JP2023022319A - ガラス - Google Patents
ガラス Download PDFInfo
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- JP2023022319A JP2023022319A JP2022197214A JP2022197214A JP2023022319A JP 2023022319 A JP2023022319 A JP 2023022319A JP 2022197214 A JP2022197214 A JP 2022197214A JP 2022197214 A JP2022197214 A JP 2022197214A JP 2023022319 A JP2023022319 A JP 2023022319A
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- JP
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- glass
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- cao
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011521 glass Substances 0.000 title claims abstract description 84
- 239000000203 mixture Substances 0.000 claims abstract description 12
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 claims abstract description 4
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 claims abstract description 4
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 claims abstract description 4
- 239000013078 crystal Substances 0.000 claims description 31
- 239000000758 substrate Substances 0.000 claims description 26
- 239000004065 semiconductor Substances 0.000 claims description 19
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 15
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 8
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 12
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052681 coesite Inorganic materials 0.000 abstract description 6
- 229910052593 corundum Inorganic materials 0.000 abstract description 6
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 6
- 239000000377 silicon dioxide Substances 0.000 abstract description 6
- 229910052682 stishovite Inorganic materials 0.000 abstract description 6
- 229910052905 tridymite Inorganic materials 0.000 abstract description 6
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 20
- 238000004031 devitrification Methods 0.000 description 17
- 230000007423 decrease Effects 0.000 description 16
- 230000000694 effects Effects 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 229910052697 platinum Inorganic materials 0.000 description 10
- 229910006404 SnO 2 Inorganic materials 0.000 description 6
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 5
- 238000000465 moulding Methods 0.000 description 4
- 229910052594 sapphire Inorganic materials 0.000 description 4
- 239000010980 sapphire Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 239000006060 molten glass Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 239000006066 glass batch Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum oxide Inorganic materials [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000007500 overflow downdraw method Methods 0.000 description 2
- KTUFCUMIWABKDW-UHFFFAOYSA-N oxo(oxolanthaniooxy)lanthanum Chemical compound O=[La]O[La]=O KTUFCUMIWABKDW-UHFFFAOYSA-N 0.000 description 2
- NOTVAPJNGZMVSD-UHFFFAOYSA-N potassium monoxide Inorganic materials [K]O[K] NOTVAPJNGZMVSD-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 229910002601 GaN Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910019603 Rh2O3 Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000006025 fining agent Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000007372 rollout process Methods 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/02—Other methods of shaping glass by casting molten glass, e.g. injection moulding
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/18—Stirring devices; Homogenisation
- C03B5/187—Stirring devices; Homogenisation with moving elements
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02422—Non-crystalline insulating materials, e.g. glass, polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Glass Compositions (AREA)
Abstract
Description
を指す。
引き上げ法で測定した値を指す。
β-OH値 = (1/X)log(T1/T2)
X:ガラス肉厚(mm)
T1:参照波長3846cm-1における透過率(%)
T2:水酸基吸収波長3600cm-1付近における最小透過率(%)
Claims (11)
- ガラス組成として、モル%で、SiO2 55~80%、Al2O3 11~30%、B2O3 0~3%、Li2O+Na2O+K2O 0~3%、MgO+CaO+SrO+BaO 5~35%を含有し、且つ歪点が700℃より高いことを特徴とするガラス。
- B2O3の含有量が1モル%未満であることを特徴とする請求項1に記載のガラス。
- Li2O+Na2O+K2Oの含有量が0.2モル%以下であることを特徴とする請求項1又は2に記載のガラス。
- モル比(MgO+CaO+SrO+BaO)/Al2O3が0.5~5であることを特徴とする請求項1~3の何れかに記載のガラス。
- モル比MgO/(MgO+CaO+SrO+BaO)が0.5未満であることを特徴とする請求項1~4の何れかに記載のガラス。
- 30~380℃の温度範囲における熱膨張係数が40×10-7/℃以上であることを特徴とする請求項1~5の何れかに記載のガラス。
- 歪点が800℃以上であることを特徴とする請求項1~6の何れかに記載のガラス。
- (102.5dPa・sにおける温度-歪点)が900℃以下であることを特徴とする請求項1~7の何れかに記載のガラス。
- 102.5dPa・sの粘度における温度が1750℃以下であることを特徴とする請求項1~8の何れかに記載のガラス。
- 平板形状であることを特徴とする請求項1~9の何れかに記載のガラス。
- 半導体結晶を作製するための基板に用いることを特徴とする請求項1~10の何れかに記載のガラス。
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015076615 | 2015-04-03 | ||
JP2015076615 | 2015-04-03 | ||
JP2015164475 | 2015-08-24 | ||
JP2015164475 | 2015-08-24 | ||
PCT/JP2016/060914 WO2016159345A1 (ja) | 2015-04-03 | 2016-04-01 | ガラス |
JP2017510249A JP7219538B2 (ja) | 2015-04-03 | 2016-04-01 | ガラス |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017510249A Division JP7219538B2 (ja) | 2015-04-03 | 2016-04-01 | ガラス |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2023022319A true JP2023022319A (ja) | 2023-02-14 |
Family
ID=57006115
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017510249A Active JP7219538B2 (ja) | 2015-04-03 | 2016-04-01 | ガラス |
JP2021014161A Active JP7486446B2 (ja) | 2015-04-03 | 2021-02-01 | ガラス |
JP2022197214A Pending JP2023022319A (ja) | 2015-04-03 | 2022-12-09 | ガラス |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017510249A Active JP7219538B2 (ja) | 2015-04-03 | 2016-04-01 | ガラス |
JP2021014161A Active JP7486446B2 (ja) | 2015-04-03 | 2021-02-01 | ガラス |
Country Status (5)
Country | Link |
---|---|
JP (3) | JP7219538B2 (ja) |
KR (1) | KR20170136495A (ja) |
CN (3) | CN107406300A (ja) |
TW (3) | TW202235390A (ja) |
WO (1) | WO2016159345A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20230165865A (ko) * | 2016-12-28 | 2023-12-05 | 니폰 덴키 가라스 가부시키가이샤 | 유리 |
KR102157928B1 (ko) | 2017-10-20 | 2020-09-18 | 주식회사 엘지화학 | 3층 구조의 공급 스페이서 및 이를 포함하는 역삼투막 필터 모듈 |
US11214512B2 (en) | 2017-12-19 | 2022-01-04 | Owens Coming Intellectual Capital, LLC | High performance fiberglass composition |
JP7418947B2 (ja) * | 2018-01-31 | 2024-01-22 | 日本電気硝子株式会社 | ガラス |
JP7448890B2 (ja) | 2018-10-05 | 2024-03-13 | 日本電気硝子株式会社 | 無アルカリガラス板 |
Family Cites Families (29)
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GB2032909B (en) * | 1978-08-09 | 1982-12-22 | Gen Electric | Sealing glass compositions |
JPS57191251A (en) * | 1981-05-19 | 1982-11-25 | Nippon Electric Glass Co Ltd | Glass composition |
US4634684A (en) * | 1985-10-23 | 1987-01-06 | Corning Glass Works | Strontium aluminosilicate glass substrates for flat panel display devices |
JPH0825772B2 (ja) * | 1987-01-16 | 1996-03-13 | 日本板硝子株式会社 | 電子機器の基板用ガラス |
JPH0818845B2 (ja) * | 1987-11-11 | 1996-02-28 | 日本板硝子株式会社 | 電子機器用ガラス基板 |
JPH04175242A (ja) * | 1990-11-06 | 1992-06-23 | Asahi Glass Co Ltd | 無アルカリガラス |
JP3804112B2 (ja) * | 1996-07-29 | 2006-08-02 | 旭硝子株式会社 | 無アルカリガラス、無アルカリガラスの製造方法およびフラットディスプレイパネル |
DE19916296C1 (de) * | 1999-04-12 | 2001-01-18 | Schott Glas | Alkalifreies Aluminoborosilicatglas und dessen Verwendung |
JP2001122637A (ja) * | 1999-10-26 | 2001-05-08 | Nippon Electric Glass Co Ltd | ディスプレイ用ガラス基板 |
JP2002003240A (ja) * | 2000-06-19 | 2002-01-09 | Nippon Electric Glass Co Ltd | 液晶ディスプレイ用ガラス基板 |
WO2007021503A1 (en) * | 2005-08-17 | 2007-02-22 | Corning Incorporated | High strain point glasses |
WO2007095115A1 (en) * | 2006-02-10 | 2007-08-23 | Corning Incorporated | Glass compositions having high thermal and chemical stability and methods of making thereof |
US8187715B2 (en) * | 2008-05-13 | 2012-05-29 | Corning Incorporated | Rare-earth-containing glass material and substrate and device comprising such substrate |
WO2011001920A1 (ja) * | 2009-07-02 | 2011-01-06 | 旭硝子株式会社 | 無アルカリガラスおよびその製造方法 |
JP5751439B2 (ja) * | 2010-08-17 | 2015-07-22 | 日本電気硝子株式会社 | 無アルカリガラス |
CN102417298A (zh) * | 2010-09-27 | 2012-04-18 | 旭硝子株式会社 | 无碱玻璃 |
JP5874304B2 (ja) * | 2010-11-02 | 2016-03-02 | 日本電気硝子株式会社 | 無アルカリガラス |
EP2639205B1 (en) * | 2010-11-08 | 2019-03-06 | Nippon Electric Glass Co., Ltd. | Alkali-free glass |
KR101927555B1 (ko) * | 2011-01-25 | 2018-12-10 | 코닝 인코포레이티드 | 높은 열적 및 화학적 안정성을 갖는 유리 조성물 |
JP5831838B2 (ja) * | 2011-03-08 | 2015-12-09 | 日本電気硝子株式会社 | 無アルカリガラス |
JP5935471B2 (ja) * | 2011-04-25 | 2016-06-15 | 日本電気硝子株式会社 | 液晶レンズ |
CN103987666B (zh) | 2011-12-06 | 2016-05-25 | 旭硝子株式会社 | 无碱玻璃的制造方法 |
US9162919B2 (en) * | 2012-02-28 | 2015-10-20 | Corning Incorporated | High strain point aluminosilicate glasses |
CN104271526B (zh) | 2012-04-27 | 2016-12-07 | 旭硝子株式会社 | 无碱玻璃及其制造方法 |
JP6365826B2 (ja) * | 2013-07-11 | 2018-08-01 | 日本電気硝子株式会社 | ガラス |
JP6256744B2 (ja) * | 2013-10-17 | 2018-01-10 | 日本電気硝子株式会社 | 無アルカリガラス板 |
EP3122783B1 (en) * | 2014-03-24 | 2019-09-04 | Immuneonco Biopharmaceuticals (Shanghai) Co., Ltd. | Novel recombinant bi-functional fusion proteins, preparation and use thereof |
JP2015224150A (ja) | 2014-05-27 | 2015-12-14 | 旭硝子株式会社 | 無アルカリガラスの製造方法 |
JP6578774B2 (ja) * | 2014-07-18 | 2019-09-25 | Agc株式会社 | 無アルカリガラス |
-
2016
- 2016-04-01 TW TW111118162A patent/TW202235390A/zh unknown
- 2016-04-01 TW TW105110469A patent/TWI706923B/zh active
- 2016-04-01 CN CN201680012773.9A patent/CN107406300A/zh active Pending
- 2016-04-01 KR KR1020177022657A patent/KR20170136495A/ko not_active Application Discontinuation
- 2016-04-01 TW TW109131014A patent/TWI768463B/zh active
- 2016-04-01 WO PCT/JP2016/060914 patent/WO2016159345A1/ja active Application Filing
- 2016-04-01 JP JP2017510249A patent/JP7219538B2/ja active Active
- 2016-04-01 CN CN202310080491.4A patent/CN116040940A/zh active Pending
- 2016-04-01 CN CN202310085917.5A patent/CN115974404A/zh active Pending
-
2021
- 2021-02-01 JP JP2021014161A patent/JP7486446B2/ja active Active
-
2022
- 2022-12-09 JP JP2022197214A patent/JP2023022319A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
TW201704164A (zh) | 2017-02-01 |
CN116040940A (zh) | 2023-05-02 |
CN115974404A (zh) | 2023-04-18 |
JP7486446B2 (ja) | 2024-05-17 |
TW202235390A (zh) | 2022-09-16 |
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JP7219538B2 (ja) | 2023-02-08 |
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