IL273853B2 - Configuring optical layers in lithographic imprinting processes - Google Patents

Configuring optical layers in lithographic imprinting processes

Info

Publication number
IL273853B2
IL273853B2 IL273853A IL27385320A IL273853B2 IL 273853 B2 IL273853 B2 IL 273853B2 IL 273853 A IL273853 A IL 273853A IL 27385320 A IL27385320 A IL 27385320A IL 273853 B2 IL273853 B2 IL 273853B2
Authority
IL
Israel
Prior art keywords
substrate
nanolayer
imprint lithography
lithography method
functional pattern
Prior art date
Application number
IL273853A
Other languages
English (en)
Hebrew (he)
Other versions
IL273853B1 (en
IL273853A (en
Original Assignee
Magic Leap Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Magic Leap Inc filed Critical Magic Leap Inc
Publication of IL273853A publication Critical patent/IL273853A/en
Publication of IL273853B1 publication Critical patent/IL273853B1/en
Publication of IL273853B2 publication Critical patent/IL273853B2/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Integrated Circuits (AREA)
IL273853A 2017-10-20 2018-10-19 Configuring optical layers in lithographic imprinting processes IL273853B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201762574826P 2017-10-20 2017-10-20
PCT/US2018/056644 WO2019079679A1 (en) 2017-10-20 2018-10-19 CONFIGURING OPTICAL LAYERS IN PRINTING LITHOGRAPHY METHODS

Publications (3)

Publication Number Publication Date
IL273853A IL273853A (en) 2020-05-31
IL273853B1 IL273853B1 (en) 2024-12-01
IL273853B2 true IL273853B2 (en) 2025-04-01

Family

ID=66170462

Family Applications (1)

Application Number Title Priority Date Filing Date
IL273853A IL273853B2 (en) 2017-10-20 2018-10-19 Configuring optical layers in lithographic imprinting processes

Country Status (8)

Country Link
US (7) US10670971B2 (cg-RX-API-DMAC10.html)
EP (1) EP3698181A4 (cg-RX-API-DMAC10.html)
JP (3) JP7169350B2 (cg-RX-API-DMAC10.html)
KR (4) KR20260100857A (cg-RX-API-DMAC10.html)
CN (2) CN111226143B (cg-RX-API-DMAC10.html)
AU (2) AU2018351321B9 (cg-RX-API-DMAC10.html)
IL (1) IL273853B2 (cg-RX-API-DMAC10.html)
WO (1) WO2019079679A1 (cg-RX-API-DMAC10.html)

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WO2018175874A1 (en) * 2017-03-23 2018-09-27 The Board Of Trustees Of The Leland Stanford Junior University Broadband, polarization-independent, omnidirectional, metamaterial-based antireflection coating
IL273853B2 (en) 2017-10-20 2025-04-01 Magic Leap Inc Configuring optical layers in lithographic imprinting processes
EP3540479A1 (en) 2018-03-13 2019-09-18 Thomson Licensing Diffraction grating comprising double-materials structures
EP3540499A1 (en) 2018-03-13 2019-09-18 Thomson Licensing Image sensor comprising a color splitter with two different refractive indexes
EP3588150A1 (en) 2018-06-29 2020-01-01 Thomson Licensing An optical device comprising multi-layer waveguides
EP3591700A1 (en) 2018-07-02 2020-01-08 Thomson Licensing Image sensor comprising a color splitter with two different refractive indexes, and different height
EP3671322A1 (en) 2018-12-18 2020-06-24 Thomson Licensing Device for forming an outgoing electromagnetic wave from an incident electromagnetic wave
EP3671310A1 (en) 2018-12-18 2020-06-24 Thomson Licensing Optical manipulation apparatus for trapping or moving micro or nanoparticles
EP3671293A1 (en) 2018-12-21 2020-06-24 Thomson Licensing An optical device comprising at least one diffraction grating having a grating pitch above the wavelength
JP7693646B2 (ja) * 2019-07-19 2025-06-17 マジック リープ， インコーポレイテッド 回折格子を加工する方法
EP4127789B1 (en) * 2020-03-23 2025-04-30 InterDigital CE Patent Holdings, SAS Unpolarized light grating in-coupler
CN114980593B (zh) * 2021-02-18 2025-07-11 北京小米移动软件有限公司 光学膜、壳体、终端和光学膜的制备方法
US20250076651A1 (en) * 2021-04-16 2025-03-06 Magic Leap, Inc. Nanopattern encapsulation function, method and process in combined optical components
US12442961B1 (en) 2021-07-23 2025-10-14 Apple Inc. Methods of forming holographic gratings for optical systems
WO2023061987A1 (en) * 2021-10-13 2023-04-20 Nilt Switzerland Gmbh Anti-reflective structuring of optical elements that include a metasurface

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US20050095699A1 (en) * 2002-10-30 2005-05-05 Akihiro Miyauchi Functioning substrate with a group of columnar micro pillars and its manufacturing method
US20090029145A1 (en) * 2003-05-20 2009-01-29 Dsm Ip Assets B.V. Nano-structured surface coating process, nano-structured coatings and articles comprising the coating
WO2015079051A1 (en) * 2013-11-29 2015-06-04 Fom Institute For Atomic And Molecular Physics Nanopatterned antireflection coating

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US20050095699A1 (en) * 2002-10-30 2005-05-05 Akihiro Miyauchi Functioning substrate with a group of columnar micro pillars and its manufacturing method
US20090029145A1 (en) * 2003-05-20 2009-01-29 Dsm Ip Assets B.V. Nano-structured surface coating process, nano-structured coatings and articles comprising the coating
WO2015079051A1 (en) * 2013-11-29 2015-06-04 Fom Institute For Atomic And Molecular Physics Nanopatterned antireflection coating

Also Published As

Publication number Publication date
KR102769774B1 (ko) 2025-02-17
AU2018351321B2 (en) 2023-09-07
US20220187716A1 (en) 2022-06-16
WO2019079679A1 (en) 2019-04-25
CN115079514B (zh) 2025-03-07
AU2023274092B2 (en) 2024-07-04
US11550226B2 (en) 2023-01-10
US12044976B2 (en) 2024-07-23
US20190121239A1 (en) 2019-04-25
US20210223700A1 (en) 2021-07-22
KR20260100857A (ko) 2026-06-30
NZ763665A (en) 2025-05-02
IL273853B1 (en) 2024-12-01
EP3698181A4 (en) 2020-11-18
US20250264806A1 (en) 2025-08-21
KR102383721B1 (ko) 2022-04-08
US12332572B2 (en) 2025-06-17
JP2022089961A (ja) 2022-06-16
US20230105058A1 (en) 2023-04-06
AU2018351321A1 (en) 2020-05-07
EP3698181A1 (en) 2020-08-26
US10670971B2 (en) 2020-06-02
US20240329540A1 (en) 2024-10-03
JP2023016838A (ja) 2023-02-02
CN111226143A (zh) 2020-06-02
CN115079514A (zh) 2022-09-20
US10969692B2 (en) 2021-04-06
KR20200066360A (ko) 2020-06-09
JP2021500746A (ja) 2021-01-07
JP7427065B2 (ja) 2024-02-02
US11281109B2 (en) 2022-03-22
AU2018351321B9 (en) 2023-09-21
KR20220045081A (ko) 2022-04-12
IL273853A (en) 2020-05-31
AU2023274092A1 (en) 2023-12-14
CA3078522A1 (en) 2019-04-25
KR102980670B1 (ko) 2026-06-19
KR20250026388A (ko) 2025-02-25
US20200257206A1 (en) 2020-08-13
JP7169350B2 (ja) 2022-11-10
CN111226143B (zh) 2022-07-12

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