JP2022518225A5 - - Google Patents

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Publication number
JP2022518225A5
JP2022518225A5 JP2021541463A JP2021541463A JP2022518225A5 JP 2022518225 A5 JP2022518225 A5 JP 2022518225A5 JP 2021541463 A JP2021541463 A JP 2021541463A JP 2021541463 A JP2021541463 A JP 2021541463A JP 2022518225 A5 JP2022518225 A5 JP 2022518225A5
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JP
Japan
Prior art keywords
measurement system
spectral
intensity
targets
reference targets
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JP2021541463A
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English (en)
Japanese (ja)
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JP2022518225A (ja
JP7333406B2 (ja
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Priority claimed from US16/286,315 external-priority patent/US11422095B2/en
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Publication of JP2022518225A publication Critical patent/JP2022518225A/ja
Publication of JP2022518225A5 publication Critical patent/JP2022518225A5/ja
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Publication of JP7333406B2 publication Critical patent/JP7333406B2/ja
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JP2021541463A 2019-01-18 2020-01-16 所望しない回折次数の存在下でのスキャトロメトリモデル化 Active JP7333406B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201962794510P 2019-01-18 2019-01-18
US62/794,510 2019-01-18
US16/286,315 2019-02-26
US16/286,315 US11422095B2 (en) 2019-01-18 2019-02-26 Scatterometry modeling in the presence of undesired diffraction orders
PCT/US2020/013768 WO2020150407A1 (en) 2019-01-18 2020-01-16 Scatterometry modeling in the presence of undesired diffraction orders

Publications (3)

Publication Number Publication Date
JP2022518225A JP2022518225A (ja) 2022-03-14
JP2022518225A5 true JP2022518225A5 (https=) 2023-01-25
JP7333406B2 JP7333406B2 (ja) 2023-08-24

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ID=71608839

Family Applications (1)

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JP2021541463A Active JP7333406B2 (ja) 2019-01-18 2020-01-16 所望しない回折次数の存在下でのスキャトロメトリモデル化

Country Status (7)

Country Link
US (1) US11422095B2 (https=)
EP (1) EP3891489B1 (https=)
JP (1) JP7333406B2 (https=)
KR (1) KR102546448B1 (https=)
CN (1) CN113302473B (https=)
TW (1) TWI809237B (https=)
WO (1) WO2020150407A1 (https=)

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TW202131240A (zh) 2019-10-16 2021-08-16 美商Ｐｄｆ對策公司 藉由累積預測進行的機器學習變數選定及根本原因發現
US20240085321A1 (en) * 2022-09-09 2024-03-14 Kla Corporation Methods And Systems For Model-less, Scatterometry Based Measurements Of Semiconductor Structures
TWI898876B (zh) * 2024-10-16 2025-09-21 國立臺灣大學 量測關鍵尺寸的光學量測系統與方法

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