JP2020511003A5 - - Google Patents
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- JP2020511003A5 JP2020511003A5 JP2019546861A JP2019546861A JP2020511003A5 JP 2020511003 A5 JP2020511003 A5 JP 2020511003A5 JP 2019546861 A JP2019546861 A JP 2019546861A JP 2019546861 A JP2019546861 A JP 2019546861A JP 2020511003 A5 JP2020511003 A5 JP 2020511003A5
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- model
- measurement
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- 238000000034 method Methods 0.000 claims 29
- 238000005259 measurement Methods 0.000 claims 24
- 238000004590 computer program Methods 0.000 claims 8
- 230000000694 effects Effects 0.000 claims 6
- 238000005303 weighing Methods 0.000 claims 5
- 238000009795 derivation Methods 0.000 claims 3
- 238000004088 simulation Methods 0.000 claims 3
- 230000000737 periodic effect Effects 0.000 claims 2
- 239000002131 composite material Substances 0.000 claims 1
- 238000003708 edge detection Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762464382P | 2017-02-28 | 2017-02-28 | |
| US62/464,382 | 2017-02-28 | ||
| US201762591104P | 2017-11-27 | 2017-11-27 | |
| US62/591,104 | 2017-11-27 | ||
| PCT/US2018/019793 WO2018160502A1 (en) | 2017-02-28 | 2018-02-27 | Determining the impacts of stochastic behavior on overlay metrology data |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020511003A JP2020511003A (ja) | 2020-04-09 |
| JP2020511003A5 true JP2020511003A5 (enExample) | 2021-04-15 |
| JP6960462B2 JP6960462B2 (ja) | 2021-11-05 |
Family
ID=63371265
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019546861A Active JP6960462B2 (ja) | 2017-02-28 | 2018-02-27 | オーバレイ計量データの確率論的挙動の影響の判別 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10901325B2 (enExample) |
| JP (1) | JP6960462B2 (enExample) |
| KR (1) | KR102351345B1 (enExample) |
| CN (1) | CN110383442B (enExample) |
| SG (1) | SG11201907074RA (enExample) |
| TW (1) | TWI735747B (enExample) |
| WO (1) | WO2018160502A1 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6960462B2 (ja) * | 2017-02-28 | 2021-11-05 | ケーエルエー コーポレイション | オーバレイ計量データの確率論的挙動の影響の判別 |
| US11521825B2 (en) | 2017-04-13 | 2022-12-06 | Fractilia, Llc | System and method for predicting stochastic-aware process window and yield and their use for process monitoring and control |
| US11508546B2 (en) | 2017-04-13 | 2022-11-22 | Fractilia, Llc | System and method for low-noise edge detection and its use for process monitoring and control |
| US11380516B2 (en) | 2017-04-13 | 2022-07-05 | Fractilia, Llc | System and method for generating and analyzing roughness measurements and their use for process monitoring and control |
| US12142454B2 (en) | 2017-04-13 | 2024-11-12 | Fractilla, LLC | Detection of probabilistic process windows |
| US10664955B2 (en) | 2017-04-13 | 2020-05-26 | Fractilia, Llc | Edge detection system and its use for machine learning |
| US11361937B2 (en) | 2017-04-13 | 2022-06-14 | Fractilia, Llc | System and method for generating and analyzing roughness measurements and their use for process monitoring and control |
| US10522322B2 (en) | 2017-04-13 | 2019-12-31 | Fractilia, Llc | System and method for generating and analyzing roughness measurements |
| US10648801B2 (en) | 2017-04-13 | 2020-05-12 | Fractilia, Llc | System and method for generating and analyzing roughness measurements and their use for process monitoring and control |
| US11355306B2 (en) | 2017-04-13 | 2022-06-07 | Fractilia, Llc | System and method for generating and analyzing roughness measurements and their use for process monitoring and control |
| US10176966B1 (en) | 2017-04-13 | 2019-01-08 | Fractilia, Llc | Edge detection system |
| US10656532B2 (en) | 2017-04-13 | 2020-05-19 | Fractilia, Llc | Edge detection system and its use for optical proximity correction |
| US10488188B2 (en) | 2017-04-13 | 2019-11-26 | Fractilia, Llc | System and method for removing noise from roughness measurements |
| US10445889B2 (en) * | 2017-06-08 | 2019-10-15 | Inspectrology LLC | Method for measuring overlay offset in an integrated circuit and related technology |
| JP6942555B2 (ja) * | 2017-08-03 | 2021-09-29 | 東京エレクトロン株式会社 | 基板処理方法、コンピュータ記憶媒体及び基板処理システム |
| US11333982B2 (en) * | 2019-01-28 | 2022-05-17 | Kla Corporation | Scaling metric for quantifying metrology sensitivity to process variation |
| WO2020173654A1 (en) * | 2019-02-25 | 2020-09-03 | Asml Netherlands B.V. | Method for determining stochastic variation of printed patterns |
| US10990019B2 (en) * | 2019-04-09 | 2021-04-27 | Kla Corporation | Stochastic reticle defect dispositioning |
| US11353799B1 (en) * | 2019-07-23 | 2022-06-07 | Kla Corporation | System and method for error reduction for metrology measurements |
| US11568101B2 (en) * | 2019-08-13 | 2023-01-31 | International Business Machines Corporation | Predictive multi-stage modelling for complex process control |
| US11725934B2 (en) * | 2019-11-28 | 2023-08-15 | Kla Corporation | Systems and methods for metrology optimization based on metrology landscapes |
| KR102590974B1 (ko) * | 2021-09-10 | 2023-10-17 | 프랙틸리아 엘엘씨 | 확률적 프로세스 윈도우들의 검출 |
| US12444628B2 (en) | 2022-06-24 | 2025-10-14 | Kla Corporation | Image modeling-assisted contour extraction |
| US20250104216A1 (en) * | 2023-09-26 | 2025-03-27 | Kla Corporation | Method to calibrate, predict, and control stochastic defects in euv lithography |
| CN117311103B (zh) * | 2023-10-31 | 2024-08-06 | 魅杰光电科技(上海)有限公司 | 套刻误差测量方法、装置、系统及存储介质 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7541201B2 (en) | 2000-08-30 | 2009-06-02 | Kla-Tencor Technologies Corporation | Apparatus and methods for determining overlay of structures having rotational or mirror symmetry |
| US7068833B1 (en) * | 2000-08-30 | 2006-06-27 | Kla-Tencor Corporation | Overlay marks, methods of overlay mark design and methods of overlay measurements |
| US7804994B2 (en) * | 2002-02-15 | 2010-09-28 | Kla-Tencor Technologies Corporation | Overlay metrology and control method |
| US7478019B2 (en) | 2005-01-26 | 2009-01-13 | Kla-Tencor Corporation | Multiple tool and structure analysis |
| IL181209A0 (en) * | 2007-02-07 | 2007-07-04 | Nova Measuring Instr Ltd | A method of measurement |
| JP5605727B2 (ja) | 2010-04-06 | 2014-10-15 | Ｊｎｃ株式会社 | セレンテラジン類縁体及びセレンテラミド類縁体 |
| US20130042089A1 (en) | 2011-08-11 | 2013-02-14 | Advanced Micro Devices, Inc. | Word line late kill in scheduler |
| US9091942B2 (en) * | 2011-11-18 | 2015-07-28 | International Business Machines Corporation | Scatterometry measurement of line edge roughness in the bright field |
| NL2009982A (en) * | 2012-01-10 | 2013-07-15 | Asml Netherlands Bv | Source mask optimization to reduce stochastic effects. |
| US8843875B2 (en) | 2012-05-08 | 2014-09-23 | Kla-Tencor Corporation | Measurement model optimization based on parameter variations across a wafer |
| TWI526777B (zh) * | 2012-08-06 | 2016-03-21 | Ａｓｍｌ荷蘭公司 | 用於藉由嵌段共聚物之自我組裝在一基板上提供微影特徵之方法 |
| US9329033B2 (en) * | 2012-09-05 | 2016-05-03 | Kla-Tencor Corporation | Method for estimating and correcting misregistration target inaccuracy |
| JP6346297B2 (ja) * | 2014-02-11 | 2018-06-20 | エーエスエムエル ネザーランズ ビー．ブイ． | 任意パターンにおける確率的変動を計算するためのモデル |
| US10386727B2 (en) * | 2014-03-18 | 2019-08-20 | Asml Netherlands B.V. | Pattern placement error aware optimization |
| JP6227466B2 (ja) * | 2014-04-14 | 2017-11-08 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置および検査装置 |
| JP6960462B2 (ja) | 2017-02-28 | 2021-11-05 | ケーエルエー コーポレイション | オーバレイ計量データの確率論的挙動の影響の判別 |
| US10565697B2 (en) | 2017-10-22 | 2020-02-18 | Kla-Tencor Corporation | Utilizing overlay misregistration error estimations in imaging overlay metrology |
-
2018
- 2018-02-27 JP JP2019546861A patent/JP6960462B2/ja active Active
- 2018-02-27 SG SG11201907074RA patent/SG11201907074RA/en unknown
- 2018-02-27 KR KR1020197028612A patent/KR102351345B1/ko active Active
- 2018-02-27 WO PCT/US2018/019793 patent/WO2018160502A1/en not_active Ceased
- 2018-02-27 TW TW107106629A patent/TWI735747B/zh active
- 2018-02-27 CN CN201880014361.8A patent/CN110383442B/zh active Active
- 2018-02-27 US US15/763,662 patent/US10901325B2/en active Active
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