JP2022104881A - フォトレジスト組成物及びパターン形成方法 - Google Patents
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Abstract
Description
Pは重合性基である)。
スキーム1
Claims (10)
- 酸不安定基を有する第1の繰り返し単位を含む第1のポリマーと、
式(4)の1種以上のモノマー由来の繰り返し単位を含む第2のポリマーと、
光酸発生剤と、
溶媒と、を含有するフォトレジスト組成物:
Z1及びZ2は、それぞれ独立して、単結合であるか、又は置換若しくは無置換C1~30アルキレン、置換若しくは無置換C1~30ヘテロアルキレン、置換若しくは無置換C3~30シクロアルキレン、置換若しくは無置換C2~30ヘテロシクロアルキレン、置換若しくは無置換C6~30アリーレン、置換若しくは無置換C1~30ヘテロアリーレン、-O-、-C(O)-、-N(R3)-、-S-、又は-S(O)2-のうちの1つ以上を含む二価の連結基であり、R3は、水素、置換若しくは無置換C1~20アルキル、置換若しくは無置換C1~20ヘテロアルキル、置換若しくは無置換C3~20シクロアルキル、又は置換若しくは無置換C2~20ヘテロシクロアルキルであり、
任意選択的には、Z1及びZ2は、Z1とZ2との間の単結合又は二重結合を介して一緒に環を形成し、
R1及びR2は、それぞれ独立して、置換若しくは無置換C1~30アルキル、置換若しくは無置換C1~30ヘテロアルキル、置換若しくは無置換C3~30シクロアルキル、置換若しくは無置換C2~30ヘテロシクロアルキル、置換若しくは無置換C2~30アルケニル、置換若しくは無置換C6~30アリール、置換若しくは無置換C7~30アリールアルキル、置換若しくは無置換C7~30アルキルアリール、置換若しくは無置換C1~30ヘテロアリール、置換若しくは無置換C2~30ヘテロアリールアルキル、置換若しくは無置換C2~30アルキルヘテロアリール、-OR4、又は-N(R5)2であり、R4及びR5は、それぞれ独立して、置換若しくは無置換C1~30アルキル、置換若しくは無置換C1~30ヘテロアルキル、置換若しくは無置換C3~30シクロアルキル、置換若しくは無置換C2~20ヘテロシクロアルキル、置換若しくは無置換C6~30アリール、置換若しくは無置換C7~30アリールアルキル、置換若しくは無置換C7~30アルキルアリール、置換若しくは無置換C1~30ヘテロアリール、置換若しくは無置換C2~30ヘテロアリールアルキル、又は置換若しくは無置換C2~30アルキルヘテロアリールであり、
任意選択的には、R1及びR2は、単結合又は二価の連結基を介して一緒に環を形成し、
Lは単結合又は多価の連結基であり、
任意選択的には、Lは、下記式:
Pは重合性基である)。 - 前記第1のポリマーの前記第1の繰り返し単位が、式(1a)、(1b)、(1c)、(1d)、又は(1e)のうちの1種以上のモノマーに由来する、請求項1に記載のフォトレジスト組成物:
Raは、水素、フッ素、シアノ、置換若しくは無置換C1~10アルキル、又は置換若しくは無置換C1~10フルオロアルキルであり;
R7~R12は、それぞれ独立して、水素、直鎖若しくは分岐C1~20アルキル、単環式若しくは多環式C3~20シクロアルキル、単環式若しくは多環式C2~20ヘテロシクロアルキル、直鎖若しくは分岐C2~20アルケニル、単環式若しくは多環式C3~20シクロアルケニル、単環式若しくは多環式C3~20ヘテロシクロアルケニル、単環式若しくは多環式C6~20アリール、又は単環式若しくは多環式C1~20ヘテロアリールであり、そのそれぞれが置換若しくは無置換であるが、
R7~R9のうちの1つのみが水素であってよく、R10~R12のうちの1つのみが水素であってよいことを条件とし;
R7~R9のいずれか2つは、一緒に任意選択的に環を形成し、R7~R9のそれぞれは、構造の一部として、-O-、-C(O)-、-C(O)-O-、-S-、-S(O)2-、及び-N(R19)-S(O)2-から選択される1つ以上の基を任意選択的に更に含み、式中、R19は、水素、直鎖若しくは分岐C1~20アルキル、単環式若しくは多環式C3~20シクロアルキル、又は単環式若しくは多環式C2~20ヘテロシクロアルキルであり;
R10~R12のいずれか2つは、一緒に任意選択的に環を形成し、R10~R12のそれぞれは、構造の一部として、-O-、-C(O)-、-C(O)-O-、-S-、-S(O)2-、及び-N(R20)-S(O)2-から選択される1つ以上の基を任意選択的に更に含み、式中、R20は、水素、直鎖若しくは分岐C1~20アルキル、単環式若しくは多環式C3~20シクロアルキル、又は単環式若しくは多環式C2~20ヘテロシクロアルキルであり;
L1は、少なくとも1つの炭素原子、少なくとも1つのヘテロ原子、又はこれらの組み合わせを含む二価連結基であり;
R13~R14は、それぞれ独立して、水素、直鎖若しくは分岐C1~20アルキル、単環式若しくは多環式C3~20シクロアルキル、単環式若しくは多環式C2~20ヘテロシクロアルキル、単環式若しくは多環式C6~20アリール、又は単環式若しくは多環式C1~20ヘテロアリールであり、水素を除くこれらのそれぞれは置換若しくは無置換であり;
R15は、直鎖若しくは分岐C1~20アルキル、単環式若しくは多環式C3~20シクロアルキル、又は単環式若しくは多環式C2~20ヘテロシクロアルキルであり、これらのそれぞれは置換若しくは無置換であり、R13又はR14のうちの1つは、任意選択的に、R15と一緒にヘテロ環を形成し;
R16~R18は、それぞれ独立して、直鎖若しくは分岐C1~20アルキル、単環式若しくは多環式C3~20シクロアルキル、単環式若しくは多環式C2~20ヘテロシクロアルキル、単環式若しくは多環式C6~20アリール、又は単環式若しくは多環式C1~20ヘテロアリールであり、これらのそれぞれは置換若しくは無置換であり、
R16~R18のいずれか2つは、一緒に任意選択的に環を形成し、R16~R18のそれぞれは、構造の一部として、-O-、-C(O)-、-C(O)-O-、-S-、-S(O)2-、及びN(R21)-S(O)2-から選択される1つ以上の基を任意選択的に更に含み、式中、R21は、水素、直鎖若しくは分岐C1~20アルキル、単環式若しくは多環式C3~20シクロアルキル、又は単環式若しくは多環式C2~20ヘテロシクロアルキルであり;
Xaは、ノルボルニル及びビニルから選択される重合性基であり;
nは、0又は1であり;
L2は、単結合又は二価の連結基であり、但し、Xaがビニルである場合、L2は単結合ではない)。 - 前記第1のポリマーが、1種以上の式(2)のモノマーに由来する繰り返し単位を更に含む、請求項1又は2に記載のフォトレジスト組成物:
Rbは、水素、フッ素、シアノ、置換若しくは無置換C1~10アルキル、又は置換若しくは無置換C1~10フルオロアルキルであり;
L3は、単結合、又は置換若しくは無置換C1~30アルキレン、置換若しくは無置換C1~30ヘテロアルキレン、置換若しくは無置換C3~30シクロアルキレン、置換若しくは無置換C2~30ヘテロシクロアルキレン、置換若しくは無置換C6~30アリーレン、置換若しくは無置換C7~30アリールアルキレン、又は置換若しくは無置換C1~30ヘテロアリーレン、又は置換若しくは無置換C2~30ヘテロアリールアルキレンのうちの1つ以上を含む二価連結基であり、式中、L3は、任意選択的に、-O-、-C(O)-、-C(O)-O-、-S-、-S(O)2-、及び-N(R23)-S(O)2-から選択される1つ以上の基を更に含んでいてもよく、R23は、水素、直鎖若しくは分岐C1~20アルキル、単環式若しくは多環式C3~20シクロアルキル、又は単環式若しくは多環式C2~20ヘテロシクロアルキルであり;
R22は、単環式、多環式、又は縮合多環式のC4~20ラクトン含有基であるか、又は単環式、多環式、又は縮合多環式のC4~20スルトン含有基である)。 - 前記第1のポリマーが、1種以上の式(3)のモノマーに由来する繰り返し単位を更に含む、請求項1~3のいずれか一項に記載のフォトレジスト組成物:
Rcは、水素、フッ素、シアノ、置換若しくは無置換C1~10アルキル、又は置換若しくは無置換C1~10フルオロアルキルであり;
Q1は、置換若しくは無置換C1~30アルキレン、置換若しくは無置換C3~30シクロアルキレン、置換若しくは無置換C2~30ヘテロシクロアルキレン、置換若しくは無置換C6~30アリーレン、置換若しくは無置換C1~30ヘテロアリーレン、又は-C(O)-O-のうちの1つ以上であり;
Wは、-C(O)-OH;-C(CF3)2OH;アミド;イミド;又は-NH-S(O)2-Y1を含む塩基可溶性基であり、ここで、Y1は、F又はC1~4パーフルオロアルキルであり;
aは1~3の整数である)。 - 前記第2のポリマーが、1種以上の式(4a)のモノマーに由来する繰り返し単位を含む、請求項1~4のいずれか一項に記載のフォトレジスト組成物:
Raは、水素、フッ素、シアノ、置換若しくは無置換C1~10アルキル、又は置換若しくは無置換C1~10フルオロアルキルであり;
Lは、単結合又は多価の連結基であり;
任意選択的には、Lは、下記式:
Z1及びZ2は同じであり、Z1及びZ2は、単結合、-O-、式-C(O)-の基を含む二価連結基、又は式-C(O)-O-の基を含む二価連結基から選択され;
R1及びR2は、それぞれ独立して、置換若しくは無置換C1~30アルキルであり;
任意選択的には、R1及びR2は、単結合又は二価の連結基を介して一緒に環を形成する)。 - Lが式-C(O)-C1~10アルキレン-O-の基であり;
Z1及びZ2がそれぞれ-O-であり;
R1及びR2が、それぞれ独立して、置換若しくは無置換C1~30アルキルである、請求項1~5のいずれか一項に記載のフォトレジスト組成物。 - 前記光酸発生剤が非重合型である、請求項1~6のいずれか一項に記載のフォトレジスト組成物。
- 光分解性失活剤、塩基性失活剤、又はこれらの組み合わせを更に含む、請求項1~7のいずれか一項に記載のフォトレジスト組成物。
- 前記第1のポリマー対前記第2のポリマーの重量比が1:1~1,000:1である、請求項1~8のいずれか一項に記載のフォトレジスト組成物。
- パターン形成方法であって、
(a)請求項1~9のいずれか一項に記載のフォトレジスト組成物の層を基板に塗布すること;
(b)前記フォトレジスト組成物層を活性化放射にパターン状に露光すること;及び
(c)前記露光されたフォトレジスト組成物層を現像してレジストレリーフ画像を得ること;
を含むパターン形成方法。
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JP2011085927A (ja) * | 2009-09-18 | 2011-04-28 | Jsr Corp | 感放射線性樹脂組成物、レジストパターン形成方法及び重合体 |
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