JP2022553290A5 - - Google Patents

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Publication number
JP2022553290A5
JP2022553290A5 JP2022523381A JP2022523381A JP2022553290A5 JP 2022553290 A5 JP2022553290 A5 JP 2022553290A5 JP 2022523381 A JP2022523381 A JP 2022523381A JP 2022523381 A JP2022523381 A JP 2022523381A JP 2022553290 A5 JP2022553290 A5 JP 2022553290A5
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JP
Japan
Prior art keywords
carbon atoms
substrate
group
chain
fluorinated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022523381A
Other languages
English (en)
Japanese (ja)
Other versions
JP7614194B2 (ja
JP2022553290A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/IB2020/059479 external-priority patent/WO2021079223A1/en
Publication of JP2022553290A publication Critical patent/JP2022553290A/ja
Publication of JP2022553290A5 publication Critical patent/JP2022553290A5/ja
Application granted granted Critical
Publication of JP7614194B2 publication Critical patent/JP7614194B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2022523381A 2019-10-21 2020-10-08 基材からのエレクトロルミネッセンス材料の除去 Active JP7614194B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962923835P 2019-10-21 2019-10-21
US62/923,835 2019-10-21
PCT/IB2020/059479 WO2021079223A1 (en) 2019-10-21 2020-10-08 Removal of electroluminescenct materials from substrates

Publications (3)

Publication Number Publication Date
JP2022553290A JP2022553290A (ja) 2022-12-22
JP2022553290A5 true JP2022553290A5 (enExample) 2023-10-16
JP7614194B2 JP7614194B2 (ja) 2025-01-15

Family

ID=73043301

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022523381A Active JP7614194B2 (ja) 2019-10-21 2020-10-08 基材からのエレクトロルミネッセンス材料の除去

Country Status (4)

Country Link
JP (1) JP7614194B2 (enExample)
CN (1) CN114502709B (enExample)
TW (1) TWI874473B (enExample)
WO (1) WO2021079223A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118202032A (zh) * 2021-10-07 2024-06-14 3M创新有限公司 氟化的清洁流体

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3476812A (en) * 1966-12-12 1969-11-04 Air Reduction Fluorine containing halogenated dialkyl sulfides
GB1401431A (en) * 1971-08-06 1975-07-16 Haszeldine R N Preparation of fluoroalkane sulphides and the conversion thereof into fluoroalkane sulphonic acids
US5925611A (en) * 1995-01-20 1999-07-20 Minnesota Mining And Manufacturing Company Cleaning process and composition
US6159917A (en) * 1998-12-16 2000-12-12 3M Innovative Properties Company Dry cleaning compositions containing hydrofluoroether
JP3833650B2 (ja) * 2003-12-04 2006-10-18 関東化学株式会社 低分子型有機ｅｌ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法
JP2011183249A (ja) * 2010-03-04 2011-09-22 Hitachi High-Technologies Corp 蒸着マスクの洗浄装置
WO2019003605A1 (ja) * 2017-06-26 2019-01-03 Ａｇｃ株式会社 真空蒸着用のマスクの洗浄方法及びリンス組成物

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