JP2016213189A5 - - Google Patents
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- JP2016213189A5 JP2016213189A5 JP2016091417A JP2016091417A JP2016213189A5 JP 2016213189 A5 JP2016213189 A5 JP 2016213189A5 JP 2016091417 A JP2016091417 A JP 2016091417A JP 2016091417 A JP2016091417 A JP 2016091417A JP 2016213189 A5 JP2016213189 A5 JP 2016213189A5
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/702,753 | 2015-05-03 | ||
| US14/702,753 US9502211B1 (en) | 2015-05-03 | 2015-05-03 | Adaptive scanning for particle size using directed beam signal analysis |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016213189A JP2016213189A (ja) | 2016-12-15 |
| JP2016213189A5 true JP2016213189A5 (enExample) | 2019-04-25 |
| JP6822783B2 JP6822783B2 (ja) | 2021-01-27 |
Family
ID=57205188
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016091417A Active JP6822783B2 (ja) | 2015-05-03 | 2016-04-28 | 有向ビーム信号分析を使用した粒子サイズの適応走査 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US9502211B1 (enExample) |
| JP (1) | JP6822783B2 (enExample) |
| CN (1) | CN106098518B (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102206999B1 (ko) * | 2016-01-29 | 2021-01-25 | 주식회사 히타치하이테크 | 하전 입자선 장치 |
| US9881765B2 (en) * | 2016-04-20 | 2018-01-30 | Applied Materials Israel Ltd. | Method and system for scanning an object |
| US9983152B1 (en) | 2016-11-17 | 2018-05-29 | Fei Company | Material characterization using ion channeling imaging |
| US10838191B2 (en) * | 2016-12-21 | 2020-11-17 | Carl Zeiss Microscopy Gmbh | Method of operating a microscope |
| EP3531439B1 (en) * | 2018-02-22 | 2020-06-24 | FEI Company | Intelligent pre-scan in scanning transmission charged particle microscopy |
| DE102019210452A1 (de) * | 2019-07-16 | 2021-01-21 | Carl Zeiss Microscopy Gmbh | Verfahren und Vorrichtung zum Erfassen von Volumeninformationen dreidimensionaler Proben |
| KR102845787B1 (ko) * | 2020-06-18 | 2025-08-13 | 주식회사 히타치하이테크 | 하전 입자선 장치 |
| DE102020122535B4 (de) * | 2020-08-28 | 2022-08-11 | Carl Zeiss Microscopy Gmbh | Verfahren zum Betrieb eines Strahlgeräts, Computerprogrammprodukt und Strahlgerät zum Durchführen des Verfahrens |
| GB2598780B (en) * | 2020-09-14 | 2022-10-12 | Thermo Fisher Scient Ecublens Sarl | Systems and methods for performing laser-induced breakdown spectroscopy |
| CN116930232A (zh) * | 2022-03-31 | 2023-10-24 | Fei 公司 | 用于分析三维特征部的方法及系统 |
| TW202536913A (zh) * | 2023-11-06 | 2025-09-16 | 荷蘭商Ａｓｍｌ荷蘭公司 | 設計感知動態像素大小以提高掃描電子顯微鏡檢測及度量衡產出量 |
| CN119603552B (zh) * | 2024-12-18 | 2025-09-16 | 中国科学院合肥物质科学研究院 | 面向计数框计数的浮游植物快速扫描显微高清成像方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6879719B1 (en) | 2000-02-24 | 2005-04-12 | International Business Machines Corporation | Method for measurement of full-two dimensional submicron shapes |
| JP3971937B2 (ja) * | 2002-02-18 | 2007-09-05 | 株式会社日立ハイテクノロジーズ | 露光条件監視方法およびその装置並びに半導体デバイスの製造方法 |
| JP2004207032A (ja) | 2002-12-25 | 2004-07-22 | Toshiba Corp | 荷電ビーム装置、荷電ビーム照射方法、および半導体装置の製造方法 |
| JP3749241B2 (ja) | 2003-10-08 | 2006-02-22 | 株式会社東芝 | 荷電ビーム照射方法、半導体装置の製造方法および荷電ビーム照射装置 |
| US7425703B2 (en) * | 2004-02-20 | 2008-09-16 | Ebara Corporation | Electron beam apparatus, a device manufacturing method using the same apparatus, a pattern evaluation method, a device manufacturing method using the same method, and a resist pattern or processed wafer evaluation method |
| KR100689673B1 (ko) * | 2004-05-10 | 2007-03-09 | 주식회사 하이닉스반도체 | 반도체소자의 불균일 이온주입 방법 |
| JP5156619B2 (ja) | 2006-02-17 | 2013-03-06 | 株式会社日立ハイテクノロジーズ | 試料寸法検査・測定方法、及び試料寸法検査・測定装置 |
| WO2009070119A1 (en) | 2007-11-30 | 2009-06-04 | Nanofactory Instruments Ab | Iterative feedback tuning in a scanning probe microscope |
| JP5474174B2 (ja) * | 2010-02-22 | 2014-04-16 | 株式会社日立ハイテクノロジーズ | 回路パターン検査装置 |
| EP2461347A1 (en) * | 2010-12-06 | 2012-06-06 | Fei Company | Detector system for transmission electron microscope |
| US8389962B2 (en) | 2011-05-31 | 2013-03-05 | Applied Materials Israel, Ltd. | System and method for compensating for magnetic noise |
| EP2557584A1 (en) | 2011-08-10 | 2013-02-13 | Fei Company | Charged-particle microscopy imaging method |
| JP5677236B2 (ja) * | 2011-08-22 | 2015-02-25 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| US9041793B2 (en) | 2012-05-17 | 2015-05-26 | Fei Company | Scanning microscope having an adaptive scan |
| EP2924708A1 (en) | 2014-03-25 | 2015-09-30 | Fei Company | Imaging a sample with multiple beams and multiple detectors |
| EP2924710A1 (en) | 2014-03-25 | 2015-09-30 | Fei Company | Imaging a sample with multiple beams and a single detector |
-
2015
- 2015-05-03 US US14/702,753 patent/US9502211B1/en active Active
-
2016
- 2016-04-28 JP JP2016091417A patent/JP6822783B2/ja active Active
- 2016-05-03 CN CN201610294324.XA patent/CN106098518B/zh active Active
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