JP2021002414A - 磁気記録媒体のシード層用合金 - Google Patents
磁気記録媒体のシード層用合金 Download PDFInfo
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- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 55
- 239000000956 alloy Substances 0.000 title claims abstract description 55
- 229910052742 iron Inorganic materials 0.000 claims abstract description 12
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 12
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 8
- 229910052737 gold Inorganic materials 0.000 claims abstract description 8
- 239000012535 impurity Substances 0.000 claims abstract description 8
- 229910052741 iridium Inorganic materials 0.000 claims abstract description 8
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 8
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 8
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 8
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 8
- 229910052702 rhenium Inorganic materials 0.000 claims abstract description 8
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 8
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 8
- 229910052709 silver Inorganic materials 0.000 claims abstract description 8
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 8
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 8
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 8
- 238000004544 sputter deposition Methods 0.000 claims description 10
- 238000005477 sputtering target Methods 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 229910052796 boron Inorganic materials 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- 229910052735 hafnium Inorganic materials 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- 229910052748 manganese Inorganic materials 0.000 claims description 3
- 229910052698 phosphorus Inorganic materials 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 238000005260 corrosion Methods 0.000 abstract description 15
- 230000007797 corrosion Effects 0.000 abstract description 15
- 238000000034 method Methods 0.000 description 19
- 239000013078 crystal Substances 0.000 description 16
- 238000010791 quenching Methods 0.000 description 13
- 230000000171 quenching effect Effects 0.000 description 13
- 239000000463 material Substances 0.000 description 11
- 238000012360 testing method Methods 0.000 description 11
- 238000011156 evaluation Methods 0.000 description 9
- 239000000843 powder Substances 0.000 description 8
- 239000002994 raw material Substances 0.000 description 6
- 239000010949 copper Substances 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 229910017061 Fe Co Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009689 gas atomisation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000002706 hydrostatic effect Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000007670 refining Methods 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000001192 hot extrusion Methods 0.000 description 1
- 238000001513 hot isostatic pressing Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000009849 vacuum degassing Methods 0.000 description 1
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- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
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- C22C19/03—Alloys based on nickel or cobalt based on nickel
- C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
- C22C19/051—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W
- C22C19/056—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W with the maximum Cr content being at least 10% but less than 20%
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- C22C19/03—Alloys based on nickel or cobalt based on nickel
- C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
- C22C19/058—Alloys based on nickel or cobalt based on nickel with chromium without Mo and W
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- C22C19/07—Alloys based on nickel or cobalt based on cobalt
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- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/002—Ferrous alloys, e.g. steel alloys containing In, Mg, or other elements not provided for in one single group C22C38/001 - C22C38/60
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- C22C38/005—Ferrous alloys, e.g. steel alloys containing rare earths, i.e. Sc, Y, Lanthanides
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- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/007—Ferrous alloys, e.g. steel alloys containing silver
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- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/08—Ferrous alloys, e.g. steel alloys containing nickel
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- C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
- C22C38/105—Ferrous alloys, e.g. steel alloys containing cobalt containing Co and Ni
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- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/12—Ferrous alloys, e.g. steel alloys containing tungsten, tantalum, molybdenum, vanadium, or niobium
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- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/18—Ferrous alloys, e.g. steel alloys containing chromium
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- C22C38/18—Ferrous alloys, e.g. steel alloys containing chromium
- C22C38/22—Ferrous alloys, e.g. steel alloys containing chromium with molybdenum or tungsten
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- C22C38/18—Ferrous alloys, e.g. steel alloys containing chromium
- C22C38/24—Ferrous alloys, e.g. steel alloys containing chromium with vanadium
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- C—CHEMISTRY; METALLURGY
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- C22C38/40—Ferrous alloys, e.g. steel alloys containing chromium with nickel
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- G—PHYSICS
- G11—INFORMATION STORAGE
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Abstract
Description
出湯ノズルの直径:1mm
雰囲気の気圧:61kPa
噴霧差圧:69kPa
ロールの材質:銅
ロールの直径:300mm
ロールの回転数:3000rpm
ロールと出湯ノズルとのギャップ:0.3mm
振動試料型の保磁力メータの試料台に、両面テープで試験片を張り付け、初期印加磁場144kA/mの条件で保磁力を測定した。下記の基準に基づき、格付けを行った。この結果が、下表1−3に示されている。III、II、Iの順に、評価が高い。
I :保磁力が300A/m以下
II :保磁力が300A/mを超え500A/m以下
III:保磁力が500A/mを超える
急冷薄帯から試験片(約15mg)を採取し、VSM装置(振動試料型磁力計)を用いて、印可磁場1200kA/mの条件で飽和磁束を測定した。下記の基準に基づき、格付けを行った。この結果が、下表1−3に示されている。III、Iの順に評価が高い。
I :0.2T以上
III:0.2T未満
試験片の、ロール方向断面のミクロ組織像を得た。「JIS G 0551」の「鋼・結晶粒度の顕微鏡試験方法」の規定に準拠し、結晶粒径を測定した。下記の基準に基づき、格付けを行った。この結果が、下表1−3に示されている。III、II、Iの順に、評価が高い。
I :P/Ltが1.5以上
II :P/Ltが1.2以上1.5未満
III:P/Ltが1.2未満
銅ロールとの接触面が測定面になるように、ガラス板に試験片を両面テープで貼り付け、X線回折装置にて回折パターンを得た。回折の条件は、下記の通りである。
X線源:Cu−α線
スキャンスピード:4°/min
I :強度比I(111)/I(200)が0.7以上
III:強度比I(111)/I(200)が0.7未満
なお、試験片がfcc構造を保っていないもの、及びアモルファス化したものも、IIIと評価した。この結果が、下表1−3に示されている。III、Iの順に、評価が高い。
急冷薄帯から試験片(50mg)を採取し、その質量を正確に秤量した。この試験片を、濃度3wt.%のHNO3水溶液10mlに浸漬した。室温にて、1時間静置した後、浸漬液であるHNO3水溶液中に溶出したNi、Fe及びCoの量をICPにて測定した。Ni、Fe及びCoの溶出量の合計(Ni+Fe+Co)を求め、下記基準に基づいて、格付けを行った。この結果が、下表1−3に示されている。III、II、Iの順に、評価が高い。
I :(Ni+Fe+Co)が50ppm未満
II :(Ni+Fe+Co)が50ppm以上150ppm未満
III:(Ni+Fe+Co)が150ppm以上
Claims (4)
- Niと、Fe及びCoから選択される少なくとも1種と、W、Mo、Ta、Cr、V及びNbからなる群から選択される1種または2種以上の元素M1と、Au、Ag、Pd、Rh、Ir、Ru、Re及びPtからなる群から選択される1種又は2種以上の元素M2と、不可避的不純物とを含んでおり、
上記元素M1の含有率が、2at.%以上13at.%以下であり、
上記元素M2の含有率が、2at.%以上13at.%以下であり、
上記元素M1の含有率と上記元素M2の含有率との和が、4at.%以上15at.%以下であり、
この合金におけるNiの含有率(at.%)、Fe含有率(at.%)及びCoの含有率(at.%)の比Ni:Fe:CoがX:Y:Zとされるとき、Xが20以上100以下であり、Yが0以上50以下であり、Zが0以上60以下である磁気記録媒体のシード層用合金。 - 上記合金が、さらに、Al、Ga、In、Si、Ge、Sn、Zr、Ti、Hf、B、Cu、P、C及びMnからなる群から選択される1種又は2種以上の元素M3を含んでおり、
上記元素M3の含有率が、0at.%を超え、5at.%以下である請求項1に記載のシード層用合金。 - 請求項1又は2のいずれかに記載の合金を材質とするスパッタリングターゲット。
- スパッタリングにより得られるシード層を有しており、
上記スパッタリングに、請求項1又は2のいずれかに記載の合金を材質とするターゲットが用いられている、磁気記録媒体。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
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JP2019113927A JP7274361B2 (ja) | 2019-06-19 | 2019-06-19 | 磁気記録媒体のシード層用合金 |
CN202080034803.2A CN113811628A (zh) | 2019-06-19 | 2020-06-15 | 磁记录介质的籽晶层用合金 |
PCT/JP2020/023348 WO2020255908A1 (ja) | 2019-06-19 | 2020-06-15 | 磁気記録媒体のシード層用合金 |
TW109120523A TW202117031A (zh) | 2019-06-19 | 2020-06-18 | 磁性記錄媒體之種晶層用合金 |
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005174531A (ja) * | 2003-11-03 | 2005-06-30 | Seagate Technology Llc | 粒状垂直記録用途の非反応処理のための磁性体 |
JP2007004858A (ja) * | 2005-06-22 | 2007-01-11 | Fuji Electric Device Technology Co Ltd | 長手磁気記録媒体およびその製造方法 |
JP2017130242A (ja) * | 2015-06-12 | 2017-07-27 | 昭和電工株式会社 | 磁気記録媒体および磁気記録再生装置 |
WO2017179466A1 (ja) * | 2016-04-13 | 2017-10-19 | 山陽特殊製鋼株式会社 | 磁気記録媒体のシード層用合金、スパッタリングターゲット材および磁気記録媒体 |
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JP5726615B2 (ja) * | 2010-11-22 | 2015-06-03 | 山陽特殊製鋼株式会社 | 磁気記録媒体のシード層用合金およびスパッタリングターゲット材 |
US10559320B2 (en) * | 2014-12-19 | 2020-02-11 | Showa Denko K.K. | Magnetic recording medium and magnetic recording/reproducing apparatus |
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JP2005174531A (ja) * | 2003-11-03 | 2005-06-30 | Seagate Technology Llc | 粒状垂直記録用途の非反応処理のための磁性体 |
JP2007004858A (ja) * | 2005-06-22 | 2007-01-11 | Fuji Electric Device Technology Co Ltd | 長手磁気記録媒体およびその製造方法 |
JP2017130242A (ja) * | 2015-06-12 | 2017-07-27 | 昭和電工株式会社 | 磁気記録媒体および磁気記録再生装置 |
WO2017179466A1 (ja) * | 2016-04-13 | 2017-10-19 | 山陽特殊製鋼株式会社 | 磁気記録媒体のシード層用合金、スパッタリングターゲット材および磁気記録媒体 |
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