JP2021508784A - 多孔質アルミニウムマクロ、並びに、その製造システム及びその製造方法 - Google Patents
多孔質アルミニウムマクロ、並びに、その製造システム及びその製造方法 Download PDFInfo
- Publication number
- JP2021508784A JP2021508784A JP2020543689A JP2020543689A JP2021508784A JP 2021508784 A JP2021508784 A JP 2021508784A JP 2020543689 A JP2020543689 A JP 2020543689A JP 2020543689 A JP2020543689 A JP 2020543689A JP 2021508784 A JP2021508784 A JP 2021508784A
- Authority
- JP
- Japan
- Prior art keywords
- aluminum
- subsystem
- porous
- deposition
- polyurethane film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 288
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 287
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 29
- 238000000151 deposition Methods 0.000 claims abstract description 86
- 230000008021 deposition Effects 0.000 claims abstract description 83
- 229920006264 polyurethane film Polymers 0.000 claims abstract description 41
- 238000011084 recovery Methods 0.000 claims abstract description 28
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 27
- 230000005540 biological transmission Effects 0.000 claims abstract description 23
- 238000000034 method Methods 0.000 claims abstract description 14
- 239000007789 gas Substances 0.000 claims description 42
- 239000011261 inert gas Substances 0.000 claims description 23
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 21
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 20
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 16
- 239000001301 oxygen Substances 0.000 claims description 16
- 229910052760 oxygen Inorganic materials 0.000 claims description 16
- 238000004804 winding Methods 0.000 claims description 14
- 238000004544 sputter deposition Methods 0.000 claims description 11
- 229910052786 argon Inorganic materials 0.000 claims description 10
- 238000002844 melting Methods 0.000 claims description 9
- 230000008018 melting Effects 0.000 claims description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- 238000001816 cooling Methods 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 7
- 239000002033 PVDF binder Substances 0.000 claims description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 3
- 229920002635 polyurethane Polymers 0.000 claims description 3
- 239000004814 polyurethane Substances 0.000 claims description 3
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 238000002485 combustion reaction Methods 0.000 claims description 2
- 238000004891 communication Methods 0.000 claims description 2
- 238000001784 detoxification Methods 0.000 claims description 2
- 230000001939 inductive effect Effects 0.000 claims description 2
- 229920000098 polyolefin Polymers 0.000 claims description 2
- 230000006835 compression Effects 0.000 claims 1
- 238000007906 compression Methods 0.000 claims 1
- 230000037361 pathway Effects 0.000 claims 1
- 239000011800 void material Substances 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 abstract 1
- 238000011065 in-situ storage Methods 0.000 abstract 1
- 238000005289 physical deposition Methods 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 description 9
- 238000012545 processing Methods 0.000 description 7
- 239000011149 active material Substances 0.000 description 6
- 239000000155 melt Substances 0.000 description 6
- 239000012159 carrier gas Substances 0.000 description 5
- 229910001873 dinitrogen Inorganic materials 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 229920006254 polymer film Polymers 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- -1 aluminum ions Chemical class 0.000 description 3
- 238000012983 electrochemical energy storage Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000002608 ionic liquid Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002642 lithium compounds Chemical class 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/046—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
- C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5873—Removal of material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/22—Electrodes
- H01G11/24—Electrodes characterised by structural features of the materials making up or comprised in the electrodes, e.g. form, surface area or porosity; characterised by the structural features of powders or particles used therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/22—Electrodes
- H01G11/26—Electrodes characterised by their structure, e.g. multi-layered, porosity or surface features
- H01G11/28—Electrodes characterised by their structure, e.g. multi-layered, porosity or surface features arranged or disposed on a current collector; Layers or phases between electrodes and current collectors, e.g. adhesives
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/66—Current collectors
- H01G11/68—Current collectors characterised by their material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/84—Processes for the manufacture of hybrid or EDL capacitors, or components thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/64—Carriers or collectors
- H01M4/70—Carriers or collectors characterised by shape or form
- H01M4/80—Porous plates, e.g. sintered carriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/22—Electrodes
- H01G11/26—Electrodes characterised by their structure, e.g. multi-layered, porosity or surface features
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/66—Current collectors
- H01G11/70—Current collectors characterised by their structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/64—Carriers or collectors
- H01M4/66—Selection of materials
- H01M4/661—Metal or alloys, e.g. alloy coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/64—Carriers or collectors
- H01M4/66—Selection of materials
- H01M4/668—Composites of electroconductive material and synthetic resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/64—Carriers or collectors
- H01M4/70—Carriers or collectors characterised by shape or form
- H01M4/72—Grids
- H01M4/74—Meshes or woven material; Expanded metal
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/64—Carriers or collectors
- H01M4/70—Carriers or collectors characterised by shape or form
- H01M4/76—Containers for holding the active material, e.g. tubes, capsules
- H01M4/762—Porous or perforated metallic containers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Cell Electrode Carriers And Collectors (AREA)
Abstract
【選択図】図1
Description
Claims (10)
- 多孔質アルミニウムマクロであって、
前記多孔質アルミニウムマクロは、中空アルミニウムワイヤーを接続して形成される3次元の完全な通孔の構造であり、
前記中空アルミニウムワイヤーの肉厚は、7〜100μmであり、
多孔質アルミニウムマクロの総空隙率は、85〜99%であり、
引張強度は、0.4〜2MPaであり、
圧縮強度は、1〜3.5Mpaであり、
中空孔が閉じられて、外界と連通しないことを特徴とする多孔質アルミニウムマクロ。 - 請求項1に記載の多孔質アルミニウムマクロの製造システムであって、
前記製造システムは、1つのマグネトロンスパッタリングサブシステム1、1つの高温アルミニウム蒸気サブシステム2、1つの低温アルミニウム堆積サブシステム3、1つのアルミニウム蒸気回収サブシステム4、及び1本の多孔質ポリウレタンフィルム伝送サブシステム5を備え、
前記多孔質ポリウレタンフィルム伝送サブシステム5は、マグネトロンスパッタリングサブシステムサブシステム1と低温アルミニウム堆積サブシステム3と互いに接続して、前記多孔質ポリウレタンフィルムの移動経路を形成し、前記高温アルミニウム蒸気サブシステム2、前記低温アルミニウム堆積サブシステム3、及び前記アルミニウム蒸気回収サブシステム4が互いに接続して、アルミニウム元素の供給、堆積、回収の経路を形成することを特徴とする製造システム。 - 前記低温アルミニウム堆積サブシステム3の後端には、前記多孔質ポリウレタンフィルム伝送サブシステム5の方向に近づいて酸素を含むガスを入れるための入り口が設けられ、アルミニウムが堆積するとともにアルミニウムの温度を利用して、前記多孔質ポリウレタンフィルムを完全に燃焼させ、前記多孔質ポリウレタンフィルムを前記低温アルミニウム堆積サブシステム3から取り出す場合、炭素元素を含まないことを特徴とする請求項2に記載の製造システム。
- 前記低温アルミニウム堆積サブシステム3は、複数のアルミニウム堆積通路を有して、前記低温アルミニウム堆積サブシステム3が前記多孔質ポリウレタンフィルム伝送サブシステム5に向かって移動する前記多孔質アルミニウムフィルムを、酸素を含むガスに接触させ、前記多孔質ポリウレタンフィルム伝送サブシステム5から前記低温アルミニウム堆積サブシステム3に戻った前記多孔質アルミニウムフィルムを、酸素を含むガスに接触させないことを特徴とする請求項2に記載の製造システム。
- 前記アルミニウム蒸気回収サブシステム4は、風誘発システムを備え、前記低温アルミニウム堆積サブシステム3中の不活性ガス、ポリマーを燃焼した排気ガス及びアルミニウム蒸気を含む混合ガスを、前記アルミニウム蒸気回収サブシステム4に導入させ、冷却によりアルミニウム蒸気が結露して固体になって、他の气体と分離した後、それぞれ前記高温アルミニウム蒸気サブシステム2に戻ることを特徴とする請求項2に記載の製造システム。
- 前記高温アルミニウム蒸気サブシステム2は、外界のアルミニウム及び前記アルミニウム蒸気回収サブシステム4によって回収されたアルミニウムを、前記高温アルミニウム蒸気サブシステム2でアルミニウム蒸気に変更され、同時に前記アルミニウム蒸気回収サブシステム4に導入された混合ガスは、燃焼無害化処理されて排気ガスとなり、前記高温アルミニウム蒸気サブシステム2から送出されることを特徴とする請求項2に記載の製造システム。
- 請求項1に記載の多孔質アルミニウムマクロの製造方法であって、
前記製造方法は、
(1)厚み0.5〜30mm、幅1〜500mm、アスペクト比400:1〜400000:1の多孔質ポリウレタンフィルムを、前記多孔質ポリウレタンフィルム伝送サブシステム5の巻軸aに巻かれて、1〜20cm/minの速度で前記マグネトロンスパッタリングサブシステム1に送られ、25〜50℃で0.5〜5Paの絶対圧力のアルゴン環境で、アルミニウムターゲットの表面電力を2〜10W/cm2に制御し、前記多孔質ポリウレタンフィルムの一表面に、スパッタリングによりアルミニウム層が1〜500nmの厚さになるまで連続的に堆積されるステップと、
(2)前記高温アルミニウム蒸気サブシステム2が起動し、その内部の溶融プールでは常に600〜800℃でアルミニウム粒子を溶融し、不活性ガス窒素或いはアルゴンの存在下で、分圧が0.1〜10%であるアルミニウム蒸気になり、不活性ガスは、前記アルミニウム蒸気を運んで、前記低温アルミニウム堆積サブシステム3に向かって移動するステップと、
(3)前記マグネトロンスパッタリングサブシステム1から出したフィルムを、連続的に前記低温アルミニウム堆積サブシステム3に送り、前記低温アルミニウム堆積サブシステム3の温度を200〜300℃に設定し、前記アルミニウム蒸気が直接フィルムに堆積され、堆積時間を1〜30分に制御するステップと、
(4)前記低温アルミニウム堆積サブシステム3から取り出したアルミ蒸着フィルムは、前記多孔質ポリウレタンフィルム伝送サブシステム5の巻軸bに巻かれて、自動で裏返し、前記低温アルミニウム堆積サブシステム3及び前記マグネトロンスパッタリングサブシステム1へ順次に戻って、前記フィルムの上下両面に蒸着されたアルミニウムの厚みを均一にするステップと、
(5)前記低温アルミニウム堆積サブシステム3の過剰なアルミニウム蒸気は、前記アルミニウム蒸気回収サブシステム4を介して、前記高温アルミニウム蒸気サブシステム2に戻って、アルミニウムと不活性ガスの再利用を実現するステップと、
を備えることを特徴とする製造方法。 - 前記低温アルミニウム堆積サブシステム3から取り出したアルミニウムワイヤーは、中空構造であり、中空の孔は、全て外界の媒体に連通し、
前記多孔質ポリウレタンフィルム伝送サブシステム5を介して前記低温アルミニウム堆積サブシステム3とマグネトロンスパッタリングサブシステム1に戻った後、アルミニウムワイヤーの直径が多くなり、全ての中空孔が閉じられて、外界と連通しないことを特徴とする請求項7に記載の製造方法。 - 前記多孔質ポリウレタンフィルムは、ポリウレタン、ポリオレフィン、PVDFフィルム、PTFEフィルムを備えるが、それらに限定されないことを特徴とする請求項7に記載の製造方法。
- 前記高温アルミニウム蒸気サブシステム2は、外界のアルミニウム及びアルミニウム蒸気回収サブシステム4によって回収されたアルミニウムを、前記高温アルミニウム蒸気サブシステム2で高温溶融方法によってアルミニウム蒸気に変更することを特徴とする請求項7に記載の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810220747.6 | 2018-03-16 | ||
CN201810220747.6A CN108520833B (zh) | 2018-03-16 | 2018-03-16 | 多孔铝宏观体及其制造系统与方法 |
PCT/CN2019/078190 WO2019174621A1 (zh) | 2018-03-16 | 2019-03-14 | 多孔铝宏观体及其制造系统与方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021508784A true JP2021508784A (ja) | 2021-03-11 |
JP6945786B2 JP6945786B2 (ja) | 2021-10-06 |
Family
ID=63433978
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020543689A Active JP6945786B2 (ja) | 2018-03-16 | 2019-03-14 | 多孔質アルミニウムマクロ、並びに、その製造システム及びその製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US11268187B2 (ja) |
EP (1) | EP3709322A4 (ja) |
JP (1) | JP6945786B2 (ja) |
CN (1) | CN108520833B (ja) |
WO (1) | WO2019174621A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108520833B (zh) * | 2018-03-16 | 2019-09-17 | 江苏中天科技股份有限公司 | 多孔铝宏观体及其制造系统与方法 |
CN111118451B (zh) * | 2020-01-20 | 2024-08-06 | 昆山浦元真空技术工程有限公司 | 海绵铝生产工艺及其所用的海绵铝生产设备 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0610077A (ja) * | 1992-01-13 | 1994-01-18 | C Uyemura & Co Ltd | アルミニウム多孔体の製造方法 |
JP2011049023A (ja) * | 2009-08-27 | 2011-03-10 | Mitsubishi Materials Corp | 非水電解質二次電池用電極およびその製造方法 |
JP2011236476A (ja) * | 2010-05-12 | 2011-11-24 | Sumitomo Electric Ind Ltd | アルミニウム構造体の製造方法およびアルミニウム構造体 |
JP2018016869A (ja) * | 2016-07-29 | 2018-02-01 | 日立化成株式会社 | アルミニウム系多孔質体及びその製造方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1008332B (zh) * | 1987-12-08 | 1990-06-13 | 中国科学院化工冶金研究所 | 中空镍纤维毡的制法 |
JP3568052B2 (ja) * | 1994-12-15 | 2004-09-22 | 住友電気工業株式会社 | 金属多孔体、その製造方法及びそれを用いた電池用極板 |
JP3344175B2 (ja) | 1995-07-12 | 2002-11-11 | 上村工業株式会社 | アルミニウム多孔体の製造方法 |
JP4366226B2 (ja) * | 2004-03-30 | 2009-11-18 | 東北パイオニア株式会社 | 有機elパネルの製造方法、有機elパネルの成膜装置 |
JP4402016B2 (ja) * | 2005-06-20 | 2010-01-20 | キヤノン株式会社 | 蒸着装置及び蒸着方法 |
KR101254335B1 (ko) * | 2005-11-29 | 2013-04-12 | 황창훈 | 금속판 벨트 증발원을 이용한 선형 유기소자 양산장비 |
CN101086058A (zh) * | 2006-06-05 | 2007-12-12 | 李博峰 | 一种用于连续带状基料的真空沉积薄膜装置 |
JP5043394B2 (ja) * | 2006-09-29 | 2012-10-10 | 東京エレクトロン株式会社 | 蒸着装置およびその運転方法 |
JP5663938B2 (ja) * | 2010-04-22 | 2015-02-04 | 住友電気工業株式会社 | アルミニウム構造体の製造方法およびアルミニウム構造体 |
EP2570518A1 (en) | 2010-05-12 | 2013-03-20 | Sumitomo Electric Industries, Ltd. | Method of manufacturing aluminum structure, and aluminum structure |
DE112012000890T5 (de) | 2011-02-18 | 2013-11-14 | Sumitomo Electric Industries, Ltd. | Poröser Aluminiumkörper mit dreidimensionalem Netzwerk für Stromabnehmer, Elektrode, bei der der poröse Aluminiumkörper verwendet wird, und Batterie, Kondensator und Lithiumionen-Kondensator, die jeweils die Elektrode verwenden |
CN102212791A (zh) | 2011-06-02 | 2011-10-12 | 爱蓝天高新技术材料(大连)有限公司 | 对聚酯型聚氨酯泡沫基体进行磁控溅射镀膜的设备及方法 |
JP2015165036A (ja) | 2012-06-29 | 2015-09-17 | 住友電気工業株式会社 | 金属多孔体の製造方法および金属多孔体 |
CN103325840B (zh) * | 2013-04-15 | 2016-05-18 | 北京大学深圳研究生院 | 薄膜晶体管及其制作方法 |
JPWO2015105136A1 (ja) | 2014-01-09 | 2017-03-23 | 住友電気工業株式会社 | リチウムイオンキャパシタ用正極およびそれを用いたリチウムイオンキャパシタ |
CN108441821B (zh) * | 2018-03-16 | 2019-10-18 | 江苏中天科技股份有限公司 | 铝或铝/铜或铝/镍空心丝宏观体及其制造系统与方法 |
CN108520833B (zh) * | 2018-03-16 | 2019-09-17 | 江苏中天科技股份有限公司 | 多孔铝宏观体及其制造系统与方法 |
-
2018
- 2018-03-16 CN CN201810220747.6A patent/CN108520833B/zh active Active
-
2019
- 2019-03-14 JP JP2020543689A patent/JP6945786B2/ja active Active
- 2019-03-14 WO PCT/CN2019/078190 patent/WO2019174621A1/zh unknown
- 2019-03-14 EP EP19768237.0A patent/EP3709322A4/en active Pending
-
2020
- 2020-06-05 US US16/893,644 patent/US11268187B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0610077A (ja) * | 1992-01-13 | 1994-01-18 | C Uyemura & Co Ltd | アルミニウム多孔体の製造方法 |
JP2011049023A (ja) * | 2009-08-27 | 2011-03-10 | Mitsubishi Materials Corp | 非水電解質二次電池用電極およびその製造方法 |
JP2011236476A (ja) * | 2010-05-12 | 2011-11-24 | Sumitomo Electric Ind Ltd | アルミニウム構造体の製造方法およびアルミニウム構造体 |
JP2018016869A (ja) * | 2016-07-29 | 2018-02-01 | 日立化成株式会社 | アルミニウム系多孔質体及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2019174621A1 (zh) | 2019-09-19 |
EP3709322A4 (en) | 2021-09-29 |
EP3709322A1 (en) | 2020-09-16 |
US20200299827A1 (en) | 2020-09-24 |
JP6945786B2 (ja) | 2021-10-06 |
CN108520833B (zh) | 2019-09-17 |
US11268187B2 (en) | 2022-03-08 |
CN108520833A (zh) | 2018-09-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Li et al. | Poly (ether ether ketone)(PEEK) porous membranes with super high thermal stability and high rate capability for lithium-ion batteries | |
CN107405902B (zh) | 聚烯烃多层微多孔质膜、其制造方法和电池用隔膜 | |
Lee et al. | Synergistic thermal stabilization of ceramic/co-polyimide coated polypropylene separators for lithium-ion batteries | |
CN110061191B (zh) | 一种三维金属锂负极及其制备方法与应用 | |
KR101728875B1 (ko) | 압축된 파우더 3차원 배터리 전극 제조 | |
JP6945786B2 (ja) | 多孔質アルミニウムマクロ、並びに、その製造システム及びその製造方法 | |
JP6918982B2 (ja) | プロモータ層を用いてアルカリ金属で被覆された基板を製造する方法、及び被覆された基板 | |
CN107403954A (zh) | 固体电解质膜及其制备方法、锂离子电池 | |
JP2004506542A (ja) | 多成分系複合フィルム及びその製造方法 | |
CN113972440A (zh) | 电池隔膜及其制备方法、电池和终端 | |
US11309539B2 (en) | Electrochemical cell and method of manufacturing | |
TWI658633B (zh) | 鋰硫電池隔膜的製備方法 | |
Joseph et al. | Plasma enabled synthesis and processing of materials for lithium‐ion batteries | |
CN103979529A (zh) | 一种多孔炭材料的制备方法及其作为电极材料的应用 | |
CN111682163A (zh) | 一种锂电池用锂转移式补锂方法 | |
Jang et al. | Enhancing rate capability of graphite anodes for lithium-ion batteries by pore-structuring | |
CN208923279U (zh) | 一种金属锂电池、及其集流体和负极 | |
Shaibani et al. | Permselective membranes in lithium–sulfur batteries | |
TWI656681B (zh) | 鋰硫電池隔膜以及鋰硫電池 | |
CN115172660A (zh) | 金属箔及制备方法与锂电池负极和锂电池 | |
CN108441821B (zh) | 铝或铝/铜或铝/镍空心丝宏观体及其制造系统与方法 | |
JP2014082182A (ja) | リチウムイオン電池の製造装置およびリチウムイオン電池の製造方法 | |
WO2013065478A1 (ja) | リチウムイオン二次電池およびその製造方法 | |
JP7473641B2 (ja) | 多孔質フィルムの製造方法 | |
TWI761099B (zh) | 三維分級分層多孔銅及其製備方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20200428 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210108 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210323 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210512 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20210601 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20210618 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20210617 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210706 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6945786 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |