JP2020532127A5 - - Google Patents
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- Publication number
- JP2020532127A5 JP2020532127A5 JP2020511294A JP2020511294A JP2020532127A5 JP 2020532127 A5 JP2020532127 A5 JP 2020532127A5 JP 2020511294 A JP2020511294 A JP 2020511294A JP 2020511294 A JP2020511294 A JP 2020511294A JP 2020532127 A5 JP2020532127 A5 JP 2020532127A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- model
- effective medium
- thickness
- medium dispersion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000006185 dispersion Substances 0.000 claims 37
- 238000000034 method Methods 0.000 claims 26
- 230000003287 optical effect Effects 0.000 claims 15
- 239000012528 membrane Substances 0.000 claims 14
- 238000004458 analytical method Methods 0.000 claims 9
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 5
- 235000012431 wafers Nutrition 0.000 claims 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 4
- 238000000391 spectroscopic ellipsometry Methods 0.000 claims 4
- 238000011156 evaluation Methods 0.000 claims 3
- 238000002310 reflectometry Methods 0.000 claims 3
- 230000003595 spectral effect Effects 0.000 claims 3
- 229910004143 HfON Inorganic materials 0.000 claims 2
- 238000004891 communication Methods 0.000 claims 2
- 238000010276 construction Methods 0.000 claims 2
- 239000011159 matrix material Substances 0.000 claims 2
- 238000005259 measurement Methods 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- 229910010041 TiAlC Inorganic materials 0.000 claims 1
- 238000004590 computer program Methods 0.000 claims 1
- 238000013500 data storage Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762548579P | 2017-08-22 | 2017-08-22 | |
| US62/548,579 | 2017-08-22 | ||
| US15/800,877 US10663286B2 (en) | 2017-08-22 | 2017-11-01 | Measuring thin films on grating and bandgap on grating |
| US15/800,877 | 2017-11-01 | ||
| PCT/US2018/047363 WO2019040515A1 (en) | 2017-08-22 | 2018-08-21 | MEASUREMENT OF THIN LAYERS ON NETWORK AND BAND PROHIBITED ON NETWORK |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020532127A JP2020532127A (ja) | 2020-11-05 |
| JP2020532127A5 true JP2020532127A5 (https=) | 2021-09-30 |
| JP7369116B2 JP7369116B2 (ja) | 2023-10-25 |
Family
ID=65434158
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020511294A Active JP7369116B2 (ja) | 2017-08-22 | 2018-08-21 | 薄膜オン格子及びバンドギャップオン格子の計測 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US10663286B2 (https=) |
| JP (1) | JP7369116B2 (https=) |
| KR (1) | KR102618382B1 (https=) |
| CN (1) | CN111052327B (https=) |
| TW (1) | TWI808984B (https=) |
| WO (1) | WO2019040515A1 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114324184B (zh) * | 2021-12-30 | 2024-05-17 | 粤芯半导体技术股份有限公司 | 椭偏仪光谱浮动模型及建立方法 |
| KR102567843B1 (ko) * | 2023-02-13 | 2023-08-17 | (주)오로스 테크놀로지 | 다층 박막 구조물의 두께 분석 시스템 및 방법 |
| US12379672B2 (en) | 2023-05-11 | 2025-08-05 | Kla Corporation | Metrology of nanosheet surface roughness and profile |
| US12372882B2 (en) | 2023-06-30 | 2025-07-29 | Kla Corporation | Metrology in the presence of CMOS under array (CUA) structures utilizing an effective medium model with classification of CUA structures |
| US12380367B2 (en) | 2023-06-30 | 2025-08-05 | Kla Corporation | Metrology in the presence of CMOS under array (CuA) structures utilizing machine learning and physical modeling |
| US12510590B2 (en) | 2023-06-30 | 2025-12-30 | Kla Corporation | Metrology in the presence of CMOS under array (CuA) structures utilizing an effective medium model with physical modeling |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3749107B2 (ja) * | 1999-11-05 | 2006-02-22 | ファブソリューション株式会社 | 半導体デバイス検査装置 |
| JP3928714B2 (ja) * | 2002-09-02 | 2007-06-13 | 株式会社堀場製作所 | 分光エリプソメータを用いた薄膜複数層構造の解析方法 |
| JP3937149B2 (ja) * | 2002-04-12 | 2007-06-27 | 株式会社堀場製作所 | 分光エリプソメータを用いた極薄膜２層構造の解析方法 |
| WO2003023373A1 (fr) * | 2001-09-06 | 2003-03-20 | Horiba, Ltd. | Procede pour analyser une structure stratifiee en film mince au moyen d'un ellipsometre spectroscopique |
| JP2004294210A (ja) * | 2003-03-26 | 2004-10-21 | Sharp Corp | 微細物評価装置、微細物評価方法および微細物評価プログラム |
| KR100508696B1 (ko) * | 2003-12-01 | 2005-08-17 | 학교법인 서강대학교 | 구리배선용 초저유전 절연막 |
| US7065737B2 (en) * | 2004-03-01 | 2006-06-20 | Advanced Micro Devices, Inc | Multi-layer overlay measurement and correction technique for IC manufacturing |
| JP4435298B2 (ja) * | 2004-03-30 | 2010-03-17 | 株式会社堀場製作所 | 試料解析方法 |
| US7465590B1 (en) | 2005-06-30 | 2008-12-16 | Nanometrics Incorporated | Measurement of a sample using multiple models |
| EP1780499A1 (de) | 2005-10-28 | 2007-05-02 | Hch. Kündig & Cie. AG | Verfahren zum Messen der Dicke von Mehrschichtfolien |
| US20090219537A1 (en) * | 2008-02-28 | 2009-09-03 | Phillip Walsh | Method and apparatus for using multiple relative reflectance measurements to determine properties of a sample using vacuum ultra violet wavelengths |
| US8019458B2 (en) | 2008-08-06 | 2011-09-13 | Tokyo Electron Limited | Creating multi-layer/multi-input/multi-output (MLMIMO) models for metal-gate structures |
| CN101887140A (zh) * | 2010-05-26 | 2010-11-17 | 中国科学院上海光学精密机械研究所 | 宽带全介质多层膜反射衍射光栅及其设计方法 |
| US9442063B2 (en) * | 2011-06-27 | 2016-09-13 | Kla-Tencor Corporation | Measurement of composition for thin films |
| US8804106B2 (en) * | 2011-06-29 | 2014-08-12 | Kla-Tencor Corporation | System and method for nondestructively measuring concentration and thickness of doped semiconductor layers |
| JP5721586B2 (ja) * | 2011-08-12 | 2015-05-20 | 大塚電子株式会社 | 光学特性測定装置および光学特性測定方法 |
| KR101906647B1 (ko) | 2011-09-27 | 2018-10-10 | 케이엘에이-텐코 코포레이션 | 고처리량 박막 특성화 및 결함 검출 |
| US8860937B1 (en) * | 2012-10-24 | 2014-10-14 | Kla-Tencor Corp. | Metrology systems and methods for high aspect ratio and large lateral dimension structures |
| US20140118360A1 (en) * | 2012-10-30 | 2014-05-01 | Pixtronix, Inc. | Thinfilm stacks for light modulating displays |
-
2017
- 2017-11-01 US US15/800,877 patent/US10663286B2/en active Active
-
2018
- 2018-08-14 TW TW107128261A patent/TWI808984B/zh active
- 2018-08-21 JP JP2020511294A patent/JP7369116B2/ja active Active
- 2018-08-21 KR KR1020207008077A patent/KR102618382B1/ko active Active
- 2018-08-21 CN CN201880052036.0A patent/CN111052327B/zh active Active
- 2018-08-21 WO PCT/US2018/047363 patent/WO2019040515A1/en not_active Ceased
-
2020
- 2020-04-15 US US16/848,945 patent/US11555689B2/en active Active
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