JP2021121503A5 - - Google Patents

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JP2021121503A5
JP2021121503A5 JP2021085229A JP2021085229A JP2021121503A5 JP 2021121503 A5 JP2021121503 A5 JP 2021121503A5 JP 2021085229 A JP2021085229 A JP 2021085229A JP 2021085229 A JP2021085229 A JP 2021085229A JP 2021121503 A5 JP2021121503 A5 JP 2021121503A5
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Japan
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JP2021085229A
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Japanese (ja)
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JP2021121503A (ja
JP7744567B2 (ja
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Priority claimed from JP2020086414A external-priority patent/JP6943315B2/ja
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JP2021085229A 2019-05-22 2021-05-20 防汚基材 Active JP7744567B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2019096329 2019-05-22
JP2019096329 2019-05-22
JP2019159523 2019-09-02
JP2019159523 2019-09-02
JP2020086414A JP6943315B2 (ja) 2019-05-22 2020-05-18 防汚基材

Related Parent Applications (1)

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JP2020086414A Division JP6943315B2 (ja) 2019-05-22 2020-05-18 防汚基材

Publications (3)

Publication Number Publication Date
JP2021121503A JP2021121503A (ja) 2021-08-26
JP2021121503A5 true JP2021121503A5 (https=) 2023-07-18
JP7744567B2 JP7744567B2 (ja) 2025-09-26

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ID=73458335

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2020086414A Active JP6943315B2 (ja) 2019-05-22 2020-05-18 防汚基材
JP2021085229A Active JP7744567B2 (ja) 2019-05-22 2021-05-20 防汚基材

Family Applications Before (1)

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JP2020086414A Active JP6943315B2 (ja) 2019-05-22 2020-05-18 防汚基材

Country Status (7)

Country Link
US (1) US20220081590A1 (https=)
EP (1) EP3974179B1 (https=)
JP (2) JP6943315B2 (https=)
KR (1) KR102640005B1 (https=)
CN (1) CN113905883B (https=)
TW (2) TWI887611B (https=)
WO (1) WO2020235528A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115707346A (zh) * 2021-06-09 2023-02-17 株式会社日立高新技术 半导体制造方法以及半导体制造装置
JP7706315B2 (ja) * 2021-09-10 2025-07-11 日東電工株式会社 積層体、積層体付光学部材および画像表示装置
JP7822729B2 (ja) * 2021-09-10 2026-03-03 日東電工株式会社 積層体、積層体付光学部材および画像表示装置
JP7706316B2 (ja) * 2021-09-10 2025-07-11 日東電工株式会社 積層体、積層体付光学部材および画像表示装置
JP7822728B2 (ja) * 2021-09-10 2026-03-03 日東電工株式会社 積層体、積層体付光学部材および画像表示装置
JP7473851B2 (ja) * 2022-01-18 2024-04-24 ダイキン工業株式会社 防汚性物品
CN117401910A (zh) * 2022-07-08 2024-01-16 大金工业株式会社 叠层体

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US2518116A (en) * 1946-02-26 1950-08-08 Bete Fog Nozzle Inc Spiral film spray nozzle
JP4034365B2 (ja) * 1995-03-09 2008-01-16 大日本印刷株式会社 超微粒子含有反射防止フィルム、偏光板及び液晶表示装置
JP3454110B2 (ja) * 1996-11-18 2003-10-06 日本板硝子株式会社 撥水性ガラス
US6770321B2 (en) * 2002-01-25 2004-08-03 Afg Industries, Inc. Method of making transparent articles utilizing protective layers for optical coatings
JP2004021550A (ja) * 2002-06-14 2004-01-22 Sony Corp タッチパネル、表示体、反射防止フィルム及びこれらの製造方法
US6991826B2 (en) * 2004-04-20 2006-01-31 3M Innovative Properties Company Antisoiling coatings for antireflective substrates
US7323514B2 (en) * 2004-12-30 2008-01-29 3M Innovative Properties Company Low refractive index fluoropolymer coating compositions for use in antireflective polymer films
US20070141114A1 (en) * 2005-12-15 2007-06-21 Essilor International Compagnie Generale D'optique Article coated with an ultra high hydrophobic film and process for obtaining same
JP2010173294A (ja) * 2009-02-02 2010-08-12 Konica Minolta Holdings Inc 防汚性積層体
JP2012035411A (ja) * 2010-08-03 2012-02-23 Nsk Ltd 表面改質構造
US8760978B2 (en) * 2011-12-05 2014-06-24 HGST Netherlands B.V. Magnetic recording head and system having optical waveguide core and/or cladding of an alloyed oxide material
KR101743851B1 (ko) 2012-11-05 2017-06-05 다이킨 고교 가부시키가이샤 퍼플루오로(폴리)에테르기 함유 실란 화합물
KR20150118156A (ko) * 2013-02-22 2015-10-21 아사히 가라스 가부시키가이샤 광학 부품
CN109263151B (zh) * 2013-12-19 2021-02-05 3M创新有限公司 多层复合材料制品
US9975993B2 (en) * 2014-04-30 2018-05-22 Daikin Industries, Ltd. Silane compound containing perfluoro(poly)ether group
JP6274083B2 (ja) * 2014-11-17 2018-02-07 信越化学工業株式会社 耐熱性を有する撥水撥油処理剤及びその製造方法並びに物品
CN107001619B (zh) * 2014-11-28 2019-07-19 大金工业株式会社 含氟氧亚甲基的全氟聚醚改性体
WO2016190047A1 (ja) * 2015-05-22 2016-12-01 ダイキン工業株式会社 表面処理層を有する物品の製造方法
EP3333172B1 (en) 2015-07-31 2020-10-21 Daikin Industries, Ltd. Silane compound containing perfluoro(poly)ether group
CN106680905A (zh) * 2015-11-05 2017-05-17 大金工业株式会社 具有表面处理层的物品
FR3051000B1 (fr) * 2016-05-09 2018-06-01 Corporation De L'ecole Polytechnique De Montreal Article comportant une couche de nature organique-inorganique de bas indice de refraction obtenue par depot a angle oblique
WO2018056410A1 (ja) * 2016-09-23 2018-03-29 ダイキン工業株式会社 撥水性を有する基材

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