JP2021036347A5 - - Google Patents
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- JP2021036347A5 JP2021036347A5 JP2020201675A JP2020201675A JP2021036347A5 JP 2021036347 A5 JP2021036347 A5 JP 2021036347A5 JP 2020201675 A JP2020201675 A JP 2020201675A JP 2020201675 A JP2020201675 A JP 2020201675A JP 2021036347 A5 JP2021036347 A5 JP 2021036347A5
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- JP
- Japan
- Prior art keywords
- exposure
- substrate
- forming
- light
- latent image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000463 material Substances 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 16
- 238000001459 lithography Methods 0.000 claims description 12
- 239000003795 chemical substances by application Substances 0.000 claims description 9
- 239000003504 photosensitizing agent Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 claims 6
- 229960001716 benzalkonium Drugs 0.000 claims 3
- CYDRXTMLKJDRQH-UHFFFAOYSA-N benzododecinium Chemical compound CCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 CYDRXTMLKJDRQH-UHFFFAOYSA-N 0.000 claims 3
- 238000010521 absorption reaction Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000011521 glass Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020201675A JP7071483B2 (ja) | 2020-12-04 | 2020-12-04 | リソグラフィ装置、パターン形成方法及び物品の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020201675A JP7071483B2 (ja) | 2020-12-04 | 2020-12-04 | リソグラフィ装置、パターン形成方法及び物品の製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019158671A Division JP6828107B2 (ja) | 2019-08-30 | 2019-08-30 | リソグラフィ装置、パターン形成方法及び物品の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021036347A JP2021036347A (ja) | 2021-03-04 |
| JP2021036347A5 true JP2021036347A5 (https=) | 2021-04-30 |
| JP7071483B2 JP7071483B2 (ja) | 2022-05-19 |
Family
ID=74716667
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020201675A Active JP7071483B2 (ja) | 2020-12-04 | 2020-12-04 | リソグラフィ装置、パターン形成方法及び物品の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP7071483B2 (https=) |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1012521A (ja) * | 1996-06-21 | 1998-01-16 | Nikon Corp | 感光剤塗布方法及び装置、及び位置合わせ方法 |
| JP2001203146A (ja) * | 2000-01-20 | 2001-07-27 | Toshiba Corp | パターン形成方法 |
| JP2003059105A (ja) * | 2001-08-23 | 2003-02-28 | Sony Corp | 光ディスクおよびその製造方法 |
| JP2003251937A (ja) * | 2002-03-05 | 2003-09-09 | Fuji Photo Film Co Ltd | マーキング方法、マーキング装置及び感光材料 |
| JP2005092137A (ja) * | 2003-09-19 | 2005-04-07 | Nikon Corp | 露光装置及び露光方法 |
| JP2006017975A (ja) * | 2004-07-01 | 2006-01-19 | Ricoh Co Ltd | 移動体、画像形成装置及び移動体のマーク形成方法 |
| US8500895B2 (en) * | 2006-05-22 | 2013-08-06 | Marken-Imaje Corporation | Methods of marking and related structures and compositions |
| US8138058B2 (en) * | 2006-11-24 | 2012-03-20 | Semiconductor Energy Laboratory Co., Ltd. | Substrate with marker, manufacturing method thereof, laser irradiation apparatus, laser irradiation method, light exposure apparatus, and manufacturing method of semiconductor device |
| KR102288980B1 (ko) * | 2017-03-08 | 2021-08-12 | 에스케이하이닉스 주식회사 | 얼라인먼트 마크를 가지는 임프린트 템플레이트 및 임프린트 방법 |
-
2020
- 2020-12-04 JP JP2020201675A patent/JP7071483B2/ja active Active
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