JP2020511003A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2020511003A5 JP2020511003A5 JP2019546861A JP2019546861A JP2020511003A5 JP 2020511003 A5 JP2020511003 A5 JP 2020511003A5 JP 2019546861 A JP2019546861 A JP 2019546861A JP 2019546861 A JP2019546861 A JP 2019546861A JP 2020511003 A5 JP2020511003 A5 JP 2020511003A5
- Authority
- JP
- Japan
- Prior art keywords
- model
- measurement
- uncertainty
- computer
- error
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 29
- 238000005259 measurement Methods 0.000 claims 24
- 238000004590 computer program Methods 0.000 claims 8
- 230000000694 effects Effects 0.000 claims 6
- 238000005303 weighing Methods 0.000 claims 5
- 238000009795 derivation Methods 0.000 claims 3
- 238000004088 simulation Methods 0.000 claims 3
- 230000000737 periodic effect Effects 0.000 claims 2
- 239000002131 composite material Substances 0.000 claims 1
- 238000003708 edge detection Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762464382P | 2017-02-28 | 2017-02-28 | |
| US62/464,382 | 2017-02-28 | ||
| US201762591104P | 2017-11-27 | 2017-11-27 | |
| US62/591,104 | 2017-11-27 | ||
| PCT/US2018/019793 WO2018160502A1 (en) | 2017-02-28 | 2018-02-27 | Determining the impacts of stochastic behavior on overlay metrology data |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020511003A JP2020511003A (ja) | 2020-04-09 |
| JP2020511003A5 true JP2020511003A5 (enExample) | 2021-04-15 |
| JP6960462B2 JP6960462B2 (ja) | 2021-11-05 |
Family
ID=63371265
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019546861A Active JP6960462B2 (ja) | 2017-02-28 | 2018-02-27 | オーバレイ計量データの確率論的挙動の影響の判別 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10901325B2 (enExample) |
| JP (1) | JP6960462B2 (enExample) |
| KR (1) | KR102351345B1 (enExample) |
| CN (1) | CN110383442B (enExample) |
| SG (1) | SG11201907074RA (enExample) |
| TW (1) | TWI735747B (enExample) |
| WO (1) | WO2018160502A1 (enExample) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI735747B (zh) * | 2017-02-28 | 2021-08-11 | 美商克萊譚克公司 | 度量方法及模組，分段疊對目標，及電腦程式產品 |
| US11355306B2 (en) | 2017-04-13 | 2022-06-07 | Fractilia, Llc | System and method for generating and analyzing roughness measurements and their use for process monitoring and control |
| US11508546B2 (en) | 2017-04-13 | 2022-11-22 | Fractilia, Llc | System and method for low-noise edge detection and its use for process monitoring and control |
| US11521825B2 (en) | 2017-04-13 | 2022-12-06 | Fractilia, Llc | System and method for predicting stochastic-aware process window and yield and their use for process monitoring and control |
| US10522322B2 (en) | 2017-04-13 | 2019-12-31 | Fractilia, Llc | System and method for generating and analyzing roughness measurements |
| US10664955B2 (en) | 2017-04-13 | 2020-05-26 | Fractilia, Llc | Edge detection system and its use for machine learning |
| US10656532B2 (en) | 2017-04-13 | 2020-05-19 | Fractilia, Llc | Edge detection system and its use for optical proximity correction |
| US10648801B2 (en) | 2017-04-13 | 2020-05-12 | Fractilia, Llc | System and method for generating and analyzing roughness measurements and their use for process monitoring and control |
| US11380516B2 (en) | 2017-04-13 | 2022-07-05 | Fractilia, Llc | System and method for generating and analyzing roughness measurements and their use for process monitoring and control |
| US11361937B2 (en) | 2017-04-13 | 2022-06-14 | Fractilia, Llc | System and method for generating and analyzing roughness measurements and their use for process monitoring and control |
| US10176966B1 (en) | 2017-04-13 | 2019-01-08 | Fractilia, Llc | Edge detection system |
| US12142454B2 (en) | 2017-04-13 | 2024-11-12 | Fractilla, LLC | Detection of probabilistic process windows |
| US10488188B2 (en) | 2017-04-13 | 2019-11-26 | Fractilia, Llc | System and method for removing noise from roughness measurements |
| US10445889B2 (en) * | 2017-06-08 | 2019-10-15 | Inspectrology LLC | Method for measuring overlay offset in an integrated circuit and related technology |
| JP6942555B2 (ja) * | 2017-08-03 | 2021-09-29 | 東京エレクトロン株式会社 | 基板処理方法、コンピュータ記憶媒体及び基板処理システム |
| US11333982B2 (en) | 2019-01-28 | 2022-05-17 | Kla Corporation | Scaling metric for quantifying metrology sensitivity to process variation |
| WO2020173654A1 (en) * | 2019-02-25 | 2020-09-03 | Asml Netherlands B.V. | Method for determining stochastic variation of printed patterns |
| US10990019B2 (en) * | 2019-04-09 | 2021-04-27 | Kla Corporation | Stochastic reticle defect dispositioning |
| US11353799B1 (en) * | 2019-07-23 | 2022-06-07 | Kla Corporation | System and method for error reduction for metrology measurements |
| US11568101B2 (en) * | 2019-08-13 | 2023-01-31 | International Business Machines Corporation | Predictive multi-stage modelling for complex process control |
| EP4049307A4 (en) * | 2019-11-28 | 2023-12-27 | KLA Corporation | SYSTEMS AND METHODS FOR METROLOGY OPTIMIZATION BASED ON METROLOGY LANDSCAPES |
| CN116670710A (zh) * | 2021-09-10 | 2023-08-29 | 弗拉蒂利亚有限责任公司 | 概率性工艺窗口的检测 |
| US12444628B2 (en) | 2022-06-24 | 2025-10-14 | Kla Corporation | Image modeling-assisted contour extraction |
| US12579631B2 (en) | 2023-09-26 | 2026-03-17 | Kla Corporation | Method to calibrate, predict, and control stochastic defects in EUV lithography |
| CN117311103B (zh) * | 2023-10-31 | 2024-08-06 | 魅杰光电科技(上海)有限公司 | 套刻误差测量方法、装置、系统及存储介质 |
| US20250377993A1 (en) * | 2024-06-11 | 2025-12-11 | Dell Products L.P. | Multi-power-domain emulated persistent memory resource system |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7541201B2 (en) | 2000-08-30 | 2009-06-02 | Kla-Tencor Technologies Corporation | Apparatus and methods for determining overlay of structures having rotational or mirror symmetry |
| US7068833B1 (en) | 2000-08-30 | 2006-06-27 | Kla-Tencor Corporation | Overlay marks, methods of overlay mark design and methods of overlay measurements |
| US7804994B2 (en) | 2002-02-15 | 2010-09-28 | Kla-Tencor Technologies Corporation | Overlay metrology and control method |
| US7478019B2 (en) | 2005-01-26 | 2009-01-13 | Kla-Tencor Corporation | Multiple tool and structure analysis |
| IL181209A0 (en) * | 2007-02-07 | 2007-07-04 | Nova Measuring Instr Ltd | A method of measurement |
| JP5605727B2 (ja) | 2010-04-06 | 2014-10-15 | Ｊｎｃ株式会社 | セレンテラジン類縁体及びセレンテラミド類縁体 |
| US20130042089A1 (en) | 2011-08-11 | 2013-02-14 | Advanced Micro Devices, Inc. | Word line late kill in scheduler |
| US9091942B2 (en) * | 2011-11-18 | 2015-07-28 | International Business Machines Corporation | Scatterometry measurement of line edge roughness in the bright field |
| NL2009982A (en) * | 2012-01-10 | 2013-07-15 | Asml Netherlands Bv | Source mask optimization to reduce stochastic effects. |
| US8843875B2 (en) | 2012-05-08 | 2014-09-23 | Kla-Tencor Corporation | Measurement model optimization based on parameter variations across a wafer |
| TWI526777B (zh) * | 2012-08-06 | 2016-03-21 | Ａｓｍｌ荷蘭公司 | 用於藉由嵌段共聚物之自我組裝在一基板上提供微影特徵之方法 |
| US9329033B2 (en) * | 2012-09-05 | 2016-05-03 | Kla-Tencor Corporation | Method for estimating and correcting misregistration target inaccuracy |
| CN105992975B (zh) * | 2014-02-11 | 2018-06-01 | Asml荷兰有限公司 | 用于计算任意图案的随机变化的模型 |
| WO2015139951A1 (en) * | 2014-03-18 | 2015-09-24 | Asml Netherlands B.V. | Pattern placement error aware optimization |
| JP6227466B2 (ja) * | 2014-04-14 | 2017-11-08 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置および検査装置 |
| TWI735747B (zh) | 2017-02-28 | 2021-08-11 | 美商克萊譚克公司 | 度量方法及模組，分段疊對目標，及電腦程式產品 |
| KR102253565B1 (ko) | 2017-10-22 | 2021-05-18 | 케이엘에이 코포레이션 | 이미징 오버레이 계측에서 오버레이 오정렬 오차 평가치의 이용 |
-
2018
- 2018-02-27 TW TW107106629A patent/TWI735747B/zh active
- 2018-02-27 KR KR1020197028612A patent/KR102351345B1/ko active Active
- 2018-02-27 SG SG11201907074RA patent/SG11201907074RA/en unknown
- 2018-02-27 US US15/763,662 patent/US10901325B2/en active Active
- 2018-02-27 WO PCT/US2018/019793 patent/WO2018160502A1/en not_active Ceased
- 2018-02-27 CN CN201880014361.8A patent/CN110383442B/zh active Active
- 2018-02-27 JP JP2019546861A patent/JP6960462B2/ja active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2020511003A5 (enExample) | ||
| TWI735747B (zh) | 度量方法及模組，分段疊對目標，及電腦程式產品 | |
| KR102120522B1 (ko) | 대표 타겟 부분집합의 선택 및 이용 | |
| JP6183450B2 (ja) | システム分析装置、及び、システム分析方法 | |
| US8612908B2 (en) | Method and system for verification of electrical circuit designs at process, voltage, and temperature corners | |
| CN105765562B (zh) | 用于求取基于数据的函数模型的方法和设备 | |
| JPWO2020166236A5 (enExample) | ||
| CN114254792B (zh) | 一种烟气含氧量预测方法及装置 | |
| CN108022046A (zh) | 一种电力系统数据质量评估方法、存储介质及设备 | |
| KR101677008B1 (ko) | Tsd 기반 데이터 예측 방법 | |
| KR20190048840A (ko) | 자동으로 최적의 통계 모델을 결정하는 방법 및 그 장치 | |
| CN114723629A (zh) | 一种基于对抗学习的点云去噪增强方法 | |
| Beyaztas et al. | Sufficient jackknife-after-bootstrap method for detection of influential observations in linear regression models | |
| JP6216498B2 (ja) | 標本データ用のロバストなピークファインダー | |
| JP2019500698A5 (enExample) | ||
| JP6178277B2 (ja) | 故障解析における影響因子情報取得方法および影響因子情報取得装置 | |
| CN118504499B (zh) | 一种电学性能测试平台及方法 | |
| JP6728830B2 (ja) | 情報処理装置、情報処理方法、及び、プログラム | |
| JP6070337B2 (ja) | 物理故障解析プログラム、物理故障解析方法および物理故障解析装置 | |
| KR102075370B1 (ko) | 시계열 데이터 처리 장치 및 방법 | |
| KR20180131788A (ko) | 강인한 라이트필드 깊이 영상 추정 방법 및 장치 | |
| CN114972066B (zh) | 一种点云去噪算法参数的自动调优方法及装置 | |
| JP2015026218A (ja) | 異常事例検出装置、方法、プログラム、及び記録媒体 | |
| CN111316257A (zh) | 基于图结构数据的候选项集支持度计算方法及其应用 | |
| WO2019224909A1 (ja) | パラメータ選択方法、パラメータ選択プログラム、及び情報処理装置 |