JP2021064606A5 - - Google Patents

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Publication number
JP2021064606A5
JP2021064606A5 JP2020170634A JP2020170634A JP2021064606A5 JP 2021064606 A5 JP2021064606 A5 JP 2021064606A5 JP 2020170634 A JP2020170634 A JP 2020170634A JP 2020170634 A JP2020170634 A JP 2020170634A JP 2021064606 A5 JP2021064606 A5 JP 2021064606A5
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JP
Japan
Prior art keywords
sample
kev
ion beam
image
low
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JP2020170634A
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Japanese (ja)
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JP7544320B2 (ja
JP2021064606A (ja
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Priority claimed from US16/596,538 external-priority patent/US11355305B2/en
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JP2020170634A 2019-10-08 2020-10-08 オブジェクト位置特定のための機械学習による低keVイオンビーム画像復元 Active JP7544320B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16/596,538 US11355305B2 (en) 2019-10-08 2019-10-08 Low keV ion beam image restoration by machine learning for object localization
US16/596,538 2019-10-08

Publications (3)

Publication Number Publication Date
JP2021064606A JP2021064606A (ja) 2021-04-22
JP2021064606A5 true JP2021064606A5 (enExample) 2023-10-18
JP7544320B2 JP7544320B2 (ja) 2024-09-03

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JP2020170634A Active JP7544320B2 (ja) 2019-10-08 2020-10-08 オブジェクト位置特定のための機械学習による低keVイオンビーム画像復元

Country Status (4)

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US (1) US11355305B2 (enExample)
EP (1) EP3806131A3 (enExample)
JP (1) JP7544320B2 (enExample)
CN (1) CN112712473A (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11955311B2 (en) 2019-03-25 2024-04-09 Nissin Ion Equipment Co., Ltd. Ion beam irradiation apparatus and program therefor
US11462385B2 (en) * 2019-03-25 2022-10-04 Nissin Ion Equipment Co., Ltd. Ion beam irradiation apparatus and program therefor
DE102020211900A1 (de) * 2019-09-25 2021-03-25 Hitachi High-Tech Science Corporation Ladungsträgerstrahlvorrichtung
US11355305B2 (en) * 2019-10-08 2022-06-07 Fei Company Low keV ion beam image restoration by machine learning for object localization
EP3961670A1 (en) * 2020-08-31 2022-03-02 FEI Company Method of examining a sample using a charged particle beam apparatus
US11703468B2 (en) * 2021-07-01 2023-07-18 Fei Company Method and system for determining sample composition from spectral data
US12228484B2 (en) * 2022-05-19 2025-02-18 Fei Company Broad ion beam (BIB) systems for more efficient processing of multiple samples
CN115631349A (zh) * 2022-08-29 2023-01-20 江苏第三代半导体研究院有限公司 一种聚焦离子束辅助加工方法、装置、设备及存储介质
CN115575364B (zh) * 2022-09-30 2023-08-04 中国科学院生物物理研究所 基于光学显微成像的离子束加工方法
JPWO2024142280A1 (enExample) * 2022-12-27 2024-07-04

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7809155B2 (en) * 2004-06-30 2010-10-05 Intel Corporation Computing a higher resolution image from multiple lower resolution images using model-base, robust Bayesian estimation
US8912490B2 (en) * 2011-06-03 2014-12-16 Fei Company Method for preparing samples for imaging
US8704176B2 (en) * 2011-08-10 2014-04-22 Fei Company Charged particle microscope providing depth-resolved imagery
US8740209B2 (en) * 2012-02-22 2014-06-03 Expresslo Llc Method and apparatus for ex-situ lift-out specimen preparation
CN104303257B (zh) * 2012-05-21 2018-03-30 Fei 公司 用于tem观察的薄片的制备
JP6113842B2 (ja) 2012-07-16 2017-04-12 エフ・イ−・アイ・カンパニー 集束イオン・ビーム処理の終点決定
US10465293B2 (en) * 2012-08-31 2019-11-05 Fei Company Dose-based end-pointing for low-kV FIB milling TEM sample preparation
EP2787523B1 (en) * 2013-04-03 2016-02-10 Fei Company Low energy ion milling or deposition
US9911573B2 (en) * 2014-03-09 2018-03-06 Ib Labs, Inc. Methods, apparatuses, systems and software for treatment of a specimen by ion-milling
JP6207081B2 (ja) 2014-03-24 2017-10-04 株式会社日立ハイテクサイエンス 集束イオンビーム装置
JP6552383B2 (ja) 2014-11-07 2019-07-31 エフ・イ−・アイ・カンパニー 自動化されたtem試料調製
US10107769B2 (en) * 2016-01-11 2018-10-23 Carl Zeiss X-Ray Microscopy Inc. Multimodality mineralogy segmentation system and method
JP6668278B2 (ja) * 2017-02-20 2020-03-18 株式会社日立ハイテク 試料観察装置および試料観察方法
US10395362B2 (en) * 2017-04-07 2019-08-27 Kla-Tencor Corp. Contour based defect detection
EP3499459A1 (en) * 2017-12-18 2019-06-19 FEI Company Method, device and system for remote deep learning for microscopic image reconstruction and segmentation
JP6964031B2 (ja) * 2018-03-27 2021-11-10 Tasmit株式会社 パターンエッジ検出方法
US11355305B2 (en) * 2019-10-08 2022-06-07 Fei Company Low keV ion beam image restoration by machine learning for object localization

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