JP7544320B2 - オブジェクト位置特定のための機械学習による低ｋｅＶイオンビーム画像復元 - Google Patents

オブジェクト位置特定のための機械学習による低ｋｅＶイオンビーム画像復元 Download PDF

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JP7544320B2
JP7544320B2 JP2020170634A JP2020170634A JP7544320B2 JP 7544320 B2 JP7544320 B2 JP 7544320B2 JP 2020170634 A JP2020170634 A JP 2020170634A JP 2020170634 A JP2020170634 A JP 2020170634A JP 7544320 B2 JP7544320 B2 JP 7544320B2
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ヨハネス ペトラス グールツ レムコ
ポトチェク パヴェル
ぺーメン マウリス
マチェク オンドレイ
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    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
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    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G01N23/046—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material using tomography, e.g. computed tomography [CT]
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    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
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  • Medical Informatics (AREA)
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  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Pulmonology (AREA)
  • Radiology & Medical Imaging (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
JP2020170634A 2019-10-08 2020-10-08 オブジェクト位置特定のための機械学習による低ｋｅＶイオンビーム画像復元 Active JP7544320B2 (ja)

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Application Number Priority Date Filing Date Title
US16/596,538 US11355305B2 (en) 2019-10-08 2019-10-08 Low keV ion beam image restoration by machine learning for object localization
US16/596,538 2019-10-08

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JP2021064606A JP2021064606A (ja) 2021-04-22
JP2021064606A5 JP2021064606A5 (enExample) 2023-10-18
JP7544320B2 true JP7544320B2 (ja) 2024-09-03

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US (1) US11355305B2 (enExample)
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CN (1) CN112712473A (enExample)

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US11955311B2 (en) 2019-03-25 2024-04-09 Nissin Ion Equipment Co., Ltd. Ion beam irradiation apparatus and program therefor
US11462385B2 (en) * 2019-03-25 2022-10-04 Nissin Ion Equipment Co., Ltd. Ion beam irradiation apparatus and program therefor
DE102020211900A1 (de) * 2019-09-25 2021-03-25 Hitachi High-Tech Science Corporation Ladungsträgerstrahlvorrichtung
US11355305B2 (en) * 2019-10-08 2022-06-07 Fei Company Low keV ion beam image restoration by machine learning for object localization
EP3961670A1 (en) * 2020-08-31 2022-03-02 FEI Company Method of examining a sample using a charged particle beam apparatus
US11703468B2 (en) * 2021-07-01 2023-07-18 Fei Company Method and system for determining sample composition from spectral data
US12228484B2 (en) * 2022-05-19 2025-02-18 Fei Company Broad ion beam (BIB) systems for more efficient processing of multiple samples
CN115631349A (zh) * 2022-08-29 2023-01-20 江苏第三代半导体研究院有限公司 一种聚焦离子束辅助加工方法、装置、设备及存储介质
CN115575364B (zh) * 2022-09-30 2023-08-04 中国科学院生物物理研究所 基于光学显微成像的离子束加工方法
JPWO2024142280A1 (enExample) * 2022-12-27 2024-07-04

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JP2014048285A (ja) 2012-08-31 2014-03-17 Fei Co ＴＥＭ試料調製における低ｋＶＦＩＢミリングのドーズ量ベースの終点決定
JP2015525959A (ja) 2012-07-16 2015-09-07 エフ・イ−・アイ・カンパニー 集束イオン・ビーム処理の終点決定

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JP6207081B2 (ja) 2014-03-24 2017-10-04 株式会社日立ハイテクサイエンス 集束イオンビーム装置
JP6552383B2 (ja) 2014-11-07 2019-07-31 エフ・イ−・アイ・カンパニー 自動化されたｔｅｍ試料調製
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US20070019887A1 (en) 2004-06-30 2007-01-25 Oscar Nestares Computing a higher resolution image from multiple lower resolution images using model-base, robust bayesian estimation
JP2015525959A (ja) 2012-07-16 2015-09-07 エフ・イ−・アイ・カンパニー 集束イオン・ビーム処理の終点決定
JP2014048285A (ja) 2012-08-31 2014-03-17 Fei Co ＴＥＭ試料調製における低ｋＶＦＩＢミリングのドーズ量ベースの終点決定

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EP3806131A3 (en) 2021-06-23
US11355305B2 (en) 2022-06-07
EP3806131A2 (en) 2021-04-14
CN112712473A (zh) 2021-04-27
US20210104375A1 (en) 2021-04-08

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