JP2022074800A5 - - Google Patents

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Publication number
JP2022074800A5
JP2022074800A5 JP2020185158A JP2020185158A JP2022074800A5 JP 2022074800 A5 JP2022074800 A5 JP 2022074800A5 JP 2020185158 A JP2020185158 A JP 2020185158A JP 2020185158 A JP2020185158 A JP 2020185158A JP 2022074800 A5 JP2022074800 A5 JP 2022074800A5
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JP
Japan
Prior art keywords
substrate
optical system
mask
exposure apparatus
exposure
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JP2020185158A
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English (en)
Japanese (ja)
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JP2022074800A (ja
JP7566590B2 (ja
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Priority claimed from JP2020185158A external-priority patent/JP7566590B2/ja
Priority to JP2020185158A priority Critical patent/JP7566590B2/ja
Priority to TW110136239A priority patent/TWI860488B/zh
Priority to US17/506,262 priority patent/US11531276B2/en
Priority to KR1020210142416A priority patent/KR102893271B1/ko
Priority to CN202111285535.4A priority patent/CN114442445B/zh
Publication of JP2022074800A publication Critical patent/JP2022074800A/ja
Publication of JP2022074800A5 publication Critical patent/JP2022074800A5/ja
Priority to JP2024167149A priority patent/JP7760677B2/ja
Publication of JP7566590B2 publication Critical patent/JP7566590B2/ja
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JP2020185158A 2020-11-05 2020-11-05 露光装置、露光方法、及び物品の製造方法 Active JP7566590B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2020185158A JP7566590B2 (ja) 2020-11-05 2020-11-05 露光装置、露光方法、及び物品の製造方法
TW110136239A TWI860488B (zh) 2020-11-05 2021-09-29 曝光設備、曝光方法、和製造物品的方法
US17/506,262 US11531276B2 (en) 2020-11-05 2021-10-20 Exposure apparatus, exposure method, and article manufacturing method
KR1020210142416A KR102893271B1 (ko) 2020-11-05 2021-10-25 노광 장치, 노광 방법, 및 물품 제조 방법
CN202111285535.4A CN114442445B (zh) 2020-11-05 2021-11-02 曝光装置、曝光方法、以及物品制造方法
JP2024167149A JP7760677B2 (ja) 2020-11-05 2024-09-26 露光装置、露光方法、及び物品の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020185158A JP7566590B2 (ja) 2020-11-05 2020-11-05 露光装置、露光方法、及び物品の製造方法

Related Child Applications (1)

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JP2024167149A Division JP7760677B2 (ja) 2020-11-05 2024-09-26 露光装置、露光方法、及び物品の製造方法

Publications (3)

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JP2022074800A JP2022074800A (ja) 2022-05-18
JP2022074800A5 true JP2022074800A5 (https=) 2023-10-23
JP7566590B2 JP7566590B2 (ja) 2024-10-15

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ID=81362661

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JP2020185158A Active JP7566590B2 (ja) 2020-11-05 2020-11-05 露光装置、露光方法、及び物品の製造方法
JP2024167149A Active JP7760677B2 (ja) 2020-11-05 2024-09-26 露光装置、露光方法、及び物品の製造方法

Family Applications After (1)

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JP2024167149A Active JP7760677B2 (ja) 2020-11-05 2024-09-26 露光装置、露光方法、及び物品の製造方法

Country Status (5)

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US (1) US11531276B2 (https=)
JP (2) JP7566590B2 (https=)
KR (1) KR102893271B1 (https=)
CN (1) CN114442445B (https=)
TW (1) TWI860488B (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022117091A (ja) 2021-01-29 2022-08-10 キヤノン株式会社 計測装置、リソグラフィ装置及び物品の製造方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6026343A (ja) * 1983-07-22 1985-02-09 Nippon Kogaku Kk <Nikon> 投影露光装置
JP3013463B2 (ja) 1991-02-01 2000-02-28 株式会社ニコン 焦点位置検出装置及び投影露光装置
JPH0883753A (ja) * 1994-09-13 1996-03-26 Nikon Corp 焦点検出方法
EP1944654A3 (en) * 1996-11-28 2010-06-02 Nikon Corporation An exposure apparatus and an exposure method
WO2000030163A1 (en) * 1998-11-18 2000-05-25 Nikon Corporation Exposure method and device
JP2002324746A (ja) * 2001-04-25 2002-11-08 Nikon Corp 露光方法及び露光装置
JP2002353099A (ja) * 2001-05-22 2002-12-06 Canon Inc 位置検出方法及び装置及び露光装置及びデバイス製造方法
JP2005175034A (ja) * 2003-12-09 2005-06-30 Canon Inc 露光装置
JP2006135015A (ja) * 2004-11-04 2006-05-25 Canon Inc 露光装置
JP2008283052A (ja) * 2007-05-11 2008-11-20 Toshiba Corp 液浸露光装置および半導体装置の製造方法
JP2010251546A (ja) * 2009-04-16 2010-11-04 Canon Inc 露光方法
JP5662717B2 (ja) * 2010-07-08 2015-02-04 キヤノン株式会社 露光装置及びデバイスの製造方法
JP2012141452A (ja) * 2010-12-28 2012-07-26 Olympus Corp 自動合焦機構および顕微鏡装置
JP2012189734A (ja) * 2011-03-10 2012-10-04 Canon Inc 露光装置
CN103091993B (zh) * 2011-11-02 2015-02-11 上海微电子装备有限公司 用于光刻机透镜热效应测量的测试标记及其测量方法
JP6552312B2 (ja) * 2015-07-16 2019-07-31 キヤノン株式会社 露光装置、露光方法、およびデバイス製造方法
JP2019035813A (ja) * 2017-08-10 2019-03-07 キヤノン株式会社 露光装置、露光方法及び物品の製造方法
JP2019079029A (ja) * 2017-10-24 2019-05-23 キヤノン株式会社 露光装置および物品の製造方法
JP2022026343A (ja) * 2020-07-30 2022-02-10 国立大学法人 筑波大学 感圧センサー、感圧センサーの製造方法および圧力検出方法

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