JP2021103612A5 - - Google Patents

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Publication number
JP2021103612A5
JP2021103612A5 JP2019233378A JP2019233378A JP2021103612A5 JP 2021103612 A5 JP2021103612 A5 JP 2021103612A5 JP 2019233378 A JP2019233378 A JP 2019233378A JP 2019233378 A JP2019233378 A JP 2019233378A JP 2021103612 A5 JP2021103612 A5 JP 2021103612A5
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JP
Japan
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layer
ingan
gan
quantum well
scintillator
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JP2019233378A
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English (en)
Japanese (ja)
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JP7373391B2 (ja
JP2021103612A (ja
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Priority claimed from JP2019233378A external-priority patent/JP7373391B2/ja
Priority to JP2019233378A priority Critical patent/JP7373391B2/ja
Priority to CN202080085111.0A priority patent/CN114787959B/zh
Priority to US17/787,617 priority patent/US12072454B2/en
Priority to PCT/JP2020/043186 priority patent/WO2021131436A1/ja
Priority to EP20905041.8A priority patent/EP4053245A4/en
Publication of JP2021103612A publication Critical patent/JP2021103612A/ja
Publication of JP2021103612A5 publication Critical patent/JP2021103612A5/ja
Publication of JP7373391B2 publication Critical patent/JP7373391B2/ja
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JP2019233378A 2019-12-24 2019-12-24 シンチレータ、計測装置、質量分析装置および電子顕微鏡 Active JP7373391B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2019233378A JP7373391B2 (ja) 2019-12-24 2019-12-24 シンチレータ、計測装置、質量分析装置および電子顕微鏡
EP20905041.8A EP4053245A4 (en) 2019-12-24 2020-11-19 SCINTILLATOR, MEASURING DEVICE, MASS SPECTROMETER AND ELECTRONIC MICROSCOPE
US17/787,617 US12072454B2 (en) 2019-12-24 2020-11-19 Scintillator, measuring device, mass spectrometer, and electron microscope
PCT/JP2020/043186 WO2021131436A1 (ja) 2019-12-24 2020-11-19 シンチレータ、計測装置、質量分析装置および電子顕微鏡
CN202080085111.0A CN114787959B (zh) 2019-12-24 2020-11-19 闪烁器、测量装置、质量分析装置以及电子显微镜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019233378A JP7373391B2 (ja) 2019-12-24 2019-12-24 シンチレータ、計測装置、質量分析装置および電子顕微鏡

Publications (3)

Publication Number Publication Date
JP2021103612A JP2021103612A (ja) 2021-07-15
JP2021103612A5 true JP2021103612A5 (enExample) 2022-08-09
JP7373391B2 JP7373391B2 (ja) 2023-11-02

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JP2019233378A Active JP7373391B2 (ja) 2019-12-24 2019-12-24 シンチレータ、計測装置、質量分析装置および電子顕微鏡

Country Status (5)

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US (1) US12072454B2 (enExample)
EP (1) EP4053245A4 (enExample)
JP (1) JP7373391B2 (enExample)
CN (1) CN114787959B (enExample)
WO (1) WO2021131436A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021005743A1 (ja) * 2019-07-10 2021-01-14 株式会社日立ハイテク 荷電粒子線装置用シンチレータおよび荷電粒子線装置
JP7557589B1 (ja) 2023-09-13 2024-09-27 浜松ホトニクス株式会社 発光体、荷電粒子検出器、電子顕微鏡及び質量分析装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100591705B1 (ko) * 2000-09-21 2006-06-20 샤프 가부시키가이샤 질화물 반도체 발광소자 및 그것을 포함한 광학장치
JP4365255B2 (ja) * 2004-04-08 2009-11-18 浜松ホトニクス株式会社 発光体と、これを用いた電子線検出器、走査型電子顕微鏡及び質量分析装置
TWI287255B (en) * 2004-10-21 2007-09-21 Hoya Corp Apparatus and method for depositing fine particles, and manufacturing method of light-emitting element
JP5844545B2 (ja) * 2010-05-31 2016-01-20 富士フイルム株式会社 放射線撮影装置
US9929310B2 (en) * 2013-03-14 2018-03-27 Applied Materials, Inc. Oxygen controlled PVD aluminum nitride buffer for gallium nitride-based optoelectronic and electronic devices
WO2016048000A2 (ko) * 2014-09-22 2016-03-31 전남대학교산학협력단 광 발생 장치
JP6576257B2 (ja) * 2016-01-29 2019-09-18 株式会社日立ハイテクノロジーズ 荷電粒子検出器、及び荷電粒子線装置
JP6774189B2 (ja) * 2016-03-03 2020-10-21 日本碍子株式会社 発光体、発光体の製造方法、および、発光体粉末の製造方法
EP3440714A1 (en) 2016-04-04 2019-02-13 Glo Ab Through backplane laser irradiation for die transfer
JP6666626B2 (ja) * 2017-01-31 2020-03-18 株式会社日立ハイテク 荷電粒子検出器及び荷電粒子線装置

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