JP2008523392A5 - - Google Patents
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- JP2008523392A5 JP2008523392A5 JP2007545555A JP2007545555A JP2008523392A5 JP 2008523392 A5 JP2008523392 A5 JP 2008523392A5 JP 2007545555 A JP2007545555 A JP 2007545555A JP 2007545555 A JP2007545555 A JP 2007545555A JP 2008523392 A5 JP2008523392 A5 JP 2008523392A5
- Authority
- JP
- Japan
- Prior art keywords
- spectroscopic
- measurement
- diffracted light
- angles
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US63530504P | 2004-12-09 | 2004-12-09 | |
| US60/635,305 | 2004-12-09 | ||
| US11/078,572 | 2005-03-11 | ||
| US11/078,572 US7483133B2 (en) | 2004-12-09 | 2005-03-11 | Multiple angle of incidence spectroscopic scatterometer system |
| PCT/US2005/044075 WO2006062952A2 (en) | 2004-12-09 | 2005-12-06 | Multiple angle of incidence spectroscopic scatterometer system |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008523392A JP2008523392A (ja) | 2008-07-03 |
| JP2008523392A5 true JP2008523392A5 (https=) | 2011-10-27 |
| JP4879187B2 JP4879187B2 (ja) | 2012-02-22 |
Family
ID=36578480
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007545555A Expired - Fee Related JP4879187B2 (ja) | 2004-12-09 | 2005-12-06 | 複数入射角分光散乱計システム |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US7483133B2 (https=) |
| JP (1) | JP4879187B2 (https=) |
| WO (1) | WO2006062952A2 (https=) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8189193B1 (en) * | 2004-04-23 | 2012-05-29 | J.A. Woollam Co., Inc. | System and method of applying horizontally oriented arc-lamps in ellipsometer or the like systems |
| US7738105B1 (en) * | 2004-04-23 | 2010-06-15 | Liphardt Martin M | System and method of applying horizontally oriented arc-lamps in ellipsometer or the like systems |
| US20080144036A1 (en) * | 2006-12-19 | 2008-06-19 | Asml Netherlands B.V. | Method of measurement, an inspection apparatus and a lithographic apparatus |
| US7791727B2 (en) * | 2004-08-16 | 2010-09-07 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
| US20070091325A1 (en) * | 2005-01-07 | 2007-04-26 | Mehrdad Nikoonahad | Multi-channel optical metrology |
| JP4567487B2 (ja) * | 2005-02-25 | 2010-10-20 | エスアイアイ・ナノテクノロジー株式会社 | 試料観察方法、試料加工方法および荷電粒子ビーム装置 |
| US7801713B1 (en) * | 2006-11-17 | 2010-09-21 | Kla-Tencor Corporation | Generating a model using global node optimization |
| US7924435B2 (en) * | 2006-12-22 | 2011-04-12 | Zygo Corporation | Apparatus and method for measuring characteristics of surface features |
| JP5572293B2 (ja) * | 2008-07-07 | 2014-08-13 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法及び欠陥検査装置 |
| JP5341440B2 (ja) * | 2008-09-10 | 2013-11-13 | 株式会社日立ハイテクノロジーズ | 検査装置 |
| JP2012137510A (ja) * | 2009-07-27 | 2012-07-19 | Chihiro Suzuki | 光学ユニット |
| US20110276319A1 (en) * | 2010-05-06 | 2011-11-10 | Jonathan Michael Madsen | Determination of material optical properties for optical metrology of structures |
| US8502977B1 (en) * | 2010-06-01 | 2013-08-06 | Kla-Tencor Corporation | Angular resolved spectroscopic scatterometer |
| JP2012198118A (ja) * | 2011-03-22 | 2012-10-18 | Olympus Corp | 測光装置 |
| WO2012147717A1 (ja) * | 2011-04-26 | 2012-11-01 | 株式会社島津製作所 | 樹脂識別装置 |
| CN103492845B (zh) * | 2011-04-28 | 2015-09-16 | 柯尼卡美能达株式会社 | 多角度测色计 |
| US8456639B2 (en) | 2011-07-01 | 2013-06-04 | Kla-Tencor Corporation | Measurement of critical dimension |
| CN105549341A (zh) * | 2012-02-21 | 2016-05-04 | Asml荷兰有限公司 | 检查设备和方法 |
| US20150073714A1 (en) * | 2012-04-02 | 2015-03-12 | Landmark Graphics Corporation | Vsp systems and methods representing survey data as parameterized compression, shear, and dispersive wave fields |
| JP6688732B2 (ja) * | 2013-09-16 | 2020-04-28 | ケーエルエー コーポレイション | 多入射角半導体計測システム及び方法 |
| US9115987B2 (en) | 2013-12-04 | 2015-08-25 | Nanometrics Incorporated | Optical metrology with multiple angles of incidence and/or azimuth angles |
| JP6306724B2 (ja) | 2014-01-09 | 2018-04-04 | ザイゴ コーポレーションZygo Corporation | 非球面およびその他の非平坦面のトポグラフィの測定 |
| US9588066B2 (en) | 2014-01-23 | 2017-03-07 | Revera, Incorporated | Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) |
| US11157072B1 (en) * | 2016-02-24 | 2021-10-26 | Apple Inc. | Direct retinal projector |
| WO2018213971A1 (zh) * | 2017-05-22 | 2018-11-29 | 深圳配天智能技术研究院有限公司 | 一种视觉检测参数的确定方法、视觉检测设备以及视觉检测系统 |
| KR102751649B1 (ko) * | 2018-03-12 | 2025-01-07 | 오르보테크 엘티디. | 자동화된 광학 검사를 위한 광학 시스템 |
| WO2020090300A1 (ja) * | 2018-11-01 | 2020-05-07 | 富士フイルム株式会社 | 分光測定装置 |
| JP7106673B2 (ja) * | 2018-11-01 | 2022-07-26 | 富士フイルム株式会社 | 分光測定装置 |
| US12360062B1 (en) * | 2021-12-29 | 2025-07-15 | Kla Corporation | Methods and systems for regularizing the optimization of application specific semiconductor measurement system parameter settings |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4548506A (en) * | 1979-12-26 | 1985-10-22 | The United States Of America As Represented By The Secretary Of The Navy | Nondestructive analysis of multilayer roughness correlation |
| JPH0227305A (ja) * | 1988-07-18 | 1990-01-30 | Mitsubishi Rayon Co Ltd | 耐熱性光学繊維 |
| US5166752A (en) * | 1990-01-11 | 1992-11-24 | Rudolph Research Corporation | Simultaneous multiple angle/multiple wavelength ellipsometer and method |
| US5563702A (en) * | 1991-08-22 | 1996-10-08 | Kla Instruments Corporation | Automated photomask inspection apparatus and method |
| US5412473A (en) * | 1993-07-16 | 1995-05-02 | Therma-Wave, Inc. | Multiple angle spectroscopic analyzer utilizing interferometric and ellipsometric devices |
| US5608526A (en) * | 1995-01-19 | 1997-03-04 | Tencor Instruments | Focused beam spectroscopic ellipsometry method and system |
| US5889593A (en) * | 1997-02-26 | 1999-03-30 | Kla Instruments Corporation | Optical system and method for angle-dependent reflection or transmission measurement |
| US6483580B1 (en) | 1998-03-06 | 2002-11-19 | Kla-Tencor Technologies Corporation | Spectroscopic scatterometer system |
| IL130874A (en) * | 1999-07-09 | 2002-12-01 | Nova Measuring Instr Ltd | System and method for measuring pattern structures |
| CN1303397C (zh) * | 2000-01-26 | 2007-03-07 | 音质技术公司 | 为集成电路周期性光栅产生仿真衍射信号库的方法及系统 |
| US6429943B1 (en) * | 2000-03-29 | 2002-08-06 | Therma-Wave, Inc. | Critical dimension analysis with simultaneous multiple angle of incidence measurements |
| JP4666244B2 (ja) * | 2000-09-13 | 2011-04-06 | 株式会社ニコン | 表面検査装置および方法 |
| US6900892B2 (en) * | 2000-12-19 | 2005-05-31 | Kla-Tencor Technologies Corporation | Parametric profiling using optical spectroscopic systems |
| WO2002070985A1 (en) * | 2001-03-02 | 2002-09-12 | Accent Optical Technologies, Inc. | Line profile asymmetry measurement using scatterometry |
| US6704661B1 (en) * | 2001-07-16 | 2004-03-09 | Therma-Wave, Inc. | Real time analysis of periodic structures on semiconductors |
| US6785638B2 (en) * | 2001-08-06 | 2004-08-31 | Timbre Technologies, Inc. | Method and system of dynamic learning through a regression-based library generation process |
| US7031894B2 (en) * | 2002-01-16 | 2006-04-18 | Timbre Technologies, Inc. | Generating a library of simulated-diffraction signals and hypothetical profiles of periodic gratings |
| IL148484A (en) * | 2002-03-04 | 2008-11-26 | Nova Measuring Instr Ltd | Optical measurements of patterned structures |
| US6721691B2 (en) * | 2002-03-26 | 2004-04-13 | Timbre Technologies, Inc. | Metrology hardware specification using a hardware simulator |
| US6804005B2 (en) * | 2002-05-02 | 2004-10-12 | Timbre Technologies, Inc. | Overlay measurements using zero-order cross polarization measurements |
| US6919964B2 (en) * | 2002-07-09 | 2005-07-19 | Therma-Wave, Inc. | CD metrology analysis using a finite difference method |
| AU2003236819A1 (en) * | 2002-07-12 | 2004-02-02 | Luka Optoscope Aps | Method and apparatus for optically measuring the topography of nearly planar periodic structures |
| US7330279B2 (en) * | 2002-07-25 | 2008-02-12 | Timbre Technologies, Inc. | Model and parameter selection for optical metrology |
| US6784638B2 (en) * | 2003-01-24 | 2004-08-31 | Fu-I Yang | Series charger with separate detection of batteries |
| US7274472B2 (en) * | 2003-05-28 | 2007-09-25 | Timbre Technologies, Inc. | Resolution enhanced optical metrology |
| US7126700B2 (en) * | 2003-12-12 | 2006-10-24 | Timbre Technologies, Inc. | Parametric optimization of optical metrology model |
-
2005
- 2005-03-11 US US11/078,572 patent/US7483133B2/en not_active Expired - Lifetime
- 2005-12-06 WO PCT/US2005/044075 patent/WO2006062952A2/en not_active Ceased
- 2005-12-06 JP JP2007545555A patent/JP4879187B2/ja not_active Expired - Fee Related
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