JP2022512098A - Emm-41組成物、その製造方法、及び使用方法 - Google Patents
Emm-41組成物、その製造方法、及び使用方法 Download PDFInfo
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- JP2022512098A JP2022512098A JP2021531636A JP2021531636A JP2022512098A JP 2022512098 A JP2022512098 A JP 2022512098A JP 2021531636 A JP2021531636 A JP 2021531636A JP 2021531636 A JP2021531636 A JP 2021531636A JP 2022512098 A JP2022512098 A JP 2022512098A
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- 238000000034 method Methods 0.000 title claims abstract description 46
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- 239000000463 material Substances 0.000 claims abstract description 126
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 34
- 239000013078 crystal Substances 0.000 claims description 30
- 239000011541 reaction mixture Substances 0.000 claims description 27
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 26
- 238000002441 X-ray diffraction Methods 0.000 claims description 25
- 150000001875 compounds Chemical class 0.000 claims description 25
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- -1 hydroxide ions Chemical class 0.000 claims description 21
- 238000010438 heat treatment Methods 0.000 claims description 18
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- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 15
- ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 2,3-dimethylbutane Chemical compound CC(C)C(C)C ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 0.000 claims description 13
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- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 claims description 9
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- OTILCBBQTIFAGJ-UHFFFAOYSA-N 3-[3-(3-hydroxypropyl)phenyl]propan-1-ol Chemical compound OCCCC1=CC=CC(CCCO)=C1 OTILCBBQTIFAGJ-UHFFFAOYSA-N 0.000 description 3
- 239000005995 Aluminium silicate Substances 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
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- SSCDXIGJDZLROG-UHFFFAOYSA-L 1-methyl-1-[3-[3-[3-(1-methylpyrrolidin-1-ium-1-yl)propyl]phenyl]propyl]pyrrolidin-1-ium dihydroxide Chemical compound [OH-].C1(=CC(=CC=C1)CCC[N+]1(CCCC1)C)CCC[N+]1(CCCC1)C.[OH-] SSCDXIGJDZLROG-UHFFFAOYSA-L 0.000 description 1
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- 238000006356 dehydrogenation reaction Methods 0.000 description 1
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- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
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- GOMCKELMLXHYHH-UHFFFAOYSA-L dipotassium;phthalate Chemical compound [K+].[K+].[O-]C(=O)C1=CC=CC=C1C([O-])=O GOMCKELMLXHYHH-UHFFFAOYSA-L 0.000 description 1
- UQGFMSUEHSUPRD-UHFFFAOYSA-N disodium;3,7-dioxido-2,4,6,8,9-pentaoxa-1,3,5,7-tetraborabicyclo[3.3.1]nonane Chemical compound [Na+].[Na+].O1B([O-])OB2OB([O-])OB1O2 UQGFMSUEHSUPRD-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000004108 freeze drying Methods 0.000 description 1
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052621 halloysite Inorganic materials 0.000 description 1
- 125000004970 halomethyl group Chemical group 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- HVTICUPFWKNHNG-UHFFFAOYSA-N iodoethane Chemical compound CCI HVTICUPFWKNHNG-UHFFFAOYSA-N 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052622 kaolinite Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012263 liquid product Substances 0.000 description 1
- 239000012280 lithium aluminium hydride Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052605 nesosilicate Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 150000004762 orthosilicates Chemical class 0.000 description 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000004375 physisorption Methods 0.000 description 1
- 150000003058 platinum compounds Chemical class 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- TVDSBUOJIPERQY-UHFFFAOYSA-N prop-2-yn-1-ol Chemical compound OCC#C TVDSBUOJIPERQY-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000010845 search algorithm Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000012453 solvate Substances 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
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Abstract
Description
(v)X2O3:YO2 式A
(式中、0≦v≦0.05又は0.0005≦v≦0.05であり、Xは三価元素であり、Yは四価元素であり、Oは酸素である)
を有する材料を提供する。
を有する。
一態様では、一部又はすべてのDAが除去されたEMM-41材料(例えば、少なくとも部分的に焼成されたEMM-41材料)は、表1Aの度2θにおいて少なくとも5個、好ましくはすべてのXRDピークを有する。
(v)X2O3:YO2 式A
で表すことができ、式中、0≦v≦0.05又は0.0005≦v≦0.05であり、Xは三価元素であり、Yは四価元素であり、Oは酸素である。Xは、B、Al、Fe、及びGa、又はそれらの混合物から選択することができる。例えば、XはAlを含むことができる、若しくはAlであってよく、又はXはBを含むことができる、若しくはBであってよい。Yは、Si、Ge、Sn、Ti、及びZr、又はそれらの混合物から選択することができる。例えば、YはSiを含むことができる、又はSiであってよい。式A中の酸素は、炭素原子(例えば、CH2の形態)で置換することができ、これは製造されたままのEMM-41の調製に使用される試薬の供給源に由来することができる。式A中の酸素は、例えばSDAが除去された後に、窒素原子で置換することもできる。式Aは、一部又はすべてのSDAが除去されている典型的なEMM-41材料のフレームワークを表すことができるが、EMM-41材料の唯一の表現であることを意味するものではない。EMM-41材料は、SDA及び不純物を除去するための適切な処理の後にSDA及び/又は不純物を含む場合があり、これらは式A中には示されていない。さらに、式Aは、EMM-41材料中に存在しうるプロトン及び電荷補償イオンを含んでいない。
電子線回折は、材料科学のための多くの周知の特性決定技術野中の1つである。電子線回折技術は、Structural Electron Crystallography by D.L.Dorset,Plenum,N.Y.,1995(その全体が参照により本明細書に援用される)において非常に詳細に議論されている。
表3中の空間群の多形構造の規則端成分は、以下の表4~表10中に記載される単位格子の四面体(T)原子の以下の配位配列の1つ以上を示す。配位配列は、Atlas of Zeolite Structuresにおいて規定される。
製造されたままの(例えば、SDAを除去するための処理が行われていない)EMM-41材料は、表2Aから選択される度2θにおいて少なくとも4個、又は好ましくはすべてのXRDピークを有することができる。
(n)Q:(v)X2O3:YO2 式B
で表すことができ、式中、0.01≦n≦0.1、0.000≦v≦0.0.05又は0.0005≦v≦0.0.05であり、Qは有機構造指向剤(SDA)であり、Xは三価元素であり、Yは四価元素であり、Oは酸素である。Xは、B、Al、Fe、及びGa、又はそれらの混合物から選択することができる。例えば、XはAl若しくはBを含むことができる、又はAl若しくはBであってよい。Yは、Si、Ge、Sn、Ti、及びZr、又はそれらの混合物から選択することができる。例えば、YはSiを含むことができる、又はSiであってよい。式Bは、SDAを有する典型的な製造されたままのEMM-41材料のフレームワークを表すことができるが、このような材料の唯一の表現であることを意味するものではない。製造されたままのEMM-41材料は、式Bによって表されていない不純物を含む場合がある。さらに、式Bは、製造されたままのEMM-41材料中に存在しうるプロトン及び電荷補償イオンを含まない。
製造されたままのEMM-41材料の調製方法は:
(a)以下の成分:
(i)四価元素(Y)の酸化物の供給源、好ましくはTMOS;
(ii)場合により、三価元素(X)の供給源、好ましくはアルミニウム;
(iii)水酸化物イオン(OH)の供給源、好ましくはSDA(Q)の水酸化物;
(iv)フッ化物イオン(F)の供給源、好ましくはフッ化水素;
(v)ビスピロリジニウムジカチオンを含む有機構造指向剤(Q);
(vi)水;及び
(vii)場合により、四価元素(X)の重量を基準として0~10重量%の量のゼオライト種結晶の供給源
を含む反応混合物を調製するステップであって、反応混合物が、モル比に関して、以下:
YO2/X2O3=10~無限大、好ましくは20~無限大、より好ましくは40~無限大;
H2O/YO2=2~15、好ましくは2~10、より好ましくは3~8;
OH-/YO2=0.25~2又は0.25~1、好ましくは0.8~1.2又は0.35~0.75;
F/YO2=0.35~1、好ましくは0.4~0.6;
Q/YO2=0.01~0.50又は0.10~0.5、好ましくは0.15~0.3
の範囲内の組成を有するステップと;
(b)約90℃~約190℃、好ましくは90℃~175℃の温度を含む結晶化条件下でステップ(a)の上記反応混合物の混合及び/又は加熱を行って、結果として得られた混合物の結晶を形成するステップと;
(c)ステップ(b)の上記結果として得られた混合物から上記結晶の少なくとも一部を、好ましくは、表2A、好ましくは表2B中に示されるパターンのXRDピークを有する上記製造されたままのEMM-41材料として回収するステップと、
を含むことができる。
(一部又はすべてのSDAが除去される)EMM-41材料は、吸着剤として使用することができ、又はアルミノシリケート形態で、多種多様な有機化合物変換プロセスを触媒する触媒として使用することができる。本明細書に記載の改質されたEMM-41材料単独、又は1つ以上の別の触媒活性物質(別の結晶性触媒など)との組み合わせによって有効に触媒される化学変換プロセスの例としては、酸活性を有する触媒を必要とするプロセスが挙げられる。本明細書に記載の改質されたEMM-41材料によって触媒することができる有機変換プロセスの例としては、クラッキング、水素化分解、不均化、アルキル化、オリゴマー化、及び異性化が挙げられる。
前述の議論のように、EMM-28の合成に有用な有機構造指向剤、Q、又は化合物Iは、1,3-ビス(ハロメチル)ベンゼンから生成することができる。
SDA(その水酸化物形態)、フッ化水素の存在下、並びにITQ-24、ITQ-33のゼオライト種結晶の存在下、又は種結晶の非存在下で、低水合成(low water synthesis)において、150℃で10日及び28日間転動させた1.5mLのステンレス鋼反応器中で行った合成で、最初にEMM-41が確認された。テトラメチルオルトシリケート(TMOS)がシリカ源であった。SDA(OH)2は、両方のアニオンが水酸化物である水酸化物形態の化合物Iであった。SDAは、水酸化物源も提供した。合成混合物の組成を以下の表11中に示す。生成物は、遠心分離、脱イオン水中への再懸濁をさせ、次にさらなる遠心分離によって単離した。これを3回繰り返した。実施例1A~1Fでは、あらゆる周知のゼオライトと一致させることができない粉末XRDパターンが得られた。このXRDパターンを純粋なEMM-41と呼んだ。図1は、純粋相のEMM-41のXRDパターンを示している。
4.38グラムのSDAの23.81重量%溶液(その水酸化物形態)を1.62gのテトラメチルオルトシリケート(TMOS)に加え、10MLのTeflonライナー中で終夜激しく撹拌した。上記の10mLのTEFLON(登録商標)反応器を、凍結乾燥機中に入れ、すべての水を除去した。乾燥させた生成物を次に、種々の量の蒸留水及び20重量%のフッ化水素酸溶液で再スラリー化した。反応器を150℃のタンブリングオーブン中に12日間入れた。次に生成物の遠心分離/洗浄(3回)及び乾燥を行った。この実施例2の合成混合物の組成及び結果を以下の表12中に示す。表12から分かるように、H2O/SiO2が5及び7の場合の合成ではどちらもEMM-41が得られ、一方、H2O/SiO2モル比が10、14、及び18の場合の合成では、EMM-41相は形成されず、非晶質となった。実施例2A1、2A2、及び2B1の粉末XRDパターンは、EMM-41(図示せず)と一致し、EMM-41と一致した。
シリカ源(TMOS、LUDOX(登録商標)LS-30、又はCABOSPERSE(登録商標))及びSi/Alモル比を混合物中で同時に変化させて、EMM-41の種結晶の存在下で実験を行った(10ml規模)。合成混合物の組成及びSi/Alモル比を以下の表13中に示す。テトラメチルオルトシリオケート(tetramethylorthosiliocate)(TMOS)を用いた実施例ではEMM-41が生成され、一方、他のシリカ源では生成されなかった。実施例3A1及び3A2の粉末XRDパターン(図示せず)はEMM-41と一致した。
この実施例4では、シリカ源(TMOS、LUDOX(登録商標)LS-30、又はCABOSPERSE(登録商標))のみを反応混合物中で使用した(すなわち、アルミニウムの供給源なし)ことを除けば、前述の実施例3を繰り返した。合成混合物の組成及びSi/Alモル比を以下の表14中に示す。この実施例4では、それぞれの実験のSDA及びシリカ源を含む反応混合物を室温で3日間静置及び温浸し、次に凍結乾燥機中に入れて水を除去した。実施例4中のすべての実験の粉末XRDパターン(図示せず)はEMM-41と必置した。
この実施例5では、使用したゼオライト種結晶がITQ-24であることを除けば、前述の実施例2A2を繰り返した。標準的な焼成プロトコルを用いて、製造されたままの材料を600℃まで焼成して有機SDA(Q)を除去した。表15A及び15Bは、謹んで(respectfully)製造されたままの生成物及び焼成された生成物のXRDのピーク位置及びそれらの強度の一覧を示している。製造されたままの生成物及び焼成された生成物の粉末XRDパターンは図2中にグラフで示されており、合成された材料がEMM-41であることを裏付けている。
Claims (23)
- 表3中の前記空間群の前記規則端多形構造が、本明細書の表4~9に記載の単位格子の四面体(T)原子の以下の接続性の1つ以上を示す、請求項3に記載の結晶性材料。
- 約0.25~0.30cc/gの範囲内の微細孔容積を有する、請求項1~4のいずれか一項に記載の結晶性材料。
- 400~650m2/gの範囲内の全BET表面積を有する、請求項1~5のいずれか一項に記載の結晶性材料。
- 前記材料が、前記結晶性材料の重量を基準として60~150mg/gのn-ヘキサン、及び/又は40~130mg/gの2,3-ジメチルブタン、及び/又は40~130mg/gの2,2-ジメチルブタン、及び/又は60~90mg/gのメシチレンの吸着に適切である、請求項1~6のいずれか一項に記載の結晶性材料。
- 式Aの分子式:
(v)X2O3:YO2 式A
(式中、0.0000≦v≦0.05、Xは三価元素であり、Yは四価元素であり、Oは酸素である)
を有する、請求項1~7のいずれか一項に記載の結晶性材料。 - vが0.0005である場合にYのXに対するモル比が1000である、請求項8に記載の結晶性材料。
- XがAlである場合に、YのXに対するモル比が30~無限大である、請求項8に記載の結晶性材料。
- 式Bの分子式:
(n)Q:(v)X2O3:YO2 式B
(式中、0.01≦n≦0.1、0.000≦v≦0.0.05であり、Qは有機構造指向剤であり、Xは三価元素であり、Yは四価元素であり、Oは酸素である)
を有する、請求項11又は12に記載の製造されたままの材料。 - vが0.0005である場合に、YのXに対するモル比が1000である、請求項13に記載の製造されたままの材料。
- QのYに対するモル比が0.01~0.50である、請求項13又は14に記載の製造されたままの材料。
- 請求項11~16のいずれか一項に記載の製造されたままの材料の調製方法であって:
(b)以下の成分:
(viii)四価元素(Y)の酸化物の供給源;
(ix)場合により、三価元素(X)の供給源;
(x)水酸化物イオン(OH)の供給源;
(xi)フッ化物イオン(F)の供給源;
(xii)ビスピロリジニウムジカチオンを含む有機構造指向剤(Q);
(xiii)水;及び
(xiv)場合により、前記四価元素(X)の重量を基準として0~10重量%の量のゼオライト種結晶の供給源
を含む反応混合物を調製するステップであって、前記反応混合物が、モル比に関して、以下:
YO2/X2O3=10~無限大;
H2O/YO2=2~10;
OH-/YO2=0.25~1;
F/YO2=0.35~1;
Q/YO2=0.01~0.50
の範囲内の組成を有するステップと;
(b)約90℃~約190℃の温度を含む結晶化条件下でステップ(a)の前記反応混合物の混合及び/又は加熱を行って、結果として得られた混合物の結晶を形成するステップと;
(c)ステップ(b)の前記結果として得られた混合物から前記結晶の少なくとも一部を、表2AのX線回折パターンを有する前記製造されたままの材料として回収するステップと、
を含む方法。 - 両方のAイオンが水酸化物イオンである、請求項18に記載の方法。
- 前記ゼオライト種結晶が、EMM-41、ITQ-24、及びITQ-33の構造を有する、請求項17~19のいずれか一項に記載の方法。
- 供給材料の1つ以上の所望の成分を前記供給材料の残りの成分から選択的に分離する方法であって:
(i)有効な収着条件において、前記供給材料を収着剤に接触させるステップであって、前記収着剤が、請求項1~16のいずれか一項に記載の合成多孔質結晶性材料、又は請求項17~20のいずれか一項に記載の方法によって製造される合成多孔質結晶性材料の活性形態を含み、それによって収着生成物と排出生成物とが形成されるステップと;
(ii)収着生成物又は前記排出生成物のいずれかから前記1つ以上の所望の成分を回収するステップと、
を含む、方法。 - 両方のAイオンが水酸化物イオンである、請求項22に記載の有機窒素化合物。
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