JP2021500746A5 - - Google Patents

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Publication number
JP2021500746A5
JP2021500746A5 JP2020521998A JP2020521998A JP2021500746A5 JP 2021500746 A5 JP2021500746 A5 JP 2021500746A5 JP 2020521998 A JP2020521998 A JP 2020521998A JP 2020521998 A JP2020521998 A JP 2020521998A JP 2021500746 A5 JP2021500746 A5 JP 2021500746A5
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JP
Japan
Prior art keywords
substrate
nanolayer
lithography method
imprint lithography
amount
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JP2020521998A
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English (en)
Japanese (ja)
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JP2021500746A (ja
JP7169350B2 (ja
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Priority claimed from PCT/US2018/056644 external-priority patent/WO2019079679A1/en
Publication of JP2021500746A publication Critical patent/JP2021500746A/ja
Publication of JP2021500746A5 publication Critical patent/JP2021500746A5/ja
Priority to JP2022069396A priority Critical patent/JP2022089961A/ja
Application granted granted Critical
Publication of JP7169350B2 publication Critical patent/JP7169350B2/ja
Priority to JP2022181728A priority patent/JP7427065B2/ja
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JP2020521998A 2017-10-20 2018-10-19 インプリントリソグラフィプロセスにおける光学層の構成 Active JP7169350B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2022069396A JP2022089961A (ja) 2017-10-20 2022-04-20 インプリントリソグラフィプロセスにおける光学層の構成
JP2022181728A JP7427065B2 (ja) 2017-10-20 2022-11-14 インプリントリソグラフィプロセスにおける光学層の構成

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762574826P 2017-10-20 2017-10-20
US62/574,826 2017-10-20
PCT/US2018/056644 WO2019079679A1 (en) 2017-10-20 2018-10-19 CONFIGURING OPTICAL LAYERS IN PRINTING LITHOGRAPHY METHODS

Related Child Applications (1)

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JP2022069396A Division JP2022089961A (ja) 2017-10-20 2022-04-20 インプリントリソグラフィプロセスにおける光学層の構成

Publications (3)

Publication Number Publication Date
JP2021500746A JP2021500746A (ja) 2021-01-07
JP2021500746A5 true JP2021500746A5 (cg-RX-API-DMAC10.html) 2021-11-25
JP7169350B2 JP7169350B2 (ja) 2022-11-10

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ID=66170462

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JP2020521998A Active JP7169350B2 (ja) 2017-10-20 2018-10-19 インプリントリソグラフィプロセスにおける光学層の構成
JP2022069396A Pending JP2022089961A (ja) 2017-10-20 2022-04-20 インプリントリソグラフィプロセスにおける光学層の構成
JP2022181728A Active JP7427065B2 (ja) 2017-10-20 2022-11-14 インプリントリソグラフィプロセスにおける光学層の構成

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JP2022069396A Pending JP2022089961A (ja) 2017-10-20 2022-04-20 インプリントリソグラフィプロセスにおける光学層の構成
JP2022181728A Active JP7427065B2 (ja) 2017-10-20 2022-11-14 インプリントリソグラフィプロセスにおける光学層の構成

Country Status (8)

Country Link
US (7) US10670971B2 (cg-RX-API-DMAC10.html)
EP (1) EP3698181A4 (cg-RX-API-DMAC10.html)
JP (3) JP7169350B2 (cg-RX-API-DMAC10.html)
KR (4) KR20260100857A (cg-RX-API-DMAC10.html)
CN (2) CN111226143B (cg-RX-API-DMAC10.html)
AU (2) AU2018351321B9 (cg-RX-API-DMAC10.html)
IL (1) IL273853B2 (cg-RX-API-DMAC10.html)
WO (1) WO2019079679A1 (cg-RX-API-DMAC10.html)

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EP3591700A1 (en) 2018-07-02 2020-01-08 Thomson Licensing Image sensor comprising a color splitter with two different refractive indexes, and different height
EP3671322A1 (en) 2018-12-18 2020-06-24 Thomson Licensing Device for forming an outgoing electromagnetic wave from an incident electromagnetic wave
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