the conveyance is started in the + Y direction). When the substrate 9 is moved in the + Y direction along the main scanning axis, the plurality of head unit groups 30 and 30 move relative to the substrate 9 in the −Y direction along the main scanning axis. (Arrow AR11). In the forward main scanning, the control unit 50 causes each head unit group 30 to perform a drawing process on the drawing region group 910 associated with the head unit group 30. When the forward main scanning with the drawing process is completed once, the pattern group is placed in the stripe area of each drawing area 91 (the area extending along the main scanning axis and the width along the sub-scanning axis corresponds to the drawing width). Will be drawn. A specific flow of the forward main scanning accompanied with the drawing process will be described later.

  When the edge on the −Y side of the substrate 9 reaches the + Y side with respect to the head unit 310 disposed on the most + Y side (that is, when all the head units 310 cross the substrate 9 along the main scanning axis). The control unit 50 causes the holding conveyance mechanism 20 to stop conveyance of the substrate 9 along the main scanning axis. As a result, the forward main scanning with the drawing process is completed.

  When the forward main scanning with the drawing process is completed, the control unit 50 then transports the substrate 9 along the main scanning axis (Y axis) in the backward direction (here, the −Y direction) to the holding transport mechanism 20. Thus, the substrate 9 is moved to the original position (the start position of the forward main scanning). When the substrate 9 is moved in the −Y direction along the main scanning axis, the plurality of head unit groups 30 and 30 move relative to the substrate 9 in the + Y direction along the main scanning axis. The substrate 9 is traversed (arrow AR12).

  When the backward main scanning is completed, the control unit 50 causes the head moving mechanism 40 to correspond each head unit group 30 to the drawing width in the predetermined direction (for example, the −X direction) along the sub-scanning axis (X axis). Move by a distance (arrow AR13).

  Subsequently, forward main scanning with drawing processing is performed again (arrow AR14). By performing the forward main scanning, a pattern group is drawn in the stripe area adjacent to each stripe area drawn in the previous forward main scanning in each drawing area 91.

  When the forward main scanning with the drawing process is completed, the backward main scanning is performed, the head unit groups 30 are moved in the sub-scanning direction, and the forward main scanning with the drawing process is performed again. In the same way, when the forward main scanning with the drawing process is repeatedly performed and a pattern is drawn in the entire drawing area 91 in the plane of the substrate 9, the drawing process for the substrate 9 is finished, and the conveyance (not shown) is performed. The apparatus carries out the processed substrate 9.

<4-2. Outward main scan with drawing process>
A flow of processing related to forward main scanning accompanied with drawing processing will be described with reference to FIG. FIG. 8 is a diagram showing the flow of the processing. In forward main scanning with drawing processing, the control unit 50 controls each of the plurality of head units 310 included in each head unit group 30 independently, and draws each head unit 310 corresponding to the drawing. The area 91 is irradiated with drawing light. Since the control unit 50 controls each head unit 310 in the same manner, the control unit 50 controls the target head unit 310 by focusing on one head unit (target head unit) 310 below. A mode to perform will be described.

  When the substrate 9 starts to be transported in the forward direction along the main scanning axis (YES in step S11), the control unit 50 causes the imaging head (target imaging head) 312 included in the target head unit 310 to start acquiring imaging data. (Step S12). The target imaging head 312 precedes the corresponding drawing head (target drawing head) 311 in the moving direction (-Y direction) in which the head unit 310 moves relative to the substrate 9 in the forward main scanning. The partial area in the plane is imaged. Specifically, the target imaging head 312 images a position on the −Y side by a predetermined distance d from a position directly below the target drawing head 311. The target imaging head 312 reads one line of images along the sub-scanning axis direction one after another while moving relative to the substrate 9 in the −Y direction, so that the target imaging head 312 is less than the position directly below the target drawing head 311 −. Two-dimensional imaging data of the Y side region is obtained.

  When acquisition of imaging data by the target imaging head 312 is started, the control unit 50 performs image analysis on the acquired imaging data one after another, and determines the boundary between the non-drawing area 92 and the drawing area 91 (specifically, from the imaging data). Specifically, for example, the + Y side edge of the drawing area 91 is detected. When the boundary between the non-drawing area 92 and the drawing area 91 is detected from the imaging data acquired by the target imaging head 312 (YES in step S13), the control unit 50 causes the drawing area 91 to correspond to the target head unit 310. It is determined whether or not it is the attached drawing area 91 (step S14).

  When the drawing area 91 is the drawing area 91 associated with the target head unit 310, the control unit 50 calculates the time when the detected boundary position reaches directly below the target drawing head 311, and Irradiation of drawing light from the target drawing head 311 is started (step S15).

  In response to an instruction from the control unit 50, the target drawing head 311 starts to irradiate drawing light (space-modulated light for N pixels along the sub-scanning axis) and continues to irradiate the drawing light intermittently. It moves relative to the substrate 9 along the main scanning axis (while repeatedly projecting pulsed light on the surface of the substrate 9). The irradiation of the drawing light is stopped when the −Y side edge of the drawing area 91 reaches just below the target drawing head 311. This completes drawing of the pattern group for the stripe region of the drawing region 91 (a region extending along the main scanning axis and having a width (drawing width) of N pixels along the sub-scanning axis). Become. The flow of processing in which the head unit 310 draws a pattern group in the stripe area of the drawing area 91 will be described more specifically later.

  Each process of step S13 to step S15 is repeated until the −Y side edge of the substrate 9 reaches below the target head unit 310, and the −Y side edge of the substrate 9 is below the target head unit 310. When it reaches (YES in step S16), a series of processing ends.

<4-3. Drawing process flow for stripe area>
A flow of processing in which the head unit 310 draws a pattern group in the stripe area of the drawing area 91 will be described with reference to FIG. Since the flow of the process in each head unit 310 is the same, in the following, focusing on one head unit (target head unit) 310, an aspect in which the target head unit 310 executes the process will be described. .

  As described above, as the substrate 9 starts moving in the forward direction along the main scanning axis, the control unit 50 starts to acquire imaging data in the imaging head (target imaging head) 312 of the target head unit 310. I am letting. As described above, the target imaging head 312 precedes the corresponding drawing head (target drawing head) 311 in the moving direction (-Y direction) in which the head unit 310 moves relative to the substrate 9 in the forward main scanning. Then, a partial region in the plane of the substrate 9 is imaged. Specifically, the target imaging head 312 images a position on the −Y side by a predetermined distance d from a position directly below the target drawing head 311 (that is, a position irradiated with drawing light from the drawing head 311). In other words, the imaging data acquired by the target imaging head 312 at each time is obtained after the target drawing head 311 has moved a certain time after the time (specifically, after the substrate 9 is moved by the distance d with respect to the target drawing head 311). That is, the imaging data of the area to be drawn in (). While the target imaging head 312 moves relative to the substrate 9 in the −Y direction and sequentially reads one line of images along the sub-scanning axis direction, two-dimensional imaging data of the drawing scheduled area is obtained. Will be.

  In the imaging data obtained by imaging the drawing planned area, a ground pattern previously formed in the drawing scheduled area appears. Therefore, the control unit 50 performs image analysis on the captured data, detects the position of the base pattern formed in the planned drawing area, and stores the detected position as a target position. Further, the control unit 50 calculates how much the planned irradiation position of the drawing light by the target drawing head 311 is deviated from the target position, and acquires the calculated value as the deviation amount. Here, for example, the deviation width along the sub-scanning axis between the planned irradiation position of the drawing light and the base pattern is calculated.

  On the other hand, when the timing at which irradiation of drawing light starts from the target drawing head 311 arrives, the control unit 50 causes the target drawing head 311 to start irradiation of drawing light.

  Specifically, the control unit 50 drives the laser driving unit 81 to emit light from the laser oscillator 82. The emitted light is converted into a line beam by the illumination optical system 83 and enters the spatial light modulator 841. In the spatial light modulator 841, a plurality of spatial light modulation elements are arranged side by side along the sub-scanning axis (X axis), and incident light has its linear light beam cross section arranged in the arrangement direction of the spatial light modulation elements. So as to be incident on a plurality of spatial light modulation elements arranged in a row.

  Further, the control unit 50 reads out the portion of the pattern data D (FIG. 2) describing the data to be drawn in the target stripe region, and reads the read pattern data D into the spatial light modulator 841. Then, light (drawing light) modulated according to is formed. Specifically, the control unit 50 gives an instruction to the driver circuit unit of the spatial light modulator 841 based on the pattern data D, and the driver circuit unit applies a voltage to the designated spatial light modulation element. As a result, light that is individually spatially modulated by each spatial light modulator (that is, light that is spatially modulated by N pixels along the sub-scanning axis) is formed and emitted toward the substrate 9. .

  When the drawing light is incident on the optical path correction unit 86, the control unit 50 controls the optical path correction unit 86 to shift the path of the drawing light along the sub-scanning axis by the amount of deviation previously acquired. The irradiation position of the drawing light is corrected. However, the irradiation of the drawing light to the drawing scheduled area imaged at a certain time t is “d / v (where“ v ”is the relative movement of the substrate 9 relative to the head unit 310 along the main scanning axis) from the time t. In this embodiment, it is executed at the time when the holding transport mechanism 20 moves the substrate 9 in the forward direction along the main scanning axis). Therefore, the control unit 50 uses the spatial light modulation unit 84 to calculate the shift amount calculated based on the imaging data captured at a certain time t from the spatial light modulation unit 84 at the time (t + Δt) when the time Δt = d / v has elapsed from the time t. This is reflected in the correction of the optical path of the emitted drawing light.

  The drawing light whose optical path is corrected is incident on the projection optical system 85, and is imaged on the surface of the substrate 9 at a magnification determined here. The drawing light whose optical path is shifted from the planned irradiation position by the amount of deviation is imaged at the target position (ie, the base pattern formation position). That is, the drawing light is irradiated in a state where it is superimposed with high precision on the formation position of the base pattern, and the upper layer pattern superimposed on the base pattern with high precision is drawn. As described above, in the drawing apparatus 1, the control unit 50 and the optical path correction unit 86 cooperate to draw the drawing light correction position (that is, the irradiation position of the drawing light based on the imaging data acquired by the imaging head 312. Is realized.

  In this manner, the target drawing head 311 continues to irradiate the spatially modulated light for N pixels along the sub-scanning axis while moving relative to the substrate 9 along the main scanning axis. As a result, a pattern group is drawn in the stripe area of the drawing area 91.

<5. Drawing light irradiation start timing>
As described above, the control unit 50 determines that the + Y side end of the drawing area 91 that the head unit 310 is responsible for drawing has reached below the head unit 310 in the forward main scan with drawing processing. Irradiation of drawing light from the head unit 310 (specifically, from the drawing head 311 of the head unit 310) is started. Here, the irradiation of the drawing light is not necessarily started simultaneously from each of the plurality of head units 310 included in each head unit group 30.

  The drawing light irradiation start timing from each head unit 310 included in the head unit group 30 will be described with reference to FIGS. Each of FIGS. 9 to 11 exemplifies a case where a drawing area group 910 including two drawing areas 91 (1) and 91 (2) is provided on the substrate 9 to be processed. On the other hand, in each of FIGS. 12 to 14, a drawing region group 910 including three drawing regions 91 (1), 91 (2), and 91 (3) is provided on the substrate 9 to be processed. The case is illustrated. In each of FIGS. 9 to 14, the substrate 9 to be processed and the head unit 310 are schematically shown, and the other configurations are not shown. Further, in the drawing, the drawing head 311 that is irradiating the drawing light is shown in black, and the drawing head 311 in the resting state is shown in white.

  9 and 12, each drawing in which the separation distance c between the head units 310 (1) and 310 (2) included in the head unit group 30 is set in the plane of the substrate 9. When it is equal to the dimension m along the main scanning axis of the area 91 (c = m), when the head unit 310 (1) on the + Y side reaches the end on the + Y side of the drawing area 91 (1) that it is responsible for. The head unit 310 (2) on the −Y side also reaches the + Y side end of the drawing area 91 (2) that it is responsible for. Therefore, in this case, the timing at which the head unit 310 (1) on the + Y side starts drawing processing on the stripe area of the drawing area 91 (1) and the head unit 310 (2) on the −Y side draw the drawing area 91. The timing for starting the drawing process on the stripe area (2) is equal.

  Naturally, the head unit 310 (1) on the + Y side completes the drawing process for the stripe area in the drawing area 91 (1) and the head unit 310 (2) on the −Y side draws the drawing area 91. The timing of completing the drawing process for the stripe area in (2) is equal.

  10 and 13, the distance c between the head units 310 (1) and 310 (2) included in the head unit group 30 is set in the plane of the substrate 9. When the drawing area 91 is smaller than the dimension m along the main scanning axis (c <m), the head unit 310 (1) on the + Y side has reached the + Y side end of the drawing area 91 (1) that it is responsible for. At the time point, the head unit 310 (2) on the −Y side has not yet reached the end portion on the + Y side of the drawing area 91 (2) that it is in charge of, and the substrate 9 further moves from the time point to the main scanning axis. The head unit 310 (2) on the −Y side reaches the end on the + Y side of the drawing area 91 (2). Therefore, in this case, the head unit 310 (1) on the + Y side is delayed from the timing at which the drawing process is started on the stripe area in the drawing area 91 (1), and the head unit 310 (2) on the −Y side is drawn in the drawing area. Drawing processing is started for the stripe area 91 (2).

  As a matter of course, the head unit 310 (1) on the −Y side draws behind the timing when the head unit 310 (1) on the + Y side completes the drawing process on the stripe area of the drawing area 91 (1). The drawing process for the stripe region in the region 91 (2) is completed.

  11 and 14, the distance c between the head units 310 (1) and 310 (2) included in the head unit group 30 is set in the plane of the substrate 9. When the drawing area 91 is larger than the dimension m along the main scanning axis (c> m), the head unit 310 (2) on the -Y side reaches the end on the + Y side of the drawing area 91 (2) that it is responsible for. At this point, the head unit 310 (1) on the + Y side has not yet reached the end on the + Y side of the drawing area 91 (1) that it is responsible for, and the substrate 9 further moves to the main scanning axis from that point. Then, the head unit 310 (1) on the + Y side reaches the end on the + Y side of the drawing area 91 (1). Accordingly, in this case, the head unit 310 (1) on the + Y side is delayed from the timing when the head unit 310 (2) on the −Y side starts drawing processing on the stripe area in the drawing area 91 (2), and the head unit 310 (1) on the + Y side is drawn. Drawing processing is started for the stripe area 91 (1).

  As a matter of course, the head unit 310 (1) on the + Y side draws behind the timing when the head unit 310 (2) on the −Y side completes the drawing process on the stripe area of the drawing area 91 (2). The drawing process for the stripe area in the area 91 (1) is completed.

  Here, as shown in FIGS. 12 to 14, the number of drawing areas 91 included in the drawing area group 910 that the head unit group 30 is responsible for is larger than the number of head units 310 included in the head unit group 30. In this case, the head unit 310 (1) on the + Y side is in charge of drawing on the drawing area 91 (1) and the drawing area 91 (3). Therefore, the head unit 310 (1) on the + Y side reaches the −Y side end of the drawing area 91 (1) and ends the irradiation of the drawing light to the stripe area of the drawing area 91 (1). After a certain rest period (that is, the substrate 9 is moved in the forward direction along the main scanning axis, the head unit 310 (1) is the end portion on the + Y side of the drawing area 91 (3) that it is responsible for. After reaching (), irradiation of the drawing light to the stripe region of the drawing region 91 (3) is started. That is, until the head unit 310 (1) completes the irradiation of the drawing light to the stripe area of the drawing area 91 (1) and starts the irradiation of the drawing light to the stripe area of the next drawing area 91 (3). In the meantime, the head unit 310 (1) is in a resting state in which the drawing light is not irradiated. During this pause period, the head unit 310 (1) prepares for the next drawing area 91 to be irradiated with drawing light (specifically, for example, in the optical path correction unit 86, each optical component (for example, , Processing for returning the wedge prism 861) to a predetermined reference position is performed.

  If the head unit 310 (2) on the -Y side is in charge of drawing with respect to the drawing area 91 (2) and the drawing area 91 (3), the head unit 310 (2) is in charge of the drawing area 91. After the irradiation of the drawing light to the stripe area in (2) is finished, the irradiation of the drawing light to the stripe area of the drawing area 91 (3) must be started. Here, since the drawing area 91 (2) and the drawing area 91 (3) are discontinuous areas, the shift amount of the base pattern at the −Y side end of one drawing area 91 (2) and the other There is a possibility that the shift amount of the base pattern at the + Y side end of the drawing area 91 (3) is opposite to the reference X position (for example, the position where the drawing light without optical path correction is irradiated). For example, when the wedge prism 861 at the position where the optical path of the drawing light is shifted to the + X side from the reference X position is moved to a position where the optical path of the drawing light is shifted to the −X side from the reference X position, for example, The amount of movement of the prism 861 increases. On the other hand, since the interval between the drawing areas 91 (that is, the width of the non-drawing area 92) is often set to a necessary minimum width, the time for crossing the non-drawing area 92 is very short. Accordingly, there is a high possibility that the movement of the wedge prism 861 is not in time (that is, the optical path is not shifted in time).

  On the other hand, when the head unit 310 (1) on the + Y side is in charge of drawing on the drawing area 91 (3) as in the above embodiment, the head unit 310 (1) is a stripe of the drawing area 91 (1). The head unit 310 (1) is in a resting state from the end of the irradiation of the drawing light to the area until the start of the irradiation of the drawing light to the stripe area of the drawing area 91 (3). During this pause period, the wedge prism 861 is returned to the reference position in the optical path correction unit 86 so as to advance the optical path of the drawing light to the reference X position. Therefore, the possibility that the movement amount of the wedge prism 861 becomes large is low regardless of which side the base pattern is shifted with respect to the reference X position at the end on the + Y side of the drawing region 91 (3). Therefore, the possibility that the movement of the wedge prism 861 is not in time is reduced. That is, the optical path of the drawing light can be corrected appropriately.

<6. Effect>
According to the above embodiment, the plurality of head units 310 arranged at intervals along the main scanning axis are provided, and the drawing head 311 included in each head unit 310 is along the main scanning axis with respect to the substrate 9. The substrate 9 is irradiated with drawing light while relatively moving. According to this configuration, each head unit 310 can execute the drawing light irradiation in parallel on each partial region (each partial region arranged along the main scanning axis) in the in-plane region of the substrate 9. As a result, the throughput of the drawing process is improved. On the other hand, each head unit 310 includes an imaging head 312, and the irradiation position of the drawing light emitted from the drawing head 311 is corrected based on the imaging data acquired by the imaging head 312. Processing accuracy can be realized. Therefore, high drawing accuracy can be realized while improving the throughput.

  Further, according to the above embodiment, a plurality of head unit groups 30 are arranged along an axis orthogonal to the main scanning axis. According to this configuration, each head unit group 30 can execute drawing processing on each partial region (each partial region arranged along the sub-scanning axis) in the in-plane region of the substrate 9 in parallel. The throughput of the drawing process is further improved.

  Further, according to the above embodiment, the irradiation of the drawing light to each of the plurality of drawing areas 91, 91,... 91 set in the plane of the substrate 9 is associated with the drawing area 91 1. Each head unit 310 is assigned. According to this configuration, since irradiation of drawing light to one drawing area 91 is not shared by the plurality of head units 310, a joint portion between the head units does not occur in the drawing area 91. A gap or an unnecessary overlapped exposure portion is likely to occur at the joint between the head units. According to the above configuration, there is no possibility that such a gap or overlapped exposure portion is generated in each drawing area 91. . Therefore, a pattern can be appropriately drawn in each drawing area 91 without waste.

  Further, according to the above embodiment, the boundary position between the non-drawing area 92 and the drawing area 91 is detected from the imaging data acquired by the imaging head 312, and the drawing head 311 detects the boundary position based on the detected boundary position. The timing to start emitting drawing light is determined. According to this configuration, it is possible to easily and appropriately determine the start timing of drawing light emission from the drawing head 311.

  Further, according to the above-described embodiment, among the plurality of drawing areas 91, 91,... 91, each of the pair of drawing areas 91, 91 adjacent to each other with the non-drawing area 92 sandwiched along the main scanning axis. Are associated with different head units 310. That is, the irradiation of the drawing light to each of the pair of drawing areas 91 and 91 is handled by the separate head unit 310. Accordingly, there is no situation in which one head unit 310 continuously executes drawing light irradiation to a pair of adjacent drawing areas 91, 91, and the head unit 310 applies drawing light to a certain drawing area 91. After executing this irradiation, a sufficient rest period is always ensured before the irradiation of the drawing light to the next drawing area 91 is started. According to this configuration, for example, by preparing for the irradiation of the drawing light to the next drawing area 91 in the head unit 310 during the suspension period, the head unit 310 is provided with respect to each drawing area 91. Irradiation of the drawing light can always be started in an appropriate state.

<7. Modification>
In the above embodiment, the substrate 9 to be processed is a substrate scheduled to be multi-faced according to the plurality of drawing areas 91, but the substrate 9 to be processed is not necessarily a multi-faceted board. There is no need. For example, the substrate 9 to be processed may be a semiconductor substrate in which grid-like scribe lines are formed on the main surface and a drawing area in units of chips surrounded by the scribe lines is set. In this case, the entire main surface of the substrate is divided using the scribe line as a boundary line, and each partial region composed of one or more chips is associated with one of the plurality of head units 310, 310,. It is preferable that the head unit 310 associated with the partial area is in charge of the irradiation of the drawing light to each partial area. Also in this aspect, since a joint portion between the head units 310 does not occur in the area of each chip unit, a pattern can be appropriately drawn on each chip unit without waste.

  In the above embodiment, the optical path correction unit 86 includes the two wedge prisms 851 and the wedge prism moving mechanism 852. However, the optical path correction unit 86 does not necessarily have such a configuration. Good. For example, a glass plate and a posture in which the glass plate is rotatably supported with respect to a rotation axis along the Y-axis direction (that is, a direction orthogonal to the optical axis direction (Z-axis direction) and the sub-scanning direction (X-axis direction)). You may comprise from a change mechanism. In this configuration, the path of light incident on the glass plate can be shifted along the X-axis direction by changing the attitude of the glass plate and changing the incident angle when entering the glass plate. However, this shift amount is determined according to the rotation angle of the glass plate.

  In the above embodiment, the drawing apparatus 1 includes the two head unit groups 30, but the drawing apparatus may include one head unit group 30, or three or more. The head unit group 30 may be provided.

  In the above-described embodiment, each head unit group 30 includes two head units 310, but each head unit group may include three or more head units 310.

  In the above embodiment, a diffraction grating type spatial modulator is used as the spatial light modulator 841, but the configuration of the spatial light modulator 841 is not limited to this. For example, DMD (Digital Micromirror Device) may be used.

  Further, in the above-described embodiment, the substrate 9 is moved along the main scanning axis by the holding and transport mechanism 20, so that each head unit 310 is moved relative to the substrate 9 along the main scanning axis. However, the configuration may be such that each head unit 310 is moved relative to the substrate 9 along the main scanning axis by moving each head unit 310 along the main scanning axis. .

  In the above embodiment, each head unit group 30 is moved along the sub-scanning axis by the head moving mechanism 40, so that each head unit group 30 is relative to the substrate 9 along the sub-scanning axis. However, each head unit group 30 is moved relative to the substrate 9 along the sub-scanning axis by moving the substrate 9 along the sub-scanning axis. May be.

  In the above embodiment, the head unit 310 is relatively moved to the original position (the start position of the forward main scanning) by transporting the substrate 9 in the backward direction after the forward main scanning is completed. However, the drawing process may be performed while the head unit 310 is relatively moved in the return path direction. In this case, in the head unit 310, the imaging heads 312 are respectively arranged on the front side and the rear side in the moving direction of the drawing head 311. That is, the two imaging heads 312 and 312 are arranged with the drawing head 311 interposed therebetween. Then, the forward main scanning with the drawing process is completed, the head moving mechanism 40 moves the head unit group 30 along the sub-scanning axis by a distance corresponding to the drawing width, and then the head unit 310 returns with the drawing process. The main scan is executed. However, when the head unit 310 starts the return main scanning accompanied with the drawing process, the relative positional relationship between the substrate 9 and the head unit 310 is set to the second imaging head (the drawing head 311 in the moving direction of the return main scanning). The positional relationship between the imaging head 312 disposed on the preceding side and the substrate 9 is arranged on the side preceding the drawing head 311 in the moving direction of the forward main scanning when starting the forward main scanning. The imaging head) 312 and the substrate 9 are adjusted so as to have the same positional relationship. Specifically, for example, by moving the head unit 310 by a predetermined amount relative to the substrate 9 in the moving direction of the forward main scanning from the end position of the forward main scanning in the above-described embodiment, The positional relationship between the two imaging heads 312 and the substrate 9 can be an intended positional relationship. In addition, the backward main scanning may be performed while performing the drawing process in the same manner as the forward main scanning.

DESCRIPTION OF SYMBOLS 1 Drawing apparatus 20 Holding | maintenance conveyance mechanism 30 Head unit group 310 Head unit 311 Drawing head 312 Imaging head 40 Head moving mechanism 50 Control part 9 Substrate 91 Drawing area

Claims (8)

A drawing apparatus for drawing a pattern by irradiating light onto a substrate,
A head unit group comprising a plurality of head units arranged at intervals along a predetermined axis;
A moving mechanism for moving the head unit group relative to the substrate along the predetermined axis;
With
Each of the plurality of head units is
A drawing head that emits drawing light according to a pattern to be formed on the substrate toward the substrate while being moved relative to the substrate along the predetermined axis;
An imaging head for imaging a partial region in the plane of the substrate;
A drawing position correction unit that corrects the irradiation position of the drawing light based on imaging data acquired by the imaging head;
A control unit that independently controls the irradiation of the drawing light in each of the plurality of head units;
With
The control unit is
When a plurality of drawing areas separated from each other with a non-drawing area are set within the surface of the substrate to be processed, each of the plurality of drawing areas corresponds to one of the plurality of head units. And a drawing apparatus that causes each of the plurality of head units to be in charge of irradiation of the drawing light to a drawing region associated with the head unit. The drawing apparatus according to claim 1,
A plurality of the head unit groups are provided,
The drawing apparatus, wherein the plurality of head unit groups are arranged along an axis orthogonal to the predetermined axis.   The drawing apparatus according to claim 1 or 2,
  The control unit is
  From the imaging data acquired by the imaging head included in the head unit, a boundary position between the non-drawing area and the drawing area is detected, and based on the detected boundary position, the drawing head included in the head unit A drawing apparatus for determining a timing for starting emission of the drawing light.   The drawing apparatus according to any one of claims 1 to 3,
  The control unit is
  A drawing apparatus that associates each of a pair of drawing regions adjacent to each other across the non-drawing region along the predetermined axis among the plurality of drawing regions with a separate head unit.   A drawing method for drawing a pattern by irradiating a substrate with light,
  a) moving a head unit group including a plurality of head units arranged at intervals along a predetermined axis relative to the substrate along the predetermined axis;
  b) a step in which a drawing head included in the head unit emits drawing light according to a pattern to be formed on the substrate toward the substrate while the step a) is performed;
  c) a step in which the imaging head included in the head unit images a partial region in the plane of the substrate while the step a) is performed;
  d) correcting the irradiation position of the drawing light based on the imaging data acquired by the imaging head during the step b);
With
  Each of the plurality of drawing areas corresponds to one of the plurality of head units when a plurality of drawing areas separated from each other with a non-drawing area are set within the surface of the substrate to be processed. A drawing method, wherein each of the plurality of head units is in charge of irradiating the drawing light to a drawing region associated with the head unit.   The drawing method according to claim 5, wherein
  A plurality of the head unit groups are provided,
  The plurality of head unit groups are arranged along an axis orthogonal to the predetermined axis,
  In the step a), the plurality of head unit groups are moved relative to the substrate along the predetermined axis.   The drawing method according to claim 5 or 6, wherein
  e) Detecting a boundary position between the non-drawing area and the drawing area from imaging data acquired by the imaging head included in the head unit, and the drawing included in the head unit based on the detected boundary position Determining the timing to start emitting the drawing light from the head;
A drawing method further comprising:   The drawing method according to any one of claims 5 to 7,
  A drawing method in which, among the plurality of drawing areas, each of a pair of drawing areas adjacent to each other across the non-drawing area along the predetermined axis is associated with a separate head unit.

Images