JP7071483B2 - リソグラフィ装置、パターン形成方法及び物品の製造方法 - Google Patents

リソグラフィ装置、パターン形成方法及び物品の製造方法 Download PDF

Info

Publication number
JP7071483B2
JP7071483B2 JP2020201675A JP2020201675A JP7071483B2 JP 7071483 B2 JP7071483 B2 JP 7071483B2 JP 2020201675 A JP2020201675 A JP 2020201675A JP 2020201675 A JP2020201675 A JP 2020201675A JP 7071483 B2 JP7071483 B2 JP 7071483B2
Authority
JP
Japan
Prior art keywords
substrate
exposure
light
mark
alignment mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020201675A
Other languages
English (en)
Japanese (ja)
Other versions
JP2021036347A5 (https=
JP2021036347A (ja
Inventor
宏明 板橋
卓司 丸田
亨 中道
友則 塚原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2020201675A priority Critical patent/JP7071483B2/ja
Publication of JP2021036347A publication Critical patent/JP2021036347A/ja
Publication of JP2021036347A5 publication Critical patent/JP2021036347A5/ja
Application granted granted Critical
Publication of JP7071483B2 publication Critical patent/JP7071483B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2020201675A 2020-12-04 2020-12-04 リソグラフィ装置、パターン形成方法及び物品の製造方法 Active JP7071483B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2020201675A JP7071483B2 (ja) 2020-12-04 2020-12-04 リソグラフィ装置、パターン形成方法及び物品の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020201675A JP7071483B2 (ja) 2020-12-04 2020-12-04 リソグラフィ装置、パターン形成方法及び物品の製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2019158671A Division JP6828107B2 (ja) 2019-08-30 2019-08-30 リソグラフィ装置、パターン形成方法及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2021036347A JP2021036347A (ja) 2021-03-04
JP2021036347A5 JP2021036347A5 (https=) 2021-04-30
JP7071483B2 true JP7071483B2 (ja) 2022-05-19

Family

ID=74716667

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020201675A Active JP7071483B2 (ja) 2020-12-04 2020-12-04 リソグラフィ装置、パターン形成方法及び物品の製造方法

Country Status (1)

Country Link
JP (1) JP7071483B2 (https=)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001203146A (ja) 2000-01-20 2001-07-27 Toshiba Corp パターン形成方法
JP2003059105A (ja) 2001-08-23 2003-02-28 Sony Corp 光ディスクおよびその製造方法
JP2003251937A (ja) 2002-03-05 2003-09-09 Fuji Photo Film Co Ltd マーキング方法、マーキング装置及び感光材料
JP2005092137A (ja) 2003-09-19 2005-04-07 Nikon Corp 露光装置及び露光方法
JP2006017975A (ja) 2004-07-01 2006-01-19 Ricoh Co Ltd 移動体、画像形成装置及び移動体のマーク形成方法
US20070269740A1 (en) 2006-05-22 2007-11-22 Blank David H Methods of marking and related structures and compositions
JP2008153638A (ja) 2006-11-24 2008-07-03 Semiconductor Energy Lab Co Ltd マーカー付き基板、マーカー付き基板の作製方法、レーザ照射装置、レーザ照射方法、露光装置及び半導体装置の作製方法
US20180259862A1 (en) 2017-03-08 2018-09-13 SK Hynix Inc. Imprint templates with alignment marks and methods of forming imprint patterns using the same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1012521A (ja) * 1996-06-21 1998-01-16 Nikon Corp 感光剤塗布方法及び装置、及び位置合わせ方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001203146A (ja) 2000-01-20 2001-07-27 Toshiba Corp パターン形成方法
JP2003059105A (ja) 2001-08-23 2003-02-28 Sony Corp 光ディスクおよびその製造方法
JP2003251937A (ja) 2002-03-05 2003-09-09 Fuji Photo Film Co Ltd マーキング方法、マーキング装置及び感光材料
JP2005092137A (ja) 2003-09-19 2005-04-07 Nikon Corp 露光装置及び露光方法
JP2006017975A (ja) 2004-07-01 2006-01-19 Ricoh Co Ltd 移動体、画像形成装置及び移動体のマーク形成方法
US20070269740A1 (en) 2006-05-22 2007-11-22 Blank David H Methods of marking and related structures and compositions
JP2008153638A (ja) 2006-11-24 2008-07-03 Semiconductor Energy Lab Co Ltd マーカー付き基板、マーカー付き基板の作製方法、レーザ照射装置、レーザ照射方法、露光装置及び半導体装置の作製方法
US20180259862A1 (en) 2017-03-08 2018-09-13 SK Hynix Inc. Imprint templates with alignment marks and methods of forming imprint patterns using the same

Also Published As

Publication number Publication date
JP2021036347A (ja) 2021-03-04

Similar Documents

Publication Publication Date Title
JP6584567B1 (ja) リソグラフィ装置、パターン形成方法及び物品の製造方法
KR101247898B1 (ko) 위치 검출 장치, 노광 장치, 디바이스 제조 방법, 위치 검출 방법 및 노광 방법
US5160957A (en) Alignment and exposure apparatus
JP2893778B2 (ja) 露光装置
WO1999034255A1 (en) Method and apparatus for manufacturing photomask and method of fabricating device
US11474435B2 (en) Metrology sensor, illumination system and method of generating measurement illumination with a configurable illumination spot diameter
TW200305928A (en) Exposure apparatus and method
WO2005104196A1 (ja) 計測方法、計測装置、露光方法及び露光装置
JP2001166454A (ja) マスク、露光方法、線幅測定方法、並びに半導体デバイスの製造方法
CN109073987B (zh) 用于调节光刻设备的致动的方法
JP4392914B2 (ja) 面位置検出装置、露光装置、およびデバイス製造方法
US8077290B2 (en) Exposure apparatus, and device manufacturing method
JP6828107B2 (ja) リソグラフィ装置、パターン形成方法及び物品の製造方法
TW200903182A (en) Aberration measurement method, exposure apparatus, and device manufacturing method
JP2007294934A (ja) 計測方法及び装置、露光装置及び方法、調整方法、並びに、デバイス製造方法
JP7071483B2 (ja) リソグラフィ装置、パターン形成方法及び物品の製造方法
JP6606620B2 (ja) リソグラフィ装置内での基板処理方法および基板処理装置
JP2006030021A (ja) 位置検出装置及び位置検出方法
JPH0729816A (ja) 投影露光装置及びそれを用いた半導体素子の製造方法
JP2025072997A (ja) 露光装置、露光方法および物品製造方法
JP2025002494A (ja) 決定方法、露光装置、露光方法、及び物品の製造方法
JP2010153867A (ja) リソグラフィ装置及びデバイス製造方法
JP2022095051A (ja) 露光装置、露光方法、及び物品の製造方法
JP2010251409A (ja) 露光方法、露光装置及びデバイス製造方法
JPH02185014A (ja) アライメント方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210317

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20210317

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20220117

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20220125

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220310

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20220405

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20220506

R151 Written notification of patent or utility model registration

Ref document number: 7071483

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151