JP2020520090A - 自己整列はんだバンプを備えた基板貫通ビアを含む半導体デバイスを製造する方法および半導体構造 - Google Patents
自己整列はんだバンプを備えた基板貫通ビアを含む半導体デバイスを製造する方法および半導体構造 Download PDFInfo
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Abstract
Description
本発明は、米国国家安全保障局による契約番号第H98230−13−D−0173の下で米国政府の支援を受けてなされた。米国政府は、本発明に対して一定の権利を有する。
Claims (24)
- 半導体デバイスを製造する方法であって、
ベース基板と、キャリア基板と、前記ベース基板と前記キャリア基板との間に介在する埋め込みメタライゼーション層と、前記キャリア基板の上面上の第1の導電性金属材料の上部メタライゼーション層とを設けることと、
前記キャリア基板内に前記埋め込みメタライゼーション層まで未充填基板貫通ビアを形成することと、
前記未充填基板貫通ビアと、前記キャリア基板上および前記第1の導電性金属材料層上の前記未充填基板貫通ビアを囲む周縁部とを画定する表面上に、第2の導電性金属材料のアンダー・バンプ・メタライゼーション層を形成することであって、前記アンダー・バンプ・メタライゼーション層が前記埋め込みメタライゼーション層と前記上部メタライゼーション層とに結合され、前記第1の導電性金属材料と前記第2の導電性金属材料とが異なる、前記アンダー・バンプ・メタライゼーション層を形成することと、
前記未充填基板貫通ビアと、前記キャリア基板上および前記上部メタライゼーション層上の前記未充填基板貫通ビアを囲む周縁部とを露出させる開口部を形成するために、犠牲層を付着させてパターン形成することと、
充填された基板貫通ビアを形成するために、前記開口部に第3の導電性金属材料を充填することと、
前記充填された基板貫通ビアと自己整列した円柱形状のはんだバンプを形成するように前記犠牲層を除去することと
を含む方法。 - 前記充填された基板貫通ビアが前記キャリア基板に対する10未満のアスペクト比を有する、請求項1に記載の方法。
- 前記第1の導電性金属材料と前記第3の導電性金属材料とが同じである、請求項1に記載の方法。
- 充填された基板貫通ビアと自己整列した半球形状のはんだバンプを形成するために、前記第3の導電性金属材料をリフローすることをさらに含む、請求項1に記載の方法。
- 前記犠牲層を付着させることは、ドライ・フォトレジストを積層することを含む、請求項1に記載の方法。
- 前記アンダー・バンプ・メタライゼーション層を形成することは、前記キャリア基板上に実現されたトポグラフィの上にドライ・フォトレジストを付着させることと、前記未充填基板貫通ビアと、前記キャリア基板上および前記メタライゼーション層上の前記未充填基板貫通ビアを囲む前記周縁部の少なくとも一部とに対応する表面を露出させるように前記ドライ・フォトレジストをパターン形成することと、前記露出させた表面上に前記第2の導電性金属材料をスパッタ付着させることと、リフトオフ処理によって前記ドライ・フォトレジストを除去することとを含む、請求項1に記載の方法。
- 前記第1、第2、および第3の導電性金属材料が超伝導金属である、請求項1に記載の方法。
- 前記ベース基板と前記キャリア基板との間に介在する前記埋め込みメタライゼーション層を含む前記キャリア基板に接着された前記ベース基板を設けることが、前記ベース基板と前記キャリア基板とを接着するために熱圧着接着力および温度を加えることを含み、前記ベース基板と前記キャリア基板のそれぞれが前記埋め込みメタライゼーション層の一部を含む、請求項1に記載の方法。
- 前記開口部に前記第3の導電性金属材料を充填することが、射出成形はんだ処理または電気めっき処理を含む、請求項1に記載の方法。
- 前記キャリア基板が前記基板貫通ビアの長さ寸法を規定する厚さを有する、請求項1に記載の方法。
- 未充填基板貫通ビアを形成する前に、前記厚さを規定するように前記キャリア基板を薄化することをさらに含む、請求項10に記載の方法。
- 半導体デバイスを製造する方法であって、
第1のメタライゼーション層と、前記第1のメタライゼーション層上のポリシリコンまたは誘電体層と、前記ポリシリコンまたは前記誘電体層上の第2のメタライゼーション層とを含むベース基板を設けることと、前記ポリシリコンまたは誘電体層まで開口部を形成するために前記第2のメタライゼーション層をパターン形成することと、
前記ポリシリコンまたは誘電体層を通って前記第1のメタライゼーション層まで、前記開口部内に未充填基板貫通ビアを形成することと、
前記ビアと、前記ポリシリコンまたは誘電体層上および前記第2のメタライゼーション層上の前記未充填基板貫通ビアを囲む周縁部とを画定する表面上に、前記第1および第2のメタライゼーション層に結合されるアンダー・バンプ・メタライゼーション層を形成することと、
前記未充填基板貫通ビアと、前記ポリシリコンまたは誘電体層上および前記第2のメタライゼーション層上の前記ビアを囲む前記周縁部とを露出させる開口部を形成するために、犠牲層を付着させてパターン形成することと、
充填された基板貫通ビアを形成するために前記開口部に導電性金属材料を充填することと、
前記充填された基板貫通ビアに自己整列した円柱形状のはんだバンプを形成するために前記犠牲層を除去することと
を含む方法。 - 前記ビアがそれぞれ前記ポリシリコンまたは誘電体層に対する10未満のアスペクト比を有する、請求項12に記載の方法。
- 前記ビアと自己整列した半球形状のはんだバンプを形成するために、前記導電性金属材料をリフローすることをさらに含む、請求項12に記載の方法。
- 前記導電性金属材料と前記第1および第2のメタライゼーション層とが超伝導金属を含む、請求項12に記載の方法。
- 前記犠牲を付着させることは、ドライ・フォトレジストを積層することを含む、請求項12に記載の方法。
- 前記アンダー・バンプ・メタライゼーション層を形成することは、前記ポリシリコンまたは誘電体層上に実現されたトポグラフィの上にドライ・フォトレジストを付着させることと、前記ビアと、前記ポリシリコンまたは誘電体層上および前記第2のメタライゼーション層上の前記ビアを囲む前記周縁部の少なくとも一部とに対応する表面を露出させるように前記ドライ・フォトレジストをパターン形成することと、前記露出させた表面上に前記アンダー・バンプ・メタライゼーション層をスパッタ付着させることと、リフトオフ処理によって前記ドライ・フォトレジストを除去することとを含む、請求項12に記載の方法。
- 前記ベース基板がシリコンを含む、請求項12に記載の方法。
- 前記開口部に前記導電性金属材料を充填することは、射出成形はんだ処理を含む、請求項12に記載の方法。
- 半導体構造であって、
基板貫通ビアに自己整列したはんだバンプを含み、前記はんだバンプと前記基板貫通ビアとが第1の超伝導金属で形成され、前記基板貫通ビアが埋め込みメタライゼーション層に結合されている半導体構造。 - 前記はんだバンプと前記基板貫通ビアとの下にあって前記はんだバンプと前記基板貫通ビアとに結合されたアンダー・バンプ・メタライゼーション層をさらに含む、請求項20に記載の半導体構造。
- 半導体構造であって、
第1のシリコン基板と、
第2のシリコン基板と、
前記第1のシリコン基板と前記第2のシリコン基板との間に介在する少なくとも1つの埋め込み接地面であって、前記第2の基板が前記第2の基板の一方の側に位置する第1の表面から前記第2の基板の反対側の前記少なくとも1つの埋め込み接地面まで延びる基板貫通ビアを含み、前記埋め込み接地面が第1の導電性金属材料で形成された、前記少なくとも1つの埋め込み接地面と、
前記第1の表面上に第2の導電性金属材料で形成された上部層と、
前記埋め込み接地面と、前記第2の基板上の前記基板貫通ビアの周囲の周縁部と、前記上部層上の前記基板貫通ビアの周囲の周縁部とに接触する前記基板貫通ビア内の第3の導電性金属材料で形成された共形アンダー・バンプ・メタライゼーション層と、
前記基板貫通ビアに自己整列したはんだバンプと
を含み、前記はんだバンプと前記基板貫通ビアとが第4の導電性金属材料を含む、半導体構造。 - 半導体構造であって、
第1のシリコン基板と、
前記第1のシリコン基板上に第1の導電性金属材料で形成された第1のメタライゼーション層と、
前記第1のメタライゼーション層上のポリシリコン層または誘電体層と、
前記ポリシリコン層または前記誘電体層上に第2の導電性金属材料で形成された第2のメタライゼーション層と、
前記ポリシリコン層または前記誘電体層を通って延びる基板貫通ビアと、
前記基板貫通ビア内に第3の導電性金属材料で形成され、前記第1のメタライゼーション層と、前記ポリシリコン層または前記誘電体層上の前記ビアの周囲の周縁部と、前記第2のメタライゼーション層上の前記基板貫通ビアの周囲の周縁部とに接触した共形アンダー・バンプ・メタライゼーション層と、
前記基板貫通ビアに自己整列したはんだバンプと
を含み、前記はんだバンプと前記基板貫通ビアとが第4の導電性金属材料を含む、半導体構造。 - 前記第1、第2、第3および第4の導電性金属材料が超伝導金属を含む、請求項22または23に記載の半導体構造。
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US15/590,547 US10325870B2 (en) | 2017-05-09 | 2017-05-09 | Through-substrate-vias with self-aligned solder bumps |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022201253A1 (ja) | 2021-03-22 | 2022-09-29 | 富士通株式会社 | 超電導デバイス、超電導デバイスの製造方法及び積層体 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11417819B2 (en) * | 2020-04-27 | 2022-08-16 | Microsoft Technology Licensing, Llc | Forming a bumpless superconductor device by bonding two substrates via a dielectric layer |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59107586A (ja) * | 1982-12-13 | 1984-06-21 | Nippon Telegr & Teleph Corp <Ntt> | 超伝導フリツプチツプボンデイング方法 |
JPH09260529A (ja) * | 1996-03-22 | 1997-10-03 | Shinko Electric Ind Co Ltd | 半導体装置用基板及び半導体装置 |
JP2007516602A (ja) * | 2003-09-26 | 2007-06-21 | テッセラ,インコーポレイテッド | 流動可能な伝導媒体を含むキャップ付きチップの製造構造および方法 |
JP2009524254A (ja) * | 2006-01-18 | 2009-06-25 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 界面キャップ構造体を用いて最終レベル銅・c4間接続部を形成する方法 |
JP2009525613A (ja) * | 2006-02-03 | 2009-07-09 | マイクロン テクノロジー, インク. | 導電性ビアの製造と充填のための方法、およびそのように形成された導電性ビア |
JP2010508673A (ja) * | 2006-10-31 | 2010-03-18 | アドバンスト・マイクロ・ディバイシズ・インコーポレイテッド | 終端アルミニウム金属層のないメタライゼーション層積層体 |
US20130147036A1 (en) * | 2011-12-13 | 2013-06-13 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming UBM Structure on Back Surface of TSV Semiconductor Wafer |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5225372A (en) * | 1990-12-24 | 1993-07-06 | Motorola, Inc. | Method of making a semiconductor device having an improved metallization structure |
US5534462A (en) * | 1995-02-24 | 1996-07-09 | Motorola, Inc. | Method for forming a plug and semiconductor device having the same |
US5775569A (en) | 1996-10-31 | 1998-07-07 | Ibm Corporation | Method for building interconnect structures by injection molded solder and structures built |
US6143638A (en) * | 1997-12-31 | 2000-11-07 | Intel Corporation | Passivation structure and its method of fabrication |
US6216941B1 (en) | 2000-01-06 | 2001-04-17 | Trw Inc. | Method for forming high frequency connections to high temperature superconductor circuits and other fragile materials |
US6678540B2 (en) | 2001-08-22 | 2004-01-13 | Northrop Grumman Corporation | Transmission line single flux quantum chip-to -chip communication with flip-chip bump transitions |
US6605524B1 (en) * | 2001-09-10 | 2003-08-12 | Taiwan Semiconductor Manufacturing Company | Bumping process to increase bump height and to create a more robust bump structure |
US6893799B2 (en) | 2003-03-06 | 2005-05-17 | International Business Machines Corporation | Dual-solder flip-chip solder bump |
US7075171B2 (en) | 2003-03-11 | 2006-07-11 | Fujitsu Limited | Superconducting system, superconducting circuit chip, and high-temperature superconducting junction device with a shunt resistor |
US7332424B2 (en) | 2004-08-16 | 2008-02-19 | International Business Machines Corporation | Fluxless solder transfer and reflow process |
US7361993B2 (en) * | 2005-05-09 | 2008-04-22 | International Business Machines Corporation | Terminal pad structures and methods of fabricating same |
US7682961B2 (en) * | 2006-06-08 | 2010-03-23 | International Business Machines Corporation | Methods of forming solder connections and structure thereof |
US8159825B1 (en) | 2006-08-25 | 2012-04-17 | Hypres Inc. | Method for fabrication of electrical contacts to superconducting circuits |
US7485564B2 (en) * | 2007-02-12 | 2009-02-03 | International Business Machines Corporation | Undercut-free BLM process for Pb-free and Pb-reduced C4 |
JP5308145B2 (ja) * | 2008-12-19 | 2013-10-09 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
US8299611B2 (en) * | 2009-04-08 | 2012-10-30 | International Business Machines Corporation | Ball-limiting-metallurgy layers in solder ball structures |
US9202713B2 (en) * | 2010-07-26 | 2015-12-01 | Stats Chippac, Ltd. | Semiconductor device and method of forming RDL over contact pad with high alignment tolerance or reduced interconnect pitch |
US8242012B2 (en) | 2010-07-28 | 2012-08-14 | International Business Machines Corporation | Integrated circuit structure incorporating a conductor layer with both top surface and sidewall passivation and a method of forming the integrated circuit structure |
US8581420B2 (en) * | 2010-10-18 | 2013-11-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Under-bump metallization (UBM) structure and method of forming the same |
WO2012107978A1 (ja) * | 2011-02-09 | 2012-08-16 | パナソニック株式会社 | 半導体装置 |
US8921221B2 (en) | 2011-06-20 | 2014-12-30 | International Business Machines Corporation | IMS (injection molded solder) with two resist layers forming solder bumps on substrates |
US9142520B2 (en) | 2011-08-30 | 2015-09-22 | Ati Technologies Ulc | Methods of fabricating semiconductor chip solder structures |
US9627290B2 (en) * | 2011-12-07 | 2017-04-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Bump structure design for stress reduction |
US9865648B2 (en) | 2012-12-17 | 2018-01-09 | D-Wave Systems Inc. | Systems and methods for testing and packaging a superconducting chip |
CN104241239B (zh) * | 2013-06-13 | 2017-11-28 | 日月光半导体制造股份有限公司 | 半导体基板及其制造方法 |
US9159696B2 (en) * | 2013-09-13 | 2015-10-13 | GlobalFoundries, Inc. | Plug via formation by patterned plating and polishing |
US9520375B2 (en) | 2015-04-30 | 2016-12-13 | International Business Machines Corporation | Method of forming a solder bump on a substrate |
-
2017
- 2017-05-09 US US15/590,547 patent/US10325870B2/en active Active
- 2017-11-15 US US15/813,222 patent/US10347600B2/en active Active
- 2017-11-29 CN CN201780089942.3A patent/CN110574158B/zh active Active
- 2017-11-29 WO PCT/EP2017/080879 patent/WO2018206135A1/en unknown
- 2017-11-29 EP EP17805211.4A patent/EP3622555A1/en active Pending
- 2017-11-29 JP JP2019559055A patent/JP6996823B2/ja active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59107586A (ja) * | 1982-12-13 | 1984-06-21 | Nippon Telegr & Teleph Corp <Ntt> | 超伝導フリツプチツプボンデイング方法 |
JPH09260529A (ja) * | 1996-03-22 | 1997-10-03 | Shinko Electric Ind Co Ltd | 半導体装置用基板及び半導体装置 |
JP2007516602A (ja) * | 2003-09-26 | 2007-06-21 | テッセラ,インコーポレイテッド | 流動可能な伝導媒体を含むキャップ付きチップの製造構造および方法 |
JP2009524254A (ja) * | 2006-01-18 | 2009-06-25 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 界面キャップ構造体を用いて最終レベル銅・c4間接続部を形成する方法 |
JP2009525613A (ja) * | 2006-02-03 | 2009-07-09 | マイクロン テクノロジー, インク. | 導電性ビアの製造と充填のための方法、およびそのように形成された導電性ビア |
JP2010508673A (ja) * | 2006-10-31 | 2010-03-18 | アドバンスト・マイクロ・ディバイシズ・インコーポレイテッド | 終端アルミニウム金属層のないメタライゼーション層積層体 |
US20130147036A1 (en) * | 2011-12-13 | 2013-06-13 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming UBM Structure on Back Surface of TSV Semiconductor Wafer |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022201253A1 (ja) | 2021-03-22 | 2022-09-29 | 富士通株式会社 | 超電導デバイス、超電導デバイスの製造方法及び積層体 |
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