JP2021518293A - 3次元セラミックパターンのインクジェット印刷 - Google Patents
3次元セラミックパターンのインクジェット印刷 Download PDFInfo
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- JP2021518293A JP2021518293A JP2020573097A JP2020573097A JP2021518293A JP 2021518293 A JP2021518293 A JP 2021518293A JP 2020573097 A JP2020573097 A JP 2020573097A JP 2020573097 A JP2020573097 A JP 2020573097A JP 2021518293 A JP2021518293 A JP 2021518293A
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- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 20
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- PUGOMSLRUSTQGV-UHFFFAOYSA-N 2,3-di(prop-2-enoyloxy)propyl prop-2-enoate Chemical compound C=CC(=O)OCC(OC(=O)C=C)COC(=O)C=C PUGOMSLRUSTQGV-UHFFFAOYSA-N 0.000 claims description 3
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 claims description 3
- XBIUWALDKXACEA-UHFFFAOYSA-N 3-[bis(2,4-dioxopentan-3-yl)alumanyl]pentane-2,4-dione Chemical compound CC(=O)C(C(C)=O)[Al](C(C(C)=O)C(C)=O)C(C(C)=O)C(C)=O XBIUWALDKXACEA-UHFFFAOYSA-N 0.000 claims description 3
- GFLJTEHFZZNCTR-UHFFFAOYSA-N 3-prop-2-enoyloxypropyl prop-2-enoate Chemical compound C=CC(=O)OCCCOC(=O)C=C GFLJTEHFZZNCTR-UHFFFAOYSA-N 0.000 claims description 3
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 claims description 3
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 claims description 3
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- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 229910003088 Ti−O−Ti Inorganic materials 0.000 claims description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 3
- XRMBQHTWUBGQDN-UHFFFAOYSA-N [2-[2,2-bis(prop-2-enoyloxymethyl)butoxymethyl]-2-(prop-2-enoyloxymethyl)butyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(CC)COCC(CC)(COC(=O)C=C)COC(=O)C=C XRMBQHTWUBGQDN-UHFFFAOYSA-N 0.000 claims description 3
- KNSXNCFKSZZHEA-UHFFFAOYSA-N [3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical class C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C KNSXNCFKSZZHEA-UHFFFAOYSA-N 0.000 claims description 3
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 claims description 3
- 238000004132 cross linking Methods 0.000 claims description 3
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- GAURFLBIDLSLQU-UHFFFAOYSA-N diethoxy(methyl)silicon Chemical compound CCO[Si](C)OCC GAURFLBIDLSLQU-UHFFFAOYSA-N 0.000 claims description 3
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 3
- 239000000839 emulsion Substances 0.000 claims description 3
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 claims description 3
- 229910052735 hafnium Inorganic materials 0.000 claims description 3
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052741 iridium Inorganic materials 0.000 claims description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 3
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- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims description 3
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- MCULRUJILOGHCJ-UHFFFAOYSA-N triisobutylaluminium Chemical compound CC(C)C[Al](CC(C)C)CC(C)C MCULRUJILOGHCJ-UHFFFAOYSA-N 0.000 claims description 3
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- GTELLNMUWNJXMQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO GTELLNMUWNJXMQ-UHFFFAOYSA-N 0.000 claims description 2
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Abstract
Description
長さ90.23mm×幅24.75mm×2.19mmのストリップを、本明細書に記載の方法を使用して印刷した(例えば、図1照)。
Claims (18)
- インクジェットプリンタを使用して3次元(3D)セラミックパターンを形成するための方法であって、
a.インクジェット印刷システムであって、
i.少なくとも1つの開口部、プレセラミックインクリザーバ、および前記開口部を通してプレセラミックインク組成物を供給するように構成されたプレセラミックインクポンプを有する、プリントヘッドであって、前記プレセラミックインクが、ポリマー由来のセラミック相互貫入ネットワークを形成するように構成された組成物を含む、プリントヘッドと、
ii.基板を前記プリントヘッドに搬送するように構成された前記プリントヘッドに動作可能に結合されたコンベヤと、
iii.プロセッサ、そこに格納された不揮発性メモリ、および実行時に、前記プロセッサに、前記3次元セラミックパターンを表現する3D視覚化ファイルを受信させ、前記3次元セラミックパターンを印刷するための少なくとも1つの実質的に2D層を表現するファイルを生成させ、前記3次元セラミックパターンに関連するパラメータの選択を受信させ、パラメータの前記選択のうちの少なくとも1つに基づいて少なくとも1つの実質的に2D層を表現する前記ファイルを変更させる、前記不揮発性メモリに格納された一連の実行可能命令を備える、コンピュータ支援製造(「CAM」)モジュールであって、前記CAMモジュールが、前記プリントヘッドを制御するように構成されている、コンピュータ支援製造(「CAM」)モジュールと、を備える、インクジェット印刷システムを提供することと、
b.前記プレセラミックインクジェットインク組成物を提供することと、
c.前記CAMモジュールを使用して、印刷するための前記3次元セラミックパターンの第1の実質的に2D層を表現する生成されたファイルを入手することであって、前記2D層が、前記プレセラミックパターンを表すパターンを含む、入手することと、
d.前記プリントヘッドを使用して、印刷のための前記3次元セラミックパターンの前記第1の実質的に2D層における前記セラミック表現に対応する前記パターンを形成することと、
e.前記3次元セラミックパターンの前記2D層における前記表現に対応する前記プレセラミックパターンを硬化させることと、
f.前記硬化させるステップと同時、またはその後に、前記3次元セラミックパターンの前記2D層における前記セラミック表現に対応する前記パターンを熱分解し、それによって、前記相互貫入セラミックポリマー由来のネットワークを形成することと、
g.前記基板を除去し、それによって、第1の3次元セラミックパターン層を加工することと、を含む、方法。 - 前記プレセラミックインクが、ゾルゲル重合によって重合するように構成されたセラミック成分と、フリーラジカル重合によって重合するように構成されたビニル、メタクリレート、および有機成分のうちの少なくとも1つと、を含む、請求項1に記載の方法。
- 前記CAMモジュールを使用して、印刷のための前記3Dセラミックパターンの後続の実質的に2D層を表現する生成されたファイルを入手することと、後続の3次元セラミックパターン層を形成するための前記ステップを繰り返すことと、をさらに含む、請求項1に記載の方法。
- ゾルゲル重合により重合するように構成された前記セラミック成分が、テトラエチルオルトシリケート、テトラメチルオルトシリケート、テトライソプロピルチタネート、トリメトキシシラン(TMOS)、トリエトキシシラン、トリメチルエトキシシラン、フェニルトリエトキシシラン、フェニルメチルジエトキシシラン、メチルジエトキシシラン、ビニルメチルジエトキシシラン、ポリジメトキシシラン、ポリジエトキシシラン、ビニルメトキシシロキサン、ポリシラザン、チタンイソプロポキシド、アルミニウムイソプロポキシド、ジルコニウムプロポキシド、ホウ酸トリエチル、トリメトキシボロキシンジエトキシシロキサン−エチルチタネート、チタンジイソプロポキシドビス(アセチルアセトネート)、シラノールposs、アルミニウムトリ−sec−ブトキシド、トリイソブチルアルミニウム、アルミニウムアセチルアセトネート、1,3,5,7,9−ペンタメチルシクロペンタシロキサン、シロキサンのポリ(ジブチルチタネート)オリゴマー、およびAl−O−Alのオリゴマー、Ti−O−Tiのオリゴマー、Zn−O−Znのオリゴマー、または前述のものを含む組成物、を含む群から選択されるモノマー、および/またはオリゴマーである、請求項3に記載の方法。
- フリーラジカル重合によって重合するように構成されたビニル、アクリレート、メタクリレート、および有機成分のうちの前記少なくとも1つが、多官能性アクリレート、そのカーボネートコポリマー、そのウレタンコポリマー、または前述のものを含むモノマーおよび/もしくはオリゴマーの組成物を含む群から選択されるモノマーおよびオリゴマーのうちの少なくとも1つである、請求項3に記載の方法。
- 前記多官能性アクリレートが、1,2−エタンジオールジアクリレート、1,3−プロパンジオールジアクリレート、1,4−ブタンジオールジアクリレート、1,6−ヘキサンジオールジアクリレート、ジプロピレングリコールジアクリレート、ネオペンチルグリコールジアクリレート、エトキシ化ネオペンチルグリコールジアクリレート、プロポキシル化ネオペンチルグリコールジアクリレート、トリプロピレングリコールジアクリレート、ビスフェノール−A−ジグリシジルエーテルジアクリレート、ヒドロキシピバル酸ネオペンタンジオールジアクリレート、エトキシ化ビスフェノール−A−ジグリシジルエーテルジアクリレート、ポリエチレングリコールジアクリレート、トリメチロールプロパントリアクリレート、エトキシ化トリメチロールプロパントリアクリレート、プロポキシル化トリメチロールプロパントリアクリレート、プロポキシル化グリセロールトリアクリレート、トリス(2−アクリロイルオキシエチル)イソシアヌレート、ペンタエリスリトールトリアクリレート、エトキシ化ペンタエリスリトールトリアクリレート、ペンタエリスリトールテトラアクリレート、エトキシ化ペンタエリスリトールテトラアクリレート、ジトリメチロールプロパンテトラアクリレート、ジペンタエリスリトールペンタアクリレート、およびジペンタエリスリトールヘキサアクリレート、または前述のもののうちの1つ以上を含む多官能性アクリレート組成物である、請求項5に記載の方法。
- 前記硬化するステップが、加熱、光重合、乾燥、プラズマ堆積、架橋、アニーリング、レドックス反応の促進、または前述のもののうちの1つ以上を含む組み合わせを含む、請求項1または3のいずれか一項に記載の方法。
- 前記任意選択で熱分解するステップが、約200℃〜約1200℃の温度で前記パターンを局所的に加熱することを含む、請求項7に記載の方法。
- 前記プレセラミックインク組成物が、懸濁液、エマルション、溶液、または前述のものを含む組成物である、請求項8に記載の方法。
- 前記プレセラミックインクが、ラジカル光開始剤と、前記多官能性アクリレートモノマー、オリゴマー、またはポリマーとは異なる架橋剤とをさらに含む、請求項1に記載の方法。
- 前記3次元セラミックパターンに関連するパラメータの前記選択に使用される前記パラメータが、前記層における前記セラミックパターン、使用される前記ビニル、アクリレート、および有機成分のうちの前記少なくとも1つの硬化要件、スループット要件、任意選択の基板温度、プリントヘッド温度、プリントヘッド電圧、インク噴射速度、および印刷速度、または前述のもののうちの1つ以上を含むパラメータの組み合わせ、のうちの少なくとも1つである、請求項10に記載の方法。
- 前記3次元セラミックパターンを表現する前記3D視覚化ファイルが、.asm、STL、DFXファイル、CNファイル、IGES、STEP、Catia、SolidWorks、ProE、3D Studio、Gerber、Excellonファイル、Rhinoファイル、または前述のもののうちの1つ以上を含むファイルであり、少なくとも1つの実質的に2D層を表現するファイルが、JPEG、GIF、TIFF、BMP、PDFファイル、または前述のもののうちの1つ以上を含む組み合わせである、請求項11に記載の方法。
- 前記セラミック成分の重量濃度(w/we)が、前記最終的な3Dセラミックパターンの約20%〜約48%(w/w)である、請求項12に記載の方法。
- 前記ラジカル光開始剤が、エチル(2,4,6、トリメチルベンゾイル)フェニルホスフィナート)、ベンゾフェノンおよびアセトフェノン化合物、混合トリアリールスルホニウムヘキサフルオロアンチモネート塩、2−イソプロピルチオキサントン、または前述のもののうちの1つ以上を含むラジカル光開始剤組成物である、請求項10に記載の方法。
- 前記セラミック成分が、前記プレセラミックインク組成物の約20%〜約80%(w/w)を含む、請求項1に記載の方法。
- 前記セラミック成分が、印刷時にキセロゲルを形成するように適合されている、請求項1に記載の方法。
- 前記ポリマー由来のセラミック相互貫入ネットワークが、別々の相および/または共連続相から構成されている、請求項1に記載の方法。
- 前記ゾルゲル重合成分が、シリコン、アルミニウム、ジルコニウム、チタン、スズ、ハフニウム、タンタル、モリブデン、タングステン、レニウム、またはイリジウム、またはそれらの混合物の酸化物ネットワークを含む、請求項2に記載の方法。
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WO2023210074A1 (ja) * | 2022-04-26 | 2023-11-02 | 株式会社村田製作所 | 構造体の製造方法 |
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CA3105242A1 (en) | 2019-09-19 |
EP3765261A1 (en) | 2021-01-20 |
EP3765261A4 (en) | 2021-12-29 |
KR20200130428A (ko) | 2020-11-18 |
CA3105242C (en) | 2023-12-12 |
US20210046670A1 (en) | 2021-02-18 |
WO2019178599A1 (en) | 2019-09-19 |
US11155004B2 (en) | 2021-10-26 |
CN112055643A (zh) | 2020-12-08 |
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