JP2021520544A5 - - Google Patents

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Publication number
JP2021520544A5
JP2021520544A5 JP2020554148A JP2020554148A JP2021520544A5 JP 2021520544 A5 JP2021520544 A5 JP 2021520544A5 JP 2020554148 A JP2020554148 A JP 2020554148A JP 2020554148 A JP2020554148 A JP 2020554148A JP 2021520544 A5 JP2021520544 A5 JP 2021520544A5
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JP
Japan
Prior art keywords
delivery system
fluid delivery
mass flow
fluid
flow sensor
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Application number
JP2020554148A
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English (en)
Japanese (ja)
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JP7524068B2 (ja
JP2021520544A (ja
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Priority claimed from PCT/US2019/025389 external-priority patent/WO2019195292A1/en
Publication of JP2021520544A publication Critical patent/JP2021520544A/ja
Publication of JP2021520544A5 publication Critical patent/JP2021520544A5/ja
Application granted granted Critical
Publication of JP7524068B2 publication Critical patent/JP7524068B2/ja
Active legal-status Critical Current
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JP2020554148A 2018-04-03 2019-04-02 Ｍｅｍｓコリオリ・ガス流量制御器 Active JP7524068B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201862652019P 2018-04-03 2018-04-03
US62/652,019 2018-04-03
US201862673382P 2018-05-18 2018-05-18
US62/673,382 2018-05-18
PCT/US2019/025389 WO2019195292A1 (en) 2018-04-03 2019-04-02 Mems coriolis gas flow controller

Publications (3)

Publication Number Publication Date
JP2021520544A JP2021520544A (ja) 2021-08-19
JP2021520544A5 true JP2021520544A5 (cg-RX-API-DMAC7.html) 2023-09-28
JP7524068B2 JP7524068B2 (ja) 2024-07-29

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020554148A Active JP7524068B2 (ja) 2018-04-03 2019-04-02 Ｍｅｍｓコリオリ・ガス流量制御器

Country Status (4)

Country Link
US (1) US11662237B2 (cg-RX-API-DMAC7.html)
JP (1) JP7524068B2 (cg-RX-API-DMAC7.html)
KR (1) KR102796445B1 (cg-RX-API-DMAC7.html)
WO (1) WO2019195292A1 (cg-RX-API-DMAC7.html)

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JP7000393B2 (ja) * 2019-09-25 2022-01-19 株式会社Kokusai Electric 基板処理装置、ガスボックス及び半導体装置の製造方法
US12455220B2 (en) 2019-11-13 2025-10-28 Micro Motion, Inc. Detecting an orientation of a vibratory meter and compensating a measurement based on the detected orientation
JP7432400B2 (ja) * 2020-03-11 2024-02-16 東京エレクトロン株式会社 基板処理方法及び基板処理システム
CN114121585B (zh) * 2020-08-26 2023-10-31 中微半导体设备(上海)股份有限公司 一种等离子体处理装置及气体供应方法
US11772958B2 (en) 2020-09-17 2023-10-03 Applied Materials, Inc. Mass flow control based on micro-electromechanical devices
US12235144B2 (en) * 2020-09-17 2025-02-25 Applied Materials, Inc.—Robotics Micro-electromechanical device for use in a flow control apparatus
US12601621B2 (en) 2022-03-30 2026-04-14 Applied Materials, Inc. Methods of manufacturing plasma generating cells for a plasma source
US12493307B2 (en) 2023-08-21 2025-12-09 Applied Materials, Inc. Fast switching gas circuits and processing chambers, and related methods and apparatus, for gas stabilization
US12540400B2 (en) 2023-11-02 2026-02-03 Applied Materials, Inc. Multi-flow gas circuits, processing chambers, and related apparatus and methods for semiconductor manufacturing
DE102023136267A1 (de) 2023-12-21 2025-06-26 Truedyne Sensors AG Verfahren, Messanordnung und Computerprogrammprodukt zum Regeln eines Ventils

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US6772781B2 (en) * 2000-02-04 2004-08-10 Air Liquide America, L.P. Apparatus and method for mixing gases
US6631334B2 (en) * 2000-12-26 2003-10-07 Mks Instruments, Inc. Pressure-based mass flow controller system
US6439253B1 (en) 2000-12-28 2002-08-27 International Business Machines Corporation System for and method of monitoring the flow of semiconductor process gases from a gas delivery system
US6704667B2 (en) 2002-05-13 2004-03-09 Taiwan Semiconductor Manufacturing Co., Ltd Real time mass flow control system with interlock
US20040112540A1 (en) * 2002-12-13 2004-06-17 Lam Research Corporation Uniform etch system
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